JP2007307639A - 研磨パッド - Google Patents

研磨パッド Download PDF

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Publication number
JP2007307639A
JP2007307639A JP2006137356A JP2006137356A JP2007307639A JP 2007307639 A JP2007307639 A JP 2007307639A JP 2006137356 A JP2006137356 A JP 2006137356A JP 2006137356 A JP2006137356 A JP 2006137356A JP 2007307639 A JP2007307639 A JP 2007307639A
Authority
JP
Japan
Prior art keywords
polishing
polishing pad
light transmission
transmission region
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006137356A
Other languages
English (en)
Japanese (ja)
Inventor
Takeshi Fukuda
武司 福田
Junji Hirose
純司 廣瀬
Yoshiyuki Nakai
良之 中井
Takeshi Kimura
毅 木村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyo Tire Corp
Original Assignee
Toyo Tire and Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Tire and Rubber Co Ltd filed Critical Toyo Tire and Rubber Co Ltd
Priority to JP2006137356A priority Critical patent/JP2007307639A/ja
Priority to KR1020087020466A priority patent/KR101120533B1/ko
Priority to CN2007800179946A priority patent/CN101448607B/zh
Priority to US12/294,391 priority patent/US7927183B2/en
Priority to PCT/JP2007/059970 priority patent/WO2007132855A1/ja
Priority to TW096117368A priority patent/TW200804034A/zh
Publication of JP2007307639A publication Critical patent/JP2007307639A/ja
Pending legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/205—Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
    • B24D3/28—Resins or natural or synthetic macromolecular compounds
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
JP2006137356A 2006-05-17 2006-05-17 研磨パッド Pending JP2007307639A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2006137356A JP2007307639A (ja) 2006-05-17 2006-05-17 研磨パッド
KR1020087020466A KR101120533B1 (ko) 2006-05-17 2007-05-15 연마 패드
CN2007800179946A CN101448607B (zh) 2006-05-17 2007-05-15 抛光垫
US12/294,391 US7927183B2 (en) 2006-05-17 2007-05-15 Polishing pad
PCT/JP2007/059970 WO2007132855A1 (ja) 2006-05-17 2007-05-15 研磨パッド
TW096117368A TW200804034A (en) 2006-05-17 2007-05-16 Polishing pad

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006137356A JP2007307639A (ja) 2006-05-17 2006-05-17 研磨パッド

Publications (1)

Publication Number Publication Date
JP2007307639A true JP2007307639A (ja) 2007-11-29

Family

ID=38693944

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006137356A Pending JP2007307639A (ja) 2006-05-17 2006-05-17 研磨パッド

Country Status (6)

Country Link
US (1) US7927183B2 (https=)
JP (1) JP2007307639A (https=)
KR (1) KR101120533B1 (https=)
CN (1) CN101448607B (https=)
TW (1) TW200804034A (https=)
WO (1) WO2007132855A1 (https=)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012071416A (ja) * 2010-09-29 2012-04-12 Rohm & Haas Electronic Materials Cmp Holdings Inc 光安定性ポリマー終点検出窓を有するケミカルメカニカルポリッシングパッドおよびそれを用いた研磨方法
JP2018533489A (ja) * 2015-11-03 2018-11-15 キャボット マイクロエレクトロニクス コーポレイション 基礎層及びこれに取付けられた窓を有する研磨パッド
US10744618B2 (en) 2013-03-15 2020-08-18 Applied Materials, Inc. Polishing pad with secondary window seal
JP2021013970A (ja) * 2019-07-11 2021-02-12 株式会社クラレ 研磨パッド及び研磨パッドの製造方法

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7927452B2 (en) * 2005-07-15 2011-04-19 Toyo Tire & Rubber Co., Ltd. Layered sheets and processes for producing the same
JP4884726B2 (ja) * 2005-08-30 2012-02-29 東洋ゴム工業株式会社 積層研磨パッドの製造方法
US20100009611A1 (en) * 2006-09-08 2010-01-14 Toyo Tire & Rubber Co., Ltd. Method for manufacturing a polishing pad
WO2008087797A1 (ja) 2007-01-15 2008-07-24 Toyo Tire & Rubber Co., Ltd. 研磨パッド及びその製造方法
JP4593643B2 (ja) * 2008-03-12 2010-12-08 東洋ゴム工業株式会社 研磨パッド
US9017140B2 (en) 2010-01-13 2015-04-28 Nexplanar Corporation CMP pad with local area transparency
US9156124B2 (en) 2010-07-08 2015-10-13 Nexplanar Corporation Soft polishing pad for polishing a semiconductor substrate
JP5453507B1 (ja) * 2012-10-31 2014-03-26 東洋ゴム工業株式会社 研磨パッド及びその製造方法
US9186772B2 (en) 2013-03-07 2015-11-17 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad with broad spectrum, endpoint detection window and method of polishing therewith
US9446497B2 (en) 2013-03-07 2016-09-20 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Broad spectrum, endpoint detection monophase olefin copolymer window with specific composition in multilayer chemical mechanical polishing pad
US9064806B1 (en) 2014-03-28 2015-06-23 Rohm and Haas Electronics Materials CMP Holdings, Inc. Soft and conditionable chemical mechanical polishing pad with window
US9216489B2 (en) 2014-03-28 2015-12-22 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad with endpoint detection window
US9259820B2 (en) 2014-03-28 2016-02-16 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad with polishing layer and window
US9333620B2 (en) 2014-04-29 2016-05-10 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad with clear endpoint detection window
US9314897B2 (en) 2014-04-29 2016-04-19 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad with endpoint detection window
US9475168B2 (en) 2015-03-26 2016-10-25 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Polishing pad window
US20180169827A1 (en) * 2016-12-16 2018-06-21 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Methods for making chemical mechanical planarization (cmp) polishing pads having integral windows
US10207388B2 (en) 2017-04-19 2019-02-19 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Aliphatic polyurethane optical endpoint detection windows and CMP polishing pads containing them
US10293456B2 (en) 2017-04-19 2019-05-21 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Aliphatic polyurethane optical endpoint detection windows and CMP polishing pads containing them
KR102567102B1 (ko) * 2017-05-12 2023-08-14 주식회사 쿠라레 연마층용 폴리우레탄, 폴리우레탄을 포함하는 연마층과 그 연마층의 개질 방법, 연마 패드 및 연마 방법
US10569383B2 (en) 2017-09-15 2020-02-25 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Flanged optical endpoint detection windows and CMP polishing pads containing them
US10465097B2 (en) 2017-11-16 2019-11-05 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Aliphatic UV cured polyurethane optical endpoint detection windows with high UV transparency for CMP polishing pads
KR102421208B1 (ko) * 2020-09-10 2022-07-14 에스케이씨솔믹스 주식회사 연마 패드 및 이를 이용한 반도체 소자의 제조 방법
JP7650698B2 (ja) * 2021-03-30 2025-03-25 富士紡ホールディングス株式会社 研磨パッド及び研磨加工物の製造方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003012596A (ja) * 2001-06-28 2003-01-15 Central Glass Co Ltd 含フッ素脂環式ジカルボン酸化合物の製造方法
JP2004297061A (ja) * 2003-03-11 2004-10-21 Toyobo Co Ltd 研磨パッドおよび半導体デバイスの製造方法
JP2005175464A (ja) * 2003-11-25 2005-06-30 Rohm & Haas Electronic Materials Cmp Holdings Inc 光透過性が高い窓を有する研磨パッド
JP2005322790A (ja) * 2004-05-10 2005-11-17 Toyo Tire & Rubber Co Ltd 研磨パッド及び半導体デバイスの製造方法
JP2006045523A (ja) * 2004-06-28 2006-02-16 Canon Inc 光カチオン重合性エポキシ樹脂組成物、これを用いた微細構造体、および該微細構造体の製造方法
JP2006102940A (ja) * 2006-01-10 2006-04-20 Nihon Micro Coating Co Ltd 研磨パッド及びその製造方法
JP2006110686A (ja) * 2004-10-15 2006-04-27 Toyo Tire & Rubber Co Ltd 研磨パッド

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JP3859241B2 (ja) 1992-09-29 2006-12-20 旭化成ケミカルズ株式会社 ポリテトラメチレンカーボネートジオールを用いた熱可塑性ポリウレタン及びポリテトラメチレンカーボネートジオールの製造法
WO1994007934A1 (fr) * 1992-09-29 1994-04-14 Asahi Kasei Kogyo Kabushiki Kaisha Polyurethane thermoplastique derive de polytetramethylene carbonate diol
JP3431115B2 (ja) 1995-03-28 2003-07-28 アプライド マテリアルズ インコーポレイテッド ケミカルメカニカルポリシングの操作をインシチュウでモニタするための装置及び方法
US5893796A (en) 1995-03-28 1999-04-13 Applied Materials, Inc. Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus
US5605760A (en) * 1995-08-21 1997-02-25 Rodel, Inc. Polishing pads
JP2002001647A (ja) * 2000-06-19 2002-01-08 Rodel Nitta Co 研磨パッド
KR100858392B1 (ko) * 2001-04-25 2008-09-11 제이에스알 가부시끼가이샤 반도체 웨이퍼용 연마 패드와, 이를 구비한 반도체웨이퍼용 연마 적층체와, 반도체 웨이퍼의 연마 방법
JP2003048151A (ja) 2001-08-08 2003-02-18 Rodel Nitta Co 研磨パッド
KR100467765B1 (ko) 2002-02-04 2005-01-24 에스케이씨 주식회사 고경도 및 우수한 내마모성을 갖는 폴리우레탄 탄성체제조용 조성물
US7435165B2 (en) * 2002-10-28 2008-10-14 Cabot Microelectronics Corporation Transparent microporous materials for CMP
CN100349267C (zh) * 2002-11-27 2007-11-14 东洋橡胶工业株式会社 研磨垫及半导体器件的制造方法
US8845852B2 (en) * 2002-11-27 2014-09-30 Toyo Tire & Rubber Co., Ltd. Polishing pad and method of producing semiconductor device
JP3582790B2 (ja) 2002-11-27 2004-10-27 東洋紡績株式会社 研磨パッド及び半導体デバイスの製造方法
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US7238097B2 (en) * 2003-04-11 2007-07-03 Nihon Microcoating Co., Ltd. Polishing pad and method of producing same
US20040224611A1 (en) * 2003-04-22 2004-11-11 Jsr Corporation Polishing pad and method of polishing a semiconductor wafer
JP2005001059A (ja) 2003-06-12 2005-01-06 Sumitomo Bakelite Co Ltd 研磨用積層体
US7195539B2 (en) * 2003-09-19 2007-03-27 Cabot Microelectronics Coporation Polishing pad with recessed window
WO2005088690A1 (ja) * 2004-03-11 2005-09-22 Toyo Tire & Rubber Co., Ltd. 研磨パッドおよび半導体デバイスの製造方法
US7871685B2 (en) * 2004-04-08 2011-01-18 Tdk Corporation Methods for producing optical recording medium and optical recording medium
KR100881245B1 (ko) * 2004-06-28 2009-02-05 캐논 가부시끼가이샤 양이온 광중합성 에폭시 수지 조성물, 이것을 사용한 미세구조체, 및 미세 구조체의 제조 방법
US7226339B2 (en) * 2005-08-22 2007-06-05 Applied Materials, Inc. Spectrum based endpointing for chemical mechanical polishing

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JP2003012596A (ja) * 2001-06-28 2003-01-15 Central Glass Co Ltd 含フッ素脂環式ジカルボン酸化合物の製造方法
JP2004297061A (ja) * 2003-03-11 2004-10-21 Toyobo Co Ltd 研磨パッドおよび半導体デバイスの製造方法
JP2005175464A (ja) * 2003-11-25 2005-06-30 Rohm & Haas Electronic Materials Cmp Holdings Inc 光透過性が高い窓を有する研磨パッド
JP2005322790A (ja) * 2004-05-10 2005-11-17 Toyo Tire & Rubber Co Ltd 研磨パッド及び半導体デバイスの製造方法
JP2006045523A (ja) * 2004-06-28 2006-02-16 Canon Inc 光カチオン重合性エポキシ樹脂組成物、これを用いた微細構造体、および該微細構造体の製造方法
JP2006110686A (ja) * 2004-10-15 2006-04-27 Toyo Tire & Rubber Co Ltd 研磨パッド
JP2006102940A (ja) * 2006-01-10 2006-04-20 Nihon Micro Coating Co Ltd 研磨パッド及びその製造方法

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012071416A (ja) * 2010-09-29 2012-04-12 Rohm & Haas Electronic Materials Cmp Holdings Inc 光安定性ポリマー終点検出窓を有するケミカルメカニカルポリッシングパッドおよびそれを用いた研磨方法
US10744618B2 (en) 2013-03-15 2020-08-18 Applied Materials, Inc. Polishing pad with secondary window seal
US11618124B2 (en) 2013-03-15 2023-04-04 Applied Materials, Inc. Polishing pad with secondary window seal
US12330260B2 (en) 2013-03-15 2025-06-17 Applied Materials, Inc. Polishing pad with secondary window seal
JP2018533489A (ja) * 2015-11-03 2018-11-15 キャボット マイクロエレクトロニクス コーポレイション 基礎層及びこれに取付けられた窓を有する研磨パッド
JP7000320B2 (ja) 2015-11-03 2022-01-19 シーエムシー マテリアルズ，インコーポレイティド 基礎層及びこれに取付けられた窓を有する研磨パッド
JP2021013970A (ja) * 2019-07-11 2021-02-12 株式会社クラレ 研磨パッド及び研磨パッドの製造方法
JP7220130B2 (ja) 2019-07-11 2023-02-09 株式会社クラレ 研磨パッド及び研磨パッドの製造方法

Also Published As

Publication number Publication date
TWI330571B (https=) 2010-09-21
US7927183B2 (en) 2011-04-19
TW200804034A (en) 2008-01-16
US20090137188A1 (en) 2009-05-28
KR20080093059A (ko) 2008-10-17
KR101120533B1 (ko) 2012-03-07
CN101448607B (zh) 2011-09-14
WO2007132855A1 (ja) 2007-11-22
CN101448607A (zh) 2009-06-03

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