JP2007073503A5 - - Google Patents
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- Publication number
- JP2007073503A5 JP2007073503A5 JP2006216399A JP2006216399A JP2007073503A5 JP 2007073503 A5 JP2007073503 A5 JP 2007073503A5 JP 2006216399 A JP2006216399 A JP 2006216399A JP 2006216399 A JP2006216399 A JP 2006216399A JP 2007073503 A5 JP2007073503 A5 JP 2007073503A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- electrode layer
- forming
- inorganic insulating
- insulating layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims 12
- 238000009832 plasma treatment Methods 0.000 claims 10
- 238000004519 manufacturing process Methods 0.000 claims 9
- 238000000034 method Methods 0.000 claims 8
- 239000012298 atmosphere Substances 0.000 claims 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 3
- 239000012299 nitrogen atmosphere Substances 0.000 claims 3
- 239000001301 oxygen Substances 0.000 claims 3
- 229910052760 oxygen Inorganic materials 0.000 claims 3
- 238000005530 etching Methods 0.000 claims 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006216399A JP5008357B2 (ja) | 2005-08-12 | 2006-08-09 | 表示装置の作製方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005233890 | 2005-08-12 | ||
| JP2005233890 | 2005-08-12 | ||
| JP2006216399A JP5008357B2 (ja) | 2005-08-12 | 2006-08-09 | 表示装置の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007073503A JP2007073503A (ja) | 2007-03-22 |
| JP2007073503A5 true JP2007073503A5 (enrdf_load_stackoverflow) | 2009-09-24 |
| JP5008357B2 JP5008357B2 (ja) | 2012-08-22 |
Family
ID=37934761
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006216399A Expired - Fee Related JP5008357B2 (ja) | 2005-08-12 | 2006-08-09 | 表示装置の作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5008357B2 (enrdf_load_stackoverflow) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8716850B2 (en) * | 2007-05-18 | 2014-05-06 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
| KR101786801B1 (ko) * | 2010-12-22 | 2017-10-19 | 엘지디스플레이 주식회사 | 유기전계 발광소자용 기판 및 그 제조 방법 |
| KR102234318B1 (ko) * | 2013-11-28 | 2021-03-31 | 삼성디스플레이 주식회사 | 표시 장치의 제조 방법 |
| KR102469793B1 (ko) * | 2017-12-29 | 2022-11-22 | 삼성디스플레이 주식회사 | 표시 장치 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005135929A (ja) * | 2001-02-19 | 2005-05-26 | Semiconductor Energy Lab Co Ltd | 発光装置の作製方法 |
| JP4558277B2 (ja) * | 2002-02-22 | 2010-10-06 | 株式会社半導体エネルギー研究所 | 発光装置の作製方法 |
| JP2004127933A (ja) * | 2002-09-11 | 2004-04-22 | Semiconductor Energy Lab Co Ltd | 発光装置およびその作製方法 |
| JP4204912B2 (ja) * | 2003-06-30 | 2009-01-07 | 株式会社半導体エネルギー研究所 | 窒化装置および半導体装置の作製方法 |
| JP4165478B2 (ja) * | 2003-11-07 | 2008-10-15 | セイコーエプソン株式会社 | 発光装置及び電子機器 |
| JP2005158393A (ja) * | 2003-11-25 | 2005-06-16 | Pioneer Electronic Corp | 有機エレクトロルミネセンス素子の製造方法 |
-
2006
- 2006-08-09 JP JP2006216399A patent/JP5008357B2/ja not_active Expired - Fee Related