JP2006518468A5 - - Google Patents
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- Publication number
- JP2006518468A5 JP2006518468A5 JP2006503693A JP2006503693A JP2006518468A5 JP 2006518468 A5 JP2006518468 A5 JP 2006518468A5 JP 2006503693 A JP2006503693 A JP 2006503693A JP 2006503693 A JP2006503693 A JP 2006503693A JP 2006518468 A5 JP2006518468 A5 JP 2006518468A5
- Authority
- JP
- Japan
- Prior art keywords
- purified material
- contaminants
- fluid stream
- process fluid
- contaminant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 claims 51
- 239000000356 contaminant Substances 0.000 claims 28
- 239000013014 purified material Substances 0.000 claims 19
- 239000007789 gas Substances 0.000 claims 14
- 238000003795 desorption Methods 0.000 claims 13
- 239000012530 fluid Substances 0.000 claims 13
- 150000001875 compounds Chemical class 0.000 claims 10
- 239000003344 environmental pollutant Substances 0.000 claims 7
- 231100000719 pollutant Toxicity 0.000 claims 7
- 239000000126 substance Substances 0.000 claims 4
- 150000004820 halides Chemical class 0.000 claims 3
- 229910052739 hydrogen Inorganic materials 0.000 claims 3
- 239000001257 hydrogen Substances 0.000 claims 3
- -1 nitrogen-containing compound Chemical class 0.000 claims 3
- 230000000704 physical effect Effects 0.000 claims 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 2
- 238000004458 analytical method Methods 0.000 claims 2
- 238000000769 gas chromatography-flame ionisation detection Methods 0.000 claims 2
- 150000004678 hydrides Chemical class 0.000 claims 2
- 229910052751 metal Inorganic materials 0.000 claims 2
- 239000002184 metal Substances 0.000 claims 2
- 150000002894 organic compounds Chemical class 0.000 claims 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- 229910052717 sulfur Inorganic materials 0.000 claims 2
- 239000011593 sulfur Substances 0.000 claims 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims 1
- 239000004215 Carbon black (E152) Substances 0.000 claims 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims 1
- 229910003902 SiCl 4 Inorganic materials 0.000 claims 1
- 150000001412 amines Chemical class 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 229910052788 barium Inorganic materials 0.000 claims 1
- 229910052796 boron Inorganic materials 0.000 claims 1
- 229910052791 calcium Inorganic materials 0.000 claims 1
- 229910002092 carbon dioxide Inorganic materials 0.000 claims 1
- 239000001569 carbon dioxide Substances 0.000 claims 1
- 229910002091 carbon monoxide Inorganic materials 0.000 claims 1
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 claims 1
- 229910052804 chromium Inorganic materials 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 230000002596 correlated effect Effects 0.000 claims 1
- 230000001066 destructive effect Effects 0.000 claims 1
- 238000001514 detection method Methods 0.000 claims 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims 1
- 229910052736 halogen Inorganic materials 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 150000002367 halogens Chemical class 0.000 claims 1
- 229930195733 hydrocarbon Natural products 0.000 claims 1
- 150000002430 hydrocarbons Chemical class 0.000 claims 1
- 150000002431 hydrogen Chemical class 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- 229910052744 lithium Inorganic materials 0.000 claims 1
- 229910052749 magnesium Inorganic materials 0.000 claims 1
- 229910052748 manganese Inorganic materials 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 150000002739 metals Chemical class 0.000 claims 1
- 229910052750 molybdenum Inorganic materials 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229910052698 phosphorus Inorganic materials 0.000 claims 1
- 239000011574 phosphorus Substances 0.000 claims 1
- 229910052700 potassium Inorganic materials 0.000 claims 1
- 238000000746 purification Methods 0.000 claims 1
- 230000001172 regenerating effect Effects 0.000 claims 1
- 229910052708 sodium Inorganic materials 0.000 claims 1
- 150000003568 thioethers Chemical class 0.000 claims 1
- 150000003573 thiols Chemical class 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
- 229910001868 water Inorganic materials 0.000 claims 1
- 229910052725 zinc Inorganic materials 0.000 claims 1
- 229910052726 zirconium Inorganic materials 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US44928403P | 2003-02-21 | 2003-02-21 | |
| PCT/US2004/004845 WO2004077015A2 (en) | 2003-02-21 | 2004-02-20 | Method for analysis of contaminants in a process fluid stream |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006518468A JP2006518468A (ja) | 2006-08-10 |
| JP2006518468A5 true JP2006518468A5 (enExample) | 2007-03-29 |
Family
ID=32927506
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006503693A Pending JP2006518468A (ja) | 2003-02-21 | 2004-02-20 | プロセス流体流中の汚染物質の分析方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8664004B2 (enExample) |
| EP (1) | EP1595132B1 (enExample) |
| JP (1) | JP2006518468A (enExample) |
| KR (1) | KR20050103946A (enExample) |
| CN (1) | CN1756945A (enExample) |
| DE (1) | DE602004004369T2 (enExample) |
| TW (1) | TW200506334A (enExample) |
| WO (1) | WO2004077015A2 (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200506334A (en) | 2003-02-21 | 2005-02-16 | Mykrolis Corp | Purifier information retrieval system |
| US7189291B2 (en) | 2003-06-02 | 2007-03-13 | Entegris, Inc. | Method for the removal of airborne molecular contaminants using oxygen gas mixtures |
| US7384149B2 (en) * | 2003-07-21 | 2008-06-10 | Asml Netherlands B.V. | Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system |
| US20060285091A1 (en) * | 2003-07-21 | 2006-12-21 | Parekh Bipin S | Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application |
| JP4929823B2 (ja) * | 2005-06-07 | 2012-05-09 | 東京エレクトロン株式会社 | 有機物ガスの濃度測定方法及びその濃度測定装置 |
| US7946152B2 (en) | 2005-06-07 | 2011-05-24 | Tokyo Electron Limited | Apparatus and method for measuring the concentration of organic gas |
| EP1909978A2 (en) * | 2005-08-02 | 2008-04-16 | Entegris, Inc. | Systems and methods for capture substrates |
| US8017405B2 (en) * | 2005-08-08 | 2011-09-13 | The Boc Group, Inc. | Gas analysis method |
| CN101263385A (zh) * | 2005-08-08 | 2008-09-10 | 琳德股份有限公司 | 气体分析方法 |
| CN101393222B (zh) * | 2007-09-20 | 2012-07-18 | 财团法人工业技术研究院 | 有机气体监测装置及方法 |
| JP5150749B2 (ja) | 2011-05-31 | 2013-02-27 | 株式会社東芝 | 発生ガスの捕集方法、及び測定方法 |
| CN103157429A (zh) * | 2013-03-22 | 2013-06-19 | 南京玖壹环境科技有限公司 | 高真空多层绝热用吸附剂活化的装置与方法 |
| CN104865306A (zh) * | 2015-04-23 | 2015-08-26 | 中国制浆造纸研究院 | 一种固体样品中可吸附有机氯化物的检测方法 |
| CN104792604A (zh) * | 2015-04-28 | 2015-07-22 | 李勘 | 电子制冷大气预浓缩仪 |
| CN105606683A (zh) * | 2016-01-29 | 2016-05-25 | 华电电力科学研究院 | So3在线连续监测装置及方法 |
| US10228324B2 (en) | 2016-07-25 | 2019-03-12 | Mks Instruments, Inc. | Gas measurement system |
| EP3608660B1 (en) * | 2017-04-05 | 2023-12-20 | Panasonic Holdings Corporation | Gas sensor |
| KR102156387B1 (ko) | 2020-06-25 | 2020-09-15 | 엄봉 | 청소가 용이한 창호프레임 |
| US11609505B2 (en) * | 2021-04-05 | 2023-03-21 | Applied Materials, Inc. | Apparatus and methods for verification and re-use of process fluids |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5027642A (en) * | 1987-10-13 | 1991-07-02 | American Air Liquide | Method of detecting and or removing trace amounts of condensible vapors from compressed gas |
| US4805441A (en) * | 1988-02-22 | 1989-02-21 | Cms Research Corporation | Continuous air monitoring apparatus and method |
| US5138869A (en) * | 1990-12-14 | 1992-08-18 | Novapure Corporation | In-line detector system for real-time determination of impurity concentration in a flowing gas stream |
| US5583282A (en) * | 1990-12-14 | 1996-12-10 | Millipore Investment Holdings Limited | Differential gas sensing in-line monitoring system |
| JPH04353761A (ja) * | 1991-05-30 | 1992-12-08 | Tadahiro Omi | 特殊ガス中の不純物量測定方法及びその測定装置 |
| US5304796A (en) * | 1992-03-25 | 1994-04-19 | The Boc Group, Inc. | Atmospheric pressure ionization mass spectroscopy method including a silica gel drying step |
| US5511409A (en) * | 1994-09-19 | 1996-04-30 | Knaebel; Kent S. | Measurement of emission levels in a gas stream |
| US6059859A (en) * | 1997-09-19 | 2000-05-09 | Aeronex, Inc. | Method, composition and apparatus for water removal from non-corrosive gas streams |
| JP3607997B2 (ja) * | 1998-04-09 | 2005-01-05 | 大陽日酸株式会社 | ガス中の微量不純物の分析装置 |
| US6241955B1 (en) * | 1998-10-02 | 2001-06-05 | Aeronex, Inc. | Method and apparatus for purification of hydride gas streams |
| JP4268254B2 (ja) | 1999-03-04 | 2009-05-27 | 新日本製鐵株式会社 | 超音速分子ジェットレーザ分光分析装置およびその前処理方法 |
| JP2000304734A (ja) | 1999-04-21 | 2000-11-02 | Shimizu Corp | 空気中の汚染物質の検出方法 |
| US6393894B1 (en) * | 1999-07-27 | 2002-05-28 | Honeywell International Inc. | Gas sensor with phased heaters for increased sensitivity |
| US6361696B1 (en) * | 2000-01-19 | 2002-03-26 | Aeronex, Inc. | Self-regenerative process for contaminant removal from liquid and supercritical CO2 fluid streams |
| JP2001235405A (ja) | 2000-02-21 | 2001-08-31 | Ube Kagaku Bunseki Center:Kk | 揮発性有機化合物の捕集方法、及びそれを利用した分析方法、並びに揮発性有機化合物の捕集装置 |
| JP3632748B2 (ja) * | 2000-03-21 | 2005-03-23 | 日立プラント建設株式会社 | 汚染物質の固体表面吸着評価方法 |
| US6409801B1 (en) * | 2000-09-29 | 2002-06-25 | The Boc Group, Inc. | Activation processes for monolith adsorbents |
| JP4590091B2 (ja) * | 2000-11-24 | 2010-12-01 | 大陽日酸株式会社 | ガス分析装置 |
| US6547861B2 (en) * | 2000-12-26 | 2003-04-15 | Matheson Tri-Gas,, Inc. | Method and materials for purifying reactive gases using preconditioned ultra-low emission carbon material |
| DE10114947B4 (de) * | 2001-03-27 | 2004-08-19 | Gerstel Systemtechnik Gmbh & Co.Kg | Verfahren und Vorrichtung zum Herstellen eines mindestens eine gasförmige Komponente enthaltenden Gasgemisches, insbesondere eines Kalibriergases |
| US6391090B1 (en) * | 2001-04-02 | 2002-05-21 | Aeronex, Inc. | Method for purification of lens gases used in photolithography |
| US20030162305A1 (en) * | 2002-02-25 | 2003-08-28 | Daniel Alvarez | Gas contaminant detection and quantification method |
| TW200506334A (en) | 2003-02-21 | 2005-02-16 | Mykrolis Corp | Purifier information retrieval system |
| US7132011B2 (en) | 2003-09-02 | 2006-11-07 | Entegris, Inc. | Reactive gas filter |
-
2004
- 2004-02-20 TW TW093104226A patent/TW200506334A/zh unknown
- 2004-02-20 CN CNA200480004583XA patent/CN1756945A/zh active Pending
- 2004-02-20 WO PCT/US2004/004845 patent/WO2004077015A2/en not_active Ceased
- 2004-02-20 DE DE602004004369T patent/DE602004004369T2/de not_active Expired - Fee Related
- 2004-02-20 EP EP04713293A patent/EP1595132B1/en not_active Expired - Lifetime
- 2004-02-20 KR KR1020057015353A patent/KR20050103946A/ko not_active Withdrawn
- 2004-02-20 US US10/544,309 patent/US8664004B2/en active Active
- 2004-02-20 JP JP2006503693A patent/JP2006518468A/ja active Pending
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