JPH03287680A - Paste composition for organic thick film - Google Patents
Paste composition for organic thick filmInfo
- Publication number
- JPH03287680A JPH03287680A JP8738390A JP8738390A JPH03287680A JP H03287680 A JPH03287680 A JP H03287680A JP 8738390 A JP8738390 A JP 8738390A JP 8738390 A JP8738390 A JP 8738390A JP H03287680 A JPH03287680 A JP H03287680A
- Authority
- JP
- Japan
- Prior art keywords
- alkoxide
- powder
- ester
- paste
- organic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 14
- 229920005989 resin Polymers 0.000 claims abstract description 30
- 239000011347 resin Substances 0.000 claims abstract description 30
- 239000000843 powder Substances 0.000 claims abstract description 22
- 229910052751 metal Inorganic materials 0.000 claims abstract description 18
- 239000002184 metal Substances 0.000 claims abstract description 18
- 150000004703 alkoxides Chemical class 0.000 claims abstract description 14
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000000945 filler Substances 0.000 claims abstract description 10
- 150000002903 organophosphorus compounds Chemical class 0.000 claims abstract description 9
- 229920003192 poly(bis maleimide) Polymers 0.000 claims description 8
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 claims description 7
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 claims description 4
- 229910021480 group 4 element Inorganic materials 0.000 claims description 2
- 230000000737 periodic effect Effects 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 abstract description 10
- 230000000694 effects Effects 0.000 abstract description 8
- 238000002156 mixing Methods 0.000 abstract description 8
- 150000002148 esters Chemical class 0.000 abstract description 7
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 abstract description 4
- 150000003018 phosphorus compounds Chemical class 0.000 abstract description 4
- -1 phosphorous ester Chemical class 0.000 abstract description 3
- 229910000073 phosphorus hydride Inorganic materials 0.000 abstract description 2
- 229910052710 silicon Inorganic materials 0.000 abstract description 2
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- MDDUHVRJJAFRAU-YZNNVMRBSA-N tert-butyl-[(1r,3s,5z)-3-[tert-butyl(dimethyl)silyl]oxy-5-(2-diphenylphosphorylethylidene)-4-methylidenecyclohexyl]oxy-dimethylsilane Chemical compound C1[C@@H](O[Si](C)(C)C(C)(C)C)C[C@H](O[Si](C)(C)C(C)(C)C)C(=C)\C1=C/CP(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 MDDUHVRJJAFRAU-YZNNVMRBSA-N 0.000 abstract 1
- 239000000758 substrate Substances 0.000 description 20
- 239000011230 binding agent Substances 0.000 description 11
- 239000004643 cyanate ester Substances 0.000 description 9
- 238000001723 curing Methods 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 239000004642 Polyimide Substances 0.000 description 7
- 238000004191 hydrophobic interaction chromatography Methods 0.000 description 7
- 229920001721 polyimide Polymers 0.000 description 7
- 239000004020 conductor Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 229920001187 thermosetting polymer Polymers 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 239000005011 phenolic resin Substances 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 230000003685 thermal hair damage Effects 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- 238000007259 addition reaction Methods 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 2
- 229940093858 ethyl acetoacetate Drugs 0.000 description 2
- 239000006232 furnace black Substances 0.000 description 2
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 150000008301 phosphite esters Chemical class 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000000454 talc Substances 0.000 description 2
- 235000012222 talc Nutrition 0.000 description 2
- 229910052623 talc Inorganic materials 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 238000005809 transesterification reaction Methods 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- 229910052845 zircon Inorganic materials 0.000 description 2
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 2
- KJOIQMXGNUKOLD-UHFFFAOYSA-N 1-[diacetyl(ethenyl)silyl]ethanone Chemical compound CC(=O)[Si](C=C)(C(C)=O)C(C)=O KJOIQMXGNUKOLD-UHFFFAOYSA-N 0.000 description 1
- VVPSQGITNIJRIE-UHFFFAOYSA-N 1-butoxypentane-2,4-dione Chemical compound CCCCOCC(=O)CC(C)=O VVPSQGITNIJRIE-UHFFFAOYSA-N 0.000 description 1
- XDOFQFKRPWOURC-UHFFFAOYSA-N 16-methylheptadecanoic acid Chemical compound CC(C)CCCCCCCCCCCCCCC(O)=O XDOFQFKRPWOURC-UHFFFAOYSA-N 0.000 description 1
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 1
- OUIMRGXCPGJFMC-UHFFFAOYSA-N 2-chloroethenyl(dimethoxy)borane Chemical compound ClC=CB(OC)OC OUIMRGXCPGJFMC-UHFFFAOYSA-N 0.000 description 1
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 238000006845 Michael addition reaction Methods 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical group CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 239000006230 acetylene black Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- MQPPCKJJFDNPHJ-UHFFFAOYSA-K aluminum;3-oxohexanoate Chemical compound [Al+3].CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O MQPPCKJJFDNPHJ-UHFFFAOYSA-K 0.000 description 1
- 239000000440 bentonite Substances 0.000 description 1
- 229910000278 bentonite Inorganic materials 0.000 description 1
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000011195 cermet Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 150000001913 cyanates Chemical class 0.000 description 1
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 1
- DYHSMQWCZLNWGO-UHFFFAOYSA-N di(propan-2-yloxy)alumane Chemical compound CC(C)O[AlH]OC(C)C DYHSMQWCZLNWGO-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- FPAFDBFIGPHWGO-UHFFFAOYSA-N dioxosilane;oxomagnesium;hydrate Chemical compound O.[Mg]=O.[Mg]=O.[Mg]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O FPAFDBFIGPHWGO-UHFFFAOYSA-N 0.000 description 1
- POULHZVOKOAJMA-UHFFFAOYSA-M dodecanoate Chemical compound CCCCCCCCCCCC([O-])=O POULHZVOKOAJMA-UHFFFAOYSA-M 0.000 description 1
- 239000010459 dolomite Substances 0.000 description 1
- 229910000514 dolomite Inorganic materials 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000007646 gravure printing Methods 0.000 description 1
- 229920006015 heat resistant resin Polymers 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000006233 lamp black Substances 0.000 description 1
- 229940070765 laurate Drugs 0.000 description 1
- 238000013035 low temperature curing Methods 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical class [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 150000003017 phosphorus Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
- H05K1/095—Dispersed materials, e.g. conductive pastes or inks for polymer thick films, i.e. having a permanent organic polymeric binder
Landscapes
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
- Paints Or Removers (AREA)
Abstract
Description
【発明の詳細な説明】
(イ)発明の目的
[産業上の利用分野1
本発明は混成集積回路素子、プリント配線回路板又は各
種デバイス等に使用される電子部品用有機厚膜ペースト
組成物に関するものである。Detailed Description of the Invention (a) Purpose of the Invention [Industrial Application Field 1 The present invention relates to an organic thick film paste composition for electronic components used in hybrid integrated circuit elements, printed wiring circuit boards, various devices, etc. It is something.
[従来の技術]
各種電子機器の高機能化と軽薄短小化の要求に対応する
高密度モジュール実装方法として、混成集積回路素子(
ハイブリッドIC1以下rHI C,と略称する。)に
よる実装方法が知られている。[Prior art] Hybrid integrated circuit elements (
Hybrid IC1 and below are abbreviated as rHIC. ) is known.
HICは集積回路素子(IC)及びトランジスタ等の能
動素子、並びに抵抗器及びコンデンサ等の受動素子、そ
の他の電子部品を含む回路を高密度モジュール化してワ
ンパッケージの中に納めたものであり、プリント配線板
上等に実装すれば全体回路をコンパクトにすることがで
きるものである。HIC is a high-density modular circuit that includes integrated circuit elements (ICs), active elements such as transistors, passive elements such as resistors and capacitors, and other electronic components and is housed in a single package. If mounted on a wiring board or the like, the entire circuit can be made compact.
HICは特にハイパワーのアナログ回路用モジュールと
して使用されることが多く、その代表的な構成としては
、アルミナ等のセラミックス絶縁基板上にサーメット厚
膜回路用ペースト(金属及び/又は金属酸化物とガラス
質よりなる焼成型ペースト、以下rCTFペースト」と
称する。)による印刷導体、印刷抵抗器と耐熱設計され
た各種電子部品等による回路を搭載し、セラミックス或
は金属パッケージ、耐熱性樹脂等で封止したもので、従
来のHICは高信軌性で耐熱性のあるものであった。HIC is often used as a module for high-power analog circuits, and its typical configuration is a cermet thick film circuit paste (metal and/or metal oxide and glass) on a ceramic insulating substrate such as alumina. It is equipped with circuits made of printed conductors, printed resistors, and various electronic components designed to be heat-resistant, and is sealed with ceramic or metal packages, heat-resistant resin, etc. Conventional HICs were highly reliable and heat resistant.
一方近年デジタル回路の発展と絶縁基板の技術向上に伴
って金属芯基板や有機基板を使用した、より安価で高密
度でサイズフリーなHICが普及し始めている。On the other hand, in recent years, with the development of digital circuits and improvements in insulating substrate technology, cheaper, higher density, and size-free HICs using metal core substrates or organic substrates have begun to become popular.
しかしCTFペーストは、金属芯基板や有機基板の耐熱
温度を大幅に上回る1000°C前後の焼成工程が必要
なため、これら基板に搭載される印刷回路をCTFペー
ストで形成させることは困難であった。However, CTF paste requires a baking process at around 1000°C, which is much higher than the heat resistance temperature of metal core substrates and organic substrates, making it difficult to form printed circuits mounted on these substrates using CTF paste. .
そのため比較的低温度で焼付けができる有機厚膜回路用
ペースト(導電性粒子と有機バインダよりなる硬化型又
は乾燥型ペースト。以下rPTFペースト」と称する。Therefore, the paste for organic thick film circuits (hardened type or dry type paste consisting of conductive particles and an organic binder; hereinafter referred to as rPTF paste) can be baked at a relatively low temperature.
)が検討され、−都連用されてきている。) has been studied and used extensively.
〔発明が解決しようとする課題]
しかし、HICにPTFペーストを適用した場合、次の
ような問題点があった。[Problems to be Solved by the Invention] However, when PTF paste is applied to HIC, there are the following problems.
■ 通常重版されているPTFペーストを適用した場合
、HICの耐久信頼性が従来のものに比べて大幅に劣る
ものとなり、製品の用途が狭小となってしまう点。■ If PTF paste, which is usually reprinted, is applied, the durability and reliability of HIC will be significantly inferior to conventional ones, and the product's applications will be narrowed down.
■ 耐久信頼性の高いポリイミド等の高耐熱性バインダ
を用いたPTFペーストを適用した場合にはその乾燥硬
化条件が厳しく、有機基板や一部の金属芯基板に熱損傷
を与えてしまう点。■ When a PTF paste using a highly heat-resistant binder such as polyimide, which has high durability and reliability, is applied, its drying and curing conditions are severe, causing thermal damage to organic substrates and some metal core substrates.
即ち、例えば最も一般的な金属芯基板であるアルミニウ
ム芯の絶縁金属基板(IMST基板)ではアルミニウム
の硬度変化が生じ、ポリイミド基板でも反り等の変形を
生じてしまう。That is, for example, in an insulated metal substrate with an aluminum core (IMST substrate), which is the most common metal core substrate, the hardness of aluminum changes, and even in a polyimide substrate, deformation such as warping occurs.
■ 基板上のボンディング用めっき端子でも金属の拡散
及び表面汚れ等が生じ、金属線ボンディングが困難にな
る点。■ Even with plated terminals for bonding on the board, metal diffusion and surface contamination occur, making metal wire bonding difficult.
金属芯基板や有機基板とPTFペーストを用いたHrC
(以下「有機HiCJと称する。)は低コスト、高密度
、サイズフリーなものとして優れた特長があるが、更に
普及するにはこのような問題の解決が求められていた。HrC using metal core substrate or organic substrate and PTF paste
(hereinafter referred to as "organic HiCJ") has excellent features as low cost, high density, and size-free, but solutions to these problems have been required in order for it to become more widespread.
(ロ)発明の構成
[課題を解決するための手段〕
本発明者等はこの問題につき鋭意検討した結果、高信顧
性と低温硬化性を両立することができる特定の組成のP
TFペーストを見出し、更に検討を重ねて本発明を完成
するに至った。(B) Structure of the invention [Means for solving the problem] As a result of intensive study on this problem, the present inventors have found a P of a specific composition that can achieve both high reliability and low-temperature curability.
After discovering TF paste, we completed further studies and completed the present invention.
即ち、本発明は、下記成分からなる有機厚膜ペースト組
成物である。That is, the present invention is an organic thick film paste composition comprising the following components.
(A)炭素粉末、金属粉末及び非導電性粉末から選ばれ
た充填材粉末の1種又は2種以上
(B)ビスマレイミドトリアジン樹脂
(C)有機リン化合物及び/又は分子中に不飽和結合を
有する周期律表第3属又は第4属元素のアルコキシド
以下本発明の詳細な説明する。(A) One or more filler powders selected from carbon powder, metal powder, and non-conductive powder (B) Bismaleimide triazine resin (C) Organic phosphorus compound and/or unsaturated bond in the molecule The present invention will be described in detail below.
PTFペーストのバインダとしては熱可塑性樹脂、熱硬
化性樹脂、光硬化性樹脂及び放射線が最も信幀性があり
汎用されている。As binders for PTF paste, thermoplastic resins, thermosetting resins, photocuring resins, and radiation are the most reliable and widely used.
二二で言う熱硬化性樹脂とは反応性官能基を有するモノ
マー及び/又はプレポリマーであり、PTFペーストと
して配合した後、加熱して架橋硬化させるものである。The thermosetting resin referred to in 22 is a monomer and/or prepolymer having a reactive functional group, which is blended as a PTF paste and then crosslinked and cured by heating.
熱硬化性樹脂の内でも耐熱性の高いものをバインダとし
て使用することにより、耐久信頼性の高い印刷回路を得
ることができるのであるが、このようなバインダは通常
、硬化条件が厳しく、例えばボリアミンク酸タイプの縮
合型ポリイミド、マイケル付加反応により重合するタイ
プのポリイミド、及びビスマレイミドトリアジン樹脂と
称される、多官能シアン酸エステルとビスマレイミドそ
の他の反応により重合するタイプのポリイミド(以下r
BT樹脂」と称する。)等はいずれも200°C以上の
温度で数時間〜数十時間反応させる必要がある。Printed circuits with high durability and reliability can be obtained by using thermosetting resins with high heat resistance as binders, but such binders usually require strict curing conditions, such as polyamin resin. Acid-type condensed polyimides, polyimides that polymerize through Michael addition reactions, and polyimides that polymerize through the reaction of polyfunctional cyanate esters, bismaleimides, and other substances, called bismaleimide triazine resins (hereinafter referred to as r).
BT resin. ) etc., it is necessary to react at a temperature of 200° C. or higher for several hours to several tens of hours.
これらのポリイミドをPTFペーストのバインダとして
使用すれば高熱、高湿度条件でも安定な印刷抵抗器及び
印刷導体(以下これらをまとめて「印刷回路」と称する
。)が得られることは従来より知られていたのであるが
、前述のようにその硬化条件では金属芯基板や有機基板
が熱損傷等を受けてしまう。It has long been known that if these polyimides are used as a binder for PTF paste, printed resistors and printed conductors (hereinafter collectively referred to as "printed circuits") that are stable even under high heat and high humidity conditions can be obtained. However, as mentioned above, under these curing conditions, the metal core substrate and the organic substrate suffer thermal damage.
検討の結果、このような熱損傷等の認められない硬化条
件は、概ね250℃以下で30分以内であることがわか
った。As a result of the study, it was found that the curing conditions under which such thermal damage etc. are not observed are approximately 250° C. or less and 30 minutes or less.
本発明者等は、BT樹脂をベースとするPTFペースト
について、上記のような温度範囲での低温硬化の可能性
を検討した結果、後述の二種類の化合物を促進剤として
添加した場合、特異的にこの要件を満たして安定な印刷
回路を形成することを見出した。As a result of examining the possibility of low-temperature curing in the above temperature range for PTF paste based on BT resin, the present inventors found that when the two types of compounds described below are added as accelerators, specific We have found that a stable printed circuit can be formed that satisfies this requirement.
BT樹脂は、(a)多官能シアン酸エステル、シアン酸
エステルプレポリマー又は該シアン酸エステルとアミン
とのプレポリマーと、(b)ビスマレイミド、ビスマレ
イミドプレポリマー又は該ビスマレイミドとアミンとの
プレポリマーからなることを特徴とする硬化性の樹脂組
成物であり、その詳細は例えば特公昭52−31279
号公報に記載されているとおりであって、BT樹脂には
(C)エポキシ化合物が更に配合されている例が多い。The BT resin is composed of (a) a polyfunctional cyanate ester, a cyanate ester prepolymer, or a prepolymer of the cyanate ester and an amine, and (b) a bismaleimide, a bismaleimide prepolymer, or a prepolymer of the bismaleimide and an amine. It is a curable resin composition characterized by consisting of a polymer, and its details are disclosed in, for example, Japanese Patent Publication No. 52-31279.
As described in the above publication, in many cases, the BT resin further contains (C) an epoxy compound.
BT樹脂による硬化物は、上記(a)と(b)との反応
生成物をその骨格とすることにより耐熱性を示すもので
あり、上記(C)は硬化物の物性を改質するために配合
されており、本発明においては(C)が配合された又は
配合されないBT樹脂のいずれをも使用することができ
る。The cured product of BT resin exhibits heat resistance by using the reaction product of the above (a) and (b) as its skeleton, and the above (C) is used to modify the physical properties of the cured product. Both BT resins with and without (C) can be used in the present invention.
(a)として好ましいものは2.2−ビス(4−サナト
フェニル)プロパン(即ちビスフエ/ −ルAジシアン
酸エステル)を主成分とするものであり、℃)として好
ましいものはビス(4−マレイミドフェニル)メタンを
主成分とするものである。Preferred as (a) are those containing 2,2-bis(4-sanatophenyl)propane (i.e., bisphel A dicyanate ester), and preferred as (°C) are those containing bis(4-maleimide) as the main component. The main component is (phenyl)methane.
また場合により配合される(C)としては、例えばビス
フェノールA型エポキシ樹脂等があり、その配合により
硬化物の可撓性、密着性等が改良される。In addition, (C) which may be optionally blended includes, for example, a bisphenol A type epoxy resin, and its blending improves the flexibility, adhesion, etc. of the cured product.
これらの成分をそのまま混合して用いても良いし、予め
一部又は全部を予備重合(プレポリマー化)したものを
用いても良い。本発明におけるBT樹脂は、上記のごと
きビスマレイミドトリアジン樹脂モノマー及び/又はプ
レポリマーである。These components may be used as a mixture as they are, or may be partially or completely prepolymerized (prepolymerized) beforehand. The BT resin in the present invention is a bismaleimide triazine resin monomer and/or prepolymer as described above.
本発明の有機厚膜ペースト組成物のバインダは、BT樹
脂を主成分とするもので、バインダを構成する樹脂成分
中の50重量%以上を占めることが好ましい。併用でき
る他の樹脂としては、フェノール樹脂やキシレン変性フ
ェノール樹脂等のモノマー及び/又はプレポリマーが挙
げられる。これら以外に、硬化物の密着性を向上させる
目的で、グリシジルメタクリレートモノマーをBT樹脂
100重量部(以下単に「部」と称する。)に対し、1
50部以下配合して樹脂分とすることが好ましい。The binder of the organic thick film paste composition of the present invention has a BT resin as its main component, and preferably accounts for 50% by weight or more of the resin component constituting the binder. Other resins that can be used in combination include monomers and/or prepolymers such as phenolic resins and xylene-modified phenolic resins. In addition to these, for the purpose of improving the adhesion of the cured product, 1 part of glycidyl methacrylate monomer is added to 100 parts by weight of BT resin (hereinafter simply referred to as "parts").
It is preferable to mix 50 parts or less to form the resin component.
分子中に不飽和結合を有する周期律表第3属又は第4属
元素のアルコキシド(以下単に「アルコキシド」と称す
る。)は、B、AI、Ga。Alkoxides of Group 3 or Group 4 elements of the periodic table (hereinafter simply referred to as "alkoxides") having an unsaturated bond in the molecule include B, AI, and Ga.
S i、Ge、Ti又はZrを含有するアルコキシドで
、具体的な化合物としては、2−クロロビニルジメトキ
シボロン、2−(2−クロロビニル)−1,3,2−ジ
オキサボロン、アリルジメトキシボロン、アクリルジイ
ソプロポキシアルミニウム、トリス(アセチルアセトン
)アルミニウム、トリス(エチルアセトアセテート)ア
ルミニウム、アセチルアセトンビス(エチルアセトアセ
テート)アルミニウム、ビニルトリメトキシシラン、ビ
ニルトリエトキシシラン、ビニルトリス(β−メトキシ
エトキシ)シラン、ビニルトリアセチルシラン、T−メ
タクリロキシプロピルトリメトキシシラン、イソプロポ
キシメタクリルチタンジラウレート、イソプロポキシジ
メタクリルチタンラウレート、イソプロポキシジメタク
リルチタンイソステアレート、イソプロポキシトリメタ
クリルチタン、イソプロポキシトリアクリルチタン、ジ
プロポキシビス(アセチルアセトン)チタン、トリn−
ブトキシアセチルアセトンジルコン及びイソプロポキシ
トリアクリルジルコン等が挙げられる。Alkoxide containing Si, Ge, Ti or Zr, specific compounds include 2-chlorovinyldimethoxyboron, 2-(2-chlorovinyl)-1,3,2-dioxaboron, allyldimethoxyboron, acrylic Diisopropoxyaluminum, tris(acetylacetone)aluminum, tris(ethylacetoacetate)aluminum, acetylacetonebis(ethylacetoacetate)aluminum, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris(β-methoxyethoxy)silane, vinyltriacetyl Silane, T-methacryloxypropyltrimethoxysilane, isopropoxymethacrylictitanium dilaurate, isopropoxydimethacrylictitanium laurate, isopropoxydimethacrylictitanium isostearate, isopropoxytrimethacrylictitanium, isopropoxytriacrylictitanium, dipropoxybis( acetylacetone) titanium, tri-n-
Examples include butoxyacetylacetone zircon and isopropoxytriacryl zircon.
これらの内で、元素がSiであるケイ素化合物が、特に
優秀な硬化促進効果を示すので好ましい。Among these, silicon compounds containing Si as an element are preferred because they exhibit particularly excellent hardening accelerating effects.
本発明においては、各種の有機リン化合物を使用するこ
とができる。それらの内、三価リン化合物としてはホス
フィン類(酸化に対する安定性と配合後の組成物の安定
性の点からみて、実際上トリフェニルホスフィンが最適
である。)、亜リン酸エステル、ホスフォラス酸エステ
ル及びホスフィナス酸エステルがあり、また三価リン化
合物としてはホスフィンオキシト類、リン酸エステル、
ホスフィン酸エステル、ホスフィン酸エステル及びこれ
らのチオ酸エステル型の化合物が挙げられる。In the present invention, various organic phosphorus compounds can be used. Among them, trivalent phosphorus compounds include phosphines (triphenylphosphine is actually the most suitable in terms of stability against oxidation and stability of the composition after blending), phosphite esters, and phosphorus acids. There are esters and phosphinate esters, and trivalent phosphorus compounds include phosphine oxytos, phosphate esters,
Examples include phosphinates, phosphinates, and thioate type compounds thereof.
この内、配合後の組成の安定性と硬化促進効果からみて
特に好ましいものは亜リン酸エステル類である。Among these, phosphite esters are particularly preferred in view of the stability of the composition after blending and the effect of accelerating curing.
アルコキシド及び/又は有機リン化合物をBT樹脂中に
配合し有機厚膜ペーストとした場合には、該ペーストの
安定性が良く、緩やかな硬化条件でも充分硬化し、印刷
回路の耐久信転性も優れたものとなる。When an alkoxide and/or an organic phosphorus compound is blended into a BT resin to form an organic thick film paste, the paste has good stability, is sufficiently cured even under mild curing conditions, and has excellent durability and reliability of printed circuits. It becomes something.
アルコキシド及び/又は有機リン化合物の好ましい配合
量は、樹脂分100部当り、2〜lO部である。配合量
が少ないと効果が発揮されず、10部を超えて配合して
もそれ以上の効果は期待できない。The preferred blending amount of the alkoxide and/or organic phosphorus compound is 2 to 10 parts per 100 parts of the resin. If the amount is too small, the effect will not be exhibited, and even if more than 10 parts is added, no further effect can be expected.
本発明のPTFペーストにおける粉末充填剤は、導電性
及び非導電性のいずれでも良<l)炭素粉末、(2)金
属粉末及び(3)非導電性粉末から選ばれた1種又は2
種以上である。The powder filler in the PTF paste of the present invention may be either electrically conductive or non-conductive.
More than a species.
印刷抵抗器用には通常(1)と(3)を併用し、印刷導
体回路用には通常(2)を使用し、両用途に使用する保
護コート用には通常(3)を使用する。For printed resistors, (1) and (3) are usually used together, for printed conductor circuits, (2) is usually used, and for protective coats used for both purposes, (3) is usually used.
炭素粉末は各種の有機物質を不完全燃焼して得られるい
わゆるカーボンブラック、或いは結晶性の高い層構造物
として天然に産出され又は人工的に得られるいわゆるグ
ラファイトが好ましく、中でも導電性のよいもの、即ち
一般的に言う(原料、製法、特徴により分類された名称
ではあるが)ファーネスブラック、アセチレンブラック
、ランプブラック、ケッチエンブラック及びグラファイ
トが最も好ましい。The carbon powder is preferably so-called carbon black obtained by incomplete combustion of various organic substances, or so-called graphite, which is naturally produced or artificially obtained as a layered structure with high crystallinity, and among them, those with good conductivity, That is, generally speaking (although the names are classified according to raw materials, manufacturing methods, and characteristics), furnace black, acetylene black, lamp black, Ketschen black, and graphite are most preferred.
これらはそれぞれ単独で使用しても或は混合して用いて
も良いが、印刷抵抗器の種々の特性上から通常は混合し
て用いられる。Although these may be used alone or in combination, they are usually used in combination in view of the various characteristics of the printed resistor.
好ましい金属粉末は、酸化に対して比較的安定で導電性
の良い各種金属の粉末である。例えばプラチナ、金、銀
、銅、ニッケル、チタン及びパラジウム等があるが、価
格と性能の面から通常は銀と銅がよく使用される。Preferred metal powders are powders of various metals that are relatively stable against oxidation and have good conductivity. Examples include platinum, gold, silver, copper, nickel, titanium, and palladium, but silver and copper are usually used because of their cost and performance.
非導電性粉末は、無機物又は有機物の微粉末であり、例
えば、無機物としてはコロイド状シリカ、熔融シリカ、
アルミナ、タルク、マイカ、酸化鉄、炭酸カルシウム、
炭酸マグネシウム、ベントナイト、ドロマイト及びカオ
リン等があり、有機物としては、熱硬化性樹脂、例えば
フェノール樹脂及びベンゾグアナミン樹脂等の硬化物粉
末、或いは熱可塑性樹脂、例えばポリメチルメタクリレ
ート、ポリエチレン及びポリスチレン等の粉末がある。The non-conductive powder is a fine powder of an inorganic substance or an organic substance. Examples of the inorganic substance include colloidal silica, fused silica,
Alumina, talc, mica, iron oxide, calcium carbonate,
Magnesium carbonate, bentonite, dolomite, kaolin, etc. are used, and organic substances include thermosetting resins such as hardened powders of phenol resins and benzoguanamine resins, and thermoplastic resins such as polymethyl methacrylate, polyethylene, and polystyrene powders. be.
これらの非導電性粉末は、適宜単独又は混合して用いる
。These non-conductive powders are used alone or in combination as appropriate.
本発明の有機厚膜ペーストにおける上記粉末充填剤の配
合量は、該ペーストが導電性又は非導電性のいずれを目
的とするか、或いはいかなる抵抗値を目的とするのか等
によって異なる。The blending amount of the powder filler in the organic thick film paste of the present invention varies depending on whether the paste is intended to be conductive or non-conductive, or what resistance value is intended.
印刷抵抗器用及び保護コート用の場合は、バインダ10
0部に対し、粉末充填剤を80部以下配合することが好
ましい。80部を超えて配合するとペーストの粘度が高
くなりすぎ、塗工性が悪くなる。For printed resistors and protective coats, binder 10
It is preferable to mix 80 parts or less of the powder filler with respect to 0 parts. If the amount exceeds 80 parts, the viscosity of the paste will become too high, resulting in poor coating properties.
一方印刷導体回路用に用いる金属粉末は、比重が大きい
ので、バインダー100部に対し、1900部以下の配
合が好ましい。On the other hand, since the metal powder used for printed conductor circuits has a high specific gravity, it is preferable to mix it in an amount of 1900 parts or less per 100 parts of the binder.
本発明の有機厚膜ペーストには、ケトン系、エステル系
、エーテル系又はアルコール系等の溶剤も配合すること
ができるが、スクリーン印刷等を考えた場合、高沸点の
溶剤が好まし、く、例えばブチルセロソルブアセテート
、ブチルカルピトールアセテート、イソホロン又はテル
ピネオール等が好ましく用いられる。The organic thick film paste of the present invention can also contain a ketone, ester, ether, or alcohol solvent, but when considering screen printing, a high boiling point solvent is preferred. For example, butyl cellosolve acetate, butyl carpitol acetate, isophorone, terpineol, etc. are preferably used.
溶剤は、有機厚膜ペーストを構成する他の固体成分(樹
脂分及び粉末充填材)100部当り2〜50部程度の配
合が好ましい。The solvent is preferably mixed in an amount of about 2 to 50 parts per 100 parts of other solid components (resin and powder filler) constituting the organic thick film paste.
その他の添加材、例えばレベリング性改良剤などの種々
のインク特性改良剤、分散性改良剤、密着性改良剤等と
着色剤である種々の顔料、染料等を所望により適宜配合
して、本発明の有機厚膜ペースト組成物とすることもで
きる。Other additives, such as various ink property improvers such as leveling improvers, dispersibility improvers, adhesion improvers, etc., and various pigments, dyes, etc. as coloring agents are appropriately blended as desired, and the present invention It can also be an organic thick film paste composition.
有機厚膜ペーストを印刷する方法としてはスクリーン印
刷、グラビア印刷、オフセット印刷及びノズルによる描
画法があるが、最も一般的なものはスクリーン印刷であ
る。Methods for printing organic thick film pastes include screen printing, gravure printing, offset printing, and nozzle drawing methods, and the most common method is screen printing.
乾燥硬化方法としては熱風炉、遠赤外線炉、近赤外線炉
及びマイクロ波加熱炉等によるものがあり、いずれをも
使用することができる。Drying and curing methods include methods using a hot air oven, a far-infrared oven, a near-infrared oven, a microwave heating oven, etc., and any of them can be used.
アルコキシド及び有機リン化合物が、BT樹脂の硬化促
進剤として有効に作用する理由は定かではないが、アル
コキシドの場合、その不飽和結合とシアン酸エステル化
合物のニトリル結合が付加反応をすること、アルコキシ
ドがシアン酸エステル化合物とエステル交換反応をする
こと、及びアルコキシドから加水分解により生成した(
半)金属ヒドロキシドがシアン酸エステル化合物のニト
リル結合に付加反応をすること等によるものと推定され
る。It is not clear why alkoxides and organic phosphorus compounds act effectively as curing accelerators for BT resins, but in the case of alkoxides, the unsaturated bonds and the nitrile bonds of the cyanate ester compound undergo an addition reaction. Produced by transesterification with a cyanate ester compound and hydrolysis from an alkoxide (
It is presumed that this is due to an addition reaction of the semi-metal hydroxide to the nitrile bond of the cyanate ester compound.
一方有機リン化合物の場合、シアン酸エステル化合物に
リン原子が配位し触媒作用をすることの他、アルコキシ
ドの場合と同様にシアン酸エステル化合物とのエステル
交換反応をすることによるものと推定される。On the other hand, in the case of organic phosphorus compounds, it is presumed that in addition to the phosphorus atom coordinating with the cyanate ester compound and acting as a catalyst, it also undergoes a transesterification reaction with the cyanate ester compound as in the case of alkoxides. .
以下、実施例及び比較例を用いて本発明の詳細な説明す
る。Hereinafter, the present invention will be explained in detail using Examples and Comparative Examples.
実施例1
バインダとしてビス(4−マレイミドフェニル)メタン
並びに2.2−ビス(4−サナトフェニル)プロパンの
モノマー及び/又はプレポリマーからなり、両者の重量
比が3対7であるBT樹脂 BT2300(三菱瓦斯化
学■製)45部、グリシジルメタクリレート50部並び
にトリス(エチルアセトアセテート)アルミニウム5部
の混合物100部、炭素粉末としてファーネスブラック
であるMS−500(旭カーボン■製)8部、充填材と
してタルク粉末 ミクロエースに−1(日本タルク■製
)40部、溶剤としてプチルカルビトールアセテートヲ
30部配合し、三本ロールにて混練し抵抗ペーストを得
た。Example 1 BT resin BT2300( 100 parts of a mixture of 50 parts of glycidyl methacrylate and 5 parts of tris(ethyl acetoacetate) aluminum; 8 parts of furnace black MS-500 (manufactured by Asahi Carbon) as a filler; 40 parts of talcum powder Micro Ace (manufactured by Nippon Talc ■) and 30 parts of butyl carbitol acetate as a solvent were blended and kneaded with a three-roller to obtain a resistance paste.
PTF銀ペーストC−100(東亜合成化学工業■製)
の端子が10組印刷しであるポリイミド絶縁基板を用い
、その上に当該抵抗ペーストを巾2mm、端子間2mm
(端子とのラップ巾両方各1mm)、固形分厚み20部
2μmとなるようにスクリーン印刷し、150°Cで5
分乾燥し250°Cで30分硬化した。PTF silver paste C-100 (manufactured by Toagosei Chemical Industry Co., Ltd.)
Use a polyimide insulating substrate on which 10 sets of terminals are printed, and apply the resistor paste on it with a width of 2 mm and a distance of 2 mm between the terminals.
(Wrap width with the terminal is 1 mm each), screen printed so that the solid content thickness is 20 parts 2 μm, and
It was dried for 30 minutes and cured at 250°C for 30 minutes.
更にその上にオーバコートとしてP−100(東°亜合
成化学工業■製)を固形分厚み20μmで施し、同様に
150℃で5分乾燥し180℃で30分硬化した。この
結果得られたテストピースは反り等の異常は見られなか
った。Furthermore, P-100 (manufactured by Toagosei Chemical Industry Co., Ltd.) was applied thereon as an overcoat to a solid content thickness of 20 μm, similarly dried at 150° C. for 5 minutes, and cured at 180° C. for 30 minutes. The test piece obtained as a result showed no abnormalities such as warping.
このようにして都合10個のテストピースを作成し合計
100個の印刷抵抗器を得た。In this way, a total of 10 test pieces were created, giving a total of 100 printed resistors.
これらの印刷抵抗器の抵抗値は20μm厚みに換算して
(以下に記す全ての抵抗値は20μm厚みに換算した平
均のシート抵抗値を表わす)平均8.52 KΩ/口、
標準偏差0.61にΩ/口であった。These printed resistors have an average resistance value of 8.52 KΩ/hole when converted to a 20 μm thickness (all resistance values listed below represent average sheet resistance values converted to a 20 μm thickness);
The standard deviation was 0.61 Ω/mouth.
該印刷抵抗器の60°C295%Rh、1000時間の
耐湿試験(以下単に「耐湿試験」と記す。)後の抵抗値
変化率は2.5%、121″C12気圧、100%Rh
、48時間のプレッシャークツカー試験(以下単にrP
CTJと記す。)後の抵抗値変化率は2.1%、260
″Cのはんだ浴中に10秒間浸漬した後の抵抗値変化率
は2゜2%と優れた耐久信鯨性を示した。The resistance change rate of the printed resistor after a 1000 hour humidity test (hereinafter simply referred to as "humidity test") at 60°C, 295% Rh was 2.5%, 121"C, 12 atmospheres, 100% Rh.
, 48-hour pressure test (rP)
It is written as CTJ. ) The resistance value change rate after 2.1%, 260
After being immersed in a solder bath of "C" for 10 seconds, the resistance change rate was 2.2%, indicating excellent durability.
実施例2〜8、比較例1〜4
各種バインダと充填材の組合せで表1に記載の有機厚膜
ペースト(抵抗器用、導体回路用及び保護コート用)を
製造した。Examples 2 to 8, Comparative Examples 1 to 4 Organic thick film pastes (for resistors, conductor circuits, and protective coats) shown in Table 1 were manufactured using combinations of various binders and fillers.
これらを組み合わせて表2の条件で各々、印刷抵抗器、
印刷導体端子を含む印刷回路を実施例1に従って作成し
、評価した。その結果を表2に示す。By combining these and under the conditions shown in Table 2, printed resistors,
A printed circuit including printed conductor terminals was prepared according to Example 1 and evaluated. The results are shown in Table 2.
(ハ)発明の効果
本発明の有機厚膜ペースト組成物による回路は耐久信頼
性が非常に優れているので、これを用いて金属芯基板や
有l!基板をベースとした有機HICが製造できる。こ
れは電子部品の高密度実装、低コスト化に大きく貢献す
るものである。(c) Effects of the Invention Since the circuit made of the organic thick film paste composition of the present invention has extremely excellent durability and reliability, it can be used to create metal core substrates and other circuits. Organic HICs based on substrates can be manufactured. This greatly contributes to high-density packaging and cost reduction of electronic components.
Claims (1)
た充填材粉末の1種又は2種以上 (B)ビスマレイミドトリアジン樹脂 (C)有機リン化合物及び/又は分子中に不飽和結合を
有する周期律表第3属又は第4属元素のアルコキシド[Claims] 1. An organic thick film paste composition comprising the following components. (A) One or more filler powders selected from carbon powder, metal powder, and non-conductive powder (B) Bismaleimide triazine resin (C) Organic phosphorus compound and/or unsaturated bond in the molecule Alkoxide of Group 3 or Group 4 element of the periodic table with
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8738390A JPH03287680A (en) | 1990-04-03 | 1990-04-03 | Paste composition for organic thick film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8738390A JPH03287680A (en) | 1990-04-03 | 1990-04-03 | Paste composition for organic thick film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03287680A true JPH03287680A (en) | 1991-12-18 |
Family
ID=13913376
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8738390A Pending JPH03287680A (en) | 1990-04-03 | 1990-04-03 | Paste composition for organic thick film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03287680A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007096121A (en) * | 2005-09-29 | 2007-04-12 | Mitsubishi Plastics Ind Ltd | Multilayer wiring board |
JP2007096122A (en) * | 2005-09-29 | 2007-04-12 | Mitsubishi Plastics Ind Ltd | Connection bonding sheet for multilayer wiring board |
JP2007096120A (en) * | 2005-09-29 | 2007-04-12 | Mitsubishi Plastics Ind Ltd | Conductive paste composition for filling via hole |
-
1990
- 1990-04-03 JP JP8738390A patent/JPH03287680A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007096121A (en) * | 2005-09-29 | 2007-04-12 | Mitsubishi Plastics Ind Ltd | Multilayer wiring board |
JP2007096122A (en) * | 2005-09-29 | 2007-04-12 | Mitsubishi Plastics Ind Ltd | Connection bonding sheet for multilayer wiring board |
JP2007096120A (en) * | 2005-09-29 | 2007-04-12 | Mitsubishi Plastics Ind Ltd | Conductive paste composition for filling via hole |
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