JP2007294190A5 - - Google Patents
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- JP2007294190A5 JP2007294190A5 JP2006119483A JP2006119483A JP2007294190A5 JP 2007294190 A5 JP2007294190 A5 JP 2007294190A5 JP 2006119483 A JP2006119483 A JP 2006119483A JP 2006119483 A JP2006119483 A JP 2006119483A JP 2007294190 A5 JP2007294190 A5 JP 2007294190A5
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- JP
- Japan
- Prior art keywords
- electrode
- fixing plate
- holes
- screwed
- optical window
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
図３に示すように。ＲＦ電極３０の例えば６つのねじ孔３１には、電極押さえ板５０の６つの孔５１を介してボルト７０が螺合されることで、ＲＦ電極３０と電極押さえ板５０とが固定される。また、石英ガラス固定板４０の例えば８つのねじ孔４１には、ＲＦ電極固定板６０の孔６１を介してボルト７１が螺合することで、石英ガラス固定板４０とＲＦ電極固定板６０とが固定される。さらに、チャンバー壁１２に設けた例えば８つのねじ孔１１には、ＲＦ電極固定板６０の孔６３を介してボルト（図示せず）が螺合されることで、ＲＦ電極固定板６０がチャンバー壁１２に固定される。この構造により、ＲＦ電極３０は他の金属部材１２，４０，６０と絶縁されて、光学窓２０に保持される。 As shown in FIG. For example, the bolt 70 is screwed into the six screw holes 31 of the RF electrode 30 through the six holes 51 of the electrode pressing plate 50, whereby the RF electrode 30 and the electrode pressing plate 50 are fixed. Further, the bolt 71 is screwed into the eight screw holes 41 of the quartz glass fixing plate 40 through the holes 61 of the RF electrode fixing plate 60, so that the quartz glass fixing plate 40 and the RF electrode fixing plate 60 are connected. Fixed. Further, the example 8 screw holes 11 provided in the chamber wall 12, (not shown) bolts through the holes 63 of the RF electrode fixing plate 60 that is screwed, RF electrode fixing plate 60 is the chamber wall 12 is fixed. With this structure, the RF electrode 30 is insulated from the other metal members 12, 40, 60 and held by the optical window 20.
このとき、光学窓２０付近に生成される酸素プラズマまたは窒素プラズマのトリガーとして、ＫｒＦエキシマレーザを好適に用いることができる。なお、本発明ではレーザ波長はエキシマレーザに限定されるものではなく、他の波長であってもよく、好ましくは紫外線レーザであると良い。また、ガス導入管１３０を介して光学窓２０付近に導入されるガスの種類についても、好ましくは酸素または窒素であるが、これらに限定されない。 At this time, a KrF excimer laser can be suitably used as a trigger for oxygen plasma or nitrogen plasma generated near the optical window 20. In the present invention, the laser wavelength is not limited to the excimer laser, but may be other wavelengths, preferably an ultraviolet laser. Further, the kind of gas introduced into the vicinity of the optical window 20 through the gas introduction pipe 130 is preferably oxygen or nitrogen, but is not limited thereto.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006119483A JP4860336B2 (en) | 2006-04-24 | 2006-04-24 | Vacuum processing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006119483A JP4860336B2 (en) | 2006-04-24 | 2006-04-24 | Vacuum processing equipment |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007294190A JP2007294190A (en) | 2007-11-08 |
| JP2007294190A5 true JP2007294190A5 (en) | 2009-06-04 |
| JP4860336B2 JP4860336B2 (en) | 2012-01-25 |
Family
ID=38764608
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006119483A Expired - Fee Related JP4860336B2 (en) | 2006-04-24 | 2006-04-24 | Vacuum processing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4860336B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101235796B1 (en) * | 2010-09-28 | 2013-02-21 | 한국표준과학연구원 | Optical window cleaning apparatus, optical window cleaning method, and process monitoring method |
| CN102586753A (en) * | 2012-03-21 | 2012-07-18 | 中微半导体设备(上海)有限公司 | Method for cleaning metal organic chemical vapor deposition (MOCVD) device |
| JP6980319B2 (en) * | 2018-06-27 | 2021-12-15 | 国立研究開発法人産業技術総合研究所 | Optical window cleaning device, engine and its optical window cleaning method |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1996025834A1 (en) * | 1995-02-17 | 1996-08-22 | Hitachi, Ltd. | Plasma processing apparatus |
| JP3727518B2 (en) * | 2000-07-24 | 2005-12-14 | 松下電器産業株式会社 | Plasma processing apparatus and plasma cleaning method |
| KR20030038763A (en) * | 2000-09-21 | 2003-05-16 | 어플라이드 머티어리얼즈 인코포레이티드 | Reducing deposition of process residues on a surface in a chamber |
| JP2003264172A (en) * | 2002-03-07 | 2003-09-19 | New Japan Radio Co Ltd | Plasma processor |
-
2006
- 2006-04-24 JP JP2006119483A patent/JP4860336B2/en not_active Expired - Fee Related
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