JP2008071492A5 - - Google Patents

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Publication number
JP2008071492A5
JP2008071492A5 JP2006246249A JP2006246249A JP2008071492A5 JP 2008071492 A5 JP2008071492 A5 JP 2008071492A5 JP 2006246249 A JP2006246249 A JP 2006246249A JP 2006246249 A JP2006246249 A JP 2006246249A JP 2008071492 A5 JP2008071492 A5 JP 2008071492A5
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JP
Japan
Prior art keywords
sample
charge
charged particle
particle beam
charged
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006246249A
Other languages
English (en)
Japanese (ja)
Other versions
JP4283835B2 (ja
JP2008071492A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2006246249A external-priority patent/JP4283835B2/ja
Priority to JP2006246249A priority Critical patent/JP4283835B2/ja
Priority to US11/898,358 priority patent/US8013315B2/en
Priority to TW096133807A priority patent/TWI443704B/zh
Priority to TW103100024A priority patent/TWI485742B/zh
Priority to KR1020070092115A priority patent/KR101364672B1/ko
Publication of JP2008071492A publication Critical patent/JP2008071492A/ja
Publication of JP2008071492A5 publication Critical patent/JP2008071492A5/ja
Publication of JP4283835B2 publication Critical patent/JP4283835B2/ja
Application granted granted Critical
Priority to KR1020130136867A priority patent/KR101507476B1/ko
Priority to KR1020140088521A priority patent/KR101564047B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2006246249A 2006-09-12 2006-09-12 荷電粒子線装置及び該装置を用いたデバイス製造方法 Expired - Fee Related JP4283835B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2006246249A JP4283835B2 (ja) 2006-09-12 2006-09-12 荷電粒子線装置及び該装置を用いたデバイス製造方法
KR1020070092115A KR101364672B1 (ko) 2006-09-12 2007-09-11 하전입자선장치, 그 장치를 이용한 비점수차 조정방법 및그 장치를 이용한 디바이스제조방법
TW096133807A TWI443704B (zh) 2006-09-12 2007-09-11 荷電粒子束裝置及使用該裝置之元件製造方法
TW103100024A TWI485742B (zh) 2006-09-12 2007-09-11 荷電粒子束裝置及使用該裝置之半導體元件製造方法
US11/898,358 US8013315B2 (en) 2006-09-12 2007-09-11 Charged particle beam apparatus, method of adjusting astigmatism using same and method of manufacturing device using same
KR1020130136867A KR101507476B1 (ko) 2006-09-12 2013-11-12 하전입자선장치, 그 장치를 이용한 비점수차 조정방법 및 그 장치를 이용한 디바이스제조방법
KR1020140088521A KR101564047B1 (ko) 2006-09-12 2014-07-14 하전입자선장치, 그 장치를 이용한 비점수차 조정방법 및 그 장치를 이용한 디바이스제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006246249A JP4283835B2 (ja) 2006-09-12 2006-09-12 荷電粒子線装置及び該装置を用いたデバイス製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2009019535A Division JP4960393B2 (ja) 2009-01-30 2009-01-30 荷電粒子線装置及び該装置を用いたデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2008071492A JP2008071492A (ja) 2008-03-27
JP2008071492A5 true JP2008071492A5 (enExample) 2008-08-14
JP4283835B2 JP4283835B2 (ja) 2009-06-24

Family

ID=39292923

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006246249A Expired - Fee Related JP4283835B2 (ja) 2006-09-12 2006-09-12 荷電粒子線装置及び該装置を用いたデバイス製造方法

Country Status (1)

Country Link
JP (1) JP4283835B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011007517A1 (ja) * 2009-07-15 2011-01-20 株式会社 日立ハイテクノロジーズ 試料電位測定方法、及び荷電粒子線装置
KR101177504B1 (ko) * 2011-06-30 2012-08-28 김용환 전자빔 소스로부터 조사된 전자빔 전하의 중화 방법

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