JP2007235167A - Wiring circuit board - Google Patents

Wiring circuit board Download PDF

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JP2007235167A
JP2007235167A JP2007122786A JP2007122786A JP2007235167A JP 2007235167 A JP2007235167 A JP 2007235167A JP 2007122786 A JP2007122786 A JP 2007122786A JP 2007122786 A JP2007122786 A JP 2007122786A JP 2007235167 A JP2007235167 A JP 2007235167A
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circuit board
connection
protrusions
printed circuit
metal
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Asao Iijima
朝雄 飯島
Masayuki Osawa
正行 大沢
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Invensas Corp
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Tessera Interconnect Materials Inc
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<P>PROBLEM TO BE SOLVED: To provide a wiring circuit board in which the cost for forming the means for connection between upper and lower circuit conductors can be reduced and which is adaptable to production of a wide variety of products with small volume for each as well as production of a narrow variety of products with large volume for each by enhancing the productivity of the wiring circuit board that possesses different circuit conductor patterns depending on the product. <P>SOLUTION: The wiring circuit board uses a number of metal protrusions 53(57), which penetrates an interlayer insulating film interposed between metal layers, as the means for connection between upper and lower conductors, wherein the protrusions 53(57) for connection between upper and lower conductors are positioned at cross points of a lattice arranged with fixed intervals. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、例えばIC、LSI等の電子デバイス接続用の配線回路基板、特に高密度実装を実現できる配線回路基板に関する。   The present invention relates to a printed circuit board for connecting electronic devices such as IC and LSI, and more particularly to a printed circuit board capable of realizing high-density mounting.

本願出願人会社は配線回路基板の製造技術の開発を種々行い、その成果は例えば特願平11−229140号等により提案し、それが、例えば特開2001−05139号公報等により公表されているが、比較的最新の従来技術の一例を図4及び図5によって紹介する。
図4(A)〜(F)及び図5(G)〜(I)は高密度実装用配線回路基板に関する一つの従来例を説明するためのもので、配線回路基板の製造方法を工程順(A)〜(I)に示す断面図である。
The applicant company has developed various manufacturing techniques for printed circuit boards, and the results have been proposed in, for example, Japanese Patent Application No. 11-229140, which is disclosed in, for example, Japanese Patent Application Laid-Open No. 2001-05139. However, an example of the relatively latest prior art will be introduced with reference to FIGS.
4 (A) to 4 (F) and FIGS. 5 (G) to 5 (I) are for explaining one conventional example related to a printed circuit board for high-density mounting. It is sectional drawing shown to A)-(I).

(A)先ず、50〜100μm程度の厚さの絶縁シートからなる絶縁ベース1を用意し、図4(A)に示すように、該絶縁シート1に層間接続用の孔2をドリルにより或いはレーザー加工により形成する。
(B)次に、図4(B)に示すように、上記孔2を導電性ペースト(例えば銀或いは銅等を主材料とする。)3により例えば印刷法で充填する。これにより、絶縁ベース1は孔2、2、・・・が導電性ペースト3により充填された半硬化状態のシートAになる。
(A) First, an insulating base 1 made of an insulating sheet having a thickness of about 50 to 100 μm is prepared. As shown in FIG. 4 (A), holes 2 for interlayer connection are drilled or lasered in the insulating sheet 1. Formed by processing.
(B) Next, as shown in FIG. 4B, the holes 2 are filled with a conductive paste (for example, silver or copper, etc. as a main material) 3 by, for example, a printing method. As a result, the insulating base 1 becomes a semi-cured sheet A in which the holes 2, 2,... Are filled with the conductive paste 3.

(C)、(D)次に、図4(C)に示すように、上記シートAの両面に例えば銅からなる金属箔4、4を臨ませ、図4(D)に示すようにその金属箔4、4を加圧プレスで積層する。これにより両面に金属箔4、4が形成され、その間に絶縁シート1が存在し、孔2、2、・・・にて導電性ペースト3、3、・・・により上記両面の金属箔4・4間が電気的に接続された積層体が構成される。
(E)次に、上記金属箔4、4上に形成すべき導体回路と同じパターンを有するレジスト膜5、5を形成する。図4(E)はレジスト膜5、5形成後の状態を示す。
(C), (D) Next, as shown in FIG. 4 (C), metal foils 4 and 4 made of copper, for example, are allowed to face both sides of the sheet A, and the metal as shown in FIG. 4 (D). The foils 4 and 4 are laminated by a pressure press. As a result, metal foils 4 and 4 are formed on both sides, and an insulating sheet 1 exists between them, and the conductive foils 3, 3. A laminate in which the four are electrically connected is formed.
(E) Next, resist films 5 and 5 having the same pattern as the conductor circuit to be formed on the metal foils 4 and 4 are formed. FIG. 4E shows a state after the resist films 5 and 5 are formed.

(F)次に、上記レジスト膜5、5をマスクとして上記金属箔4、4をエッチングすることにより図4(F)に示すように導体回路6、6を形成する。これにより両面に絶縁シート1により層間分離され、孔2内の導電性ペースト3により層間接続された導体回路6、6が形成された積層体Bが構成される。
(G)次に、図5(G)に示すように、上記積層体Bの両面に、孔2、2、・・・を有し、その孔2、2、・・・が導電性ペースト3、3、・・・で充填された絶縁シート1a、1aと金属箔4a、4aを重ね、その後、加圧プレスでこれらを積層する。この積層により形成された積層体をCとする。
(F) Next, by etching the metal foils 4 and 4 using the resist films 5 and 5 as a mask, conductor circuits 6 and 6 are formed as shown in FIG. As a result, a laminated body B is formed in which conductor circuits 6 and 6 are formed on both surfaces by interlayer separation by the insulating sheet 1 and interlayer connection by the conductive paste 3 in the hole 2.
(G) Next, as shown in FIG. 5 (G), the laminate B has holes 2, 2,... On both sides, and the holes 2, 2,. The insulating sheets 1a, 1a filled with 3,... And the metal foils 4a, 4a are stacked, and then these are stacked by a pressure press. The laminated body formed by this lamination is defined as C.

(H)次に、図5(H)に示すように、積層体Cの両面の金属箔4a、4a上にレジスト膜5、5を選択的に形成する。
(I)次に、上記レジスト膜5、5をマスクとして金属箔4a、4aを選択的にエッチングすることによりパターニングして、図5(I)に示すように配線膜6a、6aを形成する。これにより、4層の導体回路6、6、6a、6aを有する配線回路基板7が形成される。
(H) Next, as shown in FIG. 5H, resist films 5 and 5 are selectively formed on the metal foils 4a and 4a on both sides of the laminate C.
(I) Next, using the resist films 5 and 5 as a mask, the metal foils 4a and 4a are selectively etched to form wiring films 6a and 6a as shown in FIG. As a result, a printed circuit board 7 having four layers of conductor circuits 6, 6, 6a, 6a is formed.

図6(A)〜(G)は高密度実装用配線回路基板に関する別の従来例を説明するためのもので、配線回路基板の製造方法を工程順(A)〜(G)に示す断面図である。
(A)例えば銅からなる金属箔(厚さ例えば18μm)10を用意し、図6(A)に示すように、該金属箔10上に導電性の突起11、11、・・・を銅或いは銀等の導電性ペーストのスクリーン印刷により形成する。突起11、11、・・・の厚さは例えば50〜100μm程度である。
FIGS. 6A to 6G are cross-sectional views illustrating another conventional example related to a printed circuit board for high-density mounting in order of steps (A) to (G). It is.
(A) A metal foil (thickness, for example, 18 μm) 10 made of, for example, copper is prepared. As shown in FIG. 6 (A), conductive protrusions 11, 11,. It is formed by screen printing of a conductive paste such as silver. The thickness of the protrusions 11, 11,... Is, for example, about 50 to 100 μm.

(B)次に、図6(B)に示すように、上記金属箔10の突起11、11、・・・が形成された面上に絶縁性の接着シート12を接着する。この接着シート12として記突起11、11、・・・の厚さよりも適宜薄いものを用いることより、上記突起11、11、・・・の頂部が接着シート12の表面から突出するようにする。この金属箔10に突起11、11、・・・を形成し、接着シート12をそれから突起11、11、・・・の頂部が突出するように接着した積層体Aが出来上がる。 (B) Next, as shown in FIG. 6B, an insulating adhesive sheet 12 is bonded onto the surface of the metal foil 10 on which the protrusions 11, 11,. The adhesive sheet 12 is appropriately thinner than the thickness of the projections 11, 11,... So that the tops of the projections 11, 11,. .. Are formed on the metal foil 10, and an adhesive sheet 12 is bonded to the top of the protrusions 11, 11,.

(C)、(D)次に、図6(C)に示すように、上記金属箔10と同様の金属箔13を上記接着シート10の接着シート12表面上方に臨ませ、熱加圧プレス法により、図5(D)に示すように、金属箔13を接着シート12及び突起11、11、・・・上に積層する。Bはそれによりできた積層体である。
(E)次に、上記積層体Bの両面の金属箔10、13上にパターニングした例えばレジスト膜を形成し、該レジスト膜をマスクとして上記金属箔10、13をエッチングすることにより導体回路14、15を形成する。図6(E)は導体回路形成後マスクとして用いたレジスト膜を除去した状態を示す。
(C), (D) Next, as shown in FIG. 6 (C), a metal foil 13 similar to the metal foil 10 is placed above the surface of the adhesive sheet 12 of the adhesive sheet 10, and a hot press method is used. 5D, the metal foil 13 is laminated on the adhesive sheet 12 and the protrusions 11, 11,. B is a laminate formed thereby.
(E) Next, a patterned resist film, for example, is formed on the metal foils 10 and 13 on both surfaces of the laminate B, and the metal foils 10 and 13 are etched using the resist film as a mask to thereby form the conductor circuit 14 and 15 is formed. FIG. 6E shows a state where the resist film used as a mask after the formation of the conductor circuit is removed.

(F)次に、上記図6(B)に示す積層体Aと同じ方法でつくられた積層体aを二つ用意し、その二つの積層体a、aを、図6(F)に示すように、上記積層体Bの両面に臨ませる。
(G)次に、上記積層体Bをその両面側から積層体a、aでサンドイッチ状に挟んで上述した熱加圧プレス法により加圧して積層し、図6(G)に示すような配線回路基板16が出来上がる。
特開2001−05139号公報
(F) Next, two laminates a made by the same method as the laminate A shown in FIG. 6B are prepared, and the two laminates a and a are shown in FIG. 6F. Thus, it is made to face on both surfaces of the laminate B.
(G) Next, the laminated body B is sandwiched between the laminated bodies a and a from both sides thereof, and pressed and laminated by the above-described hot press method, and wiring as shown in FIG. The circuit board 16 is completed.
JP 2001-05139 A

ところで、図4、図5に示した従来例には、第1に、絶縁シート1の孔2を銀等の高価な金属を主材料とする導電性ペースト3で埋めて層間接続に用いるので、コストアップに繋がるという問題があった。特に、高密度化に伴い、孔2の配設密度が増えるので、無視できないコストアップが生じる。第2に、孔2を導電性ペースト3で埋める際に、孔2以外の部分にも導電性材料が微量ながら付着し、絶縁抵抗が低下するという問題があった。   By the way, in the prior art shown in FIGS. 4 and 5, first, the hole 2 of the insulating sheet 1 is filled with a conductive paste 3 mainly composed of an expensive metal such as silver and used for interlayer connection. There was a problem that led to an increase in cost. In particular, as the density is increased, the arrangement density of the holes 2 increases, resulting in a cost increase that cannot be ignored. Secondly, when the hole 2 is filled with the conductive paste 3, there is a problem that a small amount of the conductive material adheres to portions other than the hole 2 and the insulation resistance decreases.

第3に、絶縁シート1に孔2、2、・・・を形成した後加圧積層するときに、加わる圧力によりシート1が横方向に伸延され、孔2、2、・・・の位置ずれが生じ、補正するための孔明けをしても補正しきれない場合が生じるという問題があった。斯かる孔2の位置ずれは層間接続不良の原因になり看過できない重大な問題となり、特に高密度実装の配線回路基板の場合には致命的となる。第4に、銅等からなる金属箔4、4と導電性ペースト3との接合の信頼性が不充分であるという問題があった。即ち、孔2を埋めた導電性ペースト3は半硬化状になるように溶剤分を除去するが、半硬化後の導電ペーストは溶剤分の除去等により収縮し、体積が小さくなり、導電ペースト3の上下両面が凹状になることが多い。その結果、金属箔4、4との間に接合不良が生じやすく、歩留まり、信頼性が低くなると言う問題があったのである。   Third, when forming the holes 2, 2,... In the insulating sheet 1 and then laminating under pressure, the sheet 1 is stretched in the lateral direction by the applied pressure, and the positions of the holes 2, 2,. As a result, there is a problem that even if a hole for correction is made, the correction cannot be completed. Such misalignment of the holes 2 causes an interlayer connection failure and becomes a serious problem that cannot be overlooked, and is particularly fatal in the case of a printed circuit board with high-density mounting. Fourth, there is a problem that the reliability of joining between the metal foils 4 and 4 made of copper or the like and the conductive paste 3 is insufficient. That is, the conductive paste 3 in which the holes 2 are filled removes the solvent so that it becomes semi-cured, but the semi-cured conductive paste shrinks due to the removal of the solvent and the like, and the volume becomes small. Often, the upper and lower surfaces of the are concave. As a result, there is a problem that poor bonding is likely to occur between the metal foils 4 and 4, yield and reliability are lowered.

次に、図6に示す従来例にも問題があった。第1に、突起11は高価な材料である導電性ペーストで形成するので、コストアップになるという問題があった。第2に、突起11の導電性ペーストによる形成には、スクリーン印刷法を用いる結果、導電性ペーストを厚くすることに限界があり、その結果、突起11の形成にスクリーン印刷を複数回繰り返すことが必要になる場合が多い。そして、そのように印刷回数が多くなると、位置ずれによる突起11の形状の変形が生じ易くなり、延いては後における金属箔4との接続の信頼度が低くなると言う問題があるし、スクリーン印刷するときの位置合わせ作業が非常に難しく、面倒で、熟練を要するとか、位置合わせ時間が長くなるという問題が生じる。このような傾向は、突起11の径が小さくなる程顕著である。因みに、直径が0.3mmの突起の場合、2回印刷が必要であり、直径0.2mmの突起の場合、4回印刷する必要がある。これはかなり面倒であり、高密度配線回路基板への対応に課題を残している。   Next, there was a problem with the conventional example shown in FIG. First, since the protrusion 11 is formed of a conductive paste that is an expensive material, there is a problem that the cost increases. Secondly, the formation of the protrusion 11 with the conductive paste has a limit in increasing the thickness of the conductive paste as a result of using the screen printing method. As a result, the screen printing may be repeated a plurality of times for the formation of the protrusion 11. Often needed. And if the number of times of printing increases, there is a problem that the shape of the projection 11 is easily deformed due to misalignment, and the reliability of connection with the metal foil 4 later becomes low, and screen printing is problematic. Alignment work is very difficult, troublesome, requires skill, and requires a long alignment time. Such a tendency becomes more prominent as the diameter of the protrusion 11 becomes smaller. Incidentally, in the case of a protrusion having a diameter of 0.3 mm, it is necessary to print twice, and in the case of a protrusion having a diameter of 0.2 mm, it is necessary to print four times. This is quite troublesome and leaves a problem in dealing with high-density printed circuit boards.

第3に、突起11、11、・・・の高さにばらつきが生じやすいと言う問題があった。即ち、スクリーン印刷には、形成される膜の厚さを均一にすることが難しいので、当然にスクリーン印刷により形成した突起11、11、・・・の高さにはばらつきが生じやすく、その結果、その厚さのばらつきにより、金属箔13と突起11、11、・・・との接続が不良になるおそれが生じ、歩留まり、信頼性が低くなるという問題があったのである。第4に、製造過程において配線回路基板のベースとなる金属箔10が例えば18μmと薄く、上記スクリーン印刷の際に、金属箔13側にしわ、変形、折れ曲がり等が生じないように充分な注意が必要であり、僅かなミスによる歩留まり低下を起こす可能性を有する。これは当然のことながら、コストアップの原因となり、看過できない問題となる。かといって、その金属箔10を厚くしてベースの剛性を強くしようとすると、導体回路のファインパターン化を妨げることになるという問題に直面する。   Third, there is a problem that the heights of the protrusions 11, 11,. That is, since it is difficult to make the thickness of the formed film uniform in screen printing, naturally the heights of the protrusions 11, 11,. Due to the variation in thickness, there is a possibility that the connection between the metal foil 13 and the protrusions 11, 11,... May be poor, and there is a problem that yield and reliability are lowered. Fourth, the metal foil 10 serving as the base of the printed circuit board in the manufacturing process is as thin as 18 μm, for example, and sufficient care is taken not to cause wrinkles, deformation, bending, etc. on the metal foil 13 side during the screen printing. It is necessary and has the possibility of causing a decrease in yield due to a slight mistake. Naturally, this causes a cost increase and cannot be overlooked. However, if the metal foil 10 is made thick to increase the rigidity of the base, it faces a problem that it prevents the fine patterning of the conductor circuit.

また、上記各従来例に共通する問題点としては高密度化、即ち微小な層間接続には限界があり、一つの従来例には孔径の微細化と導電ペーストの充填の難しさのため、また、別の従来例ではバンプ印刷で微小径になればなるほど印刷が難しくなり、200μm以下の径は実際はつくり得なかった。また、導電ペーストと銅箔の間の接合強度が低く、パットオンビアとして使用した場合、ビア状のパッド強度が充分でなく必要以上に面積をとる必要があった。
また、少品種大量生産に対応できるのみならず、機種に応じて異なるパターンの導体回路を有する配線回路基板の生産性を高め、他品種少量生産まで対応することができるようにすることが要求されるが、その要求に応えきれていないのが実情である。
In addition, as a problem common to each of the above conventional examples, there is a limit to high density, that is, a minute interlayer connection, and in one conventional example, due to difficulty in miniaturizing the hole diameter and filling the conductive paste, In another conventional example, printing becomes more difficult as the diameter becomes smaller by bump printing, and a diameter of 200 μm or less could not be actually produced. Further, the bonding strength between the conductive paste and the copper foil is low, and when it is used as a pad-on via, the via-shaped pad strength is not sufficient, and it is necessary to take an area more than necessary.
In addition, it is required not only to deal with mass production of small varieties, but also to increase the productivity of printed circuit boards having conductor circuits with different patterns depending on the model, and to be able to cope with small production of other varieties. However, the reality is that it has not been able to meet the demand.

本発明はこのような問題点を解決すべく為されたものであり、製造過程において曲がり、折れ、変形等が生じないようにし、製造過程における寸法の安定性を高めることにより上下導体回路間の接続の確実性を高め、上下導体回路間接続手段のコスト低減を図り、また、少品種大量生産に対応できるのみならず、機種に応じて異なるパターンの導体回路を有する配線回路基板の生産性を高め、他品種少量生産まで対応することができるようにすることを目的とする。   The present invention has been made in order to solve such problems, and prevents bending, bending, deformation, and the like in the manufacturing process, and improving the dimensional stability in the manufacturing process, thereby improving the space between the upper and lower conductor circuits. Improves connection reliability, reduces the cost of connecting means between upper and lower conductor circuits, and not only supports mass production of small varieties, but also increases the productivity of printed circuit boards with different patterns of conductor circuits depending on the model. The purpose is to be able to cope with even small production of other varieties.

請求項1の配線回路基板は、金属層の表面に多数の金属からなる上下導体間接続用突起を一定の間隔をおいて配列された格子の各交点上に配置し、上記金属層の上記導体間接続用突起が形成された表面上に層間絶縁層を該導体間接続用突起に貫通された状態で設け、上記層間絶縁層の上記上下導体間接続用突起を含む表面に金属層を形成してなることを特徴とする。   The wired circuit board according to claim 1, wherein upper and lower conductor connecting projections made of a number of metals are arranged on each surface of the metal layer on each intersection of the lattices arranged at a predetermined interval, An interlayer insulating layer is provided on the surface on which the inter-connection connection protrusion is formed so as to penetrate the inter-conductor connection protrusion, and a metal layer is formed on the surface of the interlayer insulation layer including the upper and lower conductor connection protrusions. It is characterized by.

請求項1の配線回路基板によれば、金属層の表面に多数の金属からなる上下導体間接続用突起を一定の間隔をもった格子の交点上に配置したので、配線回路基板の機種の如何を問わず、両面の導体回路を選択的エッチングにより形成するよりも前の段階までは、標準品として量産しておき、その後、機種に応じて異なるパターンの導体回路を形成することとすることができるので、多品種の配線回路基板についてその生産性を高めることができる。それと共に、マスクも品種により変える必要がなく、金属エッチング量も少なくて済むことから、多品種少量生産から少品種大量生産まで対応することができ、経済性向上に大きく寄与する。   According to the wired circuit board of the first aspect, the upper and lower conductor connecting projections made of a large number of metals are arranged on the surface of the metal layer on the intersections of the grids having a constant interval. Regardless of whether the two-sided conductor circuit is formed by selective etching, it is mass-produced as a standard product, and then a different pattern conductor circuit is formed depending on the model. Therefore, the productivity of various types of printed circuit boards can be increased. At the same time, the mask does not need to be changed depending on the product type, and the amount of metal etching can be reduced. Therefore, it is possible to deal with a wide range of production from low-mix production to small-product mass production, greatly contributing to economic improvement.

本発明は、基本的には、金属層の表面に多数の金属からなる上下導体間接続用突起を一定の間隔をおいて配列された格子の各交点上に配置し、上記金属層の上記導体間接続用突起が形成された表面上に層間絶縁層を該導体間接続用突起に貫通された状態で設け、上記層間絶縁層の上記上下導体間接続用突起を含む表面に金属層を形成してなるもので、導体回路となる金属層、上下導体間接続用突起を成す金属及び層間絶縁膜の上記上下導体間接続用突起を含む表面上に形成する金属層の材料は、銅が好適である。   In the present invention, basically, the upper and lower conductor connecting projections made of a large number of metals are arranged on each surface of the metal layer on each intersection of the lattices arranged at regular intervals, and the conductor of the metal layer An interlayer insulating layer is provided on the surface on which the inter-connection connection protrusion is formed so as to penetrate the inter-conductor connection protrusion, and a metal layer is formed on the surface of the interlayer insulation layer including the upper and lower conductor connection protrusions. The material of the metal layer forming the conductor circuit, the metal forming the protrusions for connecting the upper and lower conductors, and the metal layer formed on the surface including the protrusions for connecting the upper and lower conductors of the interlayer insulating film is preferably copper. is there.

また、上下導体間接続用突起の頂部に導電ペースト、半田或いは金等の貴金属、或いは異方性導線膜等接続性を向上させる或いは接続性について信頼度を高める膜54をコーティングすることにすると良い。
また、層間絶縁膜は例えばガラスクロス入りのプレプレグが好適である。
Moreover, it is preferable to coat a film 54 for improving the connectivity or improving the reliability of the connectivity, such as a conductive paste, a noble metal such as solder or gold, or an anisotropic conductive film, on the top of the connection protrusion between the upper and lower conductors. .
The interlayer insulating film is preferably a prepreg containing glass cloth, for example.

実施例1
図1(A)〜(E)、図2(A)、(B)及び図3は本発明配線回路基板の第1の実施例を説明するためのもので、図1(A)〜(E)はその実施例の配線回路基板の製造方法を工程順に示す断面図であり、図2(A)、(B)は上下導体間接続用突起の各別の例を示す断面図であり、図3はその実施例の配線回路基板の特徴を示す斜視図である。
先ず、図1(A)〜(E)を参照して配線回路基板の製造方法を説明する。
(A)先ず、図1(A)に示すように、例えば銅等の金属板からなる単層構造のベース材51を用意し、その一方の表面にレジスト膜52を選択的に形成する。
Example 1
FIGS. 1A to 1E, 2A, 2B and 3 are for explaining a first embodiment of the wired circuit board according to the present invention. ) Is a cross-sectional view showing the method of manufacturing the printed circuit board of the embodiment in the order of steps, and FIGS. 2A and 2B are cross-sectional views showing other examples of the upper and lower conductor connecting projections. 3 is a perspective view showing the characteristics of the printed circuit board according to the embodiment.
First, a method for manufacturing a printed circuit board will be described with reference to FIGS.
(A) First, as shown in FIG. 1A, a base material 51 having a single layer structure made of a metal plate such as copper is prepared, and a resist film 52 is selectively formed on one surface thereof.

(B)次に、図1(B)に示すように、上記レジスト膜52をマスクとして上記ベース材51をその上記表面からハーフエッチングすることにより上記導体間接続用突起53を形成する。尚、ハーフエッチングとは、文字通り厚さの2分の1エッチングするということではなく、回路層となる部分を残してエッチングすることを意味します。
(C)次に、図1(C)に示すように、上記突起53の頂部に必要に応じて導電ペースト、半田、或いは金等の貴金属、或いは異方性導線膜等接続性を向上させる或いは接続性について信頼度を高める膜54をコーティングする。該膜54は不可欠というわけではないが、接続性或いは信頼性をより高くする必要のある場合には設けると良い。
(B) Next, as shown in FIG. 1B, the base material 51 is half-etched from the surface using the resist film 52 as a mask to form the inter-conductor connection projection 53. Note that half-etching does not literally mean half-thickness etching, but means that etching is performed while leaving a portion to be a circuit layer.
(C) Next, as shown in FIG. 1 (C), the top of the protrusion 53 is improved in connection with a noble metal such as conductive paste, solder, or gold, or an anisotropic conductive film, if necessary. A film 54 that increases reliability in terms of connectivity is coated. The film 54 is not indispensable, but it is preferable to provide it when it is necessary to further improve connectivity or reliability.

(D)次に、図1(D)に示すように、銅等からなる金属箔56を上記ベース材51の上記一方の表面に層間絶縁膜55を介して積層する。
(E)次に、図1(E)に示すように、上記ベース材51の上記他方の表面部と、上記金属箔56の表面を選択的にエッチングすることにより導体回路を形成する。これにより、配線回路基板が出来上がる。
(D) Next, as shown in FIG. 1D, a metal foil 56 made of copper or the like is laminated on the one surface of the base material 51 with an interlayer insulating film 55 interposed therebetween.
(E) Next, as shown in FIG. 1E, a conductive circuit is formed by selectively etching the other surface portion of the base material 51 and the surface of the metal foil 56. Thereby, a printed circuit board is completed.

このような配線回路基板の製造方法によれば、ベース材としてエッチングバリア層のある多層構造のものを用いる必要はなく、且つ、エッチングバリア層を除去する工程が不要なので、配線回路基板の製造コストの低減を図ることができる。   According to such a method for manufacturing a printed circuit board, it is not necessary to use a multi-layer structure having an etching barrier layer as a base material, and a process for removing the etching barrier layer is not required. Can be reduced.

尚、突起53の形成後、その先端部を粗化して針状の棘が多数できるようにして金属箔56からなる導体回路との接続性を高めるようにしても良い。粗化はスプレーエッチングや、CZ処理により為し得る。また、つぶ銅メッキにより粗化することもできる。
また、突起53を含め銅の表面全面を電解クロメート処理して電解クロメート膜を形成し、以て突起53、銅表面の酸化防止性を向上させ、参加による銅箔の品質低下を防止するようにしても良い。
In addition, after the formation of the protrusion 53, the tip end portion thereof may be roughened so that a large number of needle-like spines can be formed so as to improve the connectivity with the conductor circuit made of the metal foil 56. Roughening can be done by spray etching or CZ treatment. Moreover, it can also roughen by crushed copper plating.
Further, the entire surface of the copper including the protrusion 53 is subjected to an electrolytic chromate treatment to form an electrolytic chromate film, thereby improving the oxidation resistance of the protrusion 53 and the copper surface, and preventing the deterioration of the copper foil quality due to participation. May be.

尚、図1に示した配線回路基板の上下導体間接続用突起53はその形状がコニーデ状(富士山状)であったが、必ずしもこのようにすることは不可欠ではなく、図2(A)に示すように鼓状にしても良い。(53aは鼓状の突起を示す。)。エッチング条件を変えることにより突起の形状は変わり、鼓状の突起53aを形成することもできる。この突起53aの頂部の面が広いので、半田、導電ペースト処理等がやりやすく、また、導体回路との接続性を良好にし易いという利点がある。   Although the shape of the protrusion 53 for connecting the upper and lower conductors of the printed circuit board shown in FIG. 1 is a coneide shape (Mt. Fuji shape), this is not always necessary, and FIG. It may be a drum shape as shown. (53a indicates a drum-shaped protrusion). By changing the etching conditions, the shape of the protrusion changes, and the drum-like protrusion 53a can be formed. Since the top surface of the projection 53a is wide, there are advantages that solder, conductive paste processing, etc. can be easily performed, and that the connection with the conductor circuit is easily improved.

また、図2(B)に示すように、槍状の突起57を形成するようにしても良い。このようにやり状の突起57は先が尖っていので層間絶縁膜55の貫通性、特にガラスクロス入りのプリプレグに対する貫通性を向上させ易く、且つ導体回路に食い込みやすいので、導体回路との接続性を高くすることができるという利点がある。このような槍状突起57は、形成すべき突起よりもレジスト膜の径を小さくしてエッチングすることにより形成することができる。或いは、一旦コニーデ状或いは鼓状の突起をレジスト膜等をマスクとする選択的エッチング(勿論ハーフエッチング)により形成した後、そのマスクを除去し、再度エッチング(勿論ハーフエッチング)をすることにより形成することができる。   Further, as shown in FIG. 2B, a hook-like protrusion 57 may be formed. Thus, since the protrusion 57 has a pointed tip, it is easy to improve the penetrability of the interlayer insulating film 55, particularly the penetrability to the prepreg with glass cloth, and to easily bite into the conductor circuit. There is an advantage that it can be increased. Such hook-shaped protrusions 57 can be formed by etching with a resist film having a smaller diameter than the protrusions to be formed. Alternatively, a conical or drum-shaped protrusion is once formed by selective etching (of course half-etching) using a resist film or the like as a mask, and then the mask is removed and etching (of course half-etching) is performed again. be able to.

次に、本実施例の特徴を図3に示す。本実施例は、図1では図示しなかったが、図3に示すように、上下導体間接続用突起53、57或いは25を格子の各交点上に配置したという特徴を有している。
本実施例においては、所定の間隔を置いて縦横に(観念的に)設けたラインからなる格子の各交点上に突起例えば57を配置することとしたものである。
Next, the features of this embodiment are shown in FIG. Although this embodiment is not shown in FIG. 1, as shown in FIG. 3, the upper and lower conductor connecting protrusions 53, 57, or 25 are characterized in that they are arranged at each intersection of the lattice.
In the present embodiment, projections, for example 57, are arranged on each intersection of a grid made up of lines arranged vertically and horizontally (ideally) at predetermined intervals.

このような配線回路基板によれば、配線回路基板の機種の如何を問わず、両面の導体回路を選択的エッチングにより形成するよりも前の段階までは、量産しておき、その後、機種に応じて異なるパターンの導体回路を形成することとすることができるので、特定の突起だけ層間接続用に利用し、その他のものは回路を構成しないようにすることにより、或いは少しオーバーエッチングすることにより不要な突起をエッチングにより取り除くことができ、多品種についてその生産性を高めることができる。   According to such a printed circuit board, regardless of the type of the printed circuit board, mass production is carried out until the stage before the conductive circuit on both sides is formed by selective etching, and then depending on the model. Since it is possible to form conductor circuits with different patterns, only specific protrusions are used for interlayer connection, and others are unnecessary by not forming the circuit or by slightly over-etching. As a result, various protrusions can be removed by etching, and the productivity of various types can be increased.

本発明は、例えばIC、LSI等の電子デバイス接続用の配線回路基板、特に高密度実装を実現できる配線回路基板に利用可能性がある。 The present invention can be applied to, for example, a printed circuit board for connecting electronic devices such as ICs and LSIs, in particular, a printed circuit board capable of realizing high-density mounting.

(A)〜(E)は本発明配線回路基板の第1の実施例の製造方法を工程順に示す断面図である。(A)-(E) are sectional drawings which show the manufacturing method of the 1st Example of this invention circuit board in order of a process. (A)、(B)は上記実施例の上下導体間接続用突起の各別の例を示す断面図である。(A), (B) is sectional drawing which shows each another example of the protrusion for an upper-lower conductor connection of the said Example. 上記実施例の特徴を示すための斜視図である。It is a perspective view for showing the feature of the above-mentioned example. (A)〜(F)は高密度実装用配線回路基板に関する一つの従来例を説明するためのもので、配線回路基板の製造方法を工程順(A)〜(F)に示す断面図である。(A)-(F) is for demonstrating one conventional example regarding the printed circuit board for high-density mounting, and is sectional drawing which shows the manufacturing method of a wired circuit board to process order (A)-(F). . (G)〜(I)は高密度実装用配線回路基板に関する一つの従来例を説明するためのもので、配線回路基板の製造方法を工程順(A)〜(F)に示す断面図である。(G)-(I) is for demonstrating one conventional example regarding the printed circuit board for high-density mounting, and is sectional drawing which shows the manufacturing method of a wired circuit board to process order (A)-(F). . (A)〜(G)は高密度実装用配線回路基板に関する別の従来例を説明するためのもので、配線回路基板の製造方法を工程順(A)〜(G)に示す断面図である。(A)-(G) is for demonstrating another prior art example regarding the printed circuit board for high-density mounting, and is sectional drawing which shows the manufacturing method of a wired circuit board to process order (A)-(G). .

符号の説明Explanation of symbols

51・・・ベース材、53・・・上下導体間接続用突起(コニーデ状)、
53a・・・鼓状突起、54・・・接続性を高める膜、55・・・層間絶縁膜、
55a・・・異方性導電膜からなる層間絶縁膜、57・・・突起。
51 ... Base material, 53 ... Projection for connection between upper and lower conductors (cone shape),
53a ... drum-like protrusions, 54 ... film for enhancing connectivity, 55 ... interlayer insulating film,
55a ... Interlayer insulating film made of anisotropic conductive film, 57 ... Projection.

Claims (1)

金属層の表面に多数の金属からなる上下導体間接続用突起を一定の間隔をおいて配列された格子の各交点上に配置し、
上記金属層の上記導体間接続用突起が形成された表面上に層間絶縁層を該導体間接続用突起に貫通された状態で設け、
上記層間絶縁層の上記上下導体間接続用突起を含む表面に金属層を形成してなることを特徴とする配線回路基板。
The upper and lower conductor connecting projections made of a number of metals on the surface of the metal layer are arranged on each intersection of the lattices arranged at regular intervals,
An interlayer insulating layer is provided on the surface of the metal layer on which the inter-conductor connection protrusions are formed in a state of being penetrated by the inter-conductor connection protrusions,
A printed circuit board comprising a metal layer formed on a surface of the interlayer insulating layer including the upper and lower conductor connecting projections.
JP2007122786A 2007-05-07 2007-05-07 Wiring circuit board Withdrawn JP2007235167A (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109507814A (en) * 2017-09-15 2019-03-22 佳胜科技股份有限公司 The production method of composite substrate
US10813213B2 (en) 2017-02-16 2020-10-20 Azotek Co., Ltd. High-frequency composite substrate and insulating structure thereof
US11044802B2 (en) 2017-02-16 2021-06-22 Azotek Co., Ltd. Circuit board
US11225563B2 (en) 2017-02-16 2022-01-18 Azotek Co., Ltd. Circuit board structure and composite for forming insulating substrates

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10813213B2 (en) 2017-02-16 2020-10-20 Azotek Co., Ltd. High-frequency composite substrate and insulating structure thereof
US11044802B2 (en) 2017-02-16 2021-06-22 Azotek Co., Ltd. Circuit board
US11225563B2 (en) 2017-02-16 2022-01-18 Azotek Co., Ltd. Circuit board structure and composite for forming insulating substrates
CN109507814A (en) * 2017-09-15 2019-03-22 佳胜科技股份有限公司 The production method of composite substrate
KR20190031121A (en) * 2017-09-15 2019-03-25 아조텍 컴퍼니 리미티드 Manufacturing method of composite substrate
JP2019054231A (en) * 2017-09-15 2019-04-04 佳勝科技股▲ふん▼有限公司 Method of manufacturing composite substrate
US10743423B2 (en) 2017-09-15 2020-08-11 Azotek Co., Ltd. Manufacturing method of composite substrate
KR102176154B1 (en) * 2017-09-15 2020-11-10 아조텍 컴퍼니 리미티드 Manufacturing method of composite substrate
CN109507814B (en) * 2017-09-15 2021-07-20 佳胜科技股份有限公司 Method for manufacturing composite substrate

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