JP2007021406A - Two-fluid nozzle and substrate treating device using the two-fluid nozzle - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a two-fluid nozzle capable of uniformly treating a long substrate in a longitudinal direction and to provide a substrate treating device using the two-fluid nozzle. <P>SOLUTION: Pure water discharged from a liquid discharge slit 45 collides perpendicularly with the upper surface 461 of a collision member 46 installed at a diffusion part 35 in the state of facing to a discharge opening 451. The pure water after collision is crushed from the state of a liquid film, and the liquid drop group of crushed pure water is fed through a communicating opening 37 into two mixing parts 38 positioned at both sides of the diffusion part 35, expanded to both sides of Y direction along X direction. Thereby, the liquid drop group expanded in the Y direction is mixed with compressed air at the respective mixing parts 38 to form mist-like pure water uniformly in the Y direction. Further, The mist-like pure water formed at the respective mixing parts 38 is joined at a confluent part 39 to form a confluent liquid, and the confluent liquid is sprayed from an opening 31 extending in the Y direction. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  According to the present invention, a gas and a liquid are mixed to generate a mist-like liquid, and a two-fluid nozzle that ejects the mist-like liquid toward a substrate, and a semiconductor wafer and a liquid crystal display using the two-fluid nozzle BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate processing apparatus that performs predetermined processing on a glass substrate for an apparatus, a substrate for a plasma display panel (PDP), a glass substrate for a magnetic disk, and various substrates such as ceramic (hereinafter simply referred to as “substrate”). Is.

  The manufacturing process of an electronic component such as a semiconductor device or a liquid crystal display device includes a step of repeatedly forming a fine pattern by repeatedly performing processes such as film formation and etching on the surface of the substrate. Here, in order to perform fine processing satisfactorily, it is necessary to keep the substrate surface clean, and the substrate is cleaned as necessary.

  For example, as a cleaning method that can advantageously cope with a long glass substrate used in a liquid crystal display device or the like, there is a substrate processing apparatus that discharges a processing liquid such as an etching liquid from a plurality of nozzles toward a substrate (patent) Reference 1). In the apparatus described in Patent Document 1, a plurality of two-fluid nozzles that mix and inject a processing liquid and gas are arranged in a row, thereby spreading a fan-like spray ejected from each two-fluid nozzle. A processing liquid (mist-like liquid) is supplied onto the substrate in a row (long direction). Thus, a long substrate can be processed at a time.

  There is also a substrate processing apparatus using a two-fluid nozzle that deforms an opening at the tip of a nozzle according to the shape of an object to be processed, such as a long substrate, and discharges a processing liquid such as an etching liquid from the opening in a mist form. (See Patent Document 2). In the apparatus described in Patent Document 2, the treatment liquid introduced from the treatment liquid inlet and radiated is mixed with the gas introduced from the gas inlet in the mist generating part (mixing part), so that the treatment liquid is mist-like. It is said. Then, the treatment liquid is discharged in a long shape (line shape) by radiating the mist treatment liquid from the tip of the nozzle having a flat opening.

JP 2002-256458 A (paragraph “0043”, FIG. 5) JP-A-4-132246 (Page 4, FIG. 4)

  However, in a method in which a plurality of nozzles are arranged in an array as in the apparatus described in Patent Document 1, each nozzle is determined depending on an injection angle of a spray-like processing liquid (mist-like liquid) discharged from the nozzles. There are regions where the processing liquids discharged from each other overlap each other. That is, in the supply region where the processing liquid discharged from one nozzle is supplied onto the substrate, there are a portion that overlaps with the processing liquid discharged from the other nozzle and a portion that does not. As a result, in the processing such as cleaning, light and shade (processing unevenness) can be generated, thereby inhibiting uniform cleaning.

  On the other hand, when the mist-like processing liquid generated by mixing the processing liquid introduced into the mist generating part (mixing part) and the gas is discharged in a long shape like the apparatus described in Patent Document 2 However, although the problem described in the device described in Patent Document 1 does not occur, the following different problems have occurred. That is, when the mist-like processing liquid is ejected from the nozzle tip having a long opening, the processing liquid does not overlap, but the discharge force of the mist-like processing liquid is at the center and end of the long opening. Unlike the portion, the substrate could not be processed uniformly in the longitudinal direction.

  The present invention has been made in view of the above problems, and provides a two-fluid nozzle capable of uniformly processing a long substrate in the longitudinal direction and a substrate processing apparatus using the two-fluid nozzle. Objective.

  The two-fluid nozzle according to the present invention is a two-fluid nozzle that mixes a gas and a liquid to generate a mist-like liquid and injects it from the opening toward the substrate. Gas introducing section, liquid introducing section for introducing liquid, liquid ejecting section for ejecting the liquid introduced from the liquid introducing section into the nozzle, the facing portion facing the ejection port of the liquid ejecting section, and the liquid ejection direction The liquid is ejected from the liquid discharge unit by the opposing part to generate a liquid droplet group and is opposed to each other. A diffusion unit that diffuses while spreading on both sides of the part, and a droplet group that is provided on both sides of the diffusion unit with the diffusion unit in between, and the gas introduced from the gas introduction unit is mixed Two mist-like liquids, and two mist-like liquids that are connected to the two mixing parts and merged with the two mist-like liquids to collide with each other to form a merged liquid. A merging portion for guiding the merging liquid to the opening.

  In the invention configured as described above, gas and liquid are mixed as follows to generate a mist-like liquid and eject it from the opening. That is, the liquid is ejected from the ejection port of the liquid ejection unit and collides with an opposing portion facing the ejection port. As a result, the liquid is crushed to generate a droplet group, and the droplet group is spread on both sides along the direction intersecting the liquid discharge direction, and the two mixing units provided on both sides of the diffusion unit respectively. I'm sending it in. For this reason, the droplet group is mixed with gas in each mixing portion in a spread state, and a mist-like liquid is uniformly generated. Furthermore, the mist-like liquid produced | generated in each mixing part is merged, the merged liquid is formed, and this merged liquid is ejected from opening. Therefore, the merged liquid is uniformly supplied to the substrate. With this configuration, the merged liquid can be uniformly ejected even in a long range. For example, even a long substrate can be uniformly processed in the long direction.

  In addition, as described above, the liquid droplet group is generated by dividing the liquid into two sides along the direction intersecting the liquid discharge direction while crushing the liquid, that is, in two directions, so that the liquid droplets can be atomized. Furthermore, the droplet group generated by dividing in two directions and the gas are mixed to generate a mist-like liquid, and the generated mist-like liquid is caused to collide with each other to cause the merged liquid to flow. Forming. Therefore, further droplets can be atomized by the collision of the liquids. Thereby, the impact at the time of the collision of a droplet with the board | substrate can be relieve | moderated and the damage to a board | substrate can be reduced. In addition, the surface area of the entire droplet group supplied to the substrate can be increased by atomizing the droplets. Thereby, the surface energy of the entire droplet group can be increased, and the moving speed of the substance captured by the droplet group can be increased. As a result, for example, when removing contaminants such as particles, the removal efficiency can be improved and the cleaning effect can be enhanced.

  Further, the mist-like liquid generated in both mixing portions is joined to form a joined liquid, and the joined liquid is ejected from the opening toward the substrate, so that the density of droplets supplied to the substrate can be increased. . Accordingly, the substrate processing efficiency can be improved in combination with droplet atomization.

  Here, it is preferable that the discharge angle of the liquid with respect to the facing portion is vertical. According to this configuration, the droplet group crushed and generated by the facing portion is diffused evenly on both sides. As a result, the density of the mist-like liquid generated in each mixing unit can be made uniform, and further, the density of the merged liquid formed by the merge of the mist-like liquid can be made uniform.

  Further, a collision member having a collision plane having a predetermined width may be provided in the diffusing section in a state where the collision plane is opposed to the discharge port of the liquid discharge section so that the collision plane functions as an opposed portion. . According to such a configuration, the liquid ejected from the liquid ejecting unit is crushed by colliding with the collision plane of the collision member and a droplet group is generated. Controlled according to the width of the plane. Specifically, the liquid that has collided with the collision plane scatters on both sides while forming a thin liquid film from the collision member, but the thickness of the liquid film is further divided from the liquid film by the width of the collision plane. The particle size of the generated droplet is determined. Therefore, by providing a collision member having a collision plane with a predetermined width in the diffusion portion, it is possible to generate a droplet having a required particle size according to the processing content of the substrate.

  Here, it is preferable that the collision member is configured to be detachable from the diffusion portion. According to this configuration, even when the collision member is worn according to the number of times of processing and the processing time of the substrate, it is possible to improve the economical efficiency and convenience of maintenance by replacing only the collision member. In addition, by configuring the collision member so as to be detachable as described above, the particle size of the generated droplet can be easily changed. In other words, by preparing collision members with different widths, droplets having a desired particle size can be freely selected by appropriately selecting the collision member according to the processing content of the substrate and mounting it on the diffusion portion. Can be generated.

  The discharge port of the liquid discharge unit forms a slit extending in the direction intersecting the liquid discharge direction between the two mixing units, and the diffusion unit and the two mixing units communicating with the diffusion unit are also in the same direction. Preferably, it is formed to extend. According to this configuration, the liquid is discharged from the liquid discharge portion between the two mixing portions in a band shape, and the liquid discharged in the band shape is mixed with the gas in each mixing portion while spreading on both sides in the diffusion portion. For this reason, a mist-like liquid is uniformly formed in a strip shape in the two mixing sections, and then merges with each other and is sprayed onto the substrate. Therefore, even a large-area substrate can be processed uniformly in a long length.

  Further, it is desirable that the opening forms a slit extending in the direction intersecting the liquid discharge direction between the two mixing portions. According to this configuration, the merging liquid (mist-like liquid) guided from the merging portion to the opening is ejected from the slit extending between the mixing portions, so that the merging liquid that is about to scatter in all directions is caused by the slit. Be regulated. For this reason, the merged liquid can be stably supplied to the substrate in the slit forming direction of the opening, and it is possible to reliably prevent the occurrence of shading (processing unevenness) in the processing.

  A two-fluid nozzle according to the present invention is a two-fluid nozzle that mixes a gas and a liquid to generate a mist-like liquid and ejects the liquid from an opening extending in a first direction toward the substrate. Therefore, a gas introduction part that introduces a gas, a liquid introduction part that introduces a liquid, a liquid ejection part that ejects the liquid introduced from the liquid introduction part into the nozzle, and a facing part that faces the ejection port of the liquid ejection part And a liquid droplet that crushes the liquid ejected from the liquid ejecting portion by the facing portion, and has a facing surface having a diffusion portion adjacent to each of both sides along a second direction orthogonal to the first direction of the facing portion. A diffusion unit that generates a group and diffuses while spreading in both directions along the second direction in the first direction, and is provided on both sides of the diffusion unit across the diffusion unit in the second direction, and is diffused and sent from the diffusion unit. Two mixing units for generating a mist-like liquid by mixing a liquid droplet group and a gas introduced from the gas introduction unit, and a mist-like liquid generated by the two mixing units connected to the two mixing units And a merging portion for forming a merging liquid by colliding with each other and guiding the merging liquid to the opening.

  In the invention configured as described above, gas and liquid are mixed as follows to generate a mist-like liquid and eject it from an opening extending in the first direction. That is, the liquid is ejected from the ejection port of the liquid ejection unit and collides with an opposing portion facing the ejection port. Thereby, the liquid was crushed to generate a droplet group, and the droplet group was provided on both sides of the diffusion part while spreading in the first direction on both sides along the second direction orthogonal to the first direction. It feeds into two mixing parts. For this reason, the droplet group is mixed with gas in each mixing portion in a state of spreading in the first direction, and a mist-like liquid is uniformly generated in the first direction. Furthermore, the mist-like liquid produced | generated in each mixing part is merged, the merged liquid is formed, and this merged liquid is injected from the opening extended in a 1st direction. Therefore, the merged liquid is supplied to the substrate uniformly in the first direction, and even a long substrate can be uniformly processed in the long direction (first direction).

  Further, as described above, the liquid droplets are generated by dividing the liquid into two sides along the second direction, that is, in two directions while crushing the liquid, so that the liquid droplets can be atomized. Furthermore, the droplet group generated by dividing in two directions and the gas are mixed to generate a mist-like liquid, and the generated mist-like liquid is caused to collide with each other to cause the merged liquid to flow. Forming. Therefore, further droplets can be atomized by the collision of the liquids. Thereby, the impact at the time of the collision of a droplet with the board | substrate can be relieve | moderated and the damage to a board | substrate can be reduced. In addition, the surface area of the entire droplet group supplied to the substrate can be increased by atomizing the droplets. Thereby, the surface energy of the entire droplet group can be increased, and the moving speed of the substance captured by the droplet group can be increased. As a result, for example, when removing contaminants such as particles, the removal efficiency can be improved and the cleaning effect can be enhanced.

  Further, the mist-like liquid generated in both mixing portions is joined to form a joined liquid, and the joined liquid is ejected from the opening toward the substrate, so that the density of droplets supplied to the substrate can be increased. . Accordingly, the substrate processing efficiency can be improved in combination with droplet atomization.

  Here, it is preferable that the discharge angle of the liquid with respect to the facing portion is vertical. According to this configuration, the droplet group that is crushed and generated by the facing portion is evenly diffused on both sides along the second direction. As a result, the density of the mist-like liquid generated in each mixing unit can be made uniform, and further, the density of the merged liquid formed by the merge of the mist-like liquid can be made uniform.

  In addition, a collision member having a collision plane having a predetermined width in the second direction is provided in the diffusing section in a state where the collision plane is opposed to the discharge port of the liquid discharge section so that the collision plane functions as an opposed portion. It may be. According to such a configuration, the liquid ejected from the liquid ejecting unit is crushed by colliding with the collision plane of the collision member and a droplet group is generated. It is controlled according to the width in the second direction of the plane. Specifically, the liquid that collided with the collision plane scatters on both sides along the second direction while forming a thin liquid film from the collision member, but the thickness of the liquid film depends on the width of the collision plane in the second direction. However, the particle size of the droplets generated by splitting from the liquid film is determined. Therefore, by providing a collision member having a collision plane having a predetermined width in the second direction in the diffusion portion, it is possible to generate a droplet having a particle size required according to the processing content of the substrate.

  Here, it is preferable that the collision member is configured to be detachable from the diffusion portion. According to this configuration, even when the collision member is worn according to the number of times of processing and the processing time of the substrate, it is possible to improve the economical efficiency and convenience of maintenance by replacing only the collision member. In addition, by configuring the collision member so as to be detachable as described above, the particle size of the generated droplet can be easily changed. That is, by preparing collision members having different widths in the second direction, a liquid having a desired particle size can be selected by appropriately selecting the collision member according to the processing content of the substrate and mounting it on the diffusion portion. Drops can be generated freely.

  In addition, it is preferable that the discharge port of the liquid discharge portion is formed with a slit extending in the first direction, and the diffusion portion and the two mixing portions communicating with the diffusion portion are extended in the first direction. According to this configuration, the liquid is discharged from the liquid discharge unit in a strip shape along the first direction, and the mixed portion is discharged while the liquid discharged in the strip shape spreads in the first direction on both sides along the second direction in the diffusion unit. And mixed with gas. Therefore, a mist-like liquid is uniformly generated in a strip shape along the first direction, and then merged with each other and sprayed onto the substrate. Therefore, even a large-area substrate can be uniformly processed in the longitudinal direction (first direction).

  Further, it is desirable that the opening forms a slit extending in the first direction. According to this configuration, the merging liquid (mist-like liquid) guided from the merging portion to the opening is ejected from the slit extending in the first direction, so that the merging liquid tries to scatter in a direction different from the first direction. Liquid is regulated by the slit. For this reason, the merged liquid can be stably supplied to the substrate in the first direction, and it is possible to reliably prevent the occurrence of shading (processing unevenness) in the processing.

  In addition, the substrate processing apparatus according to the present invention includes the two-fluid nozzle according to any one of claims 1 to 12, so that the uniformly generated combined liquid can be sprayed toward the substrate, and the Can be processed.

  Here, the processing may be performed by fixing and arranging the two-fluid nozzle on the substrate to be transported and ejecting the merged liquid from the two-fluid nozzle.

  According to the present invention, the liquid ejected from the liquid ejecting section is collided with an opposing portion facing the ejection port to generate a droplet group, and both sides along the direction intersecting the liquid ejection direction. It is fed into two mixing parts respectively arranged on both sides of the diffusion part. And in each mixing part, it mixes with a droplet group and gas, and while producing | generating a mist-like liquid, the produced | generated mist-like liquid is merged, a merged liquid is formed, and it ejects from opening. For this reason, the merged liquid is uniformly generated and supplied to the substrate. As a result, even a long range can be processed uniformly. In addition, a droplet group is generated by being divided in two directions, and a mist-like liquid is generated by mixing the droplet group and a gas in each mixing unit, and the mist-like liquid is further joined to collide. Since the combined liquid is formed, droplets can be atomized. For this reason, damage to the substrate can be reduced. Furthermore, since the density of the droplets supplied to the substrate is increased, the processing efficiency of the substrate can be improved in synergy with the atomization of the droplets.

<Overall configuration of substrate processing apparatus>
FIG. 1 is a diagram showing an embodiment of a substrate processing apparatus according to the present invention. This substrate processing apparatus includes a transport mechanism 100 that transports a rectangular glass substrate for liquid crystal display panel (hereinafter simply referred to as “substrate”) W along a substrate transport path C, and a substrate W that is transported by the transport mechanism 100. A developing processing unit 200 for supplying a developing solution to the surface of the substrate and developing the substrate, and supplying pure water to the surface of the substrate that has been subjected to the rinsing process, and at the same time compressed air (or nitrogen) A rinsing drying unit 300 for spraying and drying the gas), and a developing solution circulating unit 400 for circulating the developing solution collected from the developing processing unit 200 and the rinsing drying unit 300 to the developing processing unit 200. Note that FIG. 1 and the subsequent drawings are appropriately referred to with an XYZ orthogonal coordinate system.

  The transport mechanism 100 has a configuration in which a plurality of transport rollers 100a are arranged in the X direction. By rotating a part (or all) of these transport rollers 100a, the substrate W on the transport mechanism 100 is moved in the X direction ( In the direction from the left to the right in FIG. The plurality of transport rollers 100a are supported by a support shaft (not shown) disposed in a direction (Y direction) substantially orthogonal to the substrate transport direction (X direction), and support the substrate W in a substantially horizontal posture for transport. To do.

  The development processing unit 200 includes a processing chamber 201 (processing chamber). Inside the processing chamber 201, a developer such as a TMAH (tetramethylammonium hydroxide) aqueous solution is jetted onto the substrate W transported by the transport roller 100a. A nozzle 202 is disposed on the substrate conveyance path C. A recovery path 203 for recovering the developer supplied to the substrate W is provided at the bottom of the processing chamber 201. A recovery liquid storage tank 401 provided in the developer circulation section 400 is disposed below the development processing section 200, and the recovery path 203 communicates with the recovery liquid storage tank 401 via an on-off valve 204.

  A rinse drying unit 300 is disposed downstream of the development processing unit 200 in the transport direction (X direction). The rinse drying unit 300 includes a processing chamber (processing chamber) 301, and inside the processing chamber 301, a feed balanced flush nozzle head 10 and a feed balanced air knife head 20 sandwich a buffer unit 9. It is arranged close to the conveyance path C. The width in the direction (Y direction) orthogonal to the substrate transport direction (X direction) of the feed balanced water washing nozzle head 10 and the feed balanced air knife head 20 is equal to or greater than the orthogonal width of the substrate W (width in the Y direction). Since the substrate W is transported in the X direction, each head can process the entire surface of the substrate. A recovery path 303 is provided at the bottom of the processing chamber 301 for recovering the liquid falling from the substrate W transferred into the processing chamber 301. The recovery path 303 communicates with the recovered liquid storage tank 401 via the open / close valve 304. ing.

  FIG. 2 is an enlarged view of a main part of the rinse drying unit 300 provided in the substrate processing apparatus of FIG. As shown in FIG. 2, the feed-balanced flush nozzle head 10 includes a developer drain tube wall 1, a pre-drain tube wall 2, and a flush two-fluid nozzle in order from the upstream side in the transport direction of the substrate W. 3, a post-drain tube wall 4, and a preliminary drain tube wall 5. The balance-balanced air knife head 20 includes a front exhaust tube wall 6, an air knife 7, and a rear exhaust tube wall 8 in order from the upstream side in the transport direction of the substrate W. The tube wall provided in each head is configured as follows.

  FIG. 3 is a diagram showing a schematic configuration of the tube wall. The tube wall functions as a suction removal means for sucking and removing the processed liquid or processed gas on the substrate. As shown in FIG. 3A, the tube wall is configured by arranging a plurality of tubes densely in a row in a predetermined direction (Y direction in this embodiment). One end of each tube is connected to a decompression pump. By operating the decompression pump, the treated liquid or treated gas on the substrate is sucked and removed from the suction port at the other end of the tube (the tip of the tube on the substrate side). . The tip of the tube on the substrate side is disposed in close proximity to the substrate W, but each tube is formed of a resin such as PVC (polyvinyl chloride) having chemical resistance, assuming that it is in contact with the substrate W. The substrate side tip of each tube is cut so as to incline at an angle of less than 90 degrees with respect to the substrate surface in consideration of suction efficiency (for example, at an angle of 45 degrees with respect to the substrate surface). The suction removal means for sucking and removing the processed liquid or processed gas on the substrate is not limited to the tube wall. For example, instead of the tube wall, suction removal may be performed using a slit nozzle opened to extend in the Y direction at a predetermined interval in the X direction.

  As shown in FIG. 1, the developer drain tube wall 1 is connected to a recovered liquid storage tank 401 via a developer recovery pump 11. Therefore, by operating the developer recovery pump 11, the developer supplied from the developer drain tube wall 1 to the substrate W (the developer drained and the resist dissolved by the developer) is removed from the substrate and recovered. Then, it is fed to the collected liquid storage tank 401.

  The two-fluid nozzle 3 is connected to a pure water supply source 13 via a pure water supply pump 12, and is connected to a compressed air supply source 15 via a compressed air supply pump 14. Therefore, pure water and compressed air are supplied to the two-fluid nozzle 3 by operating the pure water supply pump 12 and the compressed air supply pump 14, respectively. Thereby, as will be described later, mist-like pure water (droplets) is generated uniformly in the Y direction (corresponding to the “first direction” of the present invention). As a result, the substrate W is transported in the X direction (corresponding to the “second direction” of the present invention) orthogonal to the Y direction while supplying mist-like pure water from the two-fluid nozzle 3 onto the substrate W. The entire substrate surface can be rinsed uniformly and efficiently. The configuration and operation of the two-fluid nozzle 3 will be described later in detail.

  A front drain tube wall 2 and a rear drain tube wall 4 are disposed on the upstream side and the downstream side in the transport direction of the substrate W with respect to the two-fluid nozzle 3, respectively. These are connected to the drainage pump 16, and when the drainage pump 16 is operated, pure water after the rinsing process (processed rinse liquid) and mist that scatters are discharged from the front drainage tube wall 2 and the rear drainage tube wall. 4 is sucked and removed from the suction port of each tube constituting 4 and drained out of the substrate. Here, the tube walls are arranged close to the substrate W and on the upstream side and the downstream side in the transport direction of the substrate W with respect to the two-fluid nozzle 3, so that each tube constituting the tube wall is a barrier. Thus, the pure water after the rinsing process is prevented from scattering to the upstream side and the downstream side in the transport direction of the substrate W with respect to the feed-balanced type washing nozzle head 10. As a result, it is possible to prevent re-adhesion of pure water accompanied by contaminants.

  Furthermore, as shown in FIG. 3B, it is desirable to arrange the tube walls 3a and 3b so as to sandwich the two-fluid nozzle 3 from the Y direction. By surrounding the two-fluid nozzle 3 from the four sides with the tube wall in this way, the mist-like pure water scattered in the direction perpendicular to the substrate transport direction (Y direction) is also sucked and removed, and the pure water that entrains the contaminants. While preventing the reattachment of water, it is possible to prevent the deionized water from entering the back side of the substrate W. In addition, the suction port of each tube wall that surrounds the two-fluid nozzle 3 from four directions is arranged so that the opening area of the suction port is expanded toward the two-fluid nozzle 3 side in order to efficiently suck mist-like pure water. The tip of the tube on the substrate side is cut obliquely with respect to the substrate surface.

  A preliminary drainage tube wall 5 is further provided downstream of the rear drainage tube wall 4 in the transport direction of the substrate W, and after the rinsing process deviates without being removed by suction by the upstream side wall. Pure water is reliably removed by suction.

  Next, the feed balanced air knife head 20 disposed on the downstream side in the transport direction of the substrate W with respect to the feed balanced water washing nozzle head 10 configured as described above will be described. The air knife 7 is connected to a compressed air supply source 15 via a compressed air supply pump 14. By operating the compressed air supply pump 14, compressed air is sprayed as a dry gas on the surface of the substrate W, and the substrate The pure water after the rinsing process (processed rinsing liquid) remaining on the surface is drained.

  A front exhaust tube wall 6 and a rear exhaust tube wall 8 are disposed upstream and downstream of the air knife 7 in the transport direction of the substrate W, respectively. These are connected to the exhaust pump 17, and by operating the exhaust pump 17, the gas containing the liquid component after the drying process (processed dry gas) is exhausted outside the substrate. As described above, the tube walls are arranged on the upstream side and the downstream side in the transport direction of the substrate W with respect to the air knife 7, so that each tube constituting the tube wall becomes a barrier and contains a liquid component. The gas is prevented from scattering to the upstream side and the downstream side in the transport direction of the substrate W with respect to the feed-balanced air knife head 20. Further, when the tube wall is disposed so as to sandwich the air knife 7 from the Y direction in the same manner as the two-fluid nozzle 3, the air knife 7 can be surrounded by the tube wall from all sides, and the air containing the liquid component is surrounded by the tube wall. It is surely prevented from scattering.

  A buffer portion 9 is disposed between the front exhaust tube wall 6 and the preliminary drainage tube wall 5 provided in the feed-balance type flush nozzle head 10. As a result, the pre-exhaust tube wall 6 and the preliminary drain tube wall 5 perform suction under reduced pressure, thereby avoiding mutual interference.

  Further, as shown in FIG. 2, a front backup roller 311 and a rear backup roller 312 are provided below the two-fluid nozzle 3 and the air knife 7 with the substrate W interposed therebetween. Each backup roller is formed in a cylindrical shape having excellent straightness and roundness so as to extend in the Y direction, and mist-like pure water and compressed air ejected from the two-fluid nozzle 3 and the air knife 7 respectively. Counter pressure. Accordingly, it is possible to prevent the substrate W from being bent and to make the spot (supply position) on the substrate of mist-like pure water ejected from the two-fluid nozzle 3 uniform.

  Next, returning to FIG. 1, the configuration of the developer circulation unit 400 will be described. As described above, the recovery liquid storage tank 401 is connected to the development drainage tube wall 1 via the developer recovery pump 11, and the recovery liquid (concentrated drainage) is sucked into the recovery liquid storage tank 401 by the development drainage tube wall 1. Liquid) is recovered. The top of the recovery liquid storage tank 401 communicates with the recovery paths 203 and 303, and the processed liquid including the developer can be recovered by appropriately controlling the opening and closing of the on-off valves 204 and 304. With this configuration, it is possible to collect all the developer supplied to the substrate W.

  The recovered liquid storage tank 401 is connected to the pump 402, and the recovered liquid (developer) recovered and stored in the recovered liquid storage tank 401 by the pump 402 is sent to the defoamed liquid storage tank 404 via the vacuum degassing device 403. Be paid. Here, the pump 402 may be a positive displacement pump such as a diaphragm method, or a non-positive displacement pump such as a spiral method. That is, a pump that matches the use conditions may be selected. The same applies to other pumps.

  The vacuum degassing apparatus 403 includes a fiber-like hollow fiber, and the recovered liquid passing through the hollow fiber is degassed by depressurizing the vacuum degassing apparatus 403 by a vacuum pump 403a connected to the vacuum degassing apparatus 403. Is done. Thereby, gas (bubbles) is removed from the collected liquid, and foaming of the developer can be prevented. The defoamed recovered liquid (defoamed liquid) is stored in the defoamed liquid storage tank 404. Here, two vacuum degassing devices 403 may be prepared and arranged in parallel between the recovered liquid storage tank 401 and the defoamed liquid storage tank 404. By comprising in this way, the two pressure reduction deaerators 403 can be operated alternately. Thereby, for example, when one of the reduced-pressure degassing apparatus 403 is clogged, the apparatus 403 is back-plugged, and the other depressurized degassing apparatus 403 degass the recovered liquid, and clogged in the meantime. It becomes possible to continuously operate by replacing the device 403 that has caused the problem.

  The defoaming liquid storage tank 404 is connected to a pump 405, and the defoaming liquid is sent from the defoaming liquid storage tank 405 to the nozzle 202. As a result, the defoaming liquid is ejected from the nozzle 202 onto the surface of the substrate W, and the resist attached to the substrate W is developed. Note that the defoaming liquid storage tank 404 is connected to the developing liquid storage tank 406, and when the concentration of the developing liquid decreases due to the mixing of pure water, the defoaming liquid storage tank 404 is appropriately replenished with the developing liquid from the developing liquid storage tank 406. It is comprised so that. Specifically, the concentration of the defoamed liquid in the defoamed liquid storage tank 404 is controlled by a concentration sensor (not shown) so as to be within a predetermined concentration range defined by a recipe or the like. The developer is replenished from the developer storage tank 406 when it deviates from the concentration range. This enables continuous circulation of the developer and reduces the amount of developer used.

<Configuration of two-fluid nozzle>
Next, the configuration and operation of the two-fluid nozzle will be described in detail with reference to FIGS. FIG. 4 is a cross-sectional perspective view of a two-fluid nozzle according to the present invention. FIG. 5 is a partially enlarged view of the two-fluid nozzle of FIG. The two-fluid nozzle 3 has an opening 31 extending in the Y direction (first direction) orthogonal to the substrate transport direction (X direction; second direction) at the tip thereof, and pure water (“ Liquid) and compressed air (corresponding to the “gas” of the present invention) are mixed to produce mist-like pure water (droplets), and the mist-like pure water is merged from the opening 31. This is a nozzle internal mixing type two-fluid nozzle that sprays toward the substrate W.

  The two-fluid nozzle 3 includes a casing 32, a liquid discharge base 33, and a liquid collision base 34. These are all extended in the Y direction, that is, extended in a direction intersecting with the discharge direction of pure water discharged from the liquid discharge slit 45 between two mixing portions 38 to be described later. The base 33 for liquid and the base 34 for liquid collision are accommodated in the casing 32. The liquid discharge base 33 and the liquid collision base 34 are arranged at a predetermined interval in the Z direction, and the space between the liquid discharge base 33 and the liquid collision base 34 is pure water. The diffusing part 35 is diffused. Note that the liquid discharge base 33 and the liquid collision base 34 have the same width in the X direction, and are opposed to each other with their centers aligned. In addition, slit-shaped spaces formed between the liquid discharge base 33 and the casing 32 on both sides of the liquid discharge base 33 in the X direction serve as gas flow passages 36 for circulating the compressed air introduced into the nozzle. ing. In the X direction, both sides of the diffusing unit 35 are communicated with the mixing unit 38 via the communication ports 37, and each mixing unit 38 is connected to the gas flow path 36. That is, the mixing unit 38 is provided on both sides of the diffusion unit 35 via the communication port 37 with the diffusion unit 35 interposed therebetween, and the pure unit that is diffused from the diffusion unit 35 and sent through the communication port 37 in each mixing unit 38. Water and compressed air supplied from the gas flow passage 36 are mixed to generate mist-like pure water. Further, the two mixing portions 38 are connected to the merging portion 39 below the liquid collision base 34, and the mist-like liquid generated in each mixing portion 38 is merged via the merging portion 39 into the opening 31. Guided.

  In the upper part of the casing 32, one or a plurality of gas pressure ports 41 are provided as the “gas introduction part” of the present invention, and the gas pressure port 41 communicates with a gas manifold 42 disposed inside the nozzle. ing. The gas manifold 42 is configured by an internal space extending in the Y direction above the liquid discharge base 33. In addition, gas flow passages 36 for allowing compressed air to flow in the Z direction are connected to both sides of the bottom of the gas manifold 42 in the X direction. The gas pressure supply port 41 is connected to the compressed air supply source 15 via the compressed air supply pump 14, and the compressed air is supplied from the compressed air supply source 15 by operating the compressed air supply pump 14. The gas manifold 42 is supplied via 41. The gas manifold 42 serves to evenly distribute the compressed air introduced from the gas pressure port 41 in the manifold, and the compressed air is supplied from each gas flow passage 36 toward the mixing portion 38 positioned immediately below the Y direction. Supply uniformly.

  Further, one or a plurality of liquid pressure ports 43 are provided as the “liquid introduction part” of the present invention in the upper part of the casing 32, and the liquid pressure ports 43 are arranged in the Y direction inside the liquid discharge base 33. It is communicated with the extended liquid manifold 44. Furthermore, the bottom of the liquid manifold 44 is connected to a liquid discharge slit 45 extending in a slit shape in the Y direction with a predetermined gap S1 (FIG. 5) in the X direction. That is, the liquid discharge slit 45 extends in a slit shape between the two mixing portions 38 in a direction crossing the pure water discharge direction. The liquid discharge slit 45 is provided at a position equidistant from the two gas flow passages 36 formed on both sides of the liquid discharge base 33 in the X direction. The liquid discharge slit 45 forms a flow path along the Z direction, and communicates with the diffusion portion 35 through the discharge port 451. Therefore, when pure water is pumped from the pure water supply source 13 to the liquid pressure feeding port 43, the pure water is strip-shaped along the Y direction from the liquid discharge slit 45 toward the diffusion portion 35 via the liquid manifold 44. Discharged. The liquid manifold 44 serves to evenly distribute the pure water introduced from the liquid pressure supply port 43 in the manifold, and discharges the pure water from the liquid discharge slit 45 toward the diffusion portion 35 in the Y direction. In this embodiment, the cross-sectional shape of the liquid manifold 44 is U-shaped, and the flow path is bent so that the pure water introduced into the liquid pressure port 43 is not directly discharged from the liquid discharge slit 45. That is, although the diffusion plate with which pure water flowing down from the liquid pressure port 43 contacts is provided, the cross-sectional shape of the manifold is not particularly limited. For example, as long as pure water is evenly distributed in the Y direction, a square shape such as a circle or a rectangle may be used. The same applies to the gas manifold 42 described above.

  Further, in this embodiment, by introducing compressed air and pure water from the upper part of the casing 32 through the gas pressure supply port 41 and the liquid pressure supply port 43, respectively, two fluids can be saved in the horizontal direction (XY direction) in a space-saving manner. Although it has constituted so that nozzle 3 may be arranged, it is not limited to this, for example, compressed air and / or pure water may be introduced from the nozzle side (Y direction).

  The liquid discharge base 33 and the liquid collision base 34 are arranged at a predetermined interval in the Z direction, and are sandwiched between the lower surface of the liquid discharge base 33 and the upper surface 341 of the liquid collision base 34. The pure water discharged from the discharge port 451 of the liquid discharge slit 45 opened on the lower surface of the liquid discharge base 33 is diffused using the space. In this manner, the diffusing portion 35 is configured by the space sandwiched between the lower surface of the liquid discharge base 33 and the upper surface 341 of the liquid collision base 34. The diffusion member 35 is provided with a collision member 46 in a state where the upper surface 461 thereof is opposed to the discharge port 451 of the liquid discharge slit 45 as the “opposing portion” of the present invention. Specifically, the collision member 46 is arranged symmetrically about the liquid ejection slit 45 in the X direction so that the center of the liquid ejection slit 45 and the center of the collision member 46 coincide with each other in the X direction.

  The collision member 46 is detachably attached to the upper surface side of the liquid collision base 34. Specifically, the collision member 46 is formed in a rail shape extending along the Y direction, and a part thereof is fitted into a holding groove 342 provided on the upper surface side of the liquid collision base 34. Specifically, the upper part of the collision member 46 is formed in a flat plate shape extending in the Y direction while having a constant width S2 in the X direction, while the lower part extends in the Y direction with a convex cross-sectional shape. It is formed between the two mixing parts 38 (FIG. 5). On the other hand, the holding groove 342 is formed on the upper surface side of the liquid collision base 34 so that the cross-sectional shape extends in the Y direction in accordance with the lower cross-sectional shape of the collision member 46. Therefore, by moving the collision member 46 along the Y direction, the collision member 46 can be inserted into and removed from the liquid collision base 34 as a cartridge.

  The upper surface 341 of the liquid collision base 34 forms a plane extending in the XY direction, while the upper surface 461 of the collision member 46 forms a plane parallel to the upper surface 341 of the liquid collision base 34. Therefore, when pure water is discharged from the liquid discharge slit 45 in the Z direction, the discharged pure water is perpendicularly incident on and collides with the upper surface 461 of the collision member. Thus, the upper surface 461 of the collision member 46 corresponds to the “collision plane” of the present invention. The width S2 in the X direction of the upper surface 461 of the collision member 46 is configured to be smaller than the width in the X direction of the upper surface 341 of the liquid collision base 34, and the upper surface 461 of the collision member 46 is in the liquid collision base 34 in the Z direction. A step is formed so as to be higher than the upper surface 341 by the thickness of the collision member 46 in the Z direction. A region 341a located below the discharge port 451 on the upper surface 341 of the liquid collision base 34 is covered by the mounting of the collision member 46, but adjacent regions 341b along the X direction on both sides of the upper surface 461 of the collision member 46, respectively. The pure water that is exposed and collides with the upper surface 461 of the collision member 46 is diffused to both sides along the X direction through the space sandwiched between the lower surface of the liquid discharge base 33 and the region 341b. (FIG. 5). Thus, the regions 341b adjacent to both sides of the upper surface 461 (opposed portion) of the collision member 46 function as the “diffusion site” of the present invention. The collision member 46 is arranged so that the center of the collision member 46 and the center of the liquid collision base 34 coincide with each other in the X direction, and each region 341b on both sides of the collision member 46 forms a plane having the same shape. is doing. The width in the X direction of each region 341b is preferably set so that the flight distance of pure water after the collision is 10 mm or more. By setting in this way, it becomes possible to diffuse the pure water after the collision stably and uniformly.

  Here, from the viewpoint of effectively crushing pure water discharged from the liquid discharge slit 45, the width S2 of the collision member 46 satisfies the following relational expression (1) with respect to the slit width S1 of the liquid discharge slit 45. It is preferable to configure so as to.

S2 = S1 × 3-4 (1)
Then, by changing the width S2 of the collision member 46 in accordance with the slit width S1 of the liquid discharge slit 45, it is possible to control the diameter of the generated pure water droplet. That is, the pure water discharged from the liquid discharge slit 45 is crushed by colliding with the upper surface 461 of the collision member 46 to generate a droplet group of pure water. The details of the process are as follows. The pure water that has collided with the upper surface 461 of the collision member 46 scatters while forming a thin liquid film (water film) from the periphery of the upper surface 461 of the collision member 46 while spreading in both directions along the X direction. . At this time, the thickness S2 of the collision member 46 determines the thickness of the liquid film and the particle size of the droplets generated by splitting from the liquid film. Specifically, the larger the width S2 of the collision member 46, the larger the droplet diameter, while the smaller the width S2, the smaller the droplet diameter. This is partly because the flight distance of pure water after the collision from the collision member 46 to the mixing unit 38 in the X direction is adjusted by changing the width S2 of the collision member 46. For example, if the width S2 of the collision member 46 is reduced, the flight distance of pure water after the collision from the collision member 46 to the mixing unit 38 in the X direction becomes longer. As a result, the degree of crushing of pure water proceeds and droplets are atomized. Further, as the collision speed (discharge speed) of pure water is increased and the slit width S1 of the liquid discharge slit 45 is decreased, the droplets can be atomized. However, if the slit width S1 is excessively decreased, the liquid is discharged. Since the air resistance of the pure water discharged from the slit 45 increases, the width S2 of the collision member 46 is preferably set to 50 to 100 μm in the relationship of the expression (1). In this case, a liquid film having a thickness of 0.1 μm to 1 μm is obtained.

  As described above, since the droplet diameter can be controlled by the surface shape size of the collision member 46, it is easy to control the flow rate of the compressed air when mixing pure water and compressed air. In other words, if the droplet diameter is controlled when mixing pure water and compressed air, it becomes difficult to control the flow rate of the compressed air due to the adjustment of the gas-liquid mixing ratio. On the other hand, if the droplet diameter can be adjusted in advance before mixing with pure water and compressed air according to the surface shape size of the collision member 46, the gas-liquid mixing ratio can be freely controlled by controlling the flow rate of the compressed air. Become. In other words, by controlling the droplet diameter according to the surface shape size of the collision member 46, it is possible to easily control the droplet diameter, which is difficult by adjusting the gas-liquid mixing ratio or pressure.

  Here, the collision member 46 is preferably formed of a material having excellent wear resistance, such as tungsten carbide or cemented carbide. Thereby, wear of the collision member 46 due to collision of pure water discharged from the liquid discharge slit 45 can be reduced. Further, since the collision member 46 is detachably attached to the liquid collision base 34, even when it is worn, it can be returned to the initial state by removing only the collision member 46 and replacing it with a new one. Therefore, the maintenance can be facilitated and the cost can be reduced by forming only the collision member 46 from a material having wear resistance.

  In addition, both sides of the diffusing unit 35 in the X direction are connected to the mixing unit 38 via a communication port 37 facing the upper surface region 341b of the liquid collision base 34. Further, each mixing portion 38 is connected to the gas flow passage 36 in the Z direction. Therefore, the pure water droplets sent to the mixing unit 38 from both sides of the diffusion unit 35 along the X direction via the communication ports 37 are mixed orthogonally with the compressed air sent from the gas flow path 36. As a result, mist-like pure water is generated in each mixing section 38. Further, slit-like spaces formed between the liquid collision base 34 and the casing 32 on both sides of the liquid collision base 34 in the X direction are respectively mist-like pure water generated in the mixing unit 38. A communication passage 47 is formed. Each mixing portion 38 is connected to a merging portion 39 below the liquid collision base 34 via a communication passage 47, and the merging portion 39 is connected to an opening 31 that forms a slit extending in the Y direction.

  Next, the operation of the two-fluid nozzle 3 configured as described above will be described. By operating the compressed air supply pump 14 and the pure water supply pump 12, the compressed air and pure water are pumped to the gas pressure port 41 and the liquid pressure port 43, respectively. The compressed air fed to the gas feed port 41 is evenly distributed along the Y direction to the two gas flow passages 36 formed on both sides of the liquid discharge base 33 via the gas manifold 42, and each gas flow passage. 36 is fed uniformly in the Y direction toward each mixing section 38 located immediately below. On the other hand, the pure water pumped to the liquid feed port 43 is evenly distributed along the Y direction to the liquid discharge slit 45 formed inside the liquid discharge base 33 via the liquid manifold 44, and the liquid discharge slit The liquid is uniformly discharged in the Y direction from 45 to the diffusing portion 35.

  FIG. 6 is a diagram schematically showing a state of mixing compressed air and pure water in the two-fluid nozzle of FIG. The pure water discharged from the liquid discharge slit 45 enters the upper surface 461 of the collision member 46 facing the discharge port 451 perpendicularly and collides with it. As a result, the pure water is crushed while spreading in the Y direction along the X direction in the form of a liquid film, and becomes particulate (a group of droplets) with the diffusion portion 35 sandwiched in the X direction via the communication port 37. It is fed into the mixing unit 38 located on both sides of the diffusion unit 35. Here, since pure water is vertically incident on the collision member 46, the droplet group generated by crushing is equally divided and diffused on both sides along the X direction. The pure water droplet group sent to each mixing unit 38 is mixed with the compressed air sent from the gas flow passage 36 along the Z direction. Thereby, mist-like pure water is generated uniformly in the Y direction.

  The mist-like pure water generated in each mixing section 38 is conveyed to the merge section 39 via the communication path 47 and merges. Thus, mist-like pure water generated in each mixing unit 38 collides with each other to form a merged liquid, and the merged liquid is ejected from the opening 31 toward the substrate W in a band shape in the Y direction. Here, the opening 31 forms a slit extending in the Y direction at a predetermined distance in the X direction. Therefore, the merged liquid formed in the merge unit 39 is ejected from the opening 31, so that the merged liquid that attempts to scatter in a direction different from the Y direction is regulated by the slit. For this reason, the merged liquid can be stably supplied to the substrate W in the Y direction, and the occurrence of processing unevenness is reliably prevented.

  As described above, according to this embodiment, pure water is ejected from the liquid ejection slit 45 and is crushed by colliding with the upper surface 461 of the collision member 46 facing the ejection port 451. While being generated, the droplet group is sent to the two mixing portions 38 located on both sides of the diffusion portion 35 through the communication port 37 while spreading in the Y direction on both sides along the X direction. For this reason, the droplet group is mixed with the compressed air in each mixing section 38 in a state of spreading in the Y direction, and mist-like pure water is uniformly generated in the Y direction. Further, the mist-like pure water generated in each mixing unit 38 is joined to form a joined liquid, and the joined liquid is ejected from the opening 31 extending in the Y direction. Therefore, the merged liquid is supplied to the substrate W uniformly in the Y direction, and the long substrate W can be uniformly processed in the long direction (Y direction).

  Further, in the above embodiment, the droplet group is generated by dividing the pure water into two directions along the X direction while crushing the pure water, so that the droplets can be atomized. Furthermore, since the mist-like pure water produced | generated in the two mixing parts 38 is made to collide with each other by making it join in the joining part 39, and the joining liquid is formed, atomization of one more droplet can be achieved. For this reason, the impact at the time of the collision of the droplet on the substrate W can be reduced, and the damage to the substrate W can be reduced. In addition, the surface area of the entire droplet group supplied to the substrate W is increased by atomization of the droplet, the surface energy of the entire droplet group is increased, and the movement speed of the substance captured by the droplet group is increased. Can do. As a result, the removal efficiency of contaminants such as particles can be improved and the cleaning effect can be enhanced.

  Furthermore, since the mist-like pure water generated in the two mixing sections 38 is joined to form a joined liquid and the joined liquid is ejected from the opening 31 onto the substrate W, the droplets supplied to the substrate W The density can be increased. Therefore, the processing efficiency of the substrate W can be improved along with the atomization of the droplets.

  Further, according to this embodiment, the collision member 46 is provided in the diffusing portion 35 with the upper surface 461 facing the ejection port 451 of the liquid ejection slit 45, so that the collision member 46 is crushed and generated by the upper surface 461 of the collision member 46. The particle size of the droplet group to be controlled can be controlled according to the width S2 of the collision member 46 in the X direction. That is, when pure water collides with the upper surface 461 of the collision member 46, the pure water scatters on both sides along the X direction while forming a thin liquid film (water film) from the collision member 46. The distance from the collision member 46 to the mixing unit 38 located on both sides of the diffusion unit 35 is changed by the width S2. Thereby, the progress degree of the crushing of the pure water is adjusted, and the thickness of the liquid film and the particle diameter of the droplet generated by splitting from the liquid film can be controlled according to the width S2 of the collision member 46. . Therefore, by providing the collision member 46 in the diffusing portion 35, it is possible to generate a droplet having a required particle size according to the processing content of the substrate W. In addition, by controlling the droplet diameter by the collision member 46 in this way, the flight distance of the droplet until the desired droplet diameter is obtained can be effectively shortened, and the nozzle is made compact in the X direction. be able to.

  Furthermore, according to this embodiment, since the collision member 46 is detachably provided on the diffusing portion 35, even when the collision member 46 is worn according to the number of processing times and the processing time of the substrate W, only the collision member 46 is provided. By exchanging, the economical efficiency and convenience of maintenance can be improved. In addition, by configuring the collision member 46 so as to be detachable as described above, the particle size of the generated droplet can be easily changed. That is, by preparing the collision members 46 having different widths S2 in the X direction, the collision members 46 are appropriately selected according to the processing content of the substrate W and mounted on the liquid collision base 34. A droplet having a desired particle size can be freely generated.

<Others>
The present invention is not limited to the above-described embodiment, and various modifications other than those described above can be made without departing from the spirit of the present invention. For example, in the above-described embodiment, the droplet diameter of pure water generated by providing the collision member 46 in the diffusion unit 35 is controlled, but the arrangement of the collision member 46 is not essential. In this case, the upper surface region 341a of the liquid collision base 34 that faces the discharge port 451 of the liquid discharge slit 45 without forming the holding groove 342 on the upper surface side of the liquid collision base 34 is the “opposing” It functions as a “part”.

  Moreover, in the said embodiment, although the pure water is discharged perpendicularly | vertically with respect to the opposing site | part from the discharge outlet 451 of the liquid discharge slit 45, the discharge direction of a pure water is not limited to this. However, it is advantageous that the pure water is ejected perpendicularly to the facing portion in that the pure water droplet group is uniformly diffused on both sides along the X direction. Thereby, the density of the mist-like pure water produced | generated in each mixing part 38 can be made uniform, and also the density of the merged liquid formed by joining mist-like pure water can be made uniform. .

  Moreover, in the said embodiment, although the pure water droplet group sent into the mixing part 38 and compressed air are mixed orthogonally, it is not limited to this. For example, each gas flow passage 36 formed on both sides of the liquid discharge base 33 is configured to be inclined toward the opening 31, and the traveling direction of the droplet group scattered toward the mixing unit 38 and the mixing unit You may make it mix so that the advancing direction of the compressed air sent toward 38 may make an obtuse angle.

  Moreover, in the said embodiment, although pure water is discharged in strip | belt shape along the Y direction from the liquid discharge slit 45, it is not limited to this. For example, pure water may be discharged from each liquid discharge pipe by arranging a plurality of liquid discharge pipes along the Y direction. Even in such a configuration, the pure water discharged from each liquid discharge pipe collides with the facing portion, and is sent to the mixing unit 38 while spreading in both directions along the X direction in the Y direction. Thereby, mist-like pure water can be generated uniformly along the Y direction.

  In the above-described embodiment, the two-fluid nozzle 3 is fixed in a posture in which the merged liquid (mist-like pure water) ejected toward the substrate W is substantially parallel to the normal direction of the substrate W. You may make it incline with respect to the normal line direction of W, and may make it inject a confluent liquid.

  In the above embodiment, the two-fluid nozzle 3 has an opening 31 extending in the Y direction with respect to the substrate W transported in the X direction with the Y direction as the first direction and the X direction orthogonal to the Y direction as the second direction. However, the present invention is not limited to this. That is, the present invention can also be applied to a substrate processing apparatus that ejects a merged liquid from the two-fluid nozzle 3 onto a substrate W that is transported in a direction different from the first direction.

  Moreover, in the said embodiment, although it processed using the 2 fluid nozzle 3 with respect to the board | substrate W conveyed in one direction (X direction), it is not limited to this. For example, the present invention can also be applied to a substrate processing apparatus that performs processing using a two-fluid nozzle 3 on a substrate such as a rotated semiconductor wafer or glass substrate.

  Moreover, in the said embodiment, although the board | substrate conveyed is made into the glass substrate, you may make it convey a semiconductor wafer.

  Moreover, in the said embodiment, although the 2 fluid nozzle 3 is fixed and the board | substrate W conveyed is processed, it is not limited to this. For example, processing may be performed while the substrate W is fixed and the two-fluid nozzle 3 is moved, or processing may be performed while both the substrate W and the two-fluid nozzle 3 are moved.

  In the above embodiment, the substrate W is cleaned by supplying pure water as “liquid” to the two-fluid nozzle 3, but the present invention is not limited to this. For example, a chemical solution may be supplied as “liquid” to perform etching processing, development processing, and peeling processing. Also in this case, the chemical solution can be replaced efficiently by using it in combination with suction removal means such as a tube wall disposed upstream and / or downstream of the substrate transport path C of the two-fluid nozzle 3. Various reactions by chemical solutions can be promoted.

  In the above embodiment, the gas pressure port 41 and the liquid pressure port 43 are arranged in parallel in the X direction on the upper surface of the casing 32. However, as shown in FIGS. You may make it arrange | position in a line in a slit formation direction. FIG. 7 is a cross-sectional perspective view showing a modified form of the two-fluid nozzle according to the present invention. 8A is a cross-sectional view taken along the line A-A ′ of the two-fluid nozzle of FIG. 7, and FIG. 8B is a cross-sectional view taken along the line B-B ′ of the two-fluid nozzle of FIG. 7.

  In this case, the gas pressure port 61 and the liquid pressure port 63 are alternately arranged along the Y direction with a predetermined interval. A gas manifold 62 connected to the gas pressure port 61 is disposed at an upper portion of the casing 52 and between the liquid pressure ports 63 arranged along the Y direction. The upper part of the casing 52 is composed of a separate plate-like member 71. The inner surface of the plate-like member 71 is cut to the area communicating with the gas flow passage 56 to cut the recess, and the open surface is used for liquid discharge. The gas manifold 62 is formed by blocking the upper surface of the base 53. Further, the liquid manifold 64 inside the liquid discharge base 53 forms a buffer chamber having an expanded flow path. The buffer chamber has a quadrangular cross section and extends in the Y direction.

  With this configuration, the inside of the casing 52 can be formed into a symmetrical shape with the imaginary line extending from the liquid pressure port 63 and the gas pressure port 61 to the opening 51 as viewed from the Y direction. Can be produced.

  In the present invention, a gas and a liquid are mixed on the entire surface of a substrate including a semiconductor wafer, a glass substrate for a liquid crystal display device, a substrate for a plasma display panel (PDP), or a glass substrate or a ceramic substrate for a magnetic disk. The present invention can be applied to a two-fluid nozzle that ejects a mist-like liquid generated in this way and a substrate processing apparatus using the two-fluid nozzle.

It is a figure which shows one Embodiment of the substrate processing apparatus concerning this invention. It is a principal part enlarged view of the rinse drying part with which the substrate processing apparatus of FIG. 1 was equipped. It is a figure which shows schematic structure of a tube wall. It is a cross-sectional perspective view of the two-fluid nozzle concerning this invention. It is the elements on larger scale of the two-fluid nozzle of FIG. It is a figure which shows typically the mode of mixing of the compressed air and pure water in the two-fluid nozzle of FIG. It is a section perspective view showing the modification of the two fluid nozzle concerning the present invention. It is a figure which shows the cut surface of the two-fluid nozzle of FIG.

Explanation of symbols

3 ... Two-fluid nozzle 31, 51 ... Opening 35 ... Diffusion part 38 ... Mixing part 39 ... Confluence part 41, 61 ... Gas pressure port (gas introduction part)
43, 63 ... Liquid pressure supply port (liquid introduction part)
45 ... Liquid ejection slit (Liquid ejection part)
46 ... Colliding member 341 ... Upper surface (of the liquid collision base) (opposing surface)
341a (upper surface of liquid collision base) region (opposite part)
341b (upper surface of liquid collision base) region (diffusion site)
451 ... Discharge port (of the liquid discharge slit) 461 ... Upper surface of the collision member (opposite part)
S2 ... Width of collision plane in second direction W ... Substrate

Claims (14)

In a two-fluid nozzle that mixes a gas and a liquid to generate a mist-like liquid and ejects it from the opening toward the substrate,
A gas introduction part for introducing gas;
A liquid introduction part for introducing a liquid;
A liquid ejection unit that ejects the liquid introduced from the liquid introduction unit into the nozzle;
An opposing surface having a facing portion facing the discharge port of the liquid discharge portion and a diffusion portion adjacent to each of both sides of the facing portion along a direction intersecting the liquid discharge direction, and discharged from the liquid discharge portion. And diffusing the liquid to be spread while spreading on both sides of the facing part, and crushing the liquid by the facing part to generate a liquid droplet group,
The mist-like liquid is prepared by mixing the droplet group that is provided on both sides of the diffusing unit with the diffusing unit in between and diffused and sent from the diffusing unit and the gas introduced from the gas introducing unit. Two mixing parts to be generated;
A merging portion that is connected to the two mixing portions to cause the mist-like liquids generated in the two mixing portions to merge with each other to form a merging liquid and guide the merging liquid to the opening; A two-fluid nozzle characterized by that.   The two-fluid nozzle according to claim 1, wherein the liquid discharge unit discharges the liquid vertically from the discharge port to the facing portion.   The diffusion unit is provided with a collision member having a collision plane having a predetermined width in a state where the collision plane is opposed to the discharge port, and the collision plane functions as the facing portion. The two-fluid nozzle described.   The two-fluid nozzle according to claim 3, wherein the collision member is detachably attached to the diffusion portion.   The ejection port forms a slit extending in a direction intersecting the liquid ejection direction between the two mixing portions, and the diffusion portion and the two mixing portions communicating with the diffusion portion also extend in the same direction. The two-fluid nozzle according to claim 1, wherein the two-fluid nozzle is formed.   The two-fluid nozzle according to any one of claims 1 to 5, wherein the opening forms a slit extending in a direction intersecting a liquid discharge direction between the two mixing portions. In a two-fluid nozzle that mixes a gas and a liquid to generate a mist-like liquid and ejects it from an opening extending in the first direction toward the substrate.
A gas introduction part for introducing gas;
A liquid introduction part for introducing a liquid;
A liquid ejection unit that ejects the liquid introduced from the liquid introduction unit into the nozzle;
A counter surface having a counter part facing the discharge port of the liquid discharge part and a diffusion part adjacent to both sides of the counter part along a second direction orthogonal to the first direction, from the liquid discharge part A diffusing unit that crushes the discharged liquid by the facing part to generate a group of liquid droplets and diffuses the liquid while spreading in both directions along the second direction in the first direction;
In the second direction, provided on both sides of the diffusion part with the diffusion part interposed therebetween, the droplet group diffused and sent from the diffusion part and the gas introduced from the gas introduction part are mixed together to mix the liquid Two mixing parts that produce a mist-like liquid;
A merging portion that is connected to the two mixing portions to cause the mist-like liquids generated in the two mixing portions to merge with each other to form a merging liquid and guide the merging liquid to the opening; A two-fluid nozzle characterized by that.   The two-fluid nozzle according to claim 7, wherein the liquid discharge unit discharges the liquid vertically from the discharge port to the facing portion.   The diffusion portion is provided with a collision member having a collision plane having a predetermined width in the second direction in a state where the collision plane faces the discharge port, and the collision plane functions as the facing portion. The two-fluid nozzle according to claim 7 or 8.   The two-fluid nozzle according to claim 9, wherein the collision member is detachably attached to the diffusion portion.   11. The discharge port according to claim 7, wherein the discharge port forms a slit extending in the first direction, and the diffusing portion and the two mixing portions communicating with the diffusing portion are formed to extend in the first direction. The two-fluid nozzle according to any one of the above.   The two-fluid nozzle according to claim 7, wherein the opening forms a slit extending in the first direction.   A substrate processing apparatus comprising the two-fluid nozzle according to claim 1, wherein the combined liquid is ejected from the two-fluid nozzle onto a substrate to perform a predetermined process on the substrate. The substrate processing apparatus according to claim 13, wherein the predetermined processing is performed by fixing the two-fluid nozzle and ejecting the merged liquid from the two-fluid nozzle with respect to the substrate to be transported.

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