JP2006332654A5 - - Google Patents

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Publication number
JP2006332654A5
JP2006332654A5 JP2006139772A JP2006139772A JP2006332654A5 JP 2006332654 A5 JP2006332654 A5 JP 2006332654A5 JP 2006139772 A JP2006139772 A JP 2006139772A JP 2006139772 A JP2006139772 A JP 2006139772A JP 2006332654 A5 JP2006332654 A5 JP 2006332654A5
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JP
Japan
Prior art keywords
radiation
foil
euv
radiation system
reflective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006139772A
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English (en)
Japanese (ja)
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JP2006332654A (ja
Filing date
Publication date
Priority claimed from US11/133,460 external-priority patent/US7233010B2/en
Application filed filed Critical
Publication of JP2006332654A publication Critical patent/JP2006332654A/ja
Publication of JP2006332654A5 publication Critical patent/JP2006332654A5/ja
Pending legal-status Critical Current

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JP2006139772A 2005-05-20 2006-05-19 放射システム及びリソグラフィ装置 Pending JP2006332654A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/133,460 US7233010B2 (en) 2005-05-20 2005-05-20 Radiation system and lithographic apparatus

Publications (2)

Publication Number Publication Date
JP2006332654A JP2006332654A (ja) 2006-12-07
JP2006332654A5 true JP2006332654A5 (https=) 2009-10-15

Family

ID=37447506

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006139772A Pending JP2006332654A (ja) 2005-05-20 2006-05-19 放射システム及びリソグラフィ装置

Country Status (2)

Country Link
US (1) US7233010B2 (https=)
JP (1) JP2006332654A (https=)

Families Citing this family (33)

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Publication number Priority date Publication date Assignee Title
NL1008352C2 (nl) 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
TWI230847B (en) * 2002-12-23 2005-04-11 Asml Netherlands Bv Contamination barrier with expandable lamellas
SG123770A1 (en) * 2004-12-28 2006-07-26 Asml Netherlands Bv Lithographic apparatus, radiation system and filt er system
SG123767A1 (en) 2004-12-28 2006-07-26 Asml Netherlands Bv Lithographic apparatus, illumination system and filter system
US7485881B2 (en) * 2004-12-29 2009-02-03 Asml Netherlands B.V. Lithographic apparatus, illumination system, filter system and method for cooling a support of such a filter system
US7397056B2 (en) * 2005-07-06 2008-07-08 Asml Netherlands B.V. Lithographic apparatus, contaminant trap, and device manufacturing method
US7231017B2 (en) * 2005-07-27 2007-06-12 Physical Optics Corporation Lobster eye X-ray imaging system and method of fabrication thereof
US20070115443A1 (en) * 2005-11-23 2007-05-24 Asml Netherlands B.V. Radiation system and lithographic apparatus
US7332731B2 (en) * 2005-12-06 2008-02-19 Asml Netherlands, B.V. Radiation system and lithographic apparatus
US7465943B2 (en) * 2005-12-08 2008-12-16 Asml Netherlands B.V. Controlling the flow through the collector during cleaning
US7468521B2 (en) * 2005-12-28 2008-12-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7453071B2 (en) * 2006-03-29 2008-11-18 Asml Netherlands B.V. Contamination barrier and lithographic apparatus comprising same
US7368733B2 (en) * 2006-03-30 2008-05-06 Asml Netherlands B.V. Contamination barrier and lithographic apparatus comprising same
US7442948B2 (en) * 2006-05-15 2008-10-28 Asml Netherlands B.V. Contamination barrier and lithographic apparatus
US7696492B2 (en) * 2006-12-13 2010-04-13 Asml Netherlands B.V. Radiation system and lithographic apparatus
US7696493B2 (en) * 2006-12-13 2010-04-13 Asml Netherlands B.V. Radiation system and lithographic apparatus
US8071963B2 (en) * 2006-12-27 2011-12-06 Asml Netherlands B.V. Debris mitigation system and lithographic apparatus
US7724349B2 (en) * 2007-05-02 2010-05-25 Asml Netherlands B.V. Device arranged to measure a quantity relating to radiation and lithographic apparatus
US7839482B2 (en) * 2007-05-21 2010-11-23 Asml Netherlands B.V. Assembly comprising a radiation source, a reflector and a contaminant barrier
US7700930B2 (en) * 2007-09-14 2010-04-20 Asml Netherlands B.V. Lithographic apparatus with rotation filter device
EP2215527A2 (en) * 2007-11-22 2010-08-11 Philips Intellectual Property & Standards GmbH Method of increasing the operation lifetime of a collector optics arranged in an irradiation device and corresponding irradiation device
NL1036613A1 (nl) * 2008-03-03 2009-09-07 Asml Netherlands Bv Lithographic apparatus, plasma source, and reflecting method.
NL1036768A1 (nl) 2008-04-29 2009-10-30 Asml Netherlands Bv Radiation source.
EP2157481A3 (en) * 2008-08-14 2012-06-13 ASML Netherlands B.V. Radiation source, lithographic apparatus, and device manufacturing method
EP2170021B1 (en) * 2008-09-25 2015-11-04 ASML Netherlands B.V. Source module, radiation source and lithographic apparatus
US8232537B2 (en) * 2008-12-18 2012-07-31 Asml Netherlands, B.V. Radiation source, lithographic apparatus and device manufacturing method
JP5559562B2 (ja) 2009-02-12 2014-07-23 ギガフォトン株式会社 極端紫外光光源装置
WO2011033447A1 (en) 2009-09-18 2011-03-24 Koninklijke Philips Electronics N.V. Foil trap device with improved heat resistance
JP2011198609A (ja) * 2010-03-19 2011-10-06 Ushio Inc 極端紫外光光源装置における照度分布検出方法および集光光学手段の位置調整方法
US8395079B2 (en) 2010-07-12 2013-03-12 Lawrence Livermore National Security, Llc Method and system for high power reflective optical elements
US9036781B1 (en) * 2012-10-12 2015-05-19 The Boeing Company Amplified backscatter x-ray inspection system
CN107632501A (zh) * 2017-09-21 2018-01-26 武汉华星光电技术有限公司 一种烘烤装置及烘烤方法
US12158706B2 (en) 2019-07-09 2024-12-03 Asml Netherlands B.V. Lithographic apparatus and method with improved contaminant particle capture

Family Cites Families (28)

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Publication number Priority date Publication date Assignee Title
JP3601089B2 (ja) * 1994-12-08 2004-12-15 株式会社ニコン Ｘ線装置
US6541786B1 (en) * 1997-05-12 2003-04-01 Cymer, Inc. Plasma pinch high energy with debris collector
NL1008352C2 (nl) * 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
DE10138313A1 (de) * 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
US6459472B1 (en) 1998-05-15 2002-10-01 Asml Netherlands B.V. Lithographic device
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
DE10138284A1 (de) * 2001-08-10 2003-02-27 Zeiss Carl Beleuchtungssystem mit genesteten Kollektoren
AU2003255736A1 (en) 2002-07-26 2004-02-16 Bede Plc Optical device for high energy radiation
US6838684B2 (en) 2002-08-23 2005-01-04 Asml Netherlands B.V. Lithographic projection apparatus and particle barrier for use therein
SG129259A1 (en) * 2002-10-03 2007-02-26 Asml Netherlands Bv Radiation source lithographic apparatus, and device manufacturing method
US6982133B2 (en) 2002-12-21 2006-01-03 Intel Corporation Damage-resistant coatings for EUV lithography components
EP1434098B1 (en) 2002-12-23 2006-03-08 ASML Netherlands B.V. Contamination barrier with expandable lamellas
TWI230847B (en) 2002-12-23 2005-04-11 Asml Netherlands Bv Contamination barrier with expandable lamellas
US7049614B2 (en) * 2003-03-10 2006-05-23 Intel Corporation Electrode in a discharge produced plasma extreme ultraviolet source
US7217940B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Collector for EUV light source
EP1491963A3 (en) 2003-06-27 2005-08-17 ASML Netherlands B.V. Laser produced plasma radiation system with contamination barrier
EP1624467A3 (en) * 2003-10-20 2007-05-30 ASML Netherlands BV Lithographic apparatus and device manufacturing method
US7030958B2 (en) * 2003-12-31 2006-04-18 Asml Netherlands B.V. Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing method
US7567379B2 (en) * 2004-04-29 2009-07-28 Intel Corporation Technique to prevent tin contamination of mirrors and electrodes in an EUV lithography system
US7307263B2 (en) 2004-07-14 2007-12-11 Asml Netherlands B.V. Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap
US7145132B2 (en) 2004-12-27 2006-12-05 Asml Netherlands B.V. Lithographic apparatus, illumination system and debris trapping system
SG123770A1 (en) * 2004-12-28 2006-07-26 Asml Netherlands Bv Lithographic apparatus, radiation system and filt er system
US7414251B2 (en) * 2004-12-28 2008-08-19 Asml Netherlands B.V. Method for providing an operable filter system for filtering particles out of a beam of radiation, filter system, apparatus and lithographic apparatus comprising the filter system
US7453645B2 (en) * 2004-12-30 2008-11-18 Asml Netherlands B.V. Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby
US7106832B2 (en) 2005-01-10 2006-09-12 Asml Netherlands B.V. Apparatus including a radiation source, a filter system for filtering particles out of radiation emitted by the source, and a processing system for processing the radiation, a lithographic apparatus including such an apparatus, and a method of filtering particles out of radiation emitting and propagating from a radiation source
US7868304B2 (en) * 2005-02-07 2011-01-11 Asml Netherlands B.V. Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby
US7750326B2 (en) * 2005-06-13 2010-07-06 Asml Netherlands B.V. Lithographic apparatus and cleaning method therefor
US7453071B2 (en) * 2006-03-29 2008-11-18 Asml Netherlands B.V. Contamination barrier and lithographic apparatus comprising same

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