JP2007096120A5 - - Google Patents
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- JP2007096120A5 JP2007096120A5 JP2005285481A JP2005285481A JP2007096120A5 JP 2007096120 A5 JP2007096120 A5 JP 2007096120A5 JP 2005285481 A JP2005285481 A JP 2005285481A JP 2005285481 A JP2005285481 A JP 2005285481A JP 2007096120 A5 JP2007096120 A5 JP 2007096120A5
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- JP
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- conductive paste
- particles
- paste composition
- wiring board
- binder component
- Prior art date
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Claims (6)
導電粉末と、バインダー成分とを含み、該導電粉末および該バインダー成分の質量比が、90/10以上98/2未満であり、 A conductive powder and a binder component, wherein a mass ratio of the conductive powder and the binder component is 90/10 or more and less than 98/2,
前記導電粉末が、第1の合金粒子と第2の金属粒子とからなり、 The conductive powder comprises first alloy particles and second metal particles,
前記第1の合金粒子が、180℃以上260℃未満の融点を有する非鉛半田粒子であり、The first alloy particles are non-lead solder particles having a melting point of 180 ° C. or higher and lower than 260 ° C .;
前記第2の金属粒子が、Au,Ag,Cuからなる群から選ばれる少なくとも一種以上であり、前記第1の合金粒子と前記第2の金属粒子との質量比が、76/24以上90/10未満であり、The second metal particles are at least one selected from the group consisting of Au, Ag, and Cu, and the mass ratio of the first alloy particles to the second metal particles is 76/24 or more 90 / Less than 10,
前記バインダー成分が、マレイミド類を含有する混合物である、 The binder component is a mixture containing maleimides,
ビアホール充填用導電性ペースト組成物。A conductive paste composition for filling via holes.
導電粉末と、バインダー成分とを含み、該導電粉末および該バインダー成分の質量比が、90/10以上98/2未満であり、
前記導電粉末が、第1の合金粒子と第2の金属粒子とからなり、
前記第1の合金粒子が、180℃以上260℃未満の融点を有する非鉛半田粒子であり、
前記第2の金属粒子が、Au,Ag,Cuからなる群から選ばれる少なくとも一種以上であり、前記第1の合金粒子と前記第2の金属粒子との質量比が、76/24以上90/10未満であり、
前記バインダー成分が、加熱により硬化する重合性単量体の混合物であり、前記非鉛半田粒子の融点が、前記バインダー成分の硬化温度範囲に含まれている、
ビアホール充填用導電性ペースト組成物。 An insulating substrate made of a thermoplastic resin composition, a wiring board comprising a conductor pattern provided on the insulating substrate, and a via hole filled with a conductive paste composition is formed on the insulating substrate. A multilayer wiring board in which a plurality of wiring boards are superposed on each other or alternately superposed on a wiring board made of a material other than a thermoplastic resin composition, which is different from the wiring board, and laminated or sequentially laminated by thermal fusion. In the conductive paste composition filled in the via hole,
A conductive powder and a binder component, wherein a mass ratio of the conductive powder and the binder component is 90/10 or more and less than 98/2;
The conductive powder comprises first alloy particles and second metal particles,
The first alloy particles are non-lead solder particles having a melting point of 180 ° C. or higher and lower than 260 ° C .;
The second metal particles are at least one selected from the group consisting of Au, Ag, and Cu, and the mass ratio of the first alloy particles to the second metal particles is 76/24 or more 90 / Less than 10,
The binder component is a mixture of polymerizable monomers that are cured by heating, and the melting point of the lead-free solder particles is included in the curing temperature range of the binder component.
A conductive paste composition for filling via holes.
前記マレイミド類がビス(4−マレイミドフェニル)メタンであり、
前記ジメタリルビスフェノールAおよび前記ビス(4−マレイミドフェニル)メタンのモル比が、30/70以上70/30未満である、請求項3〜5のいずれかに記載のビアホール充填用導電性ペースト組成物。 The alkenylphenol compound is dimethallylbisphenol A,
The maleimide is bis (4-maleimidophenyl) methane;
The conductive paste composition for filling via holes according to any one of claims 3 to 5 , wherein a molar ratio of the dimethallyl bisphenol A and the bis (4-maleimidophenyl) methane is 30/70 or more and less than 70/30. .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005285481A JP4965102B2 (en) | 2005-09-29 | 2005-09-29 | Conductive paste composition for via hole filling |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005285481A JP4965102B2 (en) | 2005-09-29 | 2005-09-29 | Conductive paste composition for via hole filling |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2007096120A JP2007096120A (en) | 2007-04-12 |
JP2007096120A5 true JP2007096120A5 (en) | 2007-07-12 |
JP4965102B2 JP4965102B2 (en) | 2012-07-04 |
Family
ID=37981437
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005285481A Expired - Fee Related JP4965102B2 (en) | 2005-09-29 | 2005-09-29 | Conductive paste composition for via hole filling |
Country Status (1)
Country | Link |
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JP (1) | JP4965102B2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010027300A (en) * | 2008-07-16 | 2010-02-04 | Mitsubishi Chemicals Corp | Conductive paste and manufacturing method of conductive paste, and multilayer wiring board |
JP5424632B2 (en) * | 2008-12-19 | 2014-02-26 | キヤノン株式会社 | Manufacturing method of substrate for ink jet recording head |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03287680A (en) * | 1990-04-03 | 1991-12-18 | Toagosei Chem Ind Co Ltd | Paste composition for organic thick film |
JPH08302273A (en) * | 1995-05-12 | 1996-11-19 | Toagosei Co Ltd | Varnish and its application |
JP3514647B2 (en) * | 1999-01-05 | 2004-03-31 | 三菱樹脂株式会社 | Multilayer printed wiring board and method of manufacturing the same |
JP2000223836A (en) * | 1999-01-28 | 2000-08-11 | Kyocera Corp | Multilayer wiring board and its manufacture |
JP2000323804A (en) * | 1999-05-07 | 2000-11-24 | Toagosei Co Ltd | Copper clad laminate plate for printed wiring board |
JP2003092467A (en) * | 2001-09-19 | 2003-03-28 | Tatsuta Electric Wire & Cable Co Ltd | Printed wiring board and manufacturing method therefor |
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2005
- 2005-09-29 JP JP2005285481A patent/JP4965102B2/en not_active Expired - Fee Related
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