JP2007122027A5 - - Google Patents
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- Publication number
- JP2007122027A5 JP2007122027A5 JP2006257370A JP2006257370A JP2007122027A5 JP 2007122027 A5 JP2007122027 A5 JP 2007122027A5 JP 2006257370 A JP2006257370 A JP 2006257370A JP 2006257370 A JP2006257370 A JP 2006257370A JP 2007122027 A5 JP2007122027 A5 JP 2007122027A5
- Authority
- JP
- Japan
- Prior art keywords
- laser beam
- exposure
- opening
- linear laser
- openings
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006257370A JP4884148B2 (ja) | 2005-09-28 | 2006-09-22 | レーザー処理装置、露光装置及び露光方法 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005281610 | 2005-09-28 | ||
JP2005281610 | 2005-09-28 | ||
JP2006257370A JP4884148B2 (ja) | 2005-09-28 | 2006-09-22 | レーザー処理装置、露光装置及び露光方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2007122027A JP2007122027A (ja) | 2007-05-17 |
JP2007122027A5 true JP2007122027A5 (es) | 2009-10-22 |
JP4884148B2 JP4884148B2 (ja) | 2012-02-29 |
Family
ID=38145870
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006257370A Expired - Fee Related JP4884148B2 (ja) | 2005-09-28 | 2006-09-22 | レーザー処理装置、露光装置及び露光方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4884148B2 (es) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6046976B2 (ja) * | 2012-05-17 | 2016-12-21 | 株式会社アルバック | 露光装置 |
JP7056188B2 (ja) * | 2018-01-31 | 2022-04-19 | 日本ゼオン株式会社 | 表面処理方法及び表面処理用マスク構造体 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3082652B2 (ja) * | 1994-12-27 | 2000-08-28 | キヤノン株式会社 | 照明装置及びそれを用いたデバイスの製造方法 |
JPH08250401A (ja) * | 1995-03-14 | 1996-09-27 | Sharp Corp | 半導体装置の製造方法および半導体装置製造用フォトマスク |
JPH11237744A (ja) * | 1997-12-18 | 1999-08-31 | Sanee Giken Kk | 露光装置および露光方法 |
US6593064B1 (en) * | 1998-06-19 | 2003-07-15 | Creo Inc. | High resolution optical stepper |
JP5314842B2 (ja) * | 2006-08-25 | 2013-10-16 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
-
2006
- 2006-09-22 JP JP2006257370A patent/JP4884148B2/ja not_active Expired - Fee Related
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