JP2007218890A - Probe assembly - Google Patents

Probe assembly Download PDF

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JP2007218890A
JP2007218890A JP2006073505A JP2006073505A JP2007218890A JP 2007218890 A JP2007218890 A JP 2007218890A JP 2006073505 A JP2006073505 A JP 2006073505A JP 2006073505 A JP2006073505 A JP 2006073505A JP 2007218890 A JP2007218890 A JP 2007218890A
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probe
probe assembly
resin film
vertical
assembly according
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JP4974021B2 (en
JP2007218890A5 (en
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Isao Kimoto
軍生 木本
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Priority to TW096103868A priority patent/TWI397696B/en
Priority to CN2007100802360A priority patent/CN101025426B/en
Priority to KR1020070016210A priority patent/KR20070083187A/en
Priority to US11/706,652 priority patent/US7501840B2/en
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a probe assembly of which the vertical probes formed in resin films are formed into cantilever structure. <P>SOLUTION: A conductive part including the vertical probes 12 forms a parallelogram of a link 16 having a parallel spring 15, in this probe assembly of the present invention using the resin films adhered with a copper foil, formed with the conductive part including the vertical probe 12 on the each resin film by etching work of the copper foil, layered with the plurality of resin films with the vertical probe, and for bringing tip parts of the the vertical probes 12 collectively into contact with an electrode pad of a semiconductor chip to inspect a circuit of the semiconductor chip. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、LSIなどの電子デバイスの製造工程において、半導体ウエハ上に形成された複数の半導体チップの回路検査に使用するプローバ装置のプローブ組立体に関し、特に、半導体チップ上に配列される回路端子(パッド)に対しウエハ状態のまま垂直型プローブを接触させ、一括して半導体チップの電気的導通を測定するプロービングテストに使用するプローバ装置のプローブ組立体に関する。  The present invention relates to a probe assembly of a prober device used for circuit inspection of a plurality of semiconductor chips formed on a semiconductor wafer in a manufacturing process of an electronic device such as an LSI, and in particular, circuit terminals arranged on the semiconductor chip. The present invention relates to a probe assembly of a prober apparatus used for a probing test in which a vertical probe is brought into contact with a (pad) in a wafer state and the electrical continuity of semiconductor chips is collectively measured.

半導体技術の進歩に伴って電子デバイスの集積度が向上し、半導体ウエハ上に形成される各半導体チップにおいても回路配線の占めるエリアが増加し、そのため、各半導体チップ上の回路端子(パッド)の数も増加し、それにつれてパッド面積の縮小化、パッドピッチの狭小化などによるパッド配列の微細化が進んでいる。同時に、半導体チップをパッケージに収納せずに、ベアチップのまま回路基板等に搭載するチップサイズパッケージ(CSP)方式が主流になりつつあり、そのためには、半導体チップに分割する前のウエハ状態での特性チェックや良否判定がどうしても必要となる。  With the advancement of semiconductor technology, the degree of integration of electronic devices has improved, and the area occupied by circuit wiring also increases in each semiconductor chip formed on a semiconductor wafer. Therefore, the circuit terminals (pads) on each semiconductor chip have increased. The number of pads has been increased, and the pad array has been miniaturized by reducing the pad area and the pad pitch. At the same time, a chip size package (CSP) system in which a semiconductor chip is mounted in a circuit board or the like as a bare chip without being housed in a package is becoming mainstream. For this purpose, in a wafer state before being divided into semiconductor chips, A characteristic check and pass / fail judgment are absolutely necessary.

特に、パッド配列が微細化(狭ピッチ化)したことで問題となるのは、電子デバイスの電気的特性試験や回路検査の際に、半導体チップのパッドに接触させて電気的導通を得るためのプローブの構造を、パッド配列の微細化に合せたものとしなければならないということであり、このパッド配列の微細化の進歩に対応するために種々な測定手段が用いられている。  In particular, the problem with the miniaturization (narrow pitch) of the pad arrangement is to obtain electrical continuity by contacting the pads of the semiconductor chip during the electrical characteristics test and circuit inspection of the electronic device. This means that the structure of the probe must be adapted to the miniaturization of the pad array, and various measuring means are used to cope with the advancement of the miniaturization of the pad array.

例えば、被検査半導体チップのパッドと検査装置との間に、外力に対して弾性的に変形する弾性変形部を有する複数の針状プローブをエリア配列したプローブ組立体を介在させる手段がある。このプローブ組立体と半導体チップの試験回路とを電気的に接続する手段として、プローブカードと呼ばれるプリント配線基板が用いられている。  For example, there is a means for interposing a probe assembly in which a plurality of needle-like probes having an elastically deforming portion elastically deforming with respect to an external force are arranged between a pad of a semiconductor chip to be inspected and an inspection apparatus. A printed wiring board called a probe card is used as means for electrically connecting the probe assembly and the test circuit of the semiconductor chip.

一般にプローブカードにおいて、片持梁のカンチレバー構造を有する針状のプローブを採用した場合は、半導体チップのパッドと接触するプローブの先端部分は狭ピッチである。しかし、プローブカードと接続している根元の部分は、プローブが先端部分から放射状に広がって配置されることからピッチを粗くすることができ、プローブをプローブカードの回路端子に半田付け等の接続手段で固着することが可能であった。しかし、このカンチレバー構造は、パッドと接触する際に先端が水平方向にずれるためパッドに傷をつけたり、また、パッドから外れて測定歩留まりの低下を招くなどの問題がある。さらに、チップ1個ずつの測定しか出来ない、プローブ1本ずつの取りつけ精度にばらつきがあり一定接触圧のコントロールが難しいなどの問題があった。  In general, in a probe card, when a needle-like probe having a cantilever structure of a cantilever is adopted, the tip portion of the probe that comes into contact with a pad of a semiconductor chip has a narrow pitch. However, the base part connected to the probe card can be roughened because the probe is arranged radially extending from the tip part, and the connecting means such as soldering the probe to the circuit terminal of the probe card It was possible to fix with. However, this cantilever structure has a problem that the tip is displaced in the horizontal direction when contacting the pad, so that the pad is scratched, or the measurement yield is lowered due to coming off the pad. Furthermore, there are problems that only one chip can be measured, there is a variation in the mounting accuracy of each probe, and it is difficult to control a constant contact pressure.

このカンチレバー構造に代わる垂直型プローブ、すなわち、プローブがプローブカードの回路端子に垂直に固定された垂直型プローブにおいては、半導体チップ上のパッドピッチとプローブカード上の回路端子ピッチとが同等のピッチ間隔で構成されることが必要となる。しかし、プリント配線基板であるプローブカード上では回路パターンを微細化するには製造技術上の限界があり、従って回路端子の占める面積や配線幅もパッドピッチに合わせた要求を満たすことは困難である。さらに、半田付け可能なピッチ間隔にも限界があるため、微細化が進むにつれて垂直型プローブを半導体チップのパッドピッチに合せてプローブカードに垂直に固定することは不可能であった。  In a vertical probe that replaces this cantilever structure, that is, a vertical probe in which the probe is fixed vertically to the circuit terminal of the probe card, the pad pitch on the semiconductor chip is equal to the circuit terminal pitch on the probe card. It is necessary to consist of. However, on the probe card which is a printed wiring board, there is a limit in manufacturing technology to make a circuit pattern finer, so it is difficult to satisfy the requirements for the area occupied by the circuit terminal and the wiring width according to the pad pitch. . Furthermore, since there is a limit to the pitch interval at which soldering is possible, it has been impossible to vertically fix the vertical probe to the probe card in accordance with the pad pitch of the semiconductor chip as miniaturization progresses.

このように、プローブカード上では、平面的エリアが回路端子面積の他に回路配線幅によって占有される割合が大きく、回路端子の狭ピッチ化を妨げている。そこで、プローブカードに多層プリント配線基板を使用し、回路端子を格子状あるいは2列千鳥型に配列し、層間の配線をスルーホールを介して電気的に接続することによって垂直型プローブの本数を維持する手段も採られている。しかし、このスルーホールの占める空間が大きくなるため、スルーホールの存在が回路端子配列の狭ピッチ化を妨げる原因にもなっている。このように、垂直型プローブをプローブカードに固定しようとすると、回路端子の狭ピッチ化の困難性に加えて半田付け作業に高度な技術と多大な人的工数を必要とし、高価なものになっていた。これらの問題を解決するために、本発明者等は、垂直型プローブ組立体を提案し、かつその垂直型プローブ組立体を用いたプローバ装置についても既に提案している(特許文献1および特許文献2を参照)。  Thus, on the probe card, the proportion of the planar area occupied by the circuit wiring width in addition to the circuit terminal area is large, which hinders the narrowing of the pitch of the circuit terminals. Therefore, the number of vertical probes is maintained by using a multilayer printed wiring board for the probe card, arranging the circuit terminals in a grid pattern or in a two-row zigzag pattern, and electrically connecting the wiring between the layers through through holes. The means to do is also taken. However, since the space occupied by the through-holes becomes large, the presence of the through-holes also prevents the pitch of the circuit terminal array from being narrowed. As described above, when trying to fix the vertical probe to the probe card, in addition to the difficulty in narrowing the circuit terminals, it requires an advanced technique and a large number of man-hours for the soldering operation, which is expensive. It was. In order to solve these problems, the present inventors have proposed a vertical probe assembly and have already proposed a prober device using the vertical probe assembly (Patent Document 1 and Patent Document). 2).

本発明者等により提案された従来例としての垂直型プローブ組立体は、特許文献1の図22および特許文献2の図4に示すようにリボン状(短冊状)の樹脂フィルム面に銅薄板を貼り付け、この銅薄板をエッチングすることによって樹脂フィルム面に湾曲部を有する垂直型の銅プローブを形成し、このプローブ付の樹脂フイルムを複数枚積層させて垂直型プローブ組立体を構成するものである。  As shown in FIG. 22 of Patent Document 1 and FIG. 4 of Patent Document 2, a vertical probe assembly as a conventional example proposed by the present inventors has a copper thin plate on a ribbon-shaped (strip-shaped) resin film surface. By sticking and etching this copper thin plate, a vertical copper probe having a curved portion is formed on the surface of the resin film, and a plurality of resin films with the probe are laminated to constitute a vertical probe assembly. is there.

この垂直型プローブ組立体は、樹脂フィルムを積層した構造であるためきわめて狭いエリアに複数のプローブを配置することが可能であり、また、樹脂フィルムには開口部が設けられていて、プローブは垂直部の途中が開口部の縁に沿って湾曲形成されており、プローブ先端部がパッドに接触した時の圧力による歪を樹脂フィルムの開口部とプローブの湾曲部とで吸収する構造となっている。  Since this vertical probe assembly has a structure in which resin films are laminated, it is possible to place a plurality of probes in a very narrow area, and the resin film has openings so that the probes are vertical. The middle part of the probe is curved along the edge of the opening, and the structure is such that the strain caused by the pressure when the probe tip contacts the pad is absorbed by the opening of the resin film and the curved part of the probe. .

このように、測定時にプローブおよび樹脂フィルムに加わる圧力をいかに逃がすかについて、発明者等は樹脂フィルムの開口部の大きさや形状、プローブの湾曲形状を工夫することによって種々の形状を提案している。しかし、せっかく狭ピッチ化に適応したプローブ組立体が提供できても樹脂フィルムやプローブの加工が繁雑になってはコスト高になり兼ねない。そこで本発明は、樹脂フィルムに形成するプローブの形状をカンチレバー構造に近い単純な構造とし、樹脂フィルムの開口部形成などの製作工数も含めて加工を容易にした垂直型プローブ組立体を提供するものである。
特開2004−274010号公報 特開2005−300545号公報
In this way, regarding how to release the pressure applied to the probe and the resin film during measurement, the inventors have proposed various shapes by devising the size and shape of the opening of the resin film and the curved shape of the probe. . However, even if it is possible to provide a probe assembly adapted to narrow pitch, if the processing of the resin film and the probe becomes complicated, the cost may increase. Accordingly, the present invention provides a vertical probe assembly in which the shape of a probe formed on a resin film is a simple structure close to a cantilever structure, and processing is easy including manufacturing steps such as forming an opening of a resin film. It is.
JP 2004-274010 A JP-A-2005-300545

上記したように、本発明者等が既に提案したフィルム積層型の垂直型プローブ組立体を用いたプローバ装置は、狭ピッチ化されたパッドピッチ、例えば45μmピッチ以下(例えば20μmピッチ)の半導体チップに対しても測定が可能な装置である。しかも、プローブの組立に際し半田付けあるいは樹脂による固定手段を用いることなく自動組立が可能であるため、低コストの多量生産が可能であり、また、チップパッドに対し垂直に一括接触できることから全てのプローブに対し均等に接触圧をコントロールできるなどの大きな利点が得られている。  As described above, the prober apparatus using the film-stacked vertical probe assembly already proposed by the present inventors has been applied to a semiconductor chip having a narrowed pad pitch, for example, 45 μm pitch or less (for example, 20 μm pitch). It is a device that can also measure. Moreover, since automatic assembly is possible without using soldering or resin fixing means when assembling probes, low-cost mass production is possible, and all probes can be contacted vertically with respect to chip pads. On the other hand, a great advantage such as being able to control the contact pressure evenly is obtained.

本発明は、これらの利点を生かすとともに樹脂フィルムに形成するプローブの形状をカンチレバー構造に近い単純な構造とし、樹脂フィルムの開口部形成などの製作工数も含めて加工を容易にした垂直型プローブ組立体を提供するものである。  The present invention makes use of these advantages and makes the shape of the probe formed on the resin film a simple structure close to a cantilever structure, and facilitates processing including manufacturing steps such as forming the opening of the resin film. It provides a solid.

本発明は、銅箔が接着された樹脂フィルムを使用し、銅箔をエッチング加工して樹脂フィルム上に垂直プローブを含む導電部を形成し、この垂直プローブ付の樹脂フィルムを複数枚積層し半導体チップの電極パッドに垂直プローブの先端部を一括接触させて半導体チップの回路検査を行うためのプローブ組立体において、前記垂直プローブを含む導電部が平行バネ構造を有する平行四辺形のリンク機構を形成していることを特徴としている。  The present invention uses a resin film to which a copper foil is bonded, etching the copper foil to form a conductive part including a vertical probe on the resin film, and laminating a plurality of resin films with the vertical probe to form a semiconductor. In a probe assembly for carrying out circuit inspection of a semiconductor chip by bringing the tip of a vertical probe into contact with the electrode pad of the chip at a time, the conductive part including the vertical probe forms a parallelogram link mechanism having a parallel spring structure It is characterized by that.

また、本発明は、前記平行バネ構造を有する平行四辺形のリンク機構が一端側に前記垂直プローブを有し、他端側を支持部として水平方向に延びるカンチレバー構造であり、また、前記平行バネが曲げ変形されたリンク機構であり、また、前記平行バネの間の樹脂フィルムに開口部が設けられているか、あるいは開口部が設けられていないことを特徴としている。  Further, the present invention is a cantilever structure in which the parallelogram link mechanism having the parallel spring structure has the vertical probe on one end side and extends in the horizontal direction using the other end side as a support portion, and the parallel spring Is a link mechanism that is bent and deformed, and an opening is provided in the resin film between the parallel springs, or an opening is not provided.

また、本発明は、前記垂直プローブとの間をリンク機構および導電部を介して接続するとともに回路基板の接続パッドと接触する端子部を備えたことを特徴とし、前記端子部はプローブ付樹脂フィルムを積層した時にそれぞれの配置位置が等ピッチでずれる様に各樹脂フィルムに形成され、また、前記端子部近傍の導電部には湾曲部が設けられている。また、前記リンク機構および端子部はその近傍に切りこみ部を設けてカンチレバー構造とし、また、前記銅箔をエッチングする際、導電部以外の部分も除去せずに残してダミー部材部を形成することによって樹脂フィルムの補強部材とし、また、前記導電部とダミー部材部との間の樹脂フィルム面に絶縁性接着剤を充填したことを特徴としている。  Further, the present invention is characterized by comprising a terminal portion that is connected to the vertical probe via a link mechanism and a conductive portion and that contacts a connection pad of a circuit board, and the terminal portion is a resin film with a probe Each of the resin films is formed such that the arrangement positions thereof are shifted at an equal pitch when the layers are stacked, and the conductive portion near the terminal portion is provided with a curved portion. In addition, the link mechanism and the terminal part are provided with a notch part in the vicinity thereof to form a cantilever structure, and when etching the copper foil, a part other than the conductive part is left without being removed to form a dummy member part. The resin film is a reinforcing member, and the resin film surface between the conductive portion and the dummy member portion is filled with an insulating adhesive.

本発明のプローブ組立体は、プローブ付樹脂フィルムにおける垂直プローブの構造を平行バネ構造としたことによって、従来の問題点であったカンチレバー針の先端の動きに比べ水平方向の移動距離を少なくすることができる。このことは、半導体チップのパッド面積が微小化されても、カンチレバー構造のプローブが適用できることを意味する。また、従来の垂直プローブは狭ピッチになるにつれて細くする必要があり、湾曲部の弾性強度に限界があったが、本発明では湾曲部を設けなくても平行バネを用いたカンチレバー構造とすることによって弾性強度に充分対応できるものである。さらに、湾曲部のような複雑な構造をとる必要がないため、銅箔のエッチング加工も容易となり、製作コストを削減することができる。  In the probe assembly of the present invention, the structure of the vertical probe in the resin film with the probe is a parallel spring structure, so that the movement distance in the horizontal direction is reduced compared to the movement of the tip of the cantilever needle, which has been a problem in the past. Can do. This means that a probe having a cantilever structure can be applied even if the pad area of the semiconductor chip is miniaturized. In addition, the conventional vertical probe needs to be made narrower as the pitch becomes narrower, and there is a limit to the elastic strength of the curved portion. However, in the present invention, a cantilever structure using a parallel spring is used without providing a curved portion. Can sufficiently cope with the elastic strength. Furthermore, since it is not necessary to have a complicated structure such as a curved portion, the copper foil can be easily etched, and the manufacturing cost can be reduced.

以下に図面を参照して本発明の実施の形態について説明する。図1(a)、(b)、(c)はそれぞれ垂直プローブの先端部の動きを説明する原理図である。なお、垂直プローブの先端は半導体チップ等のパッドに接触するまでは垂直状態を保っている。  Embodiments of the present invention will be described below with reference to the drawings. FIGS. 1A, 1B, and 1C are principle diagrams for explaining the movement of the tip of the vertical probe. Note that the tip of the vertical probe remains vertical until it contacts a pad such as a semiconductor chip.

図1(a)において、長さLのカンチレバー11の先端部に取り付けられた垂直プローブ12は先端部が半導体チップ等のパッド部13の上面に対し垂直に対向しており、他端は支持部14に取り付けられて水平状態にある。次いで、検査のためにパッド部13を上昇させるか支持部14を下降させると垂直プローブ12の先端部とパッド部13の上面が接触し、長さLのカンチレバー11は計算上約(1/3)Lの位置を中心として回転し、垂直プローブ12の先端部はパッド部13の上面に接触しながら長手方向に距離dだけ大きく移動する。その結果、垂直プローブ12の先端部がパッド部13から外れたり、パッド部13の上面が削られたり傷を残すことになる。In FIG. 1 (a), the vertical probe 12 attached to the tip of a cantilever 11 having a length L has its tip facing perpendicularly to the upper surface of a pad 13 such as a semiconductor chip, and the other end is a support. 14 is in a horizontal state. Next, when the pad portion 13 is raised or the support portion 14 is lowered for inspection, the tip of the vertical probe 12 and the upper surface of the pad portion 13 come into contact with each other, and the cantilever 11 having the length L is calculated to be approximately (1/3). ) rotates around the position of the L, the distal end portion of the vertical probe 12 moves largely by the distance d 0 in the longitudinal direction while being in contact with the upper surface of the pad portion 13. As a result, the distal end portion of the vertical probe 12 is detached from the pad portion 13, or the upper surface of the pad portion 13 is scraped or left scratched.

この弊害を無くすために、図1(b)に示すようにカンチレバー11の構造を平行バネ15によるリンク構造とし、リンク16の一端に垂直プローブ12を設けている。このリンク構造によれば、垂直プローブ12に図1(a)と同じ垂直方向の接触荷重が加わったとしても、リンク構造であるため垂直プローブ12の先端部の移動量dは、
<d
となり、ごくわずかな移動量に押さえることができる。
In order to eliminate this problem, the cantilever 11 has a link structure with a parallel spring 15 as shown in FIG. 1B, and a vertical probe 12 is provided at one end of the link 16. According to this link structure, FIG. 1 as the contact load of the same vertical direction is applied as (a), the movement amount d 1 of the distal end portion of the vertical probe 12 for a link structure in a vertical probe 12,
d 1 <d 0
Therefore, it can be suppressed to a very small amount of movement.

図1(c)はカンチレバーを構成する平行バネ15の形状をあらかじめ変形させておくリンク構造を示すもので、この場合も垂直プローブ12の先端部の移動量dは、
<d
となり、ごくわずかな移動量に押さえることができる。
FIG. 1C shows a link structure in which the shape of the parallel spring 15 constituting the cantilever is deformed in advance. In this case as well, the moving amount d 2 of the tip of the vertical probe 12 is
d 2 <d 0
Therefore, it can be suppressed to a very small amount of movement.

次に、図1で説明した原理を応用した本発明に係る垂直プローブ付樹脂フィルム(以下、単にプローブ付フィルムと称する)の第1の実施形態について、図2の平面図を用いて説明する。図2に示すように、樹脂フィルム面に形成されるカンチレバー構造のプローブは厚さ20μmのベリリウム銅薄板を使用し、この銅薄板を厚さ5μmのポリイミド樹脂フィルムに貼り付けたものをエッチング加工して形成する。  Next, a first embodiment of a resin film with a vertical probe (hereinafter simply referred to as a film with a probe) according to the present invention to which the principle described with reference to FIG. 1 is applied will be described with reference to the plan view of FIG. As shown in FIG. 2, the cantilever structure probe formed on the resin film surface uses a 20 μm thick beryllium copper thin plate, and this copper thin plate attached to a 5 μm thick polyimide resin film is etched. Form.

このプローブ付フィルムは垂直プローブ12と、この垂直プローブ12を一端側で保持する平行バネ15と、平行バネ15を他端側で支持する支持部14とで形成され、垂直プローブ12の先端部のみが樹脂フィルム(図示せず)の外にわずか突出している。平行バネ15の寸法は、例えば図2に示すように1本のバネ幅aが20μmであり、リンク16の全体幅bが0.4〜1mmとする。この例のように、バネ幅が細い場合には平行バネ15の間の樹脂フィルムには開口部を設けないで樹脂フィルム自身に耐変形強度を持たせるようにし、銅薄板のみを加工して平行バネ15を補強する構造としてもよい。  This film with a probe is formed of a vertical probe 12, a parallel spring 15 that holds the vertical probe 12 on one end side, and a support portion 14 that supports the parallel spring 15 on the other end side. Slightly protrudes from the resin film (not shown). As shown in FIG. 2, for example, the parallel spring 15 has a single spring width a of 20 μm and an overall width b of the link 16 of 0.4 to 1 mm. As in this example, when the spring width is narrow, the resin film between the parallel springs 15 is not provided with an opening, so that the resin film itself has resistance to deformation, and only the copper thin plate is processed to be parallel. A structure in which the spring 15 is reinforced may be used.

図3は垂直プローブの第2の実施形態を示す平面図である。この図において、25は樹脂フィルムを示す。この樹脂フィルム25は垂直プローブ12の先端部を除きプローブ構成全体が収まるだけのリボン形状を備えている。平行バネ15は一端側に垂直プローブ12を有し、他端側に支持部14を有する。平行バネ15は水平方向に対し角度θだけ傾けたリンク構造となっている。これは図1(c)の変形構造の例である。  FIG. 3 is a plan view showing a second embodiment of the vertical probe. In this figure, 25 indicates a resin film. The resin film 25 has a ribbon shape that can accommodate the entire probe configuration except for the tip of the vertical probe 12. The parallel spring 15 has a vertical probe 12 on one end side and a support portion 14 on the other end side. The parallel spring 15 has a link structure inclined by an angle θ with respect to the horizontal direction. This is an example of the modified structure of FIG.

また、支持部14には、回路基板18の接続パッド19に接触し垂直プローブ12との間の電気接続部となる端子部17が湾曲部22を介して形成されている。また、このプローブ付の樹脂フィルム25を積層させたときに、積層樹脂フィルムを貫通させて樹脂フィルム25の位置決めおよび固定部となる支持棒を通す穴20が設けられている。この垂直プローブを有する樹脂フィルム25を複数枚積層させたものがプローブ組立体である。さらに本実施形態の特徴は、平行バネ15の間の樹脂フィルム25の開口部に相当する部分に、開口を設ける代わりに逆に銅箔をダミー部材21として残し、樹脂フィルム25および平行バネ15の耐変形強度を高めるための補強板の役目を果たしている。  Further, a terminal portion 17 that is in contact with the connection pad 19 of the circuit board 18 and serves as an electrical connection portion with the vertical probe 12 is formed on the support portion 14 via a curved portion 22. Moreover, when the resin film 25 with a probe is laminated, a hole 20 is provided through which a support rod that is a positioning and fixing portion of the resin film 25 is passed through the laminated resin film. A probe assembly is formed by laminating a plurality of resin films 25 each having the vertical probe. Furthermore, the feature of this embodiment is that instead of providing an opening in the portion corresponding to the opening of the resin film 25 between the parallel springs 15, copper foil is left as the dummy member 21, and the resin film 25 and the parallel spring 15 It plays the role of a reinforcing plate to increase the deformation resistance.

同様に、支持部14にも平行バネ24が設けられており、この支持部14の部分における平行バネ24間にもダミー部材23を設けることによって補強板の役目を果たしている。また、支持部14にも平行バネ24を設けたことによって、回路基板18の接続パッド19との電気的接続の際に湾曲部22とともに端子部16までもが弾力的に変形し、電気的接続を容易にしている。  Similarly, a parallel spring 24 is also provided in the support portion 14, and a dummy member 23 is provided between the parallel springs 24 in the support portion 14 portion to serve as a reinforcing plate. Further, since the parallel spring 24 is also provided on the support portion 14, the curved portion 22 and the terminal portion 16 are also elastically deformed and electrically connected when electrically connected to the connection pad 19 of the circuit board 18. Making it easy.

図4は、図3で説明したプローブ付フィルムを積層した状態を示す図である。ただし、図4では樹脂フィルムは図示されておらず、プローブと平行ばねおよび支持部の部分のみを積層した状態が示されている。図4から分かるように、プローブ付フィルムを積層した時に電気接続部となる端子部17の位相が等ピッチpでずれるように、それぞれの樹脂フィルム上であらかじめ端子部17の配置をずらして形成されている。これは端子部17と接続する回路基板18の電気接続部の接続パッド19を設ける際に、接続パッド19が配置し易いようにあらかじめ斜め方向に配置された接続パッド19に合わせたものである。  FIG. 4 is a diagram illustrating a state in which the films with probes described in FIG. 3 are stacked. However, in FIG. 4, the resin film is not shown, and only the probe, the parallel spring, and the support portion are stacked. As can be seen from FIG. 4, the terminal portions 17 are formed on the respective resin films so that the phases of the terminal portions 17 are shifted in advance so that the phase of the terminal portions 17 serving as electrical connection portions is shifted at an equal pitch p when the films with probes are laminated. ing. In this case, when the connection pads 19 of the electrical connection portions of the circuit board 18 connected to the terminal portions 17 are provided, the connection pads 19 are matched with the connection pads 19 arranged in advance in an oblique direction so that the connection pads 19 are easily arranged.

図5は本発明の第3の実施形態を示す平面図である。本実施形態の特長は、樹脂フィルム上の平行バネを形成する部分に開口部および切込みを設けたことと、回路基板との電気的接続のための端子部を設ける部分にも切りこみを設けた点である。図に示すように、樹脂フィルム25に貼り付けられた銅箔は、導電部となる部分と補強部を兼ねた電気的にダミー部材となる部分とに分離して形成されている。導電部となる部分は一端側に垂直プローブ12が形成され、他端側には回路基板18の電気接続部である接続パッド19と接触する端子部17が形成されている。ダミー部材26、27を設ける理由は、銅箔の厚さが20μmであるのに対し樹脂フィルム25の厚さが5μmと薄いため、プローブ付フィルムとしての変形強度を保つために設けている。  FIG. 5 is a plan view showing a third embodiment of the present invention. The feature of this embodiment is that an opening and a cut are provided in a portion where a parallel spring is formed on a resin film, and a cut is also provided in a portion where a terminal portion for electrical connection with a circuit board is provided. It is. As shown in the drawing, the copper foil attached to the resin film 25 is formed separately into a portion that becomes a conductive portion and an electrically dummy member that also serves as a reinforcing portion. A vertical probe 12 is formed on one end side of a portion that becomes a conductive portion, and a terminal portion 17 that contacts a connection pad 19 that is an electrical connection portion of the circuit board 18 is formed on the other end side. The reason why the dummy members 26 and 27 are provided is that the thickness of the copper foil is 20 μm while the thickness of the resin film 25 is as thin as 5 μm, so that the deformation strength as a film with a probe is maintained.

また、垂直プローブ12は平行バネ15を備えたリンク機構となるように形成され、平行バネ15の間の樹脂フィルム部分には開口部28が設けられ、また、リンク機構と平行に切り込み29が設けられて垂直プローブ12を含むカンチレバー構造となっている。また、端子部17に沿って切り込み30が設けられており、端子部17も切り込み長さに応じたカンチレバー構造となっている。このように、プローブ部を平行バネ機構によるカンチレバー構造としたことによって、導電配線31の幅を広く採ることができるので、従来構造である一本の垂直プローブの途中に湾曲部を設ける構造に比べて樹脂フィルムの変形強度をより高めることができる。また、端子部17もカンチレバー構造としたことによって、回路基板と垂直プローブとを電気的に接続させる際に弾性接触による接続だけで済むので、回路基板とプローブ組立体との取り付けを容易に行なうことができる。  Further, the vertical probe 12 is formed to be a link mechanism provided with a parallel spring 15, an opening 28 is provided in a resin film portion between the parallel springs 15, and a notch 29 is provided in parallel with the link mechanism. Thus, a cantilever structure including the vertical probe 12 is formed. Moreover, the notch 30 is provided along the terminal part 17, and the terminal part 17 also has the cantilever structure according to the notch length. Thus, since the probe portion has a cantilever structure with a parallel spring mechanism, the width of the conductive wiring 31 can be widened, so that the curved portion is provided in the middle of one vertical probe which is a conventional structure. Thus, the deformation strength of the resin film can be further increased. Further, since the terminal portion 17 has a cantilever structure, when the circuit board and the vertical probe are electrically connected, it is only necessary to connect them by elastic contact, so that the circuit board and the probe assembly can be easily attached. Can do.

また、垂直プローブ12と端子部17をつなぐ導電配線31とダミー部材26、27との隙間には、電気的絶縁性とフィルム強度を保つために絶縁性接着剤32を流し込み、補強用のスペーサーとしている。さらに、垂直プローブ12の近傍の樹脂フィルム25には、樹脂フィルム25を積層する際の位置決めおよび固定を行うための棒を通す穴20が開けられている。この棒を通す機能については、上述の特許文献2(特開2005−300545号公報)で説明済みであるのでここでは省略する。なお、図5中、符号35,36,37で指示される線は本発明の説明にとっては意味のない線であり、無視されるべきものである。  Further, an insulating adhesive 32 is poured into the gap between the conductive wiring 31 connecting the vertical probe 12 and the terminal portion 17 and the dummy members 26 and 27 to maintain electrical insulation and film strength, and serves as a reinforcing spacer. Yes. Furthermore, the resin film 25 in the vicinity of the vertical probe 12 is provided with a hole 20 through which a rod for positioning and fixing when the resin film 25 is laminated is formed. The function of passing this rod has already been described in the above-mentioned Patent Document 2 (Japanese Patent Application Laid-Open No. 2005-300545), and is omitted here. In FIG. 5, the lines indicated by reference numerals 35, 36 and 37 are meaningless lines for the explanation of the present invention and should be ignored.

本提案を含めたプローブ付樹脂フィルムは、半導体デバイスの狭ピッチ化に対応した回路検査装置(プローバ)に適用できるものであり、例えば、直径300mmで半導体チップが数十から数百個形成されたウエハの一括検査にも充分追従できる機能を備えている。  The resin film with a probe including the present proposal can be applied to a circuit inspection apparatus (prober) corresponding to a narrow pitch of a semiconductor device. For example, several tens to several hundreds of semiconductor chips with a diameter of 300 mm are formed. It has a function that can fully follow the batch inspection of wafers.

本発明に係る垂直プローブの動きを示す説明図である。  It is explanatory drawing which shows the motion of the vertical probe which concerns on this invention. 本発明に係る垂直プローブの第1の実施形態を示す平面図である。  It is a top view which shows 1st Embodiment of the vertical probe which concerns on this invention. 本発明に係る垂直プローブの第2の実施形態を示す平面図である。  It is a top view which shows 2nd Embodiment of the vertical probe which concerns on this invention. 本発明のプローブ組立体を説明する斜視図である。  It is a perspective view explaining the probe assembly of this invention. 本発明に係る垂直プローブの第3実施形態を示す平面図である。  It is a top view which shows 3rd Embodiment of the vertical probe which concerns on this invention.

符号の説明Explanation of symbols

11 カンチレバー
12 垂直プローブ
13 パッド部
14 支持部
15 平行バネ
16 リンク
17 端子部
18 回路基板
19 接続パッド
20 穴
21 ダミー部材
22 湾曲部
23 ダミー部材
24 平行バネ
25 樹脂フィルム
26 ダミー部材
27 ダミー部材
28 開口部
29 切り込み
30 切り込み
31 導電配線
32 接着剤
DESCRIPTION OF SYMBOLS 11 Cantilever 12 Vertical probe 13 Pad part 14 Support part 15 Parallel spring 16 Link 17 Terminal part 18 Circuit board 19 Connection pad 20 Hole 21 Dummy member 22 Bending part 23 Dummy member 24 Parallel spring 25 Resin film 26 Dummy member 27 Dummy member 28 Opening Part 29 Notch 30 Notch 31 Conductive wiring 32 Adhesive

Claims (11)

銅箔が接着された樹脂フィルムを使用し、前記銅箔をエッチング加工して樹脂フィルム上に垂直プローブを含む導電部を形成し、この垂直プローブ付の樹脂フィルムを複数枚積層し半導体チップの電極パッドに前記垂直プローブの先端部を一括接触させて半導体チップの回路検査を行うためのプローブ組立体において、前記垂直プローブを含む導電部が平行バネ構造を有する平行四辺形のリンク機構を形成していることを特徴とするプローブ組立体。  Using a resin film to which a copper foil is bonded, etching the copper foil to form a conductive part including a vertical probe on the resin film, and laminating a plurality of resin films with the vertical probe to form an electrode of a semiconductor chip In a probe assembly for performing circuit inspection of a semiconductor chip by bringing the tip of the vertical probe into contact with a pad at once, a conductive part including the vertical probe forms a parallelogram link mechanism having a parallel spring structure. A probe assembly characterized by comprising: 前記平行バネ構造を有する平行四辺形のリンク機構は一端側に前記垂直プローブを有し、他端側を支持部として水平方向に延びるカンチレバー構造であることを特徴とする請求項1記載のプローブ組立体。  2. The probe assembly according to claim 1, wherein the parallelogram link mechanism having the parallel spring structure has a cantilever structure having the vertical probe on one end side and extending in the horizontal direction with the other end side as a support portion. Solid. 前記平行バネが曲げ変形されたリンク機構であることを特徴とする請求項1記載のプローブ組立体。  2. The probe assembly according to claim 1, wherein the parallel spring is a link mechanism deformed by bending. 前記平行バネの間の樹脂フィルムに開口部が設けられていることを特徴とする請求項1記載のプローブ組立体。  The probe assembly according to claim 1, wherein an opening is provided in the resin film between the parallel springs. 前記平行バネの間の樹脂フィルムに開口部が設けられていないことを特徴とする請求項1記載のプローブ組立体。  The probe assembly according to claim 1, wherein no opening is provided in the resin film between the parallel springs. 前記垂直プローブとの間をリンク機構および導電部を介して接続するとともに回路基板の接続パッドと接触する端子部を備えたことを特徴とするプローブ組立体。  A probe assembly comprising a terminal portion that is connected to the vertical probe via a link mechanism and a conductive portion and that contacts a connection pad of a circuit board. 前記端子部はプローブ付樹脂フィルムを積層した時にそれぞれの配置位置が等ピッチでずれる様に各樹脂フィルムに形成されていることを特徴とする請求項6記載のプローブ組立体。  The probe assembly according to claim 6, wherein the terminal portion is formed on each resin film such that when the resin films with probes are laminated, the positions of the terminals are shifted at equal pitches. 前記端子部近傍の導電部には湾曲部が設けられていることを特徴とする請求項6記載のプローブ組立体。  The probe assembly according to claim 6, wherein the conductive portion in the vicinity of the terminal portion is provided with a curved portion. 前記リンク機構および端子部はその近傍に切りこみ部を設け、カンチレバー構造としたことを特徴とする請求項6記載のプローブ組立体。  The probe assembly according to claim 6, wherein the link mechanism and the terminal portion have a cantilever structure provided with a notch in the vicinity thereof. 前記銅箔をエッチングする際、導電部以外の部分も除去せずに残してダミー部を形成し、樹脂フィルムの補強部材としたことを特徴とする請求項1記載のプローブ組立体。  2. The probe assembly according to claim 1, wherein when the copper foil is etched, a dummy portion is formed without removing portions other than the conductive portion, thereby forming a reinforcing member for the resin film. 前記導電部とダミー部との間の樹脂フィルム面に絶縁性接着剤を充填したことを特徴とする請求項10記載のプローブ組立体。  The probe assembly according to claim 10, wherein an insulating adhesive is filled in a resin film surface between the conductive portion and the dummy portion.
JP2006073505A 2006-02-19 2006-02-19 Probe assembly Expired - Fee Related JP4974021B2 (en)

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KR1020070016210A KR20070083187A (en) 2006-02-19 2007-02-15 Probe assembly
US11/706,652 US7501840B2 (en) 2006-02-19 2007-02-15 Probe assembly comprising a parallelogram link vertical probe made of a metal foil attached to the surface of a resin film

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JP2005302917A (en) * 2004-04-09 2005-10-27 Renesas Technology Corp Method of manufacturing semiconductor integrated circuit and probe card

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010002091A1 (en) * 2008-06-30 2010-01-07 한국기계연구원 Cantilevered micro-contact probe with hinge structure
US8242797B2 (en) 2008-06-30 2012-08-14 Korea Institute Of Machinery & Materials Cantilever-type micro contact probe with hinge structure
KR101037979B1 (en) 2008-10-10 2011-06-09 송광석 vertical probe and probe head assembly using the same

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JP4974021B2 (en) 2012-07-11
CN101025426B (en) 2010-09-29
CN101025426A (en) 2007-08-29

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