JP2006319065A - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP2006319065A
JP2006319065A JP2005138949A JP2005138949A JP2006319065A JP 2006319065 A JP2006319065 A JP 2006319065A JP 2005138949 A JP2005138949 A JP 2005138949A JP 2005138949 A JP2005138949 A JP 2005138949A JP 2006319065 A JP2006319065 A JP 2006319065A
Authority
JP
Japan
Prior art keywords
liquid
exposed
wafer
exposure apparatus
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2005138949A
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English (en)
Japanese (ja)
Other versions
JP2006319065A5 (enExample
Inventor
Yuichi Iwasaki
裕一 岩▲崎▼
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005138949A priority Critical patent/JP2006319065A/ja
Publication of JP2006319065A publication Critical patent/JP2006319065A/ja
Publication of JP2006319065A5 publication Critical patent/JP2006319065A5/ja
Withdrawn legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005138949A 2005-05-11 2005-05-11 露光装置 Withdrawn JP2006319065A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005138949A JP2006319065A (ja) 2005-05-11 2005-05-11 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005138949A JP2006319065A (ja) 2005-05-11 2005-05-11 露光装置

Publications (2)

Publication Number Publication Date
JP2006319065A true JP2006319065A (ja) 2006-11-24
JP2006319065A5 JP2006319065A5 (enExample) 2008-08-07

Family

ID=37539476

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005138949A Withdrawn JP2006319065A (ja) 2005-05-11 2005-05-11 露光装置

Country Status (1)

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JP (1) JP2006319065A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010251745A (ja) * 2009-04-10 2010-11-04 Asml Netherlands Bv 液浸リソグラフィ装置及びデバイス製造方法
US8045138B2 (en) 2007-08-27 2011-10-25 Canon Kabushiki Kaisha Support plate, exposure apparatus having the support plate, and a device manufacturing method using the exposure apparatus
JP2014060217A (ja) * 2012-09-14 2014-04-03 Nikon Corp 露光装置、露光方法、デバイス製造方法
JP2017161944A (ja) * 2017-06-07 2017-09-14 株式会社ニコン 露光装置、露光方法、デバイス製造方法
JP2019032552A (ja) * 2018-10-10 2019-02-28 株式会社ニコン 露光装置、露光方法、デバイス製造方法

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8045138B2 (en) 2007-08-27 2011-10-25 Canon Kabushiki Kaisha Support plate, exposure apparatus having the support plate, and a device manufacturing method using the exposure apparatus
JP2010251745A (ja) * 2009-04-10 2010-11-04 Asml Netherlands Bv 液浸リソグラフィ装置及びデバイス製造方法
JP2013051444A (ja) * 2009-04-10 2013-03-14 Asml Netherlands Bv 液浸リソグラフィ装置、シャッター部材、および基板テーブル
US8993220B2 (en) 2009-04-10 2015-03-31 Asml Netherlands B.V. Immersion lithographic apparatus and a device manufacturing method
JP2014060217A (ja) * 2012-09-14 2014-04-03 Nikon Corp 露光装置、露光方法、デバイス製造方法
JP2017161944A (ja) * 2017-06-07 2017-09-14 株式会社ニコン 露光装置、露光方法、デバイス製造方法
JP2019032552A (ja) * 2018-10-10 2019-02-28 株式会社ニコン 露光装置、露光方法、デバイス製造方法

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