JP2006514161A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2006514161A5 JP2006514161A5 JP2004568825A JP2004568825A JP2006514161A5 JP 2006514161 A5 JP2006514161 A5 JP 2006514161A5 JP 2004568825 A JP2004568825 A JP 2004568825A JP 2004568825 A JP2004568825 A JP 2004568825A JP 2006514161 A5 JP2006514161 A5 JP 2006514161A5
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- orifices
- flow rate
- reactant gases
- plasmas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 210000002381 Plasma Anatomy 0.000 claims 56
- 239000007789 gas Substances 0.000 claims 48
- 239000000376 reactant Substances 0.000 claims 44
- 239000000758 substrate Substances 0.000 claims 12
- 239000011248 coating agent Substances 0.000 claims 7
- 238000000576 coating method Methods 0.000 claims 7
- 239000012530 fluid Substances 0.000 claims 4
- 238000000151 deposition Methods 0.000 claims 3
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/US2003/005209 WO2004076716A1 (en) | 2003-02-20 | 2003-02-20 | Apparatus and method for depositing large area coatings on planar surfaces |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006514161A JP2006514161A (ja) | 2006-04-27 |
| JP2006514161A5 true JP2006514161A5 (fi) | 2006-06-15 |
Family
ID=32925324
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004568825A Pending JP2006514161A (ja) | 2003-02-20 | 2003-02-20 | 平坦な表面上に大面積の皮膜を堆積するための装置及び方法 |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP1597409A1 (fi) |
| JP (1) | JP2006514161A (fi) |
| KR (1) | KR100977955B1 (fi) |
| CN (1) | CN1764738B (fi) |
| AU (1) | AU2003211169A1 (fi) |
| WO (1) | WO2004076716A1 (fi) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6743524B2 (en) * | 2002-05-23 | 2004-06-01 | General Electric Company | Barrier layer for an article and method of making said barrier layer by expanding thermal plasma |
| US7521653B2 (en) | 2004-08-03 | 2009-04-21 | Exatec Llc | Plasma arc coating system |
| EP2100485B1 (en) | 2006-12-28 | 2013-05-29 | Exatec, LLC. | Apparatus and method for plasma arc coating |
| KR101588174B1 (ko) | 2007-05-17 | 2016-01-27 | 엑사테크 엘.엘.씨. | 공통 플라즈마 코팅 구역에서 복수의 코팅 재료를 침착시키기 위한 장치 및 방법 |
| CN102618846B (zh) * | 2012-04-18 | 2014-04-09 | 南京航空航天大学 | 一种多炬等离子体喷射cvd法沉积超硬膜的方法及装置 |
| EP2784175A1 (fr) * | 2013-03-28 | 2014-10-01 | NeoCoat SA | Equipement de dépôt de diamant en phase vapeur |
| CN103924210A (zh) * | 2014-04-24 | 2014-07-16 | 无锡元坤新材料科技有限公司 | 一种等离子体沉积装置及金刚石涂层的制备方法 |
| US20170320080A1 (en) * | 2014-11-10 | 2017-11-09 | Superior Industries International, Inc. | Method of coating alloy wheels |
| CN107881485B (zh) * | 2017-11-01 | 2019-10-01 | 深圳市华星光电半导体显示技术有限公司 | 等离子体增强化学气相沉积设备及oled面板的封装方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0772341B2 (ja) * | 1991-02-21 | 1995-08-02 | 中外炉工業株式会社 | 圧力勾配型プラズマガンによるプラズマ発生装置 |
| US6365016B1 (en) * | 1999-03-17 | 2002-04-02 | General Electric Company | Method and apparatus for arc plasma deposition with evaporation of reagents |
| US6397776B1 (en) * | 2001-06-11 | 2002-06-04 | General Electric Company | Apparatus for large area chemical vapor deposition using multiple expanding thermal plasma generators |
| US6948448B2 (en) * | 2001-11-27 | 2005-09-27 | General Electric Company | Apparatus and method for depositing large area coatings on planar surfaces |
| US6681716B2 (en) * | 2001-11-27 | 2004-01-27 | General Electric Company | Apparatus and method for depositing large area coatings on non-planar surfaces |
| JP2003268556A (ja) * | 2002-03-08 | 2003-09-25 | Sumitomo Heavy Ind Ltd | プラズマ処理装置 |
-
2003
- 2003-02-20 JP JP2004568825A patent/JP2006514161A/ja active Pending
- 2003-02-20 KR KR1020057015386A patent/KR100977955B1/ko active IP Right Grant
- 2003-02-20 AU AU2003211169A patent/AU2003211169A1/en not_active Abandoned
- 2003-02-20 EP EP03816093A patent/EP1597409A1/en not_active Withdrawn
- 2003-02-20 WO PCT/US2003/005209 patent/WO2004076716A1/en active Application Filing
- 2003-02-20 CN CN03826341.6A patent/CN1764738B/zh not_active Expired - Fee Related
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR102074346B1 (ko) | 리모트 플라즈마를 이용한 원자층 증착 시스템 | |
| US7942968B2 (en) | Catalyst enhanced chemical vapor deposition apparatus | |
| TWI625757B (zh) | 脈衝化遠程電漿方法和系統 | |
| US7479303B2 (en) | Method for chemical vapor deposition (CVD) with showerhead and method thereof | |
| JP6240607B2 (ja) | 直線型大面積プラズマリアクタ内における均一プロセスのためのガス送出及び分配 | |
| JP5138594B2 (ja) | 大気圧下で連続化学気相堆積する装置、方法、及びその使用 | |
| TWI690616B (zh) | 氣體供給系統、電漿處理裝置及電漿處理裝置之運用方法 | |
| JP2007530796A5 (fi) | ||
| CN103649368B (zh) | 气体喷注装置、原子层沉积装置以及使用该原子层沉积装置的原子层沉积方法 | |
| JP2006514161A5 (fi) | ||
| JP2005064305A5 (fi) | ||
| JP5069581B2 (ja) | ガスバリア膜の成膜方法、ガスバリアフィルムおよび有機ｅｌ素子 | |
| KR101541154B1 (ko) | 원자층 증착장치 | |
| TWI502096B (zh) | 用於化學氣相沉積的反應裝置及反應製程 | |
| KR100977955B1 (ko) | 큰 면적의 코팅재를 평면에 침착시키기 위한 장치 및 방법 | |
| KR102337807B1 (ko) | 박막 증착 장치 | |
| KR100457455B1 (ko) | 박막 증착 속도를 조절하는 샤워헤드를 구비한 화학 기상증착 장치. | |
| KR20090026899A (ko) | 반도체 제조장치 | |
| KR20070109384A (ko) | 원자층 증착 공정 장비의 샤워 헤드 | |
| WO2023093455A1 (zh) | 一种进气分配机构及具有其的 cvd 反应设备 | |
| KR20090088056A (ko) | 가스공급 유닛 및 화학기상증착 장치 | |
| US20170365447A1 (en) | Plasma generator apparatus | |
| KR101478788B1 (ko) | 박막 증착 장치 및 이를 이용한 박막 증착 방법 | |
| US11961716B2 (en) | Atomic layer deposition method | |
| KR102125473B1 (ko) | 박막 증착 방법 |