JP4283835B2 - 荷電粒子線装置及び該装置を用いたデバイス製造方法 - Google Patents

荷電粒子線装置及び該装置を用いたデバイス製造方法 Download PDF

Info

Publication number
JP4283835B2
JP4283835B2 JP2006246249A JP2006246249A JP4283835B2 JP 4283835 B2 JP4283835 B2 JP 4283835B2 JP 2006246249 A JP2006246249 A JP 2006246249A JP 2006246249 A JP2006246249 A JP 2006246249A JP 4283835 B2 JP4283835 B2 JP 4283835B2
Authority
JP
Japan
Prior art keywords
sample
charged particle
particle beam
gas
charge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2006246249A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008071492A5 (enExample
JP2008071492A (ja
Inventor
涼 田島
賢治 渡辺
雅規 畠山
伸治 野路
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2006246249A priority Critical patent/JP4283835B2/ja
Application filed by Ebara Corp filed Critical Ebara Corp
Priority to US11/898,358 priority patent/US8013315B2/en
Priority to KR1020070092115A priority patent/KR101364672B1/ko
Priority to TW096133807A priority patent/TWI443704B/zh
Priority to TW103100024A priority patent/TWI485742B/zh
Publication of JP2008071492A publication Critical patent/JP2008071492A/ja
Publication of JP2008071492A5 publication Critical patent/JP2008071492A5/ja
Application granted granted Critical
Publication of JP4283835B2 publication Critical patent/JP4283835B2/ja
Priority to KR1020130136867A priority patent/KR101507476B1/ko
Priority to KR1020140088521A priority patent/KR101564047B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2006246249A 2006-09-12 2006-09-12 荷電粒子線装置及び該装置を用いたデバイス製造方法 Expired - Fee Related JP4283835B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2006246249A JP4283835B2 (ja) 2006-09-12 2006-09-12 荷電粒子線装置及び該装置を用いたデバイス製造方法
KR1020070092115A KR101364672B1 (ko) 2006-09-12 2007-09-11 하전입자선장치, 그 장치를 이용한 비점수차 조정방법 및그 장치를 이용한 디바이스제조방법
TW096133807A TWI443704B (zh) 2006-09-12 2007-09-11 荷電粒子束裝置及使用該裝置之元件製造方法
TW103100024A TWI485742B (zh) 2006-09-12 2007-09-11 荷電粒子束裝置及使用該裝置之半導體元件製造方法
US11/898,358 US8013315B2 (en) 2006-09-12 2007-09-11 Charged particle beam apparatus, method of adjusting astigmatism using same and method of manufacturing device using same
KR1020130136867A KR101507476B1 (ko) 2006-09-12 2013-11-12 하전입자선장치, 그 장치를 이용한 비점수차 조정방법 및 그 장치를 이용한 디바이스제조방법
KR1020140088521A KR101564047B1 (ko) 2006-09-12 2014-07-14 하전입자선장치, 그 장치를 이용한 비점수차 조정방법 및 그 장치를 이용한 디바이스제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006246249A JP4283835B2 (ja) 2006-09-12 2006-09-12 荷電粒子線装置及び該装置を用いたデバイス製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2009019535A Division JP4960393B2 (ja) 2009-01-30 2009-01-30 荷電粒子線装置及び該装置を用いたデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2008071492A JP2008071492A (ja) 2008-03-27
JP2008071492A5 JP2008071492A5 (enExample) 2008-08-14
JP4283835B2 true JP4283835B2 (ja) 2009-06-24

Family

ID=39292923

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006246249A Expired - Fee Related JP4283835B2 (ja) 2006-09-12 2006-09-12 荷電粒子線装置及び該装置を用いたデバイス製造方法

Country Status (1)

Country Link
JP (1) JP4283835B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011007517A1 (ja) * 2009-07-15 2011-01-20 株式会社 日立ハイテクノロジーズ 試料電位測定方法、及び荷電粒子線装置
KR101177504B1 (ko) * 2011-06-30 2012-08-28 김용환 전자빔 소스로부터 조사된 전자빔 전하의 중화 방법

Also Published As

Publication number Publication date
JP2008071492A (ja) 2008-03-27

Similar Documents

Publication Publication Date Title
KR101564047B1 (ko) 하전입자선장치, 그 장치를 이용한 비점수차 조정방법 및 그 장치를 이용한 디바이스제조방법
JP5179253B2 (ja) 電極ユニット、及び荷電粒子線装置
JP3661592B2 (ja) パターン検査装置
TWI662580B (zh) 帶電粒子束樣本檢查系統及用於其中操作之方法
US8624182B2 (en) Electro-optical inspection apparatus and method with dust or particle collection function
JP7094752B2 (ja) 荷電粒子ビーム照射装置
US20030213893A1 (en) Electron beam apparatus and device manufacturing method using same
JPWO1999050651A1 (ja) パターン検査装置
JP4828162B2 (ja) 電子顕微鏡応用装置および試料検査方法
JP4588017B2 (ja) 試料から放出された電子を用いることによって試料を検査するための写像投影型電子ビーム装置
JP2005208120A (ja) 試料修正装置及び試料修正方法並びに該方法を用いたデバイス製造方法
JP2005174591A (ja) 荷電粒子線装置および荷電粒子線像生成方法
US20050029451A1 (en) Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device
JP4283835B2 (ja) 荷電粒子線装置及び該装置を用いたデバイス製造方法
CN109075002B (zh) 带电粒子显微镜以及试样拍摄方法
JP4960393B2 (ja) 荷電粒子線装置及び該装置を用いたデバイス製造方法
JP2008071492A5 (enExample)
JP7692480B2 (ja) 荷電粒子線装置
KR20240116858A (ko) 전자 현미경, 전자 현미경을 위한 전자 공급원, 및 전자 현미경을 작동시키는 방법들
JPWO2006135021A1 (ja) 荷電粒子線装置および荷電粒子線像生成方法
JP4379420B2 (ja) 試料検査装置
CN119422055A (zh) 评估样品的方法、用于评估样品的装置
JP4380782B2 (ja) 試料検査装置
JP2025527982A (ja) 予測データを生成するためのモデルの訓練
JP2005121635A (ja) パターン検査装置

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080627

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20080627

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20081128

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20081203

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090130

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20090225

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20090319

R150 Certificate of patent or registration of utility model

Ref document number: 4283835

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120327

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120327

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130327

Year of fee payment: 4

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130327

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140327

Year of fee payment: 5

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees