AU2003211169A1 - Apparatus and method for depositing large area coatings on planar surfaces - Google Patents

Apparatus and method for depositing large area coatings on planar surfaces

Info

Publication number
AU2003211169A1
AU2003211169A1 AU2003211169A AU2003211169A AU2003211169A1 AU 2003211169 A1 AU2003211169 A1 AU 2003211169A1 AU 2003211169 A AU2003211169 A AU 2003211169A AU 2003211169 A AU2003211169 A AU 2003211169A AU 2003211169 A1 AU2003211169 A1 AU 2003211169A1
Authority
AU
Australia
Prior art keywords
large area
planar surfaces
area coatings
depositing large
depositing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003211169A
Inventor
Marc Schaepkens
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of AU2003211169A1 publication Critical patent/AU2003211169A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/4558—Perforated rings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
AU2003211169A 2003-02-20 2003-02-20 Apparatus and method for depositing large area coatings on planar surfaces Abandoned AU2003211169A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2003/005209 WO2004076716A1 (en) 2003-02-20 2003-02-20 Apparatus and method for depositing large area coatings on planar surfaces

Publications (1)

Publication Number Publication Date
AU2003211169A1 true AU2003211169A1 (en) 2004-09-17

Family

ID=32925324

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003211169A Abandoned AU2003211169A1 (en) 2003-02-20 2003-02-20 Apparatus and method for depositing large area coatings on planar surfaces

Country Status (6)

Country Link
EP (1) EP1597409A1 (en)
JP (1) JP2006514161A (en)
KR (1) KR100977955B1 (en)
CN (1) CN1764738B (en)
AU (1) AU2003211169A1 (en)
WO (1) WO2004076716A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6743524B2 (en) * 2002-05-23 2004-06-01 General Electric Company Barrier layer for an article and method of making said barrier layer by expanding thermal plasma
US7521653B2 (en) 2004-08-03 2009-04-21 Exatec Llc Plasma arc coating system
EP2100485B1 (en) 2006-12-28 2013-05-29 Exatec, LLC. Apparatus and method for plasma arc coating
KR101588174B1 (en) 2007-05-17 2016-01-27 엑사테크 엘.엘.씨. Apparatus and method for depositing multiple coating materials in a common plasma coating zone
CN102618846B (en) * 2012-04-18 2014-04-09 南京航空航天大学 Method and device for depositing super-hard film through multi-torch plasma spray CVD (Chemical Vapor Deposition) method
EP2784175A1 (en) * 2013-03-28 2014-10-01 NeoCoat SA Device for depositing diamond in vapour phase
CN103924210A (en) * 2014-04-24 2014-07-16 无锡元坤新材料科技有限公司 Plasma deposition device and method for preparing diamond coating
US20170320080A1 (en) * 2014-11-10 2017-11-09 Superior Industries International, Inc. Method of coating alloy wheels
CN107881485B (en) * 2017-11-01 2019-10-01 深圳市华星光电半导体显示技术有限公司 The packaging method of plasma enhanced chemical vapor deposition equipment and oled panel

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0772341B2 (en) * 1991-02-21 1995-08-02 中外炉工業株式会社 Plasma generator with pressure gradient type plasma gun
US6365016B1 (en) * 1999-03-17 2002-04-02 General Electric Company Method and apparatus for arc plasma deposition with evaporation of reagents
US6397776B1 (en) * 2001-06-11 2002-06-04 General Electric Company Apparatus for large area chemical vapor deposition using multiple expanding thermal plasma generators
US6948448B2 (en) * 2001-11-27 2005-09-27 General Electric Company Apparatus and method for depositing large area coatings on planar surfaces
US6681716B2 (en) * 2001-11-27 2004-01-27 General Electric Company Apparatus and method for depositing large area coatings on non-planar surfaces
JP2003268556A (en) * 2002-03-08 2003-09-25 Sumitomo Heavy Ind Ltd Plasma processing apparatus

Also Published As

Publication number Publication date
EP1597409A1 (en) 2005-11-23
CN1764738A (en) 2006-04-26
CN1764738B (en) 2015-04-08
WO2004076716A1 (en) 2004-09-10
JP2006514161A (en) 2006-04-27
KR100977955B1 (en) 2010-08-24
KR20050113186A (en) 2005-12-01

Similar Documents

Publication Publication Date Title
EP1420079B8 (en) Film-forming system and film-forming method
AU2003902423A0 (en) Apparatus and method
AU2003249616A1 (en) Substrate processing apparatus and related systems and methods
AU2003228256A1 (en) Locating system and method
AU2002321629A1 (en) Inkjet deposition apparatus and method
AU2003277330A1 (en) Apparatus and method for depositing an oxide film
AU2002243789A1 (en) Methods and apparatus for pericardial access
EP1672093A4 (en) Film-forming apparatus and film-forming method
AU2003289383A1 (en) Coating device and coating film forming method
AU2003222857A1 (en) Spraying method and apparatus
AU2002367901A1 (en) Surface characteristic apparatus and method
AU2003250454A1 (en) Method and apparatus for matching colours
AU2003301186A1 (en) Method and apparatus for following cells
AU2003303418A1 (en) Object identifying method and apparatus
AU2003215357A1 (en) Bladder-based apparatus and method for dispensing coatings
AU2003213625A1 (en) Coating method and apparatus
AU2003211169A1 (en) Apparatus and method for depositing large area coatings on planar surfaces
AU2003301498A1 (en) Thin films and methods for forming thin films utilizing ecae-targets
AU2002345966A1 (en) Method and apparatus for forming microstructures on polymeric substrates
AU2003275264A1 (en) Improved film coater method and apparatus
AU2002347417A1 (en) Space-dyeing method and apparatus
AU2003286823A1 (en) Substrate processing apparatus and method
AU2003244462A1 (en) Coating device and coating method
AU2003296965A1 (en) Method and apparatus for offline standbuilding
AU2003255542A1 (en) Coating apparatus

Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase