JP2007523974A - 熱安定性のカチオン光硬化性組成物 - Google Patents

熱安定性のカチオン光硬化性組成物 Download PDF

Info

Publication number
JP2007523974A
JP2007523974A JP2006550160A JP2006550160A JP2007523974A JP 2007523974 A JP2007523974 A JP 2007523974A JP 2006550160 A JP2006550160 A JP 2006550160A JP 2006550160 A JP2006550160 A JP 2006550160A JP 2007523974 A JP2007523974 A JP 2007523974A
Authority
JP
Japan
Prior art keywords
alkyl
group
phenyl
acid
phenyliodonium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006550160A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007523974A5 (https=
Inventor
ヴォルフ，ジャン−ピエール
イルク，シュテファン
ビルボーム，ジャン−リュク
スィツマン，ユージン・バレンタイン
ブラマー，デビッド
ロサピオ，グレッグ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of JP2007523974A publication Critical patent/JP2007523974A/ja
Publication of JP2007523974A5 publication Critical patent/JP2007523974A5/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22—Di-epoxy compounds
    • C08G59/24—Di-epoxy compounds carbocyclic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Epoxy Resins (AREA)
  • Polymerisation Methods In General (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Polymerization Catalysts (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
JP2006550160A 2004-01-27 2005-01-17 熱安定性のカチオン光硬化性組成物 Pending JP2007523974A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US53975204P 2004-01-27 2004-01-27
PCT/EP2005/050157 WO2005070989A2 (en) 2004-01-27 2005-01-17 Thermally stable cationic photocurable compositions

Publications (2)

Publication Number Publication Date
JP2007523974A true JP2007523974A (ja) 2007-08-23
JP2007523974A5 JP2007523974A5 (https=) 2008-02-28

Family

ID=34807263

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006550160A Pending JP2007523974A (ja) 2004-01-27 2005-01-17 熱安定性のカチオン光硬化性組成物

Country Status (6)

Country Link
US (2) US20050165141A1 (https=)
EP (1) EP1709099A2 (https=)
JP (1) JP2007523974A (https=)
KR (1) KR20070004649A (https=)
TW (1) TW200538481A (https=)
WO (1) WO2005070989A2 (https=)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006316206A (ja) * 2005-05-16 2006-11-24 Fujifilm Holdings Corp インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版
JP2007186566A (ja) * 2006-01-12 2007-07-26 Fujifilm Corp インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版
JP2007238777A (ja) * 2006-03-09 2007-09-20 Fujifilm Corp インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版
JP2008248150A (ja) * 2007-03-30 2008-10-16 Fujifilm Corp インク組成物、インクジェット記録方法、印刷物、平版印刷版の作製方法及び平版印刷版
JP2009120628A (ja) * 2007-11-12 2009-06-04 Fujifilm Corp インク組成物、インクカートリッジ、インクジェット記録方法及び印刷物
JP2009144057A (ja) * 2007-12-14 2009-07-02 Fujifilm Corp インクジェット記録用インク組成物、及び、インクジェット記録方法
JP2011090147A (ja) * 2009-10-22 2011-05-06 Toyo Ink Mfg Co Ltd カラーフィルタ用着色組成物およびカラーフィルタ
WO2017110744A1 (ja) * 2015-12-25 2017-06-29 コニカミノルタ株式会社 水系インクおよびインクジェット捺染方法

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1856742B (zh) * 2003-09-24 2010-11-24 日立化成工业株式会社 感光性元件、光阻图型的形成方法及印刷电路板制造方法
US20060172230A1 (en) * 2005-02-02 2006-08-03 Dsm Ip Assets B.V. Method and composition for reducing waste in photo-imaging applications
EP1963889B1 (en) * 2005-12-21 2019-12-04 Carl Zeiss Vision Australia Holdings Ltd. Primer layer coating compositions
JP4929722B2 (ja) * 2006-01-12 2012-05-09 日立化成工業株式会社 光硬化型ナノプリント用レジスト材及びパターン形成法
US7696260B2 (en) 2006-03-30 2010-04-13 Dsm Ip Assets B.V. Cationic compositions and methods of making and using the same
CN101466804B (zh) * 2006-04-13 2012-02-22 西巴控股有限公司 硫鎓盐引发剂
KR101435410B1 (ko) * 2006-10-24 2014-08-29 시바 홀딩 인크 열 안정성 양이온 광경화성 조성물
US20090115060A1 (en) 2007-11-01 2009-05-07 Infineon Technologies Ag Integrated circuit device and method
US9249237B2 (en) * 2008-02-15 2016-02-02 Catalyse Self-repairing composition, self-repairing materials, self-repairing methods and applications
JP2012073612A (ja) * 2010-09-14 2012-04-12 Rohm & Haas Electronic Materials Llc マルチアミド成分を含むフォトレジスト
JP2013065011A (ja) * 2011-09-09 2013-04-11 Rohm & Haas Electronic Materials Llc マルチアミド成分を含むフォトレジスト
US10131817B2 (en) 2012-10-02 2018-11-20 Elkem Silicones France Sas Cationically cross-linkable/polymerizable composition comprising an iodonium borate and releasing an acceptable odor
FR2996227A1 (fr) 2012-10-02 2014-04-04 Bluestar Silicones France Composition de resine organique reticulable/polymerisable par voie cationique comprenant un borate de iodonium et degageant une odeur acceptable
GB201508178D0 (en) * 2015-05-13 2015-06-24 Photocentric Ltd Method for making an object
JP6286396B2 (ja) * 2015-08-13 2018-02-28 株式会社ダイセル 硬化性組成物及びその硬化物
US20180273815A1 (en) * 2015-10-02 2018-09-27 3M Innovative Properties Company Actinic radiation-initiated epoxy adhesive and articles made therefrom
US20180033609A1 (en) * 2016-07-28 2018-02-01 QMAT, Inc. Removal of non-cleaved/non-transferred material from donor substrate
CN110408300B (zh) * 2018-04-26 2021-06-25 中钞特种防伪科技有限公司 100%固含量的保护性紫外光固化涂料组合物及其涂层和应用
US11846886B2 (en) 2020-11-23 2023-12-19 International Business Machines Corporation Photoacid generator

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004051922A (ja) * 2002-07-24 2004-02-19 Konica Minolta Holdings Inc 活性光線硬化型インク、画像形成方法、印刷物、記録装置

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3888752A (en) * 1973-11-28 1975-06-10 Gen Motors Corp Phosphite ester antioxidants in radiation cured styrene butadiene elastomers
US4138255A (en) * 1977-06-27 1979-02-06 General Electric Company Photo-curing method for epoxy resin using group VIa onium salt
US4299938A (en) * 1979-06-19 1981-11-10 Ciba-Geigy Corporation Photopolymerizable and thermally polymerizable compositions
US4339567A (en) * 1980-03-07 1982-07-13 Ciba-Geigy Corporation Photopolymerization by means of sulphoxonium salts
US4404355A (en) * 1980-10-08 1983-09-13 Ciba-Geigy Corporation Heat curable epoxy resin compositions
JPH02169619A (ja) * 1988-12-23 1990-06-29 Toshiba Corp 封止用エポキシ樹脂組成物及びこれを用いてなる光半導体素子
US5352712A (en) * 1989-05-11 1994-10-04 Borden, Inc. Ultraviolet radiation-curable coatings for optical fibers
KR910012820A (ko) * 1989-12-20 1991-08-08 로레인 제이. 프란시스 황산화제 배합물을 함유하는 유리 라디칼 중합성 조성물
JP2868672B2 (ja) * 1992-08-31 1999-03-10 沖電気工業株式会社 シリコーン樹脂組成物及びこれを用いたケイ酸ガラス薄膜の製造方法
TW269017B (https=) * 1992-12-21 1996-01-21 Ciba Geigy Ag
EP0683200B1 (en) * 1994-05-19 2001-09-26 General Electric Company Stabilizer composition
US5554644A (en) * 1994-06-08 1996-09-10 Warner-Lambert Company Tachykinin (NK2) antagonists
US5468895A (en) * 1994-10-19 1995-11-21 General Electric Company Amine stabilized amorphous phosphite
TW460509B (en) * 1996-07-12 2001-10-21 Ciba Sc Holding Ag Curing process for cationically photocurable formulations
WO1998014416A1 (en) * 1996-10-04 1998-04-09 Betzdearborn Inc. Compositions and methods for inhibiting vinyl aromatic monomer polymerization
US6281311B1 (en) * 1997-03-31 2001-08-28 Pmd Holdings Corp. Controlled free radical polymerization process
JPH11175402A (ja) * 1997-12-10 1999-07-02 Fujitsu Ltd カード型記憶媒体及びカード型記憶媒体のアクセス制御方法並びにカード型記憶媒体用アクセス制御プログラムを記録したコンピュータ読み取り可能な記録媒体
US6444733B1 (en) * 1999-03-01 2002-09-03 Ciba Specialty Chemicals Corporation Stabilizer combination for the rotomolding process
SG98433A1 (en) * 1999-12-21 2003-09-19 Ciba Sc Holding Ag Iodonium salts as latent acid donors
US6372350B1 (en) * 2000-06-16 2002-04-16 Loctite Corporation Curable epoxy-based compositions
US6750267B2 (en) * 2001-12-24 2004-06-15 University Of Massachusetts Lowell Radiation-curable polymeric composition
AU2003236360A1 (en) * 2002-04-03 2003-10-13 Kyowa Hakko Chemical Co., Ltd. Polyalkenyl ether resin
US20040087687A1 (en) * 2002-10-30 2004-05-06 Vantico A&T Us Inc. Photocurable compositions with phosphite viscosity stabilizers
US20040191674A1 (en) * 2003-03-28 2004-09-30 Yukio Hanamoto Chemical amplification resist composition

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004051922A (ja) * 2002-07-24 2004-02-19 Konica Minolta Holdings Inc 活性光線硬化型インク、画像形成方法、印刷物、記録装置

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006316206A (ja) * 2005-05-16 2006-11-24 Fujifilm Holdings Corp インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版
JP2007186566A (ja) * 2006-01-12 2007-07-26 Fujifilm Corp インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版
JP2007238777A (ja) * 2006-03-09 2007-09-20 Fujifilm Corp インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版
JP2008248150A (ja) * 2007-03-30 2008-10-16 Fujifilm Corp インク組成物、インクジェット記録方法、印刷物、平版印刷版の作製方法及び平版印刷版
JP2009120628A (ja) * 2007-11-12 2009-06-04 Fujifilm Corp インク組成物、インクカートリッジ、インクジェット記録方法及び印刷物
JP2009144057A (ja) * 2007-12-14 2009-07-02 Fujifilm Corp インクジェット記録用インク組成物、及び、インクジェット記録方法
JP2011090147A (ja) * 2009-10-22 2011-05-06 Toyo Ink Mfg Co Ltd カラーフィルタ用着色組成物およびカラーフィルタ
WO2017110744A1 (ja) * 2015-12-25 2017-06-29 コニカミノルタ株式会社 水系インクおよびインクジェット捺染方法

Also Published As

Publication number Publication date
KR20070004649A (ko) 2007-01-09
US20070225395A1 (en) 2007-09-27
EP1709099A2 (en) 2006-10-11
US20050165141A1 (en) 2005-07-28
WO2005070989A3 (en) 2005-12-01
WO2005070989A2 (en) 2005-08-04
TW200538481A (en) 2005-12-01

Similar Documents

Publication Publication Date Title
US20070225395A1 (en) Thermally stable cationic photocurable compositions
JP4966446B2 (ja) 潜伏性酸供与体としてのヨードニウム塩
JP5081151B2 (ja) スルホニウム塩開始剤
EP1095313B1 (en) Photopolymerizable thermosetting resin compositions
JP5721630B2 (ja) スルホニウム誘導体および潜在酸としてのその使用
JP6671381B2 (ja) 潜在酸およびそれらの使用
JP4312598B2 (ja) 感光性樹脂組成物
JP4575777B2 (ja) 光開始剤の貯蔵安定性の改善
ES2603838T3 (es) Composiciones fotocurables catiónicas térmicamente estables
JP2001512421A (ja) α−アミノケトンに基づく光活性化可能な窒素含有塩基
JP2008247780A (ja) オキシムスルホン酸化合物、及びそれを用いた感光性組成物
JP2011524436A (ja) 光開始剤混合物
CN101925616A (zh) 用于氧化还原固化可自由基固化的配制剂的光潜脒碱
CN1251103A (zh) 基于α－氨基烯烃的可被光活化的含氮碱
US7198884B2 (en) Heat stable photocurable resin composition for dry film resist

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080111

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20080111

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100820

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100824

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20110201