JP2006513568A5 - - Google Patents
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- Publication number
- JP2006513568A5 JP2006513568A5 JP2004566394A JP2004566394A JP2006513568A5 JP 2006513568 A5 JP2006513568 A5 JP 2006513568A5 JP 2004566394 A JP2004566394 A JP 2004566394A JP 2004566394 A JP2004566394 A JP 2004566394A JP 2006513568 A5 JP2006513568 A5 JP 2006513568A5
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor
- mask pattern
- exposure
- ball
- ball semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 description 154
- 238000004519 manufacturing process Methods 0.000 description 21
- 238000000034 method Methods 0.000 description 19
- 229920002120 photoresistant polymer Polymers 0.000 description 17
- 230000008569 process Effects 0.000 description 14
- 230000003287 optical effect Effects 0.000 description 10
- 239000000463 material Substances 0.000 description 8
- 230000008859 change Effects 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 238000013459 approach Methods 0.000 description 4
- 230000010354 integration Effects 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/US2003/000567 WO2004063812A1 (en) | 2003-01-09 | 2003-01-09 | Apparatus and method of exposing a semiconductor device having a curved surface to light |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006513568A JP2006513568A (ja) | 2006-04-20 |
| JP2006513568A5 true JP2006513568A5 (https=) | 2008-12-18 |
Family
ID=32710272
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004566394A Pending JP2006513568A (ja) | 2003-01-09 | 2003-01-09 | 曲面を有する半導体の露光装置及び露光方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7190433B2 (https=) |
| JP (1) | JP2006513568A (https=) |
| AU (1) | AU2003209190A1 (https=) |
| WO (1) | WO2004063812A1 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5103901B2 (ja) * | 2006-01-27 | 2012-12-19 | 富士通セミコンダクター株式会社 | 半導体装置の製造方法 |
| US20160167164A9 (en) * | 2006-07-10 | 2016-06-16 | Lazare Kaplan International, Inc. | System and method for gemstone microinscription |
| WO2009018846A1 (en) * | 2007-08-09 | 2009-02-12 | Carl Zeiss Smt Ag | Method of structuring a photosensitive material |
| JP6633925B2 (ja) * | 2016-01-29 | 2020-01-22 | 株式会社オーク製作所 | 露光装置および露光方法 |
| KR102096269B1 (ko) * | 2016-03-31 | 2020-04-03 | 주식회사 엘지화학 | 포토 마스크 및 이를 이용한 컬러필터용 컬럼 스페이서의 제조방법 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5424803A (en) * | 1991-08-09 | 1995-06-13 | Canon Kabushiki Kaisha | Projection exposure apparatus and semiconductor device manufacturing method |
| JP2852169B2 (ja) * | 1993-02-25 | 1999-01-27 | 日本電気株式会社 | 投影露光方法および装置 |
| US6304317B1 (en) * | 1993-07-15 | 2001-10-16 | Nikon Corporation | Projection apparatus and method |
| US5955776A (en) * | 1996-12-04 | 1999-09-21 | Ball Semiconductor, Inc. | Spherical shaped semiconductor integrated circuit |
| JPH10312945A (ja) * | 1997-03-12 | 1998-11-24 | Canon Inc | 球状デバイス露光装置及び製造方法 |
| US6097472A (en) * | 1997-04-17 | 2000-08-01 | Canon Kabushiki Kaisha | Apparatus and method for exposing a pattern on a ball-like device material |
| US6130742A (en) * | 1997-10-17 | 2000-10-10 | Ball Semiconductor, Ltd. | Exposure apparatus for a ball shaped substrate |
| JP2000021978A (ja) * | 1998-07-03 | 2000-01-21 | Mitsubishi Electric Corp | フォトマスクおよびパターン形成方法 |
| US6251550B1 (en) * | 1998-07-10 | 2001-06-26 | Ball Semiconductor, Inc. | Maskless photolithography system that digitally shifts mask data responsive to alignment data |
| US6136617A (en) * | 1998-07-10 | 2000-10-24 | Ball Semiconductor, Inc. | Alignment system for a spherical shaped device |
| US6262791B1 (en) * | 1998-07-10 | 2001-07-17 | Ball Semiconductor, Inc. | Optical element for imaging a flat mask onto a nonplanar substrate |
| US6251765B1 (en) * | 1998-07-10 | 2001-06-26 | Ball Semiconductor, Inc. | Manufacturing metal dip solder bumps for semiconductor devices |
| EP1095310A4 (en) * | 1998-07-10 | 2004-10-20 | Ball Semiconductor Inc | REFLECTION SYSTEM FOR IMAGING ON A NON-PLANAR SUBSTRATE |
| US6304316B1 (en) * | 1998-10-22 | 2001-10-16 | Anvik Corporation | Microlithography system for high-resolution large-area patterning on curved surfaces |
| US6529262B1 (en) * | 1999-04-14 | 2003-03-04 | Ball Semiconductor, Inc. | System and method for performing lithography on a substrate |
| US6265234B1 (en) * | 2000-01-25 | 2001-07-24 | Ball Semiconductor, Inc. | Alignment system for a spherical device |
| US6416908B1 (en) * | 2000-06-29 | 2002-07-09 | Anvik Corporation | Projection lithography on curved substrates |
| US6707534B2 (en) * | 2002-05-10 | 2004-03-16 | Anvik Corporation | Maskless conformable lithography |
-
2003
- 2003-01-09 JP JP2004566394A patent/JP2006513568A/ja active Pending
- 2003-01-09 US US10/538,979 patent/US7190433B2/en not_active Expired - Fee Related
- 2003-01-09 WO PCT/US2003/000567 patent/WO2004063812A1/en not_active Ceased
- 2003-01-09 AU AU2003209190A patent/AU2003209190A1/en not_active Abandoned
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