JP2006295208A - Semiconductor integrated circuit - Google Patents

Semiconductor integrated circuit Download PDF

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Publication number
JP2006295208A
JP2006295208A JP2006174056A JP2006174056A JP2006295208A JP 2006295208 A JP2006295208 A JP 2006295208A JP 2006174056 A JP2006174056 A JP 2006174056A JP 2006174056 A JP2006174056 A JP 2006174056A JP 2006295208 A JP2006295208 A JP 2006295208A
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Prior art keywords
connection
integrated circuit
semiconductor integrated
semiconductor chip
wiring
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Hiroyuki Nakanishi
宏之 中西
Toshiya Ishio
俊也 石尾
Katsunobu Mori
勝信 森
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Sharp Corp
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Sharp Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16135Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/16145Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/73Means for bonding being of different types provided for in two or more of groups H01L24/10, H01L24/18, H01L24/26, H01L24/34, H01L24/42, H01L24/50, H01L24/63, H01L24/71
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/191Disposition
    • H01L2924/19101Disposition of discrete passive components
    • H01L2924/19102Disposition of discrete passive components in a stacked assembly with the semiconductor or solid state device
    • H01L2924/19104Disposition of discrete passive components in a stacked assembly with the semiconductor or solid state device on the semiconductor or solid-state device, i.e. passive-on-chip

Abstract

<P>PROBLEM TO BE SOLVED: To reduce the number of components on a printed circuit by mounting a plurality of discrete electronic components on a semiconductor chip. <P>SOLUTION: The surface of the semiconductor chip in which a plurality of connection electrodes are provided is covered with a lower insulating film so that the connection electrodes are exposed. A plurality of wiring patterns, in which one end is connected to the connection electrodes and a connection part for the components is provided in the other end, are formed on the lower insulating film. The wiring patterns are covered with an upper insulating film so that the connection part for the components is exposed. The discrete electronic components are connected between different connection parts for the components. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、半導体集積回路に関し、さらに詳しくは、電子機器に搭載、内蔵される半導体集積回路に関する。   The present invention relates to a semiconductor integrated circuit, and more particularly to a semiconductor integrated circuit that is mounted and built in an electronic device.

近年、携帯電話のような小型電子機器の分野では、内部に搭載される電子部品の小型化、高機能化、高密度化、高密度実装化が図られている。また、機器の小型化を図るため、できるだけ少ない電子部品で機器を構成することも研究されており、これに応じて、従来では別々のパッケージに収納していた複数の半導体集積回路(以下「IC」ともいう)を、一個のパッケージに収納することも行われている。   2. Description of the Related Art In recent years, in the field of small electronic devices such as mobile phones, electronic components mounted inside have been reduced in size, functionality, density, and density. In addition, in order to reduce the size of the device, it has been studied to configure the device with as few electronic components as possible, and in response to this, a plurality of semiconductor integrated circuits (hereinafter referred to as “ICs”) that are conventionally housed in separate packages. Are also housed in a single package.

この一例として、特許文献1に記載のような構造の半導体装置が知られている。この半導体装置では、半導体チップに並設した導電板上にディスクリート電子部品を接着固定することで、半導体チップとディスクリート電子部品とを一個のパッケージに収納した構造となっている。この構造を図9(a)および図9(b)に示す。図9(b)は図9(a)のD−D断面を示している。   As an example of this, a semiconductor device having a structure as described in Patent Document 1 is known. This semiconductor device has a structure in which the semiconductor chip and the discrete electronic component are accommodated in one package by bonding and fixing the discrete electronic component on a conductive plate arranged in parallel with the semiconductor chip. This structure is shown in FIGS. 9 (a) and 9 (b). FIG. 9B shows a DD cross section of FIG.

この半導体装置は、半導体チップ81上に絶縁層82を設け、その上に2枚の導電板83,84を並設し、この上に導電性接着剤86によりディスクリート電子部品85を接着固定している。そして、各部の電極等をリード端子87に電気的に接続し、その周囲を樹脂封止部88で覆うことで、基板への実装密着の優れた半導体パッケージを形成した構造となっている。   In this semiconductor device, an insulating layer 82 is provided on a semiconductor chip 81, two conductive plates 83 and 84 are provided side by side, and a discrete electronic component 85 is bonded and fixed thereon with a conductive adhesive 86. Yes. Then, an electrode of each part is electrically connected to the lead terminal 87, and the periphery thereof is covered with a resin sealing part 88, so that a semiconductor package excellent in close contact with the substrate is formed.

また、小型半導体装置の代表例として、図10(a)および図10(b)に示すような、パッケージのサイズが半導体チップと同じサイズとなっているCSP(Chip Size Package:チップ・サイズ・パッケージ)の一種の半導体装置が知られている。図10(b)は図10(a)のE−E断面である。   As a representative example of a small semiconductor device, a CSP (Chip Size Package) as shown in FIG. 10A and FIG. 10B has the same package size as the semiconductor chip. ) Type of semiconductor device is known. FIG.10 (b) is the EE cross section of Fig.10 (a).

この半導体装置91は、複数の電極パッド93が設けられた半導体チップ92の表面を、電極パッド93が露出されるように第1絶縁層94で被覆し、第1絶縁層94上に、一端が電極パッド93に接続されるとともに他端に外部端子用電極パッド97が設けられた複数の配線パターン95を形成し、配線パターン95を、外部端子用電極パッド97が露出されるように第2絶縁層96で被覆し、外部端子用電極パッド97上にハンダバンプからなる外部接続用端子99を形成した構造となっている。   In this semiconductor device 91, the surface of a semiconductor chip 92 provided with a plurality of electrode pads 93 is covered with a first insulating layer 94 so that the electrode pads 93 are exposed, and one end is formed on the first insulating layer 94. A plurality of wiring patterns 95 connected to the electrode pads 93 and provided with external terminal electrode pads 97 at the other end are formed, and the wiring patterns 95 are second insulated so that the external terminal electrode pads 97 are exposed. The external connection terminal 99 made of solder bumps is formed on the external terminal electrode pad 97 by covering with the layer 96.

特開平5−21698号公報JP-A-5-21698

しかしながら、図9(a)および図9(b)で示した半導体装置では、導電板83,84を半導体チップ81に取り付けるために、接着剤としてのポリイミド等からなる絶縁性シート82を半導体チップ81に貼り付け、それにCuからなる導電板83,84を貼り付ける工程が必要であり、この作業が難しいという問題がある。すなわち、機械的動作で、接着剤を介して0.5mm角以下の板状の物体を貼り付ける作業は難しく、特に複数枚の導電板を密な状態で貼り付けるのは極めて困難である。   However, in the semiconductor device shown in FIGS. 9A and 9B, in order to attach the conductive plates 83 and 84 to the semiconductor chip 81, an insulating sheet 82 made of polyimide or the like as an adhesive is used. And a process of attaching the conductive plates 83 and 84 made of Cu to the substrate is necessary, and this work is difficult. That is, it is difficult to attach a plate-like object having a size of 0.5 mm square or less via an adhesive by mechanical operation, and it is particularly difficult to attach a plurality of conductive plates in a dense state.

小型電子機器に使用されている0.5×0.8mmサイズのディスクリート電子部品を実装するには、理論的には、0.7×1.0mmの領域に実装用導電部が2箇所あれば十分である。しかし、図9では、2枚の導電板83,84が半導体チップ81の7〜8割を占めている。これは、導電板83,84の取り扱いを容易にし、接地電極または電源電極に接続する際のワイヤーを短くするために、導電板83,84を大きくしているものと思われる。   Theoretically, in order to mount a discrete electronic component of 0.5 × 0.8 mm size used in a small electronic device, if there are two conductive portions for mounting in a 0.7 × 1.0 mm region, It is enough. However, in FIG. 9, the two conductive plates 83 and 84 occupy 70 to 80% of the semiconductor chip 81. This seems to be because the conductive plates 83 and 84 are enlarged in order to facilitate the handling of the conductive plates 83 and 84 and to shorten the wire when connecting to the ground electrode or the power supply electrode.

本発明は、このような事情を考慮してなされたもので、半導体チップ上にディスクリート電子部品を複数個搭載して、プリント配線板上の部品点数を削減するようにした半導体集積回路を提供するものである。   The present invention has been made in view of such circumstances, and provides a semiconductor integrated circuit in which a plurality of discrete electronic components are mounted on a semiconductor chip to reduce the number of components on a printed wiring board. Is.

本発明は、複数の接続電極が表面に設けられた半導体チップと、接続電極が露出されるように半導体チップの表面を被覆する下部絶縁層と、下部絶縁層上に形成され一端が接続電極に接続されるとともに他端に部品用接続部が設けられた複数の配線部と、部品用接続部が露出されるように配線部を被覆する上部絶縁層と、異なる部品用接続部間に接続された電子部品とを備えてなる半導体集積回路である。   The present invention provides a semiconductor chip having a plurality of connection electrodes provided on the surface, a lower insulating layer covering the surface of the semiconductor chip so that the connection electrodes are exposed, and one end formed on the lower insulating layer. Connected between a plurality of wiring parts that are connected and provided with a part connection part at the other end, an upper insulating layer that covers the wiring part so that the part connection part is exposed, and a connection part for different parts And a semiconductor integrated circuit.

本発明によれば、半導体チップの表面に、部品用接続部を設けた配線部を形成し、異なる部品用接続部間に電子部品を接続した構成としたので、半導体チップの表面に電子部品を搭載したものを一つの半導体集積回路としてパッケージ化することができる。   According to the present invention, since the wiring portion provided with the component connection portion is formed on the surface of the semiconductor chip and the electronic component is connected between the different component connection portions, the electronic component is placed on the surface of the semiconductor chip. The mounted one can be packaged as one semiconductor integrated circuit.

別の観点によれば、本発明は、複数の接続電極が表面に設けられた半導体チップと、接続電極が露出されるように半導体チップの表面を被覆する下部絶縁層と、下部絶縁層上に形成され、一端が接続電極に接続されるとともに、他端もしくは一端と他端の途中に部品用接続部または/および外部端子用接続部が設けられた複数の配線部と、部品用接続部および外部端子用接続部が露出されるように配線部を被覆する上部絶縁層と、異なる部品用接続部間に接続された電子部品と、電子部品が接続された半導体チップ面と同一面に存在する外部端子用接続部に形成された外部接続端子とを備え、半導体チップに接続された電子部品は、その接続後の高さが外部接続端子よりも低いことを特徴とする半導体集積回路である。   According to another aspect, the present invention provides a semiconductor chip having a plurality of connection electrodes provided on the surface, a lower insulating layer that covers the surface of the semiconductor chip so that the connection electrodes are exposed, and a lower insulating layer on the lower insulating layer. A plurality of wiring portions each having one end connected to the connection electrode and the other end or one end and the other end provided with a component connection portion or / and an external terminal connection portion; and a component connection portion; The upper insulating layer that covers the wiring portion so that the external terminal connection portion is exposed, the electronic component connected between the different component connection portions, and the semiconductor chip surface to which the electronic component is connected exist. An electronic component including an external connection terminal formed in the external terminal connection portion and connected to the semiconductor chip is a semiconductor integrated circuit characterized in that a height after the connection is lower than that of the external connection terminal.

本発明において、半導体チップは、複数の接続電極が表面に設けられたものであればよい。接続電極とは、ワイヤーでリード端子とボンディグ接合される、通常電極パッドと呼ばれる部分を意味する。半導体チップは、どのような半導体チップであってもよく、例えば、Si等の14族(旧IV族・日本式)半導体あるいは化合物半導体などの各種の半導体基板(ウェーハ)に集積回路を形成してダイシングした、一般に半導体チップと呼ばれるものであればよい。   In the present invention, the semiconductor chip only needs to have a plurality of connection electrodes provided on the surface. The connection electrode means a portion usually called an electrode pad that is bonded to a lead terminal by a wire. The semiconductor chip may be any semiconductor chip. For example, an integrated circuit is formed on various semiconductor substrates (wafers) such as a group 14 (former group IV / Japanese) semiconductor such as Si or a compound semiconductor. What is necessary is just what is generally called a semiconductor chip diced.

下部絶縁層および上部絶縁層は、形成作業の容易性、およびコストの点から、有機系のポリマーを用いて形成することが望ましい。このポリマーとしては、例えばポリイミドなどが挙げられる。接続電極が露出されるようにするためには、パターニングが必要であるが、そのためには感光性のポリマーを用いてもよい。また非感光性のポリマーを形成し、それを感光性のレジストでパターニングしてもよい。   The lower insulating layer and the upper insulating layer are preferably formed using an organic polymer from the viewpoint of ease of forming work and cost. An example of this polymer is polyimide. In order to expose the connection electrode, patterning is necessary. For this purpose, a photosensitive polymer may be used. Further, a non-photosensitive polymer may be formed and patterned with a photosensitive resist.

配線部は、一般に配線パターンと呼ばれるものであり、各種のエッチングや電解メッキで形成した各種の配線パターンを含むものである。   The wiring portion is generally called a wiring pattern, and includes various wiring patterns formed by various etching and electrolytic plating.

電子部品は、一般にディスクリート電子部品と呼ばれるものであり、異なる部品用接続部間に接続される。部品用接続部は、通常表面に金メッキが施されていることが多く、ディスクリート電子部品を異なる部品用接続部間に接続するには、部品用接続部にハンダペーストを載せてその上にディスクリート電子部品を置き、リフロー炉などを通してリフローすることにより接続することができる。   The electronic component is generally called a discrete electronic component and is connected between different component connection portions. The connection part for parts is usually gold-plated on the surface, and in order to connect discrete electronic parts between different part connection parts, solder paste is placed on the connection parts for parts and the discrete electronics are placed on the parts. Parts can be placed and connected by reflowing through a reflow oven or the like.

本発明によれば、小さなディスクリート電子部品を半導体チップ上に複数個搭載することができるので、プリント配線板上の部品点数削減に寄与できる。   According to the present invention, since a plurality of small discrete electronic components can be mounted on a semiconductor chip, it is possible to contribute to a reduction in the number of components on the printed wiring board.

以下、本発明の実施の形態を図1〜図8に基づき説明する。なお、これによって本発明が限定されるものではない。   Hereinafter, embodiments of the present invention will be described with reference to FIGS. Note that the present invention is not limited thereby.

実施形態1
図1(a)および図1(b)は本発明の半導体集積回路の実施形態1を示す説明図である。図1(b)は図1(a)のA−A断面を示している。
半導体集積回路1は、電極パッド(第1の接続部)3が設けられた半導体チップ(「ICチップ」ともいう)2、下部絶縁膜(下部絶縁層)4、配線(配線部)5、上部絶縁膜(上部絶縁層)6、部品接続端子(第2の接続部)7、ディスクリート電子部品8から構成されている。
Embodiment 1
FIG. 1A and FIG. 1B are explanatory views showing Embodiment 1 of the semiconductor integrated circuit of the present invention. FIG.1 (b) has shown the AA cross section of Fig.1 (a).
A semiconductor integrated circuit 1 includes a semiconductor chip (also referred to as an “IC chip”) 2 provided with electrode pads (first connection portions) 3, a lower insulating film (lower insulating layer) 4, wiring (wiring portions) 5, an upper portion An insulating film (upper insulating layer) 6, a component connection terminal (second connection portion) 7, and a discrete electronic component 8 are configured.

半導体チップ2の表面の端部には、複数の電極パッド3が設けられている。半導体チップ2の表面は、電極パッド3の部分を除いて、下部絶縁膜4により被覆されている。下部絶縁膜4の上には複数の配線5が形成されている。配線5の一端は電極パッド3に接続され、他端には接続用パッドが設けられ、接続用パッドの上にハンダからなる部品接続端子7が形成されている。   A plurality of electrode pads 3 are provided at the end of the surface of the semiconductor chip 2. The surface of the semiconductor chip 2 is covered with a lower insulating film 4 except for the electrode pads 3. A plurality of wirings 5 are formed on the lower insulating film 4. One end of the wiring 5 is connected to the electrode pad 3, the other end is provided with a connection pad, and a component connection terminal 7 made of solder is formed on the connection pad.

配線5は、部品接続端子7の形成された接続用パッドの部分を除いて、上部絶縁膜6により被覆されている。ディスクリート電子部品8は、異なる配線5の部品接続端子7間に接続されている。   The wiring 5 is covered with the upper insulating film 6 except for the portion of the connection pad where the component connection terminals 7 are formed. The discrete electronic component 8 is connected between the component connection terminals 7 of different wirings 5.

図2(a)〜図2(e)は本実施形態の半導体集積回路の製造プロセスを示す説明図である。これらの図に基づいて製造プロセスを説明する。
半導体チップ2は、シリコン(Si)をベースとし、内部に集積回路が形成されたものである。この半導体チップ2には、金属でできたワイヤーがボンディング接合される電極パッド3が設けられている。
2A to 2E are explanatory views showing a manufacturing process of the semiconductor integrated circuit of the present embodiment. The manufacturing process will be described based on these drawings.
The semiconductor chip 2 is based on silicon (Si) and has an integrated circuit formed therein. The semiconductor chip 2 is provided with an electrode pad 3 to which a wire made of metal is bonded.

まず、半導体チップ2の表面を、電極パッド3の部分を除いて、厚さ5μmのポリイミドの下部絶縁膜4で覆う(図2(a)参照)。下部絶縁膜4の下には、図示していないが、SiO2やSiN等の絶縁膜が存在する。 First, the surface of the semiconductor chip 2 is covered with a polyimide lower insulating film 4 having a thickness of 5 μm except for the electrode pad 3 (see FIG. 2A). Although not shown, an insulating film such as SiO 2 or SiN exists under the lower insulating film 4.

次に、下部絶縁膜4の上に、配線5をメッキで形成する。この配線5は、電極パッド3からディスクリート電子部品8が搭載される部分にかけて、電気的に導通のとれるパターンを形成している(図2(b)参照)。   Next, the wiring 5 is formed on the lower insulating film 4 by plating. The wiring 5 forms an electrically conductive pattern from the electrode pad 3 to the portion where the discrete electronic component 8 is mounted (see FIG. 2B).

この配線5の具体的形成方法を説明する。まず、電極パッド3と下部絶縁膜4の上、つまり半導体チップ2の全面に、チタンタングステン(TiW)と銅(Cu)を順に、各々約0.1μmの厚みになるようスパッター処理にて形成する。次に、銅の上に感光性レジストを10μmの厚さで塗布し、マスクを介して露光し、現像を行うことにより、配線5を形成する部分の溝を形成する(図示せず)。その溝に電解メッキにより、厚さ5μmの銅を析出させ、先の感光性レジストを化学的に剥離し、表面に露出した銅とチタンタングステンのスパッター膜を除去することで、独立した銅の配線5を形成する。   A specific method for forming the wiring 5 will be described. First, titanium tungsten (TiW) and copper (Cu) are sequentially formed on the electrode pad 3 and the lower insulating film 4, that is, on the entire surface of the semiconductor chip 2 by sputtering so as to have a thickness of about 0.1 μm. . Next, a photosensitive resist is applied on copper to a thickness of 10 μm, exposed through a mask, and developed to form a groove in a portion for forming the wiring 5 (not shown). Independent copper wiring by depositing 5μm thick copper into the groove by chemical plating, chemically stripping the photosensitive resist and removing the sputtered copper and titanium tungsten exposed on the surface. 5 is formed.

次に、配線5と下部絶縁膜4の上、つまり半導体チップ2の全面に、感光性ポリマーを10μmの厚さで塗布し、ディスクリート電子部品8が搭載される部分、つまり接続用パッドの部分が露出されるように、マスクを介して露光し、現像を行うことで、上部絶縁膜6を形成する(図2(c)参照)。   Next, a photosensitive polymer is applied to the thickness of 10 μm on the wiring 5 and the lower insulating film 4, that is, the entire surface of the semiconductor chip 2, and a portion where the discrete electronic component 8 is mounted, that is, a connection pad portion is formed. The upper insulating film 6 is formed by exposing through a mask and developing so as to be exposed (see FIG. 2C).

なお、感光性ポリマーを使用せず、非感光性のポリマーと感光性レジストを使用してもよい。すなわち、非感光性のポリマーを塗布し、その上に感光性レジストを塗布し、マスクを介して露光し、現像を行うことで、感光性レジストと非感光性ポリマーに対して同時に、ディスクリート電子部品接続用の開口(接続用パッド)を形成してもよい。この方法でも同一の構造が得られる。   In addition, a non-photosensitive polymer and a photosensitive resist may be used without using a photosensitive polymer. That is, by applying a non-photosensitive polymer, applying a photosensitive resist thereon, exposing through a mask, and developing, the discrete electronic component is simultaneously applied to the photosensitive resist and the non-photosensitive polymer. A connection opening (connection pad) may be formed. This method also provides the same structure.

次に、ディスクリート電子部品8が搭載できるように露出させた銅の配線5の部分、つまり接続用パッドの部分に、無電解メッキによりニッケル(Ni)を3μm、その上に金(Au)を0.1μm形成する(図示していない)。   Next, the portion of the copper wiring 5 exposed so that the discrete electronic component 8 can be mounted, that is, the portion of the connection pad, is made of 3 μm of nickel (Ni) by electroless plating and 0 of gold (Au) thereon. 1 μm is formed (not shown).

次に、その金の上にハンダペーストを印刷することで部品接続端子7を形成し(図2(d)参照)、その部品接続端子7の上にディスクリート電子部品8を載せ、リフロー処理によりディスクリート電子部品8を固定する(図2(e)参照)。   Next, the component connection terminal 7 is formed by printing solder paste on the gold (see FIG. 2 (d)), and the discrete electronic component 8 is placed on the component connection terminal 7 and discrete by reflow processing. The electronic component 8 is fixed (see FIG. 2 (e)).

工程の最後に、タイシング位置9にて個片化(ダイシング)を行い、半導体集積回路1が完成する。このように、ウェーハ状態で半導体チップ2の組み立てを行った後、ディスクリート電子部品8を搭載し、その後ダイシングを行う。   At the end of the process, singulation (dicing) is performed at the timing position 9 to complete the semiconductor integrated circuit 1. Thus, after assembling the semiconductor chip 2 in the wafer state, the discrete electronic component 8 is mounted and then dicing is performed.

図3(a)および図3(b)は上述した製造プロセスにより完成した半導体集積回路1をパッケージ化した状態を示す説明図である。図3(a)はTSOP(Thin Small Outline Package:シン・スモール・アウトライン・パッケージ)とよばれる半導体パッケージの内部構造を示し、図3(b)はCSPとよばれる半導体パッケージの内部構造を示している。   FIG. 3A and FIG. 3B are explanatory views showing a state where the semiconductor integrated circuit 1 completed by the manufacturing process described above is packaged. 3A shows the internal structure of a semiconductor package called TSOP (Thin Small Outline Package), and FIG. 3B shows the internal structure of a semiconductor package called CSP. Yes.

上述した製造プロセスにより完成した半導体集積回路1を樹脂モールドすることにより、従来のパッケージと全く同じ外観の、例えば半導体パッケージ70や半導体パッケージ71を製造する。   For example, a semiconductor package 70 or a semiconductor package 71 having the same appearance as a conventional package is manufactured by resin molding the semiconductor integrated circuit 1 completed by the manufacturing process described above.

図3(a)に示す半導体パッケージ70では、ディスクリート電子部品8が搭載された半導体チップ2を、ダイパッド14とよばれる領域に、銀ペースト等のダイアタッチ材11で固定し、全体をエポキシ系樹脂16で封止し、電極パッドとリード端子17をワイヤー12で電気的に接続した構造となっている。   In the semiconductor package 70 shown in FIG. 3A, the semiconductor chip 2 on which the discrete electronic component 8 is mounted is fixed to a region called a die pad 14 with a die attach material 11 such as silver paste, and the whole is an epoxy resin. 16, and the electrode pad and the lead terminal 17 are electrically connected by the wire 12.

図3(b)に示す半導体パッケージ71は、半導体チップのサイズに極めて近いパッケージである。この半導体パッケージ71では、絶縁部15aと導電部15bを有するプリント回路基板15の上に、ディスクリート電子部品8が搭載された半導体チップ2を、ポリイミド系の絶縁シート等のダイアタッチ材11で固定し、全体をエポキシ系樹脂16で封止し、電極パッドと導電部15bをワイヤー12で電気的に接続し、プリント回路基板15の半導体チップ2を搭載していない面に、外部接続端子19を設けた構造となっている。   A semiconductor package 71 shown in FIG. 3B is a package very close to the size of the semiconductor chip. In this semiconductor package 71, the semiconductor chip 2 on which the discrete electronic component 8 is mounted on the printed circuit board 15 having the insulating portion 15a and the conductive portion 15b is fixed with a die attach material 11 such as a polyimide insulating sheet. The whole is sealed with an epoxy resin 16, the electrode pad and the conductive portion 15b are electrically connected by the wire 12, and the external connection terminal 19 is provided on the surface of the printed circuit board 15 on which the semiconductor chip 2 is not mounted. It has a structure.

実施形態2
図4(a)および図4(b)は本発明の半導体集積回路の実施形態2を示す説明図である。図4(b)は図4(a)のB−B断面を示している。本実施形態の半導体集積回路は、実施形態1で示した半導体集積回路を発展させた構造となっている。
Embodiment 2
4 (a) and 4 (b) are explanatory views showing a semiconductor integrated circuit according to a second embodiment of the present invention. FIG. 4B shows a BB cross section of FIG. The semiconductor integrated circuit of the present embodiment has a structure obtained by developing the semiconductor integrated circuit shown in the first embodiment.

本半導体集積回路72では、半導体チップ22の電極パッド23形成面を下向きにし、この下向き面に、下部絶縁膜24、配線25、上部絶縁膜26、部品接続端子27、外部接続端子29を形成した構造となっている。すなわち、配線25上に、接続用パッドと外部接続端子用パッドを形成している。そして、接続用パッドの上に部品接続端子27を形成し、部品接続端子27にディスクリート電子部品28を搭載している。また、外部接続端子用パッドの上にハンダバンプからなる外部接続端子29を形成している。   In the present semiconductor integrated circuit 72, the electrode pad 23 forming surface of the semiconductor chip 22 faces downward, and the lower insulating film 24, the wiring 25, the upper insulating film 26, the component connection terminal 27, and the external connection terminal 29 are formed on the downward surface. It has a structure. That is, a connection pad and an external connection terminal pad are formed on the wiring 25. A component connection terminal 27 is formed on the connection pad, and a discrete electronic component 28 is mounted on the component connection terminal 27. An external connection terminal 29 made of a solder bump is formed on the external connection terminal pad.

ディスクリート電子部品28は、電極パッド23から外部接続端子29まで配置した配線25の途中または分岐した部分に設けてもよいし、外部接続端子29から延長した配線25の部分に設けてもよい。   The discrete electronic component 28 may be provided in the middle of the wiring 25 arranged from the electrode pad 23 to the external connection terminal 29 or in a branched portion, or may be provided in a portion of the wiring 25 extended from the external connection terminal 29.

部品接続端子27と外部接続端子29以外の領域は、厚さ10μmの感光性ポリマーからなる上部絶縁膜26で覆われている。   A region other than the component connection terminal 27 and the external connection terminal 29 is covered with an upper insulating film 26 made of a photosensitive polymer having a thickness of 10 μm.

図5(a)〜図5(e)は本実施形態の半導体集積回路の製造プロセスを示す説明図である。これらの図に基づいて製造プロセスを説明する。
半導体チップ22は実施形態1のものと同じであり、まず、実施形態1と同様に、半導体チップ2の表面を下部絶縁膜4で覆う(図5(a)参照)。
FIG. 5A to FIG. 5E are explanatory views showing a manufacturing process of the semiconductor integrated circuit of this embodiment. The manufacturing process will be described based on these drawings.
The semiconductor chip 22 is the same as that of the first embodiment, and first, similarly to the first embodiment, the surface of the semiconductor chip 2 is covered with the lower insulating film 4 (see FIG. 5A).

次に、下部絶縁膜4の上に配線5を形成し(図5(b)参照)、次に、接続用パッドと外部接続端子用パッドの部分を除く半導体チップ2の全面に、上部絶縁膜6を形成する(図5(c)参照)。   Next, the wiring 5 is formed on the lower insulating film 4 (see FIG. 5B), and then the upper insulating film is formed on the entire surface of the semiconductor chip 2 excluding the connection pad and the external connection terminal pad. 6 is formed (see FIG. 5C).

次に、接続用パッドの部分と外部接続端子用パッドの部分に、ハンダペーストを印刷することで、ディスクリート電子部品8搭載用の部品接続端子27と外部接続端子形成用の接続部27aを形成する(図5(d)参照)。   Next, solder paste is printed on the connection pad portion and the external connection terminal pad portion, thereby forming the component connection terminal 27 for mounting the discrete electronic component 8 and the connection portion 27a for forming the external connection terminal. (See FIG. 5 (d)).

次に、部品接続端子7の上にディスクリート電子部品8を載せるとともに、接続部27aの上にハンダーボールを載せ、リフロー処理を行うことにより、部品接続端子7にディスクリート電子部品8を固定するとともに、接続部27aの上にハンダバンプからなる外部接続端子29を形成する(図5(e)参照)。このように、外部接続端子29の取り付けは、ディスクリート電子部品8の取り付けと同時に行う。そして、最後にダイシングを行う。   Next, the discrete electronic component 8 is placed on the component connection terminal 7, and a solder ball is placed on the connection portion 27a, and the reflow process is performed to fix the discrete electronic component 8 to the component connection terminal 7, External connection terminals 29 made of solder bumps are formed on the connection portions 27a (see FIG. 5E). Thus, the external connection terminal 29 is attached at the same time as the discrete electronic component 8 is attached. Finally, dicing is performed.

本製造プロセスが図2の製造プロセスと異なる点は、ワイヤー12が接続される電極パッド23上の配線25が上部絶縁膜26で覆われていることと、外部接続端子29を取り付けていることである。   This manufacturing process is different from the manufacturing process of FIG. 2 in that the wiring 25 on the electrode pad 23 to which the wire 12 is connected is covered with the upper insulating film 26 and the external connection terminal 29 is attached. is there.

実施形態3
図6(a)および図6(b)は本発明の半導体集積回路の実施形態3を示す説明図である。図6(b)は図6(a)のC−C断面を示している。本実施形態の半導体集積回路も、実施形態1で示した半導体集積回路を発展させた構造となっている。
Embodiment 3
FIG. 6A and FIG. 6B are explanatory views showing Embodiment 3 of the semiconductor integrated circuit of the present invention. FIG. 6B shows a CC cross section of FIG. The semiconductor integrated circuit of the present embodiment also has a structure obtained by developing the semiconductor integrated circuit shown in the first embodiment.

本半導体集積回路41は、電極パッド43形成面を上に向けた半導体チップ42と電極パッド53形成面を下に向けた半導体チップ52とをフリップチップで接続した構造となっている。   The semiconductor integrated circuit 41 has a structure in which a semiconductor chip 42 with the electrode pad 43 forming surface facing upward and a semiconductor chip 52 with the electrode pad 53 forming surface facing downward are connected by a flip chip.

上向きの半導体チップ42の電極パッド43形成面には、下部絶縁膜44、配線45、上部絶縁膜46が順次形成されている。配線45は、一端が電極パッド43に接続され、他端にはディスクリート電子部品48が搭載される部品接続端子47と、ハンダバンプからなる接続部59に接続するための円形パッドが形成されている。この円形パッドは、配線45の端または途中に形成されている。上向きの半導体チップ42の上面は、それらの円形パッドの一部が露出するように、厚さ10μmの感光性ポリマーからなる上部絶縁膜46で覆われている。   A lower insulating film 44, wiring 45, and upper insulating film 46 are sequentially formed on the electrode pad 43 forming surface of the upward semiconductor chip 42. The wiring 45 has one end connected to the electrode pad 43 and the other end formed with a component connection terminal 47 on which a discrete electronic component 48 is mounted and a circular pad for connection to a connection portion 59 made of a solder bump. The circular pad is formed at the end or in the middle of the wiring 45. The upper surface of the upward semiconductor chip 42 is covered with an upper insulating film 46 made of a photosensitive polymer having a thickness of 10 μm so that a part of the circular pads is exposed.

下向きの半導体チップ52の電極パッド53形成面には、下部絶縁膜54、配線55、上部絶縁膜56が順次形成されている。配線55は、一端が電極パッド53に接続され、他端には接続部59に接続するための円形パッドが形成されている。下向きの半導体チップ52の下面は、それらの円形パッドの一部が露出するように、厚さ10μmの感光性ポリマーからなる上部絶縁膜56で覆われている。   A lower insulating film 54, a wiring 55, and an upper insulating film 56 are sequentially formed on the electrode pad 53 forming surface of the downward semiconductor chip 52. The wiring 55 has one end connected to the electrode pad 53 and the other end formed with a circular pad for connection to the connection portion 59. The lower surface of the downward semiconductor chip 52 is covered with an upper insulating film 56 made of a photosensitive polymer having a thickness of 10 μm so that a part of the circular pads is exposed.

そして、上向きの半導体チップ42の円形パッドと下向きの半導体チップ52の円形パッドが接続部59を介して接合されている。   Then, the circular pad of the upward semiconductor chip 42 and the circular pad of the downward semiconductor chip 52 are joined via the connection portion 59.

図6(a)および図6(b)で示した半導体集積回路41では、配線45、配線55、接続部59を介して、半導体チップ42、半導体チップ52、ディスクリート電子部品48が必要な箇所に応じて相互に電気的接続がなされていることになる。   In the semiconductor integrated circuit 41 shown in FIGS. 6A and 6B, the semiconductor chip 42, the semiconductor chip 52, and the discrete electronic component 48 are provided via the wiring 45, the wiring 55, and the connection portion 59. Accordingly, electrical connections are made to each other.

図6(a)および図6(b)では、半導体チップ52の電極パッド53は全て半導体チップ42の電極パッド43と電気的に接続しているが、半導体チップ52専用の接続パッドを半導体チップ42上に配線45の一部として設けるようにしてもよい。   6A and 6B, all the electrode pads 53 of the semiconductor chip 52 are electrically connected to the electrode pads 43 of the semiconductor chip 42. However, the connection pads dedicated to the semiconductor chip 52 are connected to the semiconductor chip 42. You may make it provide as a part of wiring 45 on it.

図7は上述した半導体集積回路41をパッケージ化した状態を示す説明図であり、上述した半導体集積回路41は、この図に示すようなパッケージ73に組み立てられる。   FIG. 7 is an explanatory view showing a state in which the above-described semiconductor integrated circuit 41 is packaged, and the above-described semiconductor integrated circuit 41 is assembled into a package 73 as shown in this figure.

図8(a)および図8(b)はウェーハ状態の半導体集積回路を示す説明図であり、この図に示すように、上述した半導体集積回路は、ウェーハ100の状態で終始一貫して組み立て、最後にダイシングを行うことで個片化する。   FIG. 8A and FIG. 8B are explanatory views showing a semiconductor integrated circuit in a wafer state. As shown in this figure, the above-described semiconductor integrated circuit is assembled in a state of a wafer 100 from start to finish. Finally, dicing into pieces.

このようにして、複数の電極パッドが設けられた半導体チップの表面を、電極パッドが露出されるように下部絶縁膜で被覆し、その上に複数の配線を形成して、配線の一端を電極パッド接続するとともに、配線の他端に部品接続端子を設け、部品接続端子が露出されるように配線部を上部絶縁膜で被覆し、異なる配線の部品接続端子間にディスクリート電子部品を接続することにより、半導体チップ上に、小さなディスクリート電子部品を複数個搭載することができ、これによりプリント配線板上の部品点数を削減することができる。   In this way, the surface of the semiconductor chip provided with a plurality of electrode pads is covered with the lower insulating film so that the electrode pads are exposed, a plurality of wirings are formed thereon, and one end of the wiring is formed as an electrode. In addition to pad connection, a component connection terminal is provided at the other end of the wiring, the wiring part is covered with an upper insulating film so that the component connection terminal is exposed, and discrete electronic components are connected between the component connection terminals of different wirings. As a result, a plurality of small discrete electronic components can be mounted on the semiconductor chip, thereby reducing the number of components on the printed wiring board.

本発明の半導体集積回路の実施形態1を示す説明図である。1 is an explanatory diagram showing a first embodiment of a semiconductor integrated circuit according to the present invention. 実施形態1の半導体集積回路の製造プロセスを示す説明図である。FIG. 6 is an explanatory diagram illustrating a manufacturing process of the semiconductor integrated circuit according to the first embodiment. 実施形態1の製造プロセスにより完成した半導体集積回路をパッケージ化した状態を示す説明図である。FIG. 6 is an explanatory diagram showing a state where the semiconductor integrated circuit completed by the manufacturing process of Embodiment 1 is packaged. 本発明の半導体集積回路の実施形態2を示す説明図である。It is explanatory drawing which shows Embodiment 2 of the semiconductor integrated circuit of this invention. 実施形態2の半導体集積回路の製造プロセスを示す説明図である。FIG. 10 is an explanatory diagram illustrating a manufacturing process of the semiconductor integrated circuit according to the second embodiment. 本発明の半導体集積回路の実施形態3を示す説明図である。It is explanatory drawing which shows Embodiment 3 of the semiconductor integrated circuit of this invention. 実施形態3の半導体集積回路をパッケージ化した状態を示す説明図である。It is explanatory drawing which shows the state which packaged the semiconductor integrated circuit of Embodiment 3. FIG. ウェーハ状態の半導体集積回路を示す説明図である。It is explanatory drawing which shows the semiconductor integrated circuit of a wafer state. 従来の半導体チップとディスクリート電子部品とを一個のパッケージに収納した構造を示す説明図である。It is explanatory drawing which shows the structure which accommodated the conventional semiconductor chip and discrete electronic components in one package. 従来のチップサイズパッケージと呼ばれる半導体装置を示す説明図である。It is explanatory drawing which shows the semiconductor device called the conventional chip size package.

符号の説明Explanation of symbols

1,41,72 半導体集積回路
2,22,42,52 半導体チップ
3,23,43,53 電極パッド
4,24,44,54 下部絶縁膜
5,25,45,55 配線
6,26,46,56 上部絶縁膜
7,27,47 部品接続端子
8,28,48 ディスクリート電子部品
9 タイシング位置
11 ダイアタッチ材
12 ワイヤー
14 ダイパッド
15 プリント回路基板
15a 絶縁部
15b 導電部
16 エポキシ系樹脂
17 リード端子
19,29 外部接続端子
27a 外部接続端子形成用の接続部
59 接続部
70,71,73 半導体パッケージ
1, 41, 72 Semiconductor integrated circuit 2, 22, 42, 52 Semiconductor chip 3, 23, 43, 53 Electrode pad 4, 24, 44, 54 Lower insulating film 5, 25, 45, 55 Wiring 6, 26, 46, 56 Upper insulating film 7, 27, 47 Component connection terminal 8, 28, 48 Discrete electronic component 9 Tying position 11 Die attach material 12 Wire 14 Die pad 15 Printed circuit board 15a Insulation portion 15b Conductive portion 16 Epoxy resin 17 Lead terminal 19, 29 External Connection Terminal 27a Connection Portion for Forming External Connection Terminal 59 Connection Portion 70, 71, 73 Semiconductor Package

Claims (5)

複数の接続電極が表面に設けられた半導体チップと、
接続電極が露出されるように半導体チップの表面を被覆する下部絶縁層と、
下部絶縁層上に形成され、一端が接続電極に接続されるとともに、他端もしくは一端と他端の途中に部品用接続部または/および外部端子用接続部が設けられた複数の配線部と、
部品用接続部および外部端子用接続部が露出されるように配線部を被覆する上部絶縁層と、
異なる部品用接続部間に接続された電子部品と、
電子部品が接続された半導体チップ面と同一面に存在する外部端子用接続部に形成された外部接続端子とを備え、
半導体チップに接続された電子部品は、その接続後の高さが外部接続端子よりも低いことを特徴とする半導体集積回路。
A semiconductor chip provided with a plurality of connection electrodes on the surface;
A lower insulating layer covering the surface of the semiconductor chip so that the connection electrode is exposed;
A plurality of wiring portions formed on the lower insulating layer, one end of which is connected to the connection electrode and the other end or one end and the other end are provided with a component connection portion or / and an external terminal connection portion;
An upper insulating layer covering the wiring part so that the connection part for parts and the connection part for external terminals are exposed;
Electronic components connected between different component connections;
An external connection terminal formed on a connection portion for external terminals existing on the same surface as the semiconductor chip surface to which the electronic component is connected;
An electronic component connected to a semiconductor chip has a height after connection lower than that of an external connection terminal.
前記配線部の一部分は、一端に外部端子用接続部が設けられ、他端に部品用接続部が設けられている配線部であることを特徴とする請求項1記載の半導体集積回路。   2. The semiconductor integrated circuit according to claim 1, wherein a part of the wiring portion is a wiring portion in which an external terminal connection portion is provided at one end and a component connection portion is provided at the other end. 請求項1または2記載の半導体集積回路の外部接続端子に、他の半導体集積回路をフリップチップ接続してなる半導体集積回路。   3. A semiconductor integrated circuit obtained by flip-chip connecting another semiconductor integrated circuit to the external connection terminal of the semiconductor integrated circuit according to claim 1. 請求項1または2記載の半導体集積回路をダイパットに搭載し、接続電極とリード端子とをワイヤーで接続し、半導体集積回路、ダイパットおよびワイヤーを樹脂により封止し、リード端子の一部を露出させてなる半導体集積回路装置。   The semiconductor integrated circuit according to claim 1 or 2 is mounted on a die pad, the connection electrode and the lead terminal are connected by a wire, the semiconductor integrated circuit, the die pad and the wire are sealed with a resin, and a part of the lead terminal is exposed. A semiconductor integrated circuit device. 請求項1または2記載の半導体集積回路を、絶縁基板と導電部からなるプリント回路基板の一方面に搭載し、接続電極とプリント回路基板の導電部とをワイヤーで接続し、半導体集積回路およびワイヤーを樹脂により封止し、プリント回路基板の他方面に導電部と電気的に接続された外部接続用端子を形成してなる半導体集積回路装置。   3. The semiconductor integrated circuit according to claim 1 or 2 is mounted on one surface of a printed circuit board composed of an insulating substrate and a conductive portion, and the connection electrode and the conductive portion of the printed circuit board are connected by a wire. A semiconductor integrated circuit device in which an external connection terminal electrically connected to the conductive portion is formed on the other surface of the printed circuit board.
JP2006174056A 2006-06-23 2006-06-23 Semiconductor integrated circuit Pending JP2006295208A (en)

Priority Applications (1)

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