JP2007073542A5 - - Google Patents
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- Publication number
- JP2007073542A5 JP2007073542A5 JP2005255294A JP2005255294A JP2007073542A5 JP 2007073542 A5 JP2007073542 A5 JP 2007073542A5 JP 2005255294 A JP2005255294 A JP 2005255294A JP 2005255294 A JP2005255294 A JP 2005255294A JP 2007073542 A5 JP2007073542 A5 JP 2007073542A5
- Authority
- JP
- Japan
- Prior art keywords
- main frame
- joined
- bottom plate
- reinforcing
- vacuum chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Description
上記課題を解決するため、本発明の第1の観点は、多角形状に形成され、底部をなす底板を有し、該底板に対向する上面が開口した主枠体と、
前記主枠体の対向する側部にそれぞれ接合される少なくとも一対の補強枠体と、
前記主枠体の上部に着脱自在に接合される部材と、
を備え、
前記主枠体と前記補強枠体とが接合され、一体となって被処理基板を収容する空間を形成するようにしたことを特徴とする、真空チャンバを提供する。
In order to solve the above-described problem, a first aspect of the present invention is a main frame body that is formed in a polygonal shape and has a bottom plate that forms a bottom portion, and an upper surface that faces the bottom plate is opened.
At least a pair of reinforcing frames respectively joined to opposite sides of the main frame;
A member detachably joined to the upper part of the main frame;
With
A vacuum chamber is provided, wherein the main frame and the reinforcing frame are joined together to form a space for accommodating a substrate to be processed.
また、本発明の第2の観点は、多角形状に形成され、底部をなす底板を有し、該底板に対向する上面が開口した主枠体と、
前記主枠体の対向する側部にそれぞれ接合される少なくとも一対の補強枠体と、
前記主枠体の上部に着脱自在に接合される部材と、
を備え、
前記主枠体と前記補強枠体とを接合することにより耐真空強度を持たせたことを特徴とする、真空チャンバを提供する。
In addition, a second aspect of the present invention is a main frame body that is formed in a polygonal shape and has a bottom plate that forms a bottom portion, and an upper surface facing the bottom plate is opened,
At least a pair of reinforcing frames respectively joined to opposite sides of the main frame;
A member detachably joined to the upper part of the main frame;
With
There is provided a vacuum chamber characterized by having a vacuum resistance strength by joining the main frame and the reinforcing frame.
また、前記内部補強部材は、前記主枠体の上端近傍において前記開口の内側に向けて突設されたフランジと、前記主枠体の壁面と、に接合される断面L字型の補強部材であることが好ましい。また、前記接合される部材は、前記フランジの上面に載置され、接合されるものであることが好ましい。 The internal reinforcing member is an L-shaped reinforcing member joined to a flange projecting toward the inside of the opening in the vicinity of the upper end of the main frame and a wall surface of the main frame. Preferably there is. Moreover, it is preferable that the member to be joined is placed on the upper surface of the flange and joined.
Claims (3)
前記主枠体の対向する側部にそれぞれ接合される少なくとも一対の補強枠体と、
前記主枠体の上部に着脱自在に接合される部材と、
を備え、
前記主枠体と前記補強枠体とが接合され、一体となって被処理基板を収容する空間を形成するようにしたことを特徴とする、真空チャンバ。 A main frame that is formed in a polygonal shape and has a bottom plate that forms a bottom portion, and an upper surface that faces the bottom plate is opened;
At least a pair of reinforcing frames respectively joined to opposite sides of the main frame;
A member detachably joined to the upper part of the main frame;
With
A vacuum chamber characterized in that the main frame and the reinforcing frame are joined together to form a space for accommodating a substrate to be processed.
前記主枠体の対向する側部にそれぞれ接合される少なくとも一対の補強枠体と、
前記主枠体の上部に着脱自在に接合される部材と、
を備え、
前記主枠体と前記補強枠体とを接合することにより耐真空強度を持たせたことを特徴とする、真空チャンバ。 A main frame that is formed in a polygonal shape and has a bottom plate that forms a bottom portion, and an upper surface that faces the bottom plate is opened;
At least a pair of reinforcing frames respectively joined to opposite sides of the main frame;
A member detachably joined to the upper part of the main frame;
With
A vacuum chamber having vacuum resistance strength by joining the main frame and the reinforcing frame.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005255294A JP4791110B2 (en) | 2005-09-02 | 2005-09-02 | Vacuum chamber and vacuum processing equipment |
KR1020060083845A KR100856145B1 (en) | 2005-09-02 | 2006-08-31 | Vacuum chamber and vacuum processing apparatus |
TW095132454A TWI406332B (en) | 2005-09-02 | 2006-09-01 | Vacuum chamber and vacuum treatment device |
CNB2006101289226A CN100421212C (en) | 2005-09-02 | 2006-09-04 | Vacuum cavity chamber and vacuum processing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005255294A JP4791110B2 (en) | 2005-09-02 | 2005-09-02 | Vacuum chamber and vacuum processing equipment |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2007073542A JP2007073542A (en) | 2007-03-22 |
JP2007073542A5 true JP2007073542A5 (en) | 2008-10-02 |
JP4791110B2 JP4791110B2 (en) | 2011-10-12 |
Family
ID=37817679
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005255294A Expired - Fee Related JP4791110B2 (en) | 2005-09-02 | 2005-09-02 | Vacuum chamber and vacuum processing equipment |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4791110B2 (en) |
KR (1) | KR100856145B1 (en) |
CN (1) | CN100421212C (en) |
TW (1) | TWI406332B (en) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100682209B1 (en) | 2002-06-21 | 2007-02-12 | 어플라이드 머티어리얼스, 인코포레이티드 | Transfer chamber for vacuum processing system |
KR101101757B1 (en) * | 2005-11-07 | 2012-01-05 | 주성엔지니어링(주) | Vacuum chamber which economizes manufacturing cost |
KR101309363B1 (en) * | 2007-12-14 | 2013-09-17 | 가부시키가이샤 알박 | Chamber and film-forming apparatus |
JP5551346B2 (en) * | 2008-06-10 | 2014-07-16 | 東京エレクトロン株式会社 | Chamber and processing apparatus |
CN102272350B (en) * | 2009-01-14 | 2014-12-24 | 株式会社爱发科 | Plasma cvd apparatus |
FI122940B (en) * | 2009-02-09 | 2012-09-14 | Beneq Oy | reaction chamber |
KR20110067939A (en) * | 2009-12-15 | 2011-06-22 | 주식회사 테스 | Load lock chamber |
KR101598176B1 (en) * | 2010-03-30 | 2016-02-26 | 주식회사 원익아이피에스 | Vacuum chamber |
JP5526988B2 (en) * | 2010-04-28 | 2014-06-18 | 東京エレクトロン株式会社 | Substrate processing apparatus and substrate processing system |
KR101363064B1 (en) * | 2012-05-22 | 2014-02-14 | 박종민 | Vacuum chamber structure |
JP2016537805A (en) * | 2013-09-26 | 2016-12-01 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | Mixed platform apparatus, system, and method for substrate processing |
JP7023097B2 (en) * | 2016-12-28 | 2022-02-21 | 東京エレクトロン株式会社 | How to lock the vacuum chamber and the door of the vacuum chamber |
JP6625597B2 (en) * | 2017-11-13 | 2019-12-25 | 平田機工株式会社 | Transfer chamber |
JP7277137B2 (en) * | 2018-12-28 | 2023-05-18 | 株式会社Screenホールディングス | Substrate processing equipment and transfer module |
KR102193096B1 (en) | 2019-01-31 | 2020-12-21 | (주)에프티엘 | Jig apparatus for welding for rib of vaccum chamber |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3608065B2 (en) * | 1996-10-31 | 2005-01-05 | 東京エレクトロン株式会社 | Vertical heat treatment apparatus and maintenance method for boat and heat insulation cylinder |
US5914493A (en) * | 1997-02-21 | 1999-06-22 | Nikon Corporation | Charged-particle-beam exposure apparatus and methods with substrate-temperature control |
US6241117B1 (en) * | 1997-11-26 | 2001-06-05 | Steven R. Wickins | Pressure differential containment structure |
JP4253107B2 (en) * | 2000-08-24 | 2009-04-08 | キヤノンアネルバ株式会社 | Substrate processing apparatus and expansion method thereof |
JP4003412B2 (en) * | 2001-06-20 | 2007-11-07 | 株式会社島津製作所 | Vacuum chamber and liquid crystal injection apparatus using the vacuum chamber |
JP2003077974A (en) * | 2001-08-31 | 2003-03-14 | Hitachi Kokusai Electric Inc | Substrate processing device and manufacturing method of semiconductor device |
JP2003188226A (en) * | 2001-12-18 | 2003-07-04 | Anelva Corp | Vacuum conveyance treating apparatus |
JP2004089872A (en) * | 2002-08-30 | 2004-03-25 | Tsukishima Kikai Co Ltd | Vacuum device |
JP2004311640A (en) * | 2003-04-04 | 2004-11-04 | Tokyo Electron Ltd | Treatment vessel |
SG115678A1 (en) * | 2003-04-22 | 2005-10-28 | Asml Netherlands Bv | Substrate carrier and method for making a substrate carrier |
JP2004335743A (en) * | 2003-05-08 | 2004-11-25 | Ulvac Japan Ltd | Vacuum chamber for vacuum processing apparatus |
KR100441875B1 (en) * | 2003-06-02 | 2004-07-27 | 주성엔지니어링(주) | Separable type transfer chamber |
JP4833512B2 (en) * | 2003-06-24 | 2011-12-07 | 東京エレクトロン株式会社 | To-be-processed object processing apparatus, to-be-processed object processing method, and to-be-processed object conveyance method |
JP4767574B2 (en) * | 2005-03-31 | 2011-09-07 | 東京エレクトロン株式会社 | Processing chamber and processing apparatus |
JP4079157B2 (en) * | 2005-04-12 | 2008-04-23 | 東京エレクトロン株式会社 | Gate valve device and processing system |
-
2005
- 2005-09-02 JP JP2005255294A patent/JP4791110B2/en not_active Expired - Fee Related
-
2006
- 2006-08-31 KR KR1020060083845A patent/KR100856145B1/en active IP Right Grant
- 2006-09-01 TW TW095132454A patent/TWI406332B/en active
- 2006-09-04 CN CNB2006101289226A patent/CN100421212C/en active Active
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