JP2006521553A5 - - Google Patents
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- Publication number
- JP2006521553A5 JP2006521553A5 JP2006507337A JP2006507337A JP2006521553A5 JP 2006521553 A5 JP2006521553 A5 JP 2006521553A5 JP 2006507337 A JP2006507337 A JP 2006507337A JP 2006507337 A JP2006507337 A JP 2006507337A JP 2006521553 A5 JP2006521553 A5 JP 2006521553A5
- Authority
- JP
- Japan
- Prior art keywords
- diaphragm
- electrode
- pressure
- cdg
- shim
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 238000000034 method Methods 0.000 description 28
- 238000003466 welding Methods 0.000 description 19
- 239000000463 material Substances 0.000 description 17
- 230000008569 process Effects 0.000 description 13
- 230000005855 radiation Effects 0.000 description 13
- 239000011521 glass Substances 0.000 description 11
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- 230000008859 change Effects 0.000 description 8
- 238000005259 measurement Methods 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 239000003990 capacitor Substances 0.000 description 6
- 229910001026 inconel Inorganic materials 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 4
- 239000012212 insulator Substances 0.000 description 4
- 239000006233 lamp black Substances 0.000 description 4
- 230000004044 response Effects 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 201000002200 Congenital disorder of glycosylation Diseases 0.000 description 3
- 229910001069 Ti alloy Inorganic materials 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 238000009530 blood pressure measurement Methods 0.000 description 3
- 235000013921 calcium diglutamate Nutrition 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 230000006903 response to temperature Effects 0.000 description 3
- 238000013459 approach Methods 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 239000001273 butane Substances 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 229910003468 tantalcarbide Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000011819 refractory material Substances 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 230000031070 response to heat Effects 0.000 description 1
- 230000000284 resting effect Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000003608 titanium Chemical class 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US45697503P | 2003-03-22 | 2003-03-22 | |
| US60/456,975 | 2003-03-22 | ||
| US10/249,238 | 2003-03-25 | ||
| US10/249,238 US6837112B2 (en) | 2003-03-22 | 2003-03-25 | Capacitance manometer having a relatively thick flush diaphragm under tension to provide low hysteresis |
| PCT/US2004/008351 WO2004086457A2 (en) | 2003-03-22 | 2004-03-17 | Capacitance manometer having a relatively thick flush diaphragm under tension to provide low hysteresis |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011161389A Division JP5457404B2 (ja) | 2003-03-22 | 2011-07-22 | 低いヒステリシスを提供するために、張力下の、比較的厚いフラッシュダイアフラムを有するキャパシタンス圧力計 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006521553A JP2006521553A (ja) | 2006-09-21 |
| JP2006521553A5 true JP2006521553A5 (enExample) | 2007-04-05 |
| JP5179752B2 JP5179752B2 (ja) | 2013-04-10 |
Family
ID=33100773
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006507337A Expired - Fee Related JP5179752B2 (ja) | 2003-03-22 | 2004-03-17 | 低いヒステリシスを提供するために、張力下の、比較的厚いフラッシュダイアフラムを有するキャパシタンス圧力計 |
| JP2011161389A Expired - Fee Related JP5457404B2 (ja) | 2003-03-22 | 2011-07-22 | 低いヒステリシスを提供するために、張力下の、比較的厚いフラッシュダイアフラムを有するキャパシタンス圧力計 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011161389A Expired - Fee Related JP5457404B2 (ja) | 2003-03-22 | 2011-07-22 | 低いヒステリシスを提供するために、張力下の、比較的厚いフラッシュダイアフラムを有するキャパシタンス圧力計 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6837112B2 (enExample) |
| EP (1) | EP1606601A4 (enExample) |
| JP (2) | JP5179752B2 (enExample) |
| KR (1) | KR101127656B1 (enExample) |
| TW (1) | TWI341386B (enExample) |
| WO (1) | WO2004086457A2 (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6910381B2 (en) * | 2002-05-31 | 2005-06-28 | Mykrolis Corporation | System and method of operation of an embedded system for a digital capacitance diaphragm gauge |
| US7489144B2 (en) * | 2005-02-16 | 2009-02-10 | P.I. Engineering, Inc. | Low-cost linear and liquid position transducers |
| EP1923685A1 (en) * | 2005-08-10 | 2008-05-21 | Horiba Stec, Co., Ltd. | Diaphragm mounting structure of electrostatic capacitance type pressure gauge |
| US7438030B1 (en) | 2005-08-26 | 2008-10-21 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Actuator operated microvalves |
| US7706995B2 (en) * | 2007-04-16 | 2010-04-27 | Mks Instr Inc | Capacitance manometers and methods relating to auto-drift correction |
| JP5260155B2 (ja) * | 2008-06-16 | 2013-08-14 | 株式会社堀場エステック | 静電容量型圧力センサ及びその製造方法 |
| US10420374B2 (en) | 2009-09-18 | 2019-09-24 | Altria Client Services Llc | Electronic smoke apparatus |
| JP5639176B2 (ja) † | 2009-09-18 | 2014-12-10 | スマート チップ マイクロエレクトロニック シーオー．リミテッド | 電子スモーク |
| US8997576B2 (en) | 2013-01-18 | 2015-04-07 | Reno Technologies, Inc. | Method and system for monitoring gas pressure for reference cavity of capacitance diaphragm gauge |
| US8997548B2 (en) | 2013-01-29 | 2015-04-07 | Reno Technologies, Inc. | Apparatus and method for automatic detection of diaphragm coating or surface contamination for capacitance diaphragm gauges |
| US8862420B2 (en) | 2013-02-05 | 2014-10-14 | Reno Sub-Sustems Canada Incorporated | Multi-axis tilt sensor for correcting gravitational effects on the measurement of pressure by a capacitance diaphragm gauge |
| US8965725B2 (en) | 2013-02-05 | 2015-02-24 | Reno Technologies, Inc. | Automatic calibration adjustment of capacitance diaphragm gauges to compensate for errors due to changes in atmospheric pressure |
| US8997575B2 (en) | 2013-02-13 | 2015-04-07 | Reno Technologies, Inc. | Method and apparatus for damping diaphragm vibration in capacitance diaphragm gauges |
| US9562820B2 (en) | 2013-02-28 | 2017-02-07 | Mks Instruments, Inc. | Pressure sensor with real time health monitoring and compensation |
| US9454158B2 (en) | 2013-03-15 | 2016-09-27 | Bhushan Somani | Real time diagnostics for flow controller systems and methods |
| JP6059641B2 (ja) * | 2013-11-25 | 2017-01-11 | 株式会社堀場エステック | 静電容量型圧力センサ |
| WO2015076413A1 (ja) | 2013-11-25 | 2015-05-28 | 株式会社堀場エステック | 静電容量型圧力センサ |
| WO2015076414A1 (ja) * | 2013-11-25 | 2015-05-28 | 株式会社堀場エステック | 静電容量型圧力センサ |
| JP6059642B2 (ja) * | 2013-11-25 | 2017-01-11 | 株式会社堀場エステック | 静電容量型圧力センサ |
| DE102014012918B4 (de) | 2014-09-05 | 2019-01-03 | Heinz Plöchinger | Dual-Kapazitäts-Manometer mit kleinem Messvolumen |
| US10983537B2 (en) | 2017-02-27 | 2021-04-20 | Flow Devices And Systems Inc. | Systems and methods for flow sensor back pressure adjustment for mass flow controller |
| KR102749090B1 (ko) | 2021-11-24 | 2025-01-06 | 주식회사 성창오토텍 | 다층 여재 및 다층 구조의 케미컬 복합 필터 |
| DE102022102437A1 (de) | 2022-02-02 | 2023-08-03 | Heinz Plöchinger | Korrekturverfahren für Dual-Kapazitäts-Manometer |
| US11467051B1 (en) | 2022-04-11 | 2022-10-11 | Heinz Plöchinger | Method for correcting a dual capacitance pressure sensor |
| CN115060410B (zh) * | 2022-06-09 | 2023-09-26 | 浙江大学 | 一种液力平滑的微压平膜压力传感阵列及制备工艺 |
Family Cites Families (46)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2751530A (en) | 1954-01-04 | 1956-06-19 | Honeywell Regulator Co | Differential pressure sensing unit |
| US2829520A (en) | 1955-02-14 | 1958-04-08 | Austin N Stanton | Pressure responsive transducers |
| US3557621A (en) | 1969-07-07 | 1971-01-26 | C G S Scient Corp Inc | Variable capacitance detecting devices |
| US3783693A (en) | 1970-01-21 | 1974-01-08 | J Paros | Absolute pressure transducer |
| US3747042A (en) | 1971-08-24 | 1973-07-17 | Gulton Ind Inc | Pressure transducer |
| US3965746A (en) | 1974-11-04 | 1976-06-29 | Teledyne Industries, Inc. | Pressure transducer |
| JPS542783A (en) * | 1977-06-09 | 1979-01-10 | Fuji Electric Co Ltd | Production of pressure or differential pressure measuring apparatus |
| US4141252A (en) * | 1977-11-04 | 1979-02-27 | Lodge Arthur S | Flush pressure transducers for measuring pressures in a flowing fluid |
| US4380041A (en) | 1978-09-25 | 1983-04-12 | Motorola Inc. | Capacitor pressure transducer with housing |
| JPS5921497B2 (ja) | 1978-11-02 | 1984-05-21 | 富士電機株式会社 | 圧力測定装置 |
| GB2048488B (en) | 1979-04-26 | 1983-04-27 | Rosemount Eng Co Ltd | Differential pressure sensing apparatus |
| DE3128032A1 (de) * | 1981-07-16 | 1983-02-03 | Robert Bosch Gmbh, 7000 Stuttgart | Anordnung zur erfassung eines druckes |
| US4542435A (en) * | 1984-03-29 | 1985-09-17 | General Signal Corporation | Pressure transducer and mounting |
| US4587851A (en) | 1985-02-26 | 1986-05-13 | Edward Mortberg | High vacuum capacitance manometer having Px side open housing |
| US4691574A (en) | 1986-02-25 | 1987-09-08 | Delatorre Leroy C | Capacitance transducer |
| US4703658A (en) | 1986-06-18 | 1987-11-03 | Motorola, Inc. | Pressure sensor assembly |
| DE3821693A1 (de) * | 1987-11-09 | 1989-05-18 | Schwerin Bezirkskrankenhaus | Kapazitiver druckwandler und verfahren zur herstellung dieses druckwandlers |
| US4864463A (en) | 1988-04-19 | 1989-09-05 | Allied-Signal Inc. | Capacitive pressure sensor |
| US4823603A (en) | 1988-05-03 | 1989-04-25 | Vacuum General, Inc. | Capacitance manometer having stress relief for fixed electrode |
| SE461300B (sv) | 1988-05-17 | 1990-01-29 | Hydrolab Ab | Tryckmaetare |
| US4974117A (en) | 1990-01-31 | 1990-11-27 | Kavlico Corporation | Dual diaphragm capacitive differential pressure transducer |
| CH685863A5 (de) * | 1991-11-18 | 1995-10-31 | Baumann & Cie | Verfahren zum Vorspannen einer Membran |
| US5271277A (en) | 1991-12-23 | 1993-12-21 | The Boc Group, Inc. | Capacitance pressure transducer |
| US5343757A (en) | 1992-05-21 | 1994-09-06 | Fuji Koki Manufacturing Co., Ltd. | Pressure sensor |
| JPH0666658A (ja) * | 1992-08-15 | 1994-03-11 | Stec Kk | 静電容量型圧力センサ |
| US5396803A (en) | 1993-07-07 | 1995-03-14 | Tylan General, Inc. | Dual balanced capacitance manometers for suppressing vibration effects |
| US5442962A (en) * | 1993-08-20 | 1995-08-22 | Setra Systems, Inc. | Capacitive pressure sensor having a pedestal supported electrode |
| US5349865A (en) | 1993-08-30 | 1994-09-27 | Kavlico Corporation | Wide-pressure-range, adaptable, simplified pressure transducer |
| US5452613A (en) | 1993-10-04 | 1995-09-26 | Granville-Phillips Company | Wide range vacuum gauge |
| SE506558C2 (sv) | 1994-04-14 | 1998-01-12 | Cecap Ab | Givarelement för tryckgivare |
| JPH095191A (ja) * | 1995-06-21 | 1997-01-10 | Matsushita Electric Ind Co Ltd | 静電容量式圧力センサ |
| US5515711A (en) | 1995-06-26 | 1996-05-14 | Mks Instruments, Inc. | Pressure measurement and calibration apparatus using gravity-induced diaphragm deflection |
| US5684245A (en) | 1995-11-17 | 1997-11-04 | Mks Instruments, Inc. | Apparatus for mass flow measurement of a gas |
| US5656780A (en) | 1996-03-28 | 1997-08-12 | Kavlico Corporation | Capacitive pressure transducer with an integrally formed front housing and flexible diaphragm |
| US5854846A (en) * | 1996-09-06 | 1998-12-29 | Northrop Grumman Corporation | Wafer fabricated electroacoustic transducer |
| FI101018B (sv) * | 1996-12-13 | 1998-03-31 | Balzers And Leybold Instrument | Förfarande och anordning för elektronisk kompensation av missvisning t ill följd av resonans hos en kapacitiv tryckgivare |
| JP4120017B2 (ja) | 1997-01-30 | 2008-07-16 | 株式会社セガ | 入力装置およびゲーム処理装置、その方法 |
| US5942692A (en) | 1997-04-10 | 1999-08-24 | Mks Instruments, Inc. | Capacitive pressure sensing method and apparatus avoiding interelectrode capacitance by driving with in-phase excitation signals |
| US5911162A (en) | 1997-06-20 | 1999-06-08 | Mks Instruments, Inc. | Capacitive pressure transducer with improved electrode support |
| US5965821A (en) | 1997-07-03 | 1999-10-12 | Mks Instruments, Inc. | Pressure sensor |
| US6019002A (en) | 1997-12-02 | 2000-02-01 | Setra Systems, Inc. | Pressure transducer having a tensioned diaphragm |
| US5939639A (en) | 1997-12-04 | 1999-08-17 | Setra Systems, Inc. | Pressure transducer housing with barometric pressure isolation |
| US6568274B1 (en) | 1998-02-04 | 2003-05-27 | Mks Instruments, Inc. | Capacitive based pressure sensor design |
| US6029525A (en) | 1998-02-04 | 2000-02-29 | Mks Instruments, Inc. | Capacitive based pressure sensor design |
| JP3556576B2 (ja) * | 2000-06-13 | 2004-08-18 | 株式会社山武 | 容量式圧力センサの製造方法 |
| JP2002005766A (ja) * | 2000-06-26 | 2002-01-09 | Kyocera Corp | 圧力検出装置用パッケージ |
-
2003
- 2003-03-25 US US10/249,238 patent/US6837112B2/en not_active Expired - Lifetime
-
2004
- 2004-03-17 KR KR1020057017770A patent/KR101127656B1/ko not_active Expired - Fee Related
- 2004-03-17 JP JP2006507337A patent/JP5179752B2/ja not_active Expired - Fee Related
- 2004-03-17 WO PCT/US2004/008351 patent/WO2004086457A2/en not_active Ceased
- 2004-03-17 EP EP04757831A patent/EP1606601A4/en not_active Withdrawn
- 2004-03-19 TW TW093107501A patent/TWI341386B/zh not_active IP Right Cessation
-
2011
- 2011-07-22 JP JP2011161389A patent/JP5457404B2/ja not_active Expired - Fee Related
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