JP2007049443A5 - - Google Patents

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Publication number
JP2007049443A5
JP2007049443A5 JP2005231843A JP2005231843A JP2007049443A5 JP 2007049443 A5 JP2007049443 A5 JP 2007049443A5 JP 2005231843 A JP2005231843 A JP 2005231843A JP 2005231843 A JP2005231843 A JP 2005231843A JP 2007049443 A5 JP2007049443 A5 JP 2007049443A5
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Japan
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print
dot
dither matrix
pixel
group
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JP2005231843A
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Japanese (ja)
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JP4572335B2 (ja
JP2007049443A (ja
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Priority claimed from JP2005231843A external-priority patent/JP4572335B2/ja
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Publication of JP2007049443A5 publication Critical patent/JP2007049443A5/ja
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Publication of JP4572335B2 publication Critical patent/JP4572335B2/ja
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JP2005231843A 2005-08-10 2005-08-10 ディザマトリックス Expired - Fee Related JP4572335B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005231843A JP4572335B2 (ja) 2005-08-10 2005-08-10 ディザマトリックス

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005231843A JP4572335B2 (ja) 2005-08-10 2005-08-10 ディザマトリックス

Publications (3)

Publication Number Publication Date
JP2007049443A JP2007049443A (ja) 2007-02-22
JP2007049443A5 true JP2007049443A5 (enrdf_load_stackoverflow) 2008-08-28
JP4572335B2 JP4572335B2 (ja) 2010-11-04

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Family Applications (1)

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JP2005231843A Expired - Fee Related JP4572335B2 (ja) 2005-08-10 2005-08-10 ディザマトリックス

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JP (1) JP4572335B2 (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5211481B2 (ja) 2006-06-27 2013-06-12 セイコーエプソン株式会社 ディザマトリックスの生成
JP4598750B2 (ja) 2006-12-27 2010-12-15 セイコーエプソン株式会社 ディザマトリックスの生成
JP5434058B2 (ja) 2008-12-04 2014-03-05 セイコーエプソン株式会社 印刷装置及びディザマスク
JP5505029B2 (ja) 2009-04-08 2014-05-28 セイコーエプソン株式会社 印刷装置、印刷方法およびディザマスクの作成方法
JP5413166B2 (ja) * 2009-12-10 2014-02-12 セイコーエプソン株式会社 印刷装置の製造方法
JP5909935B2 (ja) 2011-09-05 2016-04-27 株式会社リコー 画像処理方法、画像処理プログラム及び情報処理装置
JP6312397B2 (ja) * 2013-10-01 2018-04-18 キヤノン株式会社 ディザパタン作成方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4931164B2 (ja) * 2000-08-30 2012-05-16 キヤノン株式会社 マスクパターンの製造方法

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