JP2006307305A5 - - Google Patents

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Publication number
JP2006307305A5
JP2006307305A5 JP2005134206A JP2005134206A JP2006307305A5 JP 2006307305 A5 JP2006307305 A5 JP 2006307305A5 JP 2005134206 A JP2005134206 A JP 2005134206A JP 2005134206 A JP2005134206 A JP 2005134206A JP 2006307305 A5 JP2006307305 A5 JP 2006307305A5
Authority
JP
Japan
Prior art keywords
sputtering
gas
target
introduction means
gas introduction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005134206A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006307305A (ja
JP4613092B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005134206A priority Critical patent/JP4613092B2/ja
Priority claimed from JP2005134206A external-priority patent/JP4613092B2/ja
Publication of JP2006307305A publication Critical patent/JP2006307305A/ja
Publication of JP2006307305A5 publication Critical patent/JP2006307305A5/ja
Application granted granted Critical
Publication of JP4613092B2 publication Critical patent/JP4613092B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP2005134206A 2005-05-02 2005-05-02 成膜装置 Expired - Lifetime JP4613092B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005134206A JP4613092B2 (ja) 2005-05-02 2005-05-02 成膜装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005134206A JP4613092B2 (ja) 2005-05-02 2005-05-02 成膜装置

Publications (3)

Publication Number Publication Date
JP2006307305A JP2006307305A (ja) 2006-11-09
JP2006307305A5 true JP2006307305A5 (enrdf_load_stackoverflow) 2008-06-26
JP4613092B2 JP4613092B2 (ja) 2011-01-12

Family

ID=37474518

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005134206A Expired - Lifetime JP4613092B2 (ja) 2005-05-02 2005-05-02 成膜装置

Country Status (1)

Country Link
JP (1) JP4613092B2 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100927621B1 (ko) 2007-03-22 2009-11-20 삼성에스디아이 주식회사 보호막층을 증착시키는 장치와, 이를 이용한 증착 방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000017457A (ja) * 1998-07-03 2000-01-18 Shincron:Kk 薄膜形成装置および薄膜形成方法
JP2004277799A (ja) * 2003-03-14 2004-10-07 Matsushita Electric Ind Co Ltd 成膜装置およびそのクリーニング方法
JP2006176823A (ja) * 2004-12-22 2006-07-06 Ulvac Japan Ltd 成膜装置
JP4664061B2 (ja) * 2004-12-22 2011-04-06 株式会社アルバック 成膜装置および成膜方法

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