JP2007294909A5 - - Google Patents

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Publication number
JP2007294909A5
JP2007294909A5 JP2007073575A JP2007073575A JP2007294909A5 JP 2007294909 A5 JP2007294909 A5 JP 2007294909A5 JP 2007073575 A JP2007073575 A JP 2007073575A JP 2007073575 A JP2007073575 A JP 2007073575A JP 2007294909 A5 JP2007294909 A5 JP 2007294909A5
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JP
Japan
Prior art keywords
frequency
processing apparatus
plasma processing
plasma
probe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007073575A
Other languages
English (en)
Japanese (ja)
Other versions
JP5107597B2 (ja
JP2007294909A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2007073575A priority Critical patent/JP5107597B2/ja
Priority claimed from JP2007073575A external-priority patent/JP5107597B2/ja
Priority to US11/691,700 priority patent/US7655110B2/en
Publication of JP2007294909A publication Critical patent/JP2007294909A/ja
Publication of JP2007294909A5 publication Critical patent/JP2007294909A5/ja
Application granted granted Critical
Publication of JP5107597B2 publication Critical patent/JP5107597B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2007073575A 2006-03-29 2007-03-20 プラズマ処理装置 Expired - Fee Related JP5107597B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2007073575A JP5107597B2 (ja) 2006-03-29 2007-03-20 プラズマ処理装置
US11/691,700 US7655110B2 (en) 2006-03-29 2007-03-27 Plasma processing apparatus

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006090243 2006-03-29
JP2006090243 2006-03-29
JP2007073575A JP5107597B2 (ja) 2006-03-29 2007-03-20 プラズマ処理装置

Publications (3)

Publication Number Publication Date
JP2007294909A JP2007294909A (ja) 2007-11-08
JP2007294909A5 true JP2007294909A5 (enExample) 2010-04-30
JP5107597B2 JP5107597B2 (ja) 2012-12-26

Family

ID=38765162

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007073575A Expired - Fee Related JP5107597B2 (ja) 2006-03-29 2007-03-20 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JP5107597B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4727479B2 (ja) * 2006-03-29 2011-07-20 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ内の高周波電流量の測定方法
JPWO2009110366A1 (ja) * 2008-03-07 2011-07-14 東京エレクトロン株式会社 プラズマ処理装置
JP5878382B2 (ja) * 2012-01-24 2016-03-08 株式会社アルバック シリコンエッチング方法
KR101333104B1 (ko) 2012-09-04 2013-11-26 이도형 반도체 박막 증착 장비용 히터 모니터링 시스템
JP6899693B2 (ja) 2017-04-14 2021-07-07 東京エレクトロン株式会社 プラズマ処理装置及び制御方法
KR102873665B1 (ko) * 2020-10-15 2025-10-17 에이에스엠 아이피 홀딩 비.브이. 반도체 소자의 제조 방법, 및 ether-cat을 사용하는 기판 처리 장치

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4590031B2 (ja) * 2000-07-26 2010-12-01 東京エレクトロン株式会社 被処理体の載置機構
JP4030766B2 (ja) * 2002-01-30 2008-01-09 アルプス電気株式会社 プラズマ処理装置
JP3923323B2 (ja) * 2002-01-30 2007-05-30 アルプス電気株式会社 プラズマ処理装置及びプラズマ処理方法
JP2004152999A (ja) * 2002-10-30 2004-05-27 Matsushita Electric Ind Co Ltd プラズマ処理方法およびプラズマ処理装置
WO2004064460A1 (ja) * 2003-01-16 2004-07-29 Japan Science And Technology Agency 高周波電力供給装置およびプラズマ発生装置
JP4448335B2 (ja) * 2004-01-08 2010-04-07 東京エレクトロン株式会社 プラズマ処理方法及びプラズマ処理装置
JP2005277397A (ja) * 2004-02-26 2005-10-06 Tokyo Electron Ltd プラズマ処理装置
JP4727479B2 (ja) * 2006-03-29 2011-07-20 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ内の高周波電流量の測定方法

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