JP2007294190A5 - - Google Patents

Download PDF

Info

Publication number
JP2007294190A5
JP2007294190A5 JP2006119483A JP2006119483A JP2007294190A5 JP 2007294190 A5 JP2007294190 A5 JP 2007294190A5 JP 2006119483 A JP2006119483 A JP 2006119483A JP 2006119483 A JP2006119483 A JP 2006119483A JP 2007294190 A5 JP2007294190 A5 JP 2007294190A5
Authority
JP
Japan
Prior art keywords
electrode
fixing plate
holes
screwed
optical window
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006119483A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007294190A (ja
JP4860336B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006119483A priority Critical patent/JP4860336B2/ja
Priority claimed from JP2006119483A external-priority patent/JP4860336B2/ja
Publication of JP2007294190A publication Critical patent/JP2007294190A/ja
Publication of JP2007294190A5 publication Critical patent/JP2007294190A5/ja
Application granted granted Critical
Publication of JP4860336B2 publication Critical patent/JP4860336B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2006119483A 2006-04-24 2006-04-24 真空処理装置 Expired - Fee Related JP4860336B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006119483A JP4860336B2 (ja) 2006-04-24 2006-04-24 真空処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006119483A JP4860336B2 (ja) 2006-04-24 2006-04-24 真空処理装置

Publications (3)

Publication Number Publication Date
JP2007294190A JP2007294190A (ja) 2007-11-08
JP2007294190A5 true JP2007294190A5 (enrdf_load_stackoverflow) 2009-06-04
JP4860336B2 JP4860336B2 (ja) 2012-01-25

Family

ID=38764608

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006119483A Expired - Fee Related JP4860336B2 (ja) 2006-04-24 2006-04-24 真空処理装置

Country Status (1)

Country Link
JP (1) JP4860336B2 (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101235796B1 (ko) * 2010-09-28 2013-02-21 한국표준과학연구원 투시창 세정 장치, 투시창 세정 방법, 및 공정 모니터링 방법
CN102586753A (zh) * 2012-03-21 2012-07-18 中微半导体设备(上海)有限公司 Mocvd设备的清洁方法
US11389840B2 (en) * 2018-06-27 2022-07-19 National Institute Of Advanced Industrial Science And Technology Cleaning apparatus for optical window, engine, and method for cleaning optical window of engine
US12201037B2 (en) 2019-11-06 2025-01-14 International Business Machines Corporation Cluster tool for production-worthy fabrication of Dolan bridge quantum Josephson junction devices

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1996025834A1 (fr) * 1995-02-17 1996-08-22 Hitachi, Ltd. Appareil de traitement du plasma
JP3727518B2 (ja) * 2000-07-24 2005-12-14 松下電器産業株式会社 プラズマ処理装置及びプラズマクリーニング方法
JP2004526293A (ja) * 2000-09-21 2004-08-26 アプライド マテリアルズ インコーポレイテッド チャンバ内の表面上へのプロセス残留分の堆積を減少させる装置及び方法
JP2003264172A (ja) * 2002-03-07 2003-09-19 New Japan Radio Co Ltd プラズマ処理装置

Similar Documents

Publication Publication Date Title
TW200722717A (en) Multi-function laser induced breakdown spectroscopy and laser ablation material analysis system and method
JP2007294190A5 (enrdf_load_stackoverflow)
WO2008120459A1 (ja) プラズマ処理装置及びプラズマ処理方法
WO2008091242A3 (en) Systems and methods of laser texturing and crystallization of material surfaces
BRPI0506900B8 (pt) processo e dispositivo de esterilização a vácuo
WO2007120521A3 (en) Lazer-driven light source
JP2005502211A5 (enrdf_load_stackoverflow)
WO2002084701A3 (en) Plasma reactor electrode
TW200503087A (en) Plasma ashing apparatus and endpoint detection process
JP2008518480A5 (enrdf_load_stackoverflow)
JP2005502209A5 (enrdf_load_stackoverflow)
DE69914954D1 (de) Aus substrathaltigen gasgemischen aethanol erzeugende clostridium stamme
EP1946054A4 (en) IMPROVED SPECTRAL METROLOGY FOR A HIGH REPEAT SPEED GAS DISCHARGE LASER
JP2006148095A5 (enrdf_load_stackoverflow)
MY139113A (en) Methods of etching photoresist on substrates
TW200718809A (en) Plasma etching of tapered structures
GB0029218D0 (en) Improvements relating to gas discharge spectroscopy
TW200734494A (en) Microwave plasma abatement apparatus
JP2009503448A5 (enrdf_load_stackoverflow)
KR20050032544A (en) Plasma scrubber for elimination of waste cleaning gases emitted from semiconductor industries
WO2007053553A3 (en) Method and system for forming a nitrided germanium-containing layer using plasma processing
WO2008063602A3 (en) Laser system employing harmonic generation
WO2007053269A3 (en) Method and system for forming a nitrided germanium-containing layer using plasma processing
WO2005090638A8 (en) Remote chamber methods for removing surface deposits
WO2006094927A3 (de) Kaltkathoden-drucksensor