JP2007093593A5 - - Google Patents

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JP2007093593A5
JP2007093593A5 JP2006231713A JP2006231713A JP2007093593A5 JP 2007093593 A5 JP2007093593 A5 JP 2007093593A5 JP 2006231713 A JP2006231713 A JP 2006231713A JP 2006231713 A JP2006231713 A JP 2006231713A JP 2007093593 A5 JP2007093593 A5 JP 2007093593A5
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ray
sample
total reflection
primary
rays
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JP2006231713A
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JP2007093593A (en
JP5159068B2 (en
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Claims (7)

X線源からの1次X線を試料表面に向かって全反射を起こす入射角で入射させ、前記試料表面に対向させた検出器で前記1次X線を受けた試料表面から発生する蛍光X線を検出する全反射蛍光X線分析方法において、
前記試料表面に照射する1次X線を、ポリキャピラリーX線レンズを用いて集光させるとともに、
前記ポリキャピラリーX線レンズから出射する1次X線は、進行方向に対して直交する方向の断面形状が試料表面に平行な線状であるようにすることを特徴とする全反射蛍光X線分析方法。
Fluorescence X generated from the sample surface that has received primary X-rays from a detector that is made to enter primary X-rays from an X-ray source at an incident angle that causes total reflection toward the sample surface and is opposed to the sample surface. In the total reflection X-ray fluorescence analysis method for detecting a line,
The primary X-rays irradiated on the sample surface are condensed using a polycapillary X-ray lens ,
The total reflection fluorescent X-ray analysis characterized in that the primary X-ray emitted from the polycapillary X-ray lens has a cross-sectional shape in a direction orthogonal to the traveling direction in a line parallel to the sample surface. Method.
前記試料表面に照射する1次X線のうち、前記試料表面に対して全反射条件を満たさない入射角をもつ1次X線を遮蔽する請求項に記載の全反射蛍光X線分析方法。 Of primary X-rays to be irradiated to the sample surface, total reflection X-ray fluorescence analysis method according to claim 1 for shielding the primary X-ray having an incident angle that does not satisfy the total reflection condition with respect to the sample surface. 試料表面から発生する蛍光X線を検出する検出器側にもポリキャピラリーX線レンズを配置して、試料表面上の微小領域からの蛍光X線のみを検出する請求項1又は2に記載の全反射蛍光X線分析方法。 The whole of claim 1 or 2 , wherein a polycapillary X-ray lens is also arranged on a detector side that detects fluorescent X-rays generated from the sample surface, and only fluorescent X-rays from a minute region on the sample surface are detected. Reflected fluorescent X-ray analysis method. 試料を載置する試料台と、
1次X線を発生するX線源及びその1次X線を集光して前記試料台上に載置された試料に照射するポリキャピラリーX線レンズを含み、その1次X線を試料の表面に対し全反射を起こす入射角で入射させる1次X線照射部と、
前記試料台上に載置された試料の表面に対向して配置され、試料から発生する蛍光X線を検出する検出器と、を備えた全反射蛍光X線分析装置において、
前記ポリキャピラリーX線レンズはモノキャピラリーを多数束ねたものであり、各モノキャピラリーはその内径が受光部側の基端から放射側の先端にかけていったん拡大し、先端に向かって漸次細くなる形状をもったものであり、
前記ポリキャピラリーX線レンズは、X線光源に対面する入射面では前記モノキャピラリーの端部が円形面状に配列され、試料に対面する出射面では前記モノキャピラリーの端部が線状に、かつ放射方向が一点に向かって集光するように配列されていることを特徴とする全反射蛍光X線分析装置。
A sample stage on which the sample is placed;
An X-ray source that generates primary X-rays and a polycapillary X-ray lens that collects the primary X-rays and irradiates the sample placed on the sample stage. A primary X-ray irradiator that is incident at an incident angle causing total reflection on the surface;
In the total reflection X-ray fluorescence analyzer , which is disposed opposite to the surface of the sample placed on the sample stage and includes a detector that detects fluorescent X-rays generated from the sample ,
The polycapillary X-ray lens is formed by bundling a large number of monocapillaries, and each monocapillary has a shape in which the inner diameter is once enlarged from the proximal end on the light receiving unit side to the distal end on the radiation side and gradually becomes narrower toward the distal end. And
In the polycapillary X-ray lens, the end of the monocapillary is arranged in a circular shape on the incident surface facing the X-ray light source, and the end of the monocapillary is linear on the exit surface facing the sample. A total reflection fluorescent X-ray analyzer characterized by being arranged so that the radiation direction is condensed toward one point .
前記1次X線照射部は、ポリキャピラリーX線レンズの出射側と試料台との間にスリットを備え、該スリットは前記試料台上に載置された試料の表面に対して全反射条件を満たさない入射角をもつ1次X線を遮蔽するように配置されている請求項に記載の全反射蛍光X線分析装置。 The primary X-ray irradiator includes a slit between the exit side of the polycapillary X-ray lens and the sample stage, and the slit has a total reflection condition with respect to the surface of the sample placed on the sample stage. The total reflection X-ray fluorescence analyzer according to claim 4 , which is arranged so as to shield primary X-rays having an incident angle that is not satisfied. 前記試料台はその上に載置された試料の表面の水平面内方向、高さ方向及び入射X線に対するその試料の表面の傾き方向を調整する調整機構を備えている請求項4又は5に記載の全反射蛍光X線分析装置。 Wherein said sample stage according to claim 4 or 5 has an adjustment mechanism for adjusting the inclination direction of the surface of the sample with respect to the horizontal plane direction, the height direction and the incident X-ray of the loading surface of the specimen thereon Total reflection X-ray fluorescence analyzer. 前記試料台上に載置された試料と前記検出器との間にもポリキャピラリーX線レンズを備え、前記試料表面上の微小領域からの蛍光X線のみを検出するようにした請求項からのいずれか一項に記載の全反射蛍光X線分析装置。 Includes a polycapillary X-ray lens in between the detector and the sample mounted on the sample stage, claim 4 which is adapted to detect only the fluorescent X-rays from very small area on the sample surface The total reflection X-ray fluorescence analyzer according to any one of claims 6 to 6 .
JP2006231713A 2005-09-01 2006-08-29 Total reflection X-ray fluorescence analyzer Expired - Fee Related JP5159068B2 (en)

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JP2007093593A JP2007093593A (en) 2007-04-12
JP2007093593A5 true JP2007093593A5 (en) 2009-08-20
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JP5646147B2 (en) * 2008-03-28 2014-12-24 公立大学法人大阪市立大学 Method and apparatus for measuring a two-dimensional distribution
JP2010019584A (en) * 2008-07-08 2010-01-28 Central Japan Railway Co Fluorescent x-ray analyzer
JP5846469B2 (en) * 2008-09-02 2016-01-20 国立大学法人京都大学 Total reflection X-ray fluorescence analyzer and total reflection X-ray fluorescence analysis method
JP2010197229A (en) * 2009-02-25 2010-09-09 Osaka City Univ Fluorescent x-ray analyzer
JP5407075B2 (en) * 2009-04-23 2014-02-05 公立大学法人兵庫県立大学 X-ray analyzer
JP5964705B2 (en) * 2012-09-14 2016-08-03 浜松ホトニクス株式会社 Polycapillary lens
EP2762862B1 (en) * 2013-01-30 2017-03-08 Bruker AXS GmbH XRF measurement apparatus for detecting contaminations on the bevel of a wafer
JP6501230B2 (en) 2016-03-08 2019-04-17 株式会社リガク Multi-element simultaneous fluorescent X-ray analyzer and multi-element simultaneous fluorescent X-ray analysis method
CN112105919B (en) * 2018-06-08 2023-08-22 株式会社岛津制作所 Fluorescent X-ray analysis device and fluorescent X-ray analysis method
CN115389538B (en) * 2022-08-09 2023-12-29 深圳市埃芯半导体科技有限公司 X-ray analysis device and method

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JPH0740080B2 (en) * 1986-06-19 1995-05-01 株式会社島津製作所 X-ray beam focusing device
JP2675737B2 (en) * 1993-05-06 1997-11-12 理学電機工業株式会社 Total reflection X-ray fluorescence analysis method and analyzer
JPH0961382A (en) * 1995-08-24 1997-03-07 Hitachi Ltd Total reflection fluorescent x-ray analyzer
JPH10227749A (en) * 1997-02-14 1998-08-25 Matsushita Electric Ind Co Ltd Radiographic inspection device and method
CN1246858C (en) * 2001-06-19 2006-03-22 X射线光学系统公司 Wavelength dispersive XRF system using focusing optic for excitation and a focusing monochromator for collection
JP2003202306A (en) * 2002-01-08 2003-07-18 Japan Science & Technology Corp Total reflection fluorescent x-ray analysis method and apparatus having configuration using sample substrate and reflector for achieving multiple total reflection and convergence of x rays
JP4421327B2 (en) * 2004-02-25 2010-02-24 浜松ホトニクス株式会社 X-ray collimator and X-ray imaging apparatus

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