JP2006513443A - リターデーション・プレート - Google Patents

リターデーション・プレート Download PDF

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Publication number
JP2006513443A
JP2006513443A JP2004565923A JP2004565923A JP2006513443A JP 2006513443 A JP2006513443 A JP 2006513443A JP 2004565923 A JP2004565923 A JP 2004565923A JP 2004565923 A JP2004565923 A JP 2004565923A JP 2006513443 A JP2006513443 A JP 2006513443A
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JP
Japan
Prior art keywords
retardation plate
layer structure
plate
crystal
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004565923A
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English (en)
Japanese (ja)
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JP2006513443A5 (https=
Inventor
フィオルカ，ダミアン
Original Assignee
カール・ツアイス・エスエムテイ・アーゲー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by カール・ツアイス・エスエムテイ・アーゲー filed Critical カール・ツアイス・エスエムテイ・アーゲー
Publication of JP2006513443A publication Critical patent/JP2006513443A/ja
Publication of JP2006513443A5 publication Critical patent/JP2006513443A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G02B5/3091—Birefringent or phase retarding elements for use in the UV

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Polarising Elements (AREA)
JP2004565923A 2003-01-16 2003-02-14 リターデーション・プレート Pending JP2006513443A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10301548 2003-01-16
PCT/EP2003/001475 WO2004063777A1 (en) 2003-01-16 2003-02-14 Retardation plate

Publications (2)

Publication Number Publication Date
JP2006513443A true JP2006513443A (ja) 2006-04-20
JP2006513443A5 JP2006513443A5 (https=) 2006-10-05

Family

ID=32694896

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004565923A Pending JP2006513443A (ja) 2003-01-16 2003-02-14 リターデーション・プレート

Country Status (5)

Country Link
US (1) US20060014048A1 (https=)
EP (1) EP1583988A1 (https=)
JP (1) JP2006513443A (https=)
AU (1) AU2003212243A1 (https=)
WO (1) WO2004063777A1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008177581A (ja) * 2007-01-22 2008-07-31 Carl Zeiss Smt Ag マイクロリソグラフィ投影露光装置
JP2011508409A (ja) * 2007-11-20 2011-03-10 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学系

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040218271A1 (en) * 2001-07-18 2004-11-04 Carl Zeiss Smt Ag Retardation element made from cubic crystal and an optical system therewith
DE102007059258A1 (de) 2007-01-22 2008-07-24 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04191703A (ja) * 1990-11-27 1992-07-10 Fujitsu Ltd 偏光無依存性光学部品
US6201634B1 (en) * 1998-03-12 2001-03-13 Nikon Corporation Optical element made from fluoride single crystal, method for manufacturing optical element, method for calculating birefringence of optical element and method for determining direction of minimum birefringence of optical element
FR2793566B1 (fr) * 1999-05-11 2002-07-12 Thomson Csf Separateur de polarisations
KR20030097862A (ko) * 2001-05-16 2003-12-31 코닝 인코포레이티드 입방체 물질로부터 선택된 결정방향의 광학 소자
US20030011893A1 (en) * 2001-06-20 2003-01-16 Nikon Corporation Optical system and exposure apparatus equipped with the optical system
US6831731B2 (en) * 2001-06-28 2004-12-14 Nikon Corporation Projection optical system and an exposure apparatus with the projection optical system
US6775063B2 (en) * 2001-07-10 2004-08-10 Nikon Corporation Optical system and exposure apparatus having the optical system
US20040218271A1 (en) * 2001-07-18 2004-11-04 Carl Zeiss Smt Ag Retardation element made from cubic crystal and an optical system therewith
DE10133841A1 (de) * 2001-07-18 2003-02-06 Zeiss Carl Objektiv mit Kristall-Linsen
US7075721B2 (en) * 2002-03-06 2006-07-11 Corning Incorporated Compensator for radially symmetric birefringence
US20050094268A1 (en) * 2002-03-14 2005-05-05 Carl Zeiss Smt Ag Optical system with birefringent optical elements
US7292388B2 (en) * 2002-05-08 2007-11-06 Carl Zeiss Smt Ag Lens made of a crystalline material
US7075720B2 (en) * 2002-08-22 2006-07-11 Asml Netherlands B.V. Structures and methods for reducing polarization aberration in optical systems
KR20050057110A (ko) * 2002-09-03 2005-06-16 칼 짜이스 에스엠테 아게 복굴절 렌즈를 구비한 대물렌즈
WO2004025349A1 (de) * 2002-09-09 2004-03-25 Carl Zeiss Smt Ag Katadioptrisches projektionsobjektiv sowie verfahren zur kompensation der intrinsischen doppelbrechung in einem solchen

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008177581A (ja) * 2007-01-22 2008-07-31 Carl Zeiss Smt Ag マイクロリソグラフィ投影露光装置
JP2011508409A (ja) * 2007-11-20 2011-03-10 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学系
US8379188B2 (en) 2007-11-20 2013-02-19 Carl Zeiss Smt Gmbh Optical system

Also Published As

Publication number Publication date
EP1583988A1 (en) 2005-10-12
AU2003212243A1 (en) 2004-08-10
WO2004063777A1 (en) 2004-07-29
US20060014048A1 (en) 2006-01-19

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