JP2006507079A5 - - Google Patents

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Publication number
JP2006507079A5
JP2006507079A5 JP2004555331A JP2004555331A JP2006507079A5 JP 2006507079 A5 JP2006507079 A5 JP 2006507079A5 JP 2004555331 A JP2004555331 A JP 2004555331A JP 2004555331 A JP2004555331 A JP 2004555331A JP 2006507079 A5 JP2006507079 A5 JP 2006507079A5
Authority
JP
Japan
Prior art keywords
extensible
elastomeric
stretchable
region
strip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004555331A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006507079A (ja
JP4551768B2 (ja
Filing date
Publication date
Priority claimed from US10/301,880 external-priority patent/US7294593B2/en
Application filed filed Critical
Publication of JP2006507079A publication Critical patent/JP2006507079A/ja
Publication of JP2006507079A5 publication Critical patent/JP2006507079A5/ja
Application granted granted Critical
Publication of JP4551768B2 publication Critical patent/JP4551768B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2004555331A 2002-11-21 2003-10-17 エラストマー材料を用いた吸収性物品 Expired - Fee Related JP4551768B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/301,880 US7294593B2 (en) 2002-11-21 2002-11-21 Absorbent article material with elastomeric borders
PCT/US2003/032847 WO2004047702A1 (en) 2002-11-21 2003-10-17 Absorbent article with elastomeric material

Publications (3)

Publication Number Publication Date
JP2006507079A JP2006507079A (ja) 2006-03-02
JP2006507079A5 true JP2006507079A5 (https=) 2006-11-16
JP4551768B2 JP4551768B2 (ja) 2010-09-29

Family

ID=32324610

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004555331A Expired - Fee Related JP4551768B2 (ja) 2002-11-21 2003-10-17 エラストマー材料を用いた吸収性物品

Country Status (11)

Country Link
US (1) US7294593B2 (https=)
EP (1) EP1567108A1 (https=)
JP (1) JP4551768B2 (https=)
KR (1) KR20050084660A (https=)
CN (2) CN100506199C (https=)
AU (1) AU2003284249B2 (https=)
BR (1) BR0316079A (https=)
MX (1) MXPA05004843A (https=)
RU (1) RU2326639C2 (https=)
WO (1) WO2004047702A1 (https=)
ZA (1) ZA200503651B (https=)

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US10049913B2 (en) 2016-04-12 2018-08-14 Tokyo Electron Limited Methods for SiO2 filling of fine recessed features and selective SiO2 deposition on catalytic surfaces
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