JP2007335611A5 - - Google Patents

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Publication number
JP2007335611A5
JP2007335611A5 JP2006165359A JP2006165359A JP2007335611A5 JP 2007335611 A5 JP2007335611 A5 JP 2007335611A5 JP 2006165359 A JP2006165359 A JP 2006165359A JP 2006165359 A JP2006165359 A JP 2006165359A JP 2007335611 A5 JP2007335611 A5 JP 2007335611A5
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JP
Japan
Prior art keywords
measurement
substrate
scanning
exposure apparatus
unit
Prior art date
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Application number
JP2006165359A
Other languages
English (en)
Japanese (ja)
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JP4250637B2 (ja
JP2007335611A (ja
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Publication date
Application filed filed Critical
Priority to JP2006165359A priority Critical patent/JP4250637B2/ja
Priority claimed from JP2006165359A external-priority patent/JP4250637B2/ja
Priority to US11/759,526 priority patent/US7710543B2/en
Priority to TW096121193A priority patent/TWI370330B/zh
Priority to KR1020070058194A priority patent/KR100889843B1/ko
Publication of JP2007335611A publication Critical patent/JP2007335611A/ja
Publication of JP2007335611A5 publication Critical patent/JP2007335611A5/ja
Application granted granted Critical
Publication of JP4250637B2 publication Critical patent/JP4250637B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2006165359A 2006-06-14 2006-06-14 走査露光装置及びデバイス製造方法 Expired - Fee Related JP4250637B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006165359A JP4250637B2 (ja) 2006-06-14 2006-06-14 走査露光装置及びデバイス製造方法
US11/759,526 US7710543B2 (en) 2006-06-14 2007-06-07 Scanning exposure apparatus and device manufacturing method
TW096121193A TWI370330B (en) 2006-06-14 2007-06-12 Scanning exposure apparatus and device manufacturing method
KR1020070058194A KR100889843B1 (ko) 2006-06-14 2007-06-14 주사형 노광장치 및 디바이스 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006165359A JP4250637B2 (ja) 2006-06-14 2006-06-14 走査露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2007335611A JP2007335611A (ja) 2007-12-27
JP2007335611A5 true JP2007335611A5 (enrdf_load_stackoverflow) 2008-02-14
JP4250637B2 JP4250637B2 (ja) 2009-04-08

Family

ID=38861205

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006165359A Expired - Fee Related JP4250637B2 (ja) 2006-06-14 2006-06-14 走査露光装置及びデバイス製造方法

Country Status (4)

Country Link
US (1) US7710543B2 (enrdf_load_stackoverflow)
JP (1) JP4250637B2 (enrdf_load_stackoverflow)
KR (1) KR100889843B1 (enrdf_load_stackoverflow)
TW (1) TWI370330B (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8248465B2 (en) * 2007-12-27 2012-08-21 Olympus Corporation Measuring endoscope apparatus and program
JP2019053177A (ja) 2017-09-14 2019-04-04 東芝メモリ株式会社 露光装置および方法
JP7137363B2 (ja) * 2018-06-11 2022-09-14 キヤノン株式会社 露光方法、露光装置、物品の製造方法及び計測方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3309927B2 (ja) 1993-03-03 2002-07-29 株式会社ニコン 露光方法、走査型露光装置、及びデバイス製造方法
KR100300618B1 (ko) * 1992-12-25 2001-11-22 오노 시게오 노광방법,노광장치,및그장치를사용하는디바이스제조방법
JPH0864518A (ja) * 1994-06-14 1996-03-08 Canon Inc 露光方法
JPH09293655A (ja) 1996-04-25 1997-11-11 Nikon Corp 投影露光装置
JPH10270305A (ja) 1997-03-26 1998-10-09 Nikon Corp 露光方法
JPH10284366A (ja) 1997-04-02 1998-10-23 Nikon Corp 焦点位置検出装置及び焦点位置検出方法
JP3454497B2 (ja) * 1997-07-15 2003-10-06 キヤノン株式会社 投影露光方法および装置
JP3428872B2 (ja) * 1997-08-29 2003-07-22 キヤノン株式会社 露光方法および装置
US6128089A (en) * 1998-07-28 2000-10-03 International Business Machines Corporation Combined segmented and nonsegmented bar-in-bar targets
US6063531A (en) * 1998-10-06 2000-05-16 Advanced Micro Devices, Inc. Focus monitor structure and method for lithography process
EP1187186A1 (en) * 1998-11-18 2002-03-13 Nikon Corporation Exposure method and device
JP2000260840A (ja) 1999-03-12 2000-09-22 Toshiba Corp 半導体基板の測定方法及び測定装置
US6381004B1 (en) * 1999-09-29 2002-04-30 Nikon Corporation Exposure apparatus and device manufacturing method
JP2002100552A (ja) 2000-09-21 2002-04-05 Nikon Corp 走査露光装置及びこの装置に用いる面位置検出方法
JP4803901B2 (ja) * 2001-05-22 2011-10-26 キヤノン株式会社 位置合わせ方法、露光装置、および半導体デバイス製造方法
JP2002353099A (ja) * 2001-05-22 2002-12-06 Canon Inc 位置検出方法及び装置及び露光装置及びデバイス製造方法
JP4006217B2 (ja) * 2001-10-30 2007-11-14 キヤノン株式会社 露光方法、露光装置及びデバイスの製造方法
JP3465710B2 (ja) 2002-08-26 2003-11-10 株式会社ニコン 投影露光装置、投影露光方法、並びに集積回路製造方法
JP2005129674A (ja) * 2003-10-23 2005-05-19 Canon Inc 走査露光装置およびデバイス製造方法
JP4724470B2 (ja) 2005-06-02 2011-07-13 キヤノン株式会社 露光方法

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