JP2006333454A5 - - Google Patents

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JP2006333454A5
JP2006333454A5 JP2006121399A JP2006121399A JP2006333454A5 JP 2006333454 A5 JP2006333454 A5 JP 2006333454A5 JP 2006121399 A JP2006121399 A JP 2006121399A JP 2006121399 A JP2006121399 A JP 2006121399A JP 2006333454 A5 JP2006333454 A5 JP 2006333454A5
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layer
conductive layer
semiconductor device
shape
antenna
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JP2006121399A
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JP2006333454A (en
JP4781159B2 (en
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Priority claimed from JP2006121399A external-priority patent/JP4781159B2/en
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Publication of JP2006333454A5 publication Critical patent/JP2006333454A5/ja
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Claims (12)

アンテナと、前記アンテナと電気的に接続された半導体素子を有する層とを有し、
前記アンテナは、第1の導電層、第2の導電層、および前記第1の導電層と前記第2の導電層とに挟持される誘電体層を有し、
前記誘電体層は球形、卵形、碁石状楕円球体、ラグビーボール状楕円球体、円盤状、または、円柱状もしくは多角柱状で、かつ、その外形端部は曲面を有する形状であることを特徴とする半導体装置
An antenna, and a layer having a semiconductor element electrically connected to the antenna,
The antenna has a first conductive layer, a second conductive layer, and a dielectric layer sandwiched between the first conductive layer and the second conductive layer,
The dielectric layer has a spherical shape, an oval shape, a meteorite-like ellipsoidal sphere, a rugby ball-like ellipsoidal sphere, a disc shape, or a columnar shape or a polygonal column shape, and its outer end has a curved surface. Semiconductor device .
請求項1において、
前記アンテナおよび前記半導体素子を有する層は、導電性粒子を有する樹脂層を介して前記アンテナと前記半導体素子が電気的に接続されていることを特徴とする半導体装置
In claim 1,
The antenna and the layer having the semiconductor element to a semiconductor device wherein said antenna through the resin layer semiconductor device is characterized in that it is electrically connected with the conductive particles.
アンテナと、前記アンテナと電気的に接続された半導体素子を有する層とを有し、An antenna, and a layer having a semiconductor element electrically connected to the antenna,
前記アンテナは、第1の導電層、第2の導電層、および前記第1の導電層と前記第2の導電層とに挟持される誘電体層を有し、The antenna has a first conductive layer, a second conductive layer, and a dielectric layer sandwiched between the first conductive layer and the second conductive layer,
前記誘電体層は球形、卵形、碁石状楕円球体、ラグビーボール状楕円球体、円盤状、または、円柱状もしくは多角柱状で、かつ、その外形端部は曲面を有する形状であり、The dielectric layer has a spherical shape, an oval shape, a meteorite-like ellipsoidal sphere, a rugby ball-like ellipsoidal sphere, a disc shape, or a columnar shape or a polygonal column shape, and its outer end has a curved shape,
前記半導体素子を有する層は、前記誘電体層に形成された開口部内に挿入して設けられており、The layer having the semiconductor element is provided by being inserted into an opening formed in the dielectric layer,
前記半導体素子を有する層が設けられた前記開口部は、アンダーフィルにより充填されており、The opening provided with the layer having the semiconductor element is filled with underfill,
前記半導体素子を有する層の表面に形成された接続端子は、前記アンダーフィル及び前記誘電体層の表面に形成された前記第2の導電層に電気的に接続されていることを特徴とする半導体装置。The connection terminal formed on the surface of the layer having the semiconductor element is electrically connected to the second conductive layer formed on the surface of the underfill and the dielectric layer. apparatus.
請求項3において、前記アンダーフィルは、エポキシ樹脂、アクリル樹脂又はポリイミド樹脂であることを特徴とする半導体装置。4. The semiconductor device according to claim 3, wherein the underfill is an epoxy resin, an acrylic resin, or a polyimide resin. 半導体素子を有する層と、前記半導体素子を有する層と電気的に接続された受動素子を有する層と、前記受動素子を有する層と電気的に接続されたアンテナとを有し、
前記アンテナは、第1の導電層、第2の導電層、および前記第1の導電層と前記第2の導電層とに挟持される誘電体層を有し、
前記誘電体層は球形、卵形、碁石状楕円球体、ラグビーボール状楕円球体、円盤状、または、円柱状もしくは多角柱状で、かつ、その外形端部は曲面を有する形状であることを特徴とする半導体装置
A layer having a semiconductor element, a layer having a passive element electrically connected to the layer having the semiconductor element, and an antenna electrically connected to the layer having the passive element,
The antenna has a first conductive layer, a second conductive layer, and a dielectric layer sandwiched between the first conductive layer and the second conductive layer,
The dielectric layer has a spherical shape, an oval shape, a meteorite-like ellipsoidal sphere, a rugby ball-like ellipsoidal sphere, a disc shape, a columnar shape or a polygonal column shape, and an outer end portion of the dielectric layer has a curved shape. Semiconductor device .
請求項において、
前記受動素子を有する層は、インダクタ、コンデンサ、及び抵抗の少なくとも一つ以上からなる受動素子を有することを特徴とする半導体装置
In claim 5 ,
Layer having the passive elements, an inductor, a semiconductor device and having a capacitor, and a passive element comprising at least one or more resistors.
請求項または請求項において、
前記受動素子を有する層および前記半導体素子を有する層は、導電性粒子を有する樹脂層を介して電気的に接続されていることを特徴とする半導体装置
In claim 5 or claim 6 ,
Wherein the layer having the layer and the semiconductor device having a passive element, a semiconductor device characterized by being electrically connected via the resin layer containing conductive particles.
請求項1乃至請求項のいずれか一項において、
前記半導体素子を有する層に形成された半導体素子は、有機半導体層を有することを特徴とする半導体装置
In any one of Claims 1 thru | or 7 ,
The semiconductor element formed in the layer including a semiconductor element, the semiconductor device characterized in that it comprises a organic semiconductor layer.
請求項1乃至請求項7のいずれか一項において、In any one of Claims 1 thru | or 7,
前記半導体素子を有する層は、トランジスタと、前記トランジスタを覆う絶縁層と、第3の導電層、有機化合物層及び第4の導電層を有する記憶素子とを有し、The layer including the semiconductor element includes a transistor, an insulating layer covering the transistor, and a memory element including a third conductive layer, an organic compound layer, and a fourth conductive layer.
前記絶縁層には、前記トランジスタのソース領域とドレイン領域とを露出させるコンタクトホールが形成されており、In the insulating layer, a contact hole exposing the source region and the drain region of the transistor is formed,
前記第3の導電層は、前記コンタクトホールを介して前記トランジスタのソース領域又はドレイン領域の一方に接して設けられており、The third conductive layer is provided in contact with one of a source region or a drain region of the transistor through the contact hole,
前記有機化合物層は、前記コンタクトホール内で前記第3の導電層に接して設けられており、The organic compound layer is provided in contact with the third conductive layer in the contact hole,
前記第4の導電層は、前記コンタクトホール内で前記有機化合物層に接して設けられていることを特徴とする半導体装置。The fourth conductive layer is provided in contact with the organic compound layer in the contact hole.
請求項1乃至請求項のいずれか一項において、
前記誘電体層は、アルミナ、ガラス、フォルステライト、チタン酸バリウム、チタン酸鉛、チタン酸ストロンチウム、ジルコン酸鉛、二オブ酸リチウム、及びチタン酸ジルコン鉛から選ばれる一つ又は複数で形成されることを特徴とする半導体装置
In any one of Claims 1 thru | or 9 ,
The dielectric layer is formed of one or more selected from alumina, glass, forsterite, barium titanate, lead titanate, strontium titanate, lead zirconate, lithium diobate, and lead zirconate titanate. A semiconductor device .
請求項1乃至請求項のいずれか一項において、
前記誘電体層は、エポキシ樹脂、フェノール樹脂、ポリブタジエン樹脂、ビニルベンジル、及びポリフマレートから選ばれる一つ又は複数で形成されることを特徴とする半導体装置
In any one of Claims 1 thru | or 9 ,
It said dielectric layer is an epoxy resin, phenol resin, polybutadiene resin, and wherein a is formed at one or more selected from the vinylbenzyl, and polyfumarate.
請求項1乃至請求項11のいずれか一項において、
前記半導体装置は、樹脂またはダイヤモンドライクカーボンでなる保護層によってコーティングされ、前記半導体装置と前記保護層の間に充填剤が充填されていることを特徴とする半導体装置
In any one of Claims 1 to 11 ,
The semiconductor device is coated with a protective layer made of a resin or a diamond-like carbon, and wherein a filling agent is filled between the protective layer and the semiconductor device.
JP2006121399A 2005-04-27 2006-04-26 Semiconductor device Expired - Fee Related JP4781159B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006121399A JP4781159B2 (en) 2005-04-27 2006-04-26 Semiconductor device

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Application Number Priority Date Filing Date Title
JP2005129326 2005-04-27
JP2005129326 2005-04-27
JP2006121399A JP4781159B2 (en) 2005-04-27 2006-04-26 Semiconductor device

Publications (3)

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JP2006333454A JP2006333454A (en) 2006-12-07
JP2006333454A5 true JP2006333454A5 (en) 2009-06-04
JP4781159B2 JP4781159B2 (en) 2011-09-28

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Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080061274A (en) * 2006-12-27 2008-07-02 가부시키가이샤 한도오따이 에네루기 켄큐쇼 Antenna and semiconductor device having the same
JP5828249B2 (en) * 2011-09-02 2015-12-02 凸版印刷株式会社 Non-contact IC label
JP6060489B2 (en) * 2012-02-14 2017-01-18 凸版印刷株式会社 Non-contact IC label and nameplate
JP2013179151A (en) * 2012-02-28 2013-09-09 Toshiba Corp Semiconductor package, information processing apparatus comprising the same, and storage device
JP5710558B2 (en) 2012-08-24 2015-04-30 株式会社東芝 Wireless device, information processing device and storage device including the same
JP6869649B2 (en) * 2016-06-13 2021-05-12 ラピスセミコンダクタ株式会社 Manufacturing methods for semiconductor devices, communication systems and semiconductor devices.

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0983239A (en) * 1995-09-08 1997-03-28 Matsushita Electric Ind Co Ltd Plane antenna
JPH10303640A (en) * 1997-04-25 1998-11-13 Nippon Telegr & Teleph Corp <Ntt> Antenna system
JP2000155827A (en) * 1998-09-18 2000-06-06 Hitachi Maxell Ltd Non-contact communication type semiconductor device
JP2001339239A (en) * 2000-05-29 2001-12-07 Tdk Corp Antenna unit
JP2002344146A (en) * 2001-05-15 2002-11-29 Tdk Corp High frequency module and its manufacturing method
JP3838973B2 (en) * 2002-12-26 2006-10-25 京セラ株式会社 Multilayer dielectric antenna

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