JP2007119913A5 - - Google Patents

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JP2007119913A5
JP2007119913A5 JP2006258902A JP2006258902A JP2007119913A5 JP 2007119913 A5 JP2007119913 A5 JP 2007119913A5 JP 2006258902 A JP2006258902 A JP 2006258902A JP 2006258902 A JP2006258902 A JP 2006258902A JP 2007119913 A5 JP2007119913 A5 JP 2007119913A5
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Japan
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raw material
material powder
substrate
polycrystalline
100ppm
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JP2006258902A
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JP2007119913A (ja
JP4921091B2 (ja
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Publication of JP2007119913A5 publication Critical patent/JP2007119913A5/ja
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本発明の１つの観点に係る複合構造物は、基板と、エアロゾルデポジション法を用いて、無機材料で形成された原料粉を基板に向けて吹き付けて原料粉を下層に衝突させることにより、衝突の際に原料粉が変形及び／又は破砕することによって新たに生じる活性面を有する粒子同士を結合させて原料粉を堆積させることによって、基板上に直接又は間接的に形成された多結晶の構造物であって、不純物として重量で１００ｐｐｍ以下のカーボンを含有し、又は、平均結晶粒径が４００ｎｍより大きい多結晶の構造物とを具備する。
JP2006258902A 2005-09-30 2006-09-25 複合構造物の製造方法、不純物除去処理装置、成膜装置、及び、複合構造物 Expired - Fee Related JP4921091B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006258902A JP4921091B2 (ja) 2005-09-30 2006-09-25 複合構造物の製造方法、不純物除去処理装置、成膜装置、及び、複合構造物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005289261 2005-09-30
JP2005289261 2005-09-30
JP2006258902A JP4921091B2 (ja) 2005-09-30 2006-09-25 複合構造物の製造方法、不純物除去処理装置、成膜装置、及び、複合構造物

Publications (3)

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JP2007119913A JP2007119913A (ja) 2007-05-17
JP2007119913A5 true JP2007119913A5 (ja) 2009-04-09
JP4921091B2 JP4921091B2 (ja) 2012-04-18

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JP2006258902A Expired - Fee Related JP4921091B2 (ja) 2005-09-30 2006-09-25 複合構造物の製造方法、不純物除去処理装置、成膜装置、及び、複合構造物

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JP (1) JP4921091B2 (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4879002B2 (ja) * 2006-12-04 2012-02-15 コバレントマテリアル株式会社 半導体製造装置用部材
KR101132581B1 (ko) * 2007-09-10 2012-04-06 가부시키가이샤 알박 유기 재료 증기 발생 장치, 성막원, 성막 장치
JP5130991B2 (ja) * 2008-03-27 2013-01-30 株式会社Ｉｈｉ コールドスプレー方法、コールドスプレー装置
JP2014145103A (ja) * 2013-01-29 2014-08-14 Hitachi Ltd 構造物作製装置および構造物作製方法
JP6122730B2 (ja) * 2013-08-08 2017-04-26 積水化学工業株式会社 成膜方法、成膜装置、光電極の製造方法および色素増感太陽電池の製造方法
KR102382221B1 (ko) 2020-07-30 2022-04-04 한국핵융합에너지연구원 코팅용 분체 에어로졸 증착용 마이크로웨이브 플라즈마 노즐 및 이를 이용하는 코팅용 분체 에어로졸에 의한 코팅 장치

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001015472A (ja) * 1999-06-28 2001-01-19 Hoya Schott Kk 紫外光照射方法及び装置
JP2002235181A (ja) * 1999-10-12 2002-08-23 National Institute Of Advanced Industrial & Technology 複合構造物及びその製造方法並びに作製装置
JP3897623B2 (ja) * 2001-10-11 2007-03-28 独立行政法人産業技術総合研究所 複合構造物作製方法
TWI330672B (en) * 2002-05-28 2010-09-21 Nat Inst Of Advanced Ind Scien Method for forming ultrafine particle brittle material at low temperature
JP4075716B2 (ja) * 2003-07-16 2008-04-16 Ｔｏｔｏ株式会社 複合構造物作製装置
JP4094521B2 (ja) * 2003-10-17 2008-06-04 富士フイルム株式会社 構造物の製造方法

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