JP2006500237A - 光学アクセラレータ及び汎用の光学渦巻 - Google Patents
光学アクセラレータ及び汎用の光学渦巻 Download PDFInfo
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/32—Micromanipulators structurally combined with microscopes
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/22—Processes or apparatus for obtaining an optical image from holograms
- G03H1/2294—Addressing the hologram to an active spatial light modulator
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/0005—Adaptation of holography to specific applications
- G03H2001/0077—Adaptation of holography to specific applications for optical manipulation, e.g. holographic optical tweezers [HOT]
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
- G03H1/0841—Encoding method mapping the synthesized field into a restricted set of values representative of the modulator parameters, e.g. detour phase coding
- G03H2001/085—Kinoform, i.e. phase only encoding wherein the computed field is processed into a distribution of phase differences
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2225/00—Active addressable light modulator
- G03H2225/30—Modulation
- G03H2225/32—Phase only
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Abstract
Description
本発明は、物体を制御するための光トラップ又は光ピンセットに関し、特に、光軸に対して横方向に延びた経路に沿って物体に制御された力を加える光トラップに関する。本発明は、広くは、光学渦巻(optical vortex)を生成及び使用するための方法及び装置にも関係し、より詳細には、各種の位相マスクの1つを使用して、商業的に利用及び応用するために目的物に対して正確に制御されたトルクを印加するために選択された光学渦巻を確立することである。
R(θ)=b/sinθ (15)
この式を式(13)に代入し、関連した位相変調を解くと、下記の式が得られる。
放物線:光軸上に中心がある
R(θ)=α/(1+cosθ) (17)
mαに依存し、組合せmα<0の場合は別のローブ
Claims (20)
- 波面が少なくともほぼ平面状である光ビームを提供するステップと、
十分大きな開口数を有するレンズを用いて光ビームを収束させて、単一ビームの勾配力を有し、横方向の光学勾配力の成分を有する光トラップを作るステップと、
前記光ビームの光軸に対して横向きの力を作用させるために前記光トラップを使用するステップと
を含む、メゾスコピックな粒子を操作する方法。 - 収束された光ビームの特性を、位相変調を用いて修正するステップをさらに含むことを特徴とする請求項1に記載の方法。
- 前記光ビームがレーザビームであることを特徴とする請求項1に記載の方法。
- 前記光トラップによって加えられた力によってメゾスコピックな物体が移送されることを特徴とする請求項1に記載の方法。
- 前記メゾスコピックな物体がナノクラスタを含むことを特徴とする請求項4に記載の方法。
- 前記メゾスコピックな物体がコロイド状の粒子を含むことを特徴とする請求項4に記載の方法。
- 前記メゾスコピックな物体が生物学的細胞を含むことを特徴とする請求項4に記載の方法。
- 光学トラッピングシステムを規定する光学系中に現れる収差を補正する方法であって、
モニター装置上に光軸を配置するステップと、
前記光学トラッピングシステムの幾何配置を確立するステップと、
前記光軸を空間光変調器の上に配置するステップと、
前記空間光変調器の上の前記光軸に対して有効な入射開口を測定するステップと、
前記光学系の中に現れる全ての収差を測定するステップと、
前記光学系の中に現れる測定された収差を補正するステップと
を含む方法。 - 前記モニター装置がビデオカメラを含むことを特徴とする請求項9に記載の方法。
- 前記測定された収差が前記光学系を再位置合わせすることによって補正されることを特徴とする請求項10に記載の方法。
- 前記測定された収差が、
補償用の位相マスクを計算するステップと、
収差を補正するために、前記補償用の位相マスクを、トラップのパターンをコード化するキノフォームに組み合わせるステップと
によって補正されることを特徴とする請求項9に記載の方法。 - 前記光学系が再位置合わせを必要とするかどうかを判断するために、前記補償用の位相マスクの複雑性が測定されることを特徴とする請求項12に記載の方法。
- 前記測定された収差が球面収差、コマ収差、非点収差、像面湾曲、歪み及びこれらの組合せから成るグループから選択されることを特徴とする請求項9に記載の方法。
- 前記収差がコンピュータ結像システムを用いて測定されることを特徴とする請求項9に記載の方法。
- 前記光学トラッピングシステムの幾何配置が、
キノフォームを前記空間光変調器に送るステップと、
トラップのアレイをコード化するステップと、
前記焦点面内の結果として生じた強度を像形成するステップと
によって識別されることを特徴とする請求項9に記載の方法。 - 前記光学トラッピングシステムの幾何配置が、各投影されたトラップの位置を各収束された光のスポットに対する強度の中心に基づいて測定することによって識別されることを特徴とする請求項9に記載の方法。
- 均一の位相パターンを前記空間光変調器に送り、前記空間光変調器に、ビームを前記モニター装置に反射する鏡面上に、回折されないビームを投影させることによって、前記光軸が前記モニター装置上に位置決めされ、前記モニター装置上のビームの位置が前記光軸の位置を規定することを特徴とする請求項9に記載の方法。
- 前記ビームがレーザビームを含むことを特徴とする請求項18に記載の方法。
- 前記レーザビームの強度が、回折されない領域が前記モニター装置を飽和させることなく前記モニター装置上に現れるように調整されることを特徴とする請求項19に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US41113202P | 2002-09-16 | 2002-09-16 | |
US45188603P | 2003-03-04 | 2003-03-04 | |
PCT/US2003/028535 WO2004025668A2 (en) | 2002-09-16 | 2003-09-11 | Optical accelerator and generalized optical vortices |
Publications (2)
Publication Number | Publication Date |
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JP2006500237A true JP2006500237A (ja) | 2006-01-05 |
JP4104599B2 JP4104599B2 (ja) | 2008-06-18 |
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JP2004571987A Expired - Fee Related JP4104599B2 (ja) | 2002-09-16 | 2003-09-11 | 光学アクセラレータ及び汎用の光学渦巻 |
Country Status (10)
Country | Link |
---|---|
US (2) | US7109473B2 (ja) |
EP (1) | EP1540666A2 (ja) |
JP (1) | JP4104599B2 (ja) |
KR (1) | KR20050050105A (ja) |
CN (1) | CN100350512C (ja) |
AU (1) | AU2003282792A1 (ja) |
CA (1) | CA2499294A1 (ja) |
HK (1) | HK1081721A1 (ja) |
RU (1) | RU2005108675A (ja) |
WO (1) | WO2004025668A2 (ja) |
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JP2015085300A (ja) * | 2013-11-01 | 2015-05-07 | 浜松ホトニクス株式会社 | 微小体制御装置 |
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TW531661B (en) * | 2000-10-06 | 2003-05-11 | Arch Dev Corp | Method of controllably filling an array of small particles, method of controllably manipulating an array of optical traps, and apparatus for controllably manipulating an array of optical traps |
US6867411B2 (en) * | 2000-10-30 | 2005-03-15 | The Charles Stark Draper Laboratory, Inc. | Optically rebalanced accelerometer |
US6936811B2 (en) * | 2000-11-13 | 2005-08-30 | Genoptix, Inc. | Method for separating micro-particles |
US20030007894A1 (en) * | 2001-04-27 | 2003-01-09 | Genoptix | Methods and apparatus for use of optical forces for identification, characterization and/or sorting of particles |
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2003
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- 2003-09-11 CN CNB038219727A patent/CN100350512C/zh not_active Expired - Fee Related
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- 2003-09-11 AU AU2003282792A patent/AU2003282792A1/en not_active Abandoned
- 2003-09-11 EP EP03774468A patent/EP1540666A2/en not_active Withdrawn
- 2003-09-11 JP JP2004571987A patent/JP4104599B2/ja not_active Expired - Fee Related
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2006
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Cited By (9)
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JP2005161514A (ja) * | 2003-10-14 | 2005-06-23 | Commiss Energ Atom | 粒子移動デバイス |
WO2009016769A1 (ja) * | 2007-08-01 | 2009-02-05 | Nalux Co., Ltd. | 光マイクロモータ |
JPWO2009016769A1 (ja) * | 2007-08-01 | 2010-10-14 | ナルックス株式会社 | 光マイクロモータ |
JP2015085300A (ja) * | 2013-11-01 | 2015-05-07 | 浜松ホトニクス株式会社 | 微小体制御装置 |
US9965867B2 (en) | 2013-11-01 | 2018-05-08 | Hamamatsu Photonics K.K. | Particle control device |
CN108345129A (zh) * | 2017-01-24 | 2018-07-31 | 波音公司 | 抗电磁效应空间光调制器 |
JP2018120207A (ja) * | 2017-01-24 | 2018-08-02 | ザ・ボーイング・カンパニーThe Boeing Company | 耐電磁効果空間光変調器 |
JP7058489B2 (ja) | 2017-01-24 | 2022-04-22 | ザ・ボーイング・カンパニー | 耐電磁効果空間光変調器 |
CN108345129B (zh) * | 2017-01-24 | 2023-06-16 | 波音公司 | 可重配置光学装置和用于生成光学涡流的方法 |
Also Published As
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KR20050050105A (ko) | 2005-05-27 |
AU2003282792A1 (en) | 2004-04-30 |
CN1682317A (zh) | 2005-10-12 |
US20050017161A1 (en) | 2005-01-27 |
WO2004025668A9 (en) | 2004-06-10 |
US20070084993A1 (en) | 2007-04-19 |
CA2499294A1 (en) | 2004-03-25 |
RU2005108675A (ru) | 2005-09-10 |
JP4104599B2 (ja) | 2008-06-18 |
EP1540666A2 (en) | 2005-06-15 |
CN100350512C (zh) | 2007-11-21 |
US7109473B2 (en) | 2006-09-19 |
US7232989B2 (en) | 2007-06-19 |
WO2004025668A2 (en) | 2004-03-25 |
WO2004025668A3 (en) | 2005-02-03 |
HK1081721A1 (en) | 2006-05-19 |
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