JP2006295146A5 - - Google Patents

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Publication number
JP2006295146A5
JP2006295146A5 JP2006072175A JP2006072175A JP2006295146A5 JP 2006295146 A5 JP2006295146 A5 JP 2006295146A5 JP 2006072175 A JP2006072175 A JP 2006072175A JP 2006072175 A JP2006072175 A JP 2006072175A JP 2006295146 A5 JP2006295146 A5 JP 2006295146A5
Authority
JP
Japan
Prior art keywords
exposure
measurement
area
control system
temperature control
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006072175A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006295146A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006072175A priority Critical patent/JP2006295146A/ja
Priority claimed from JP2006072175A external-priority patent/JP2006295146A/ja
Priority to US11/378,511 priority patent/US7312848B2/en
Publication of JP2006295146A publication Critical patent/JP2006295146A/ja
Publication of JP2006295146A5 publication Critical patent/JP2006295146A5/ja
Pending legal-status Critical Current

Links

JP2006072175A 2005-03-18 2006-03-16 位置決め装置、露光装置及びデバイス製造方法 Pending JP2006295146A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2006072175A JP2006295146A (ja) 2005-03-18 2006-03-16 位置決め装置、露光装置及びデバイス製造方法
US11/378,511 US7312848B2 (en) 2005-03-18 2006-03-17 Positioning apparatus, exposure apparatus, and device manufacturing method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005080584 2005-03-18
JP2006072175A JP2006295146A (ja) 2005-03-18 2006-03-16 位置決め装置、露光装置及びデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2006295146A JP2006295146A (ja) 2006-10-26
JP2006295146A5 true JP2006295146A5 (enExample) 2009-04-02

Family

ID=37009942

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006072175A Pending JP2006295146A (ja) 2005-03-18 2006-03-16 位置決め装置、露光装置及びデバイス製造方法

Country Status (2)

Country Link
US (1) US7312848B2 (enExample)
JP (1) JP2006295146A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1965414A4 (en) * 2005-12-06 2010-08-25 Nikon Corp EXPOSURE METHOD, EXPOSURE DEVICE AND METHOD FOR MANUFACTURING COMPONENTS
US8324848B2 (en) * 2009-02-05 2012-12-04 Asm Assembly Automation Ltd System for maintaining thermal stability of a motion stage
JP5708310B2 (ja) * 2011-07-01 2015-04-30 東京エレクトロン株式会社 基板処理装置
US9778579B2 (en) * 2011-11-10 2017-10-03 Nikon Corporation System and method for controlling a temperature of a reaction assembly
JPWO2015011829A1 (ja) * 2013-07-26 2017-03-02 株式会社日立国際電気 基板処理装置、半導体装置の製造方法及びプログラム

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2928603B2 (ja) * 1990-07-30 1999-08-03 キヤノン株式会社 Ｘ線露光装置用ウエハ冷却装置
JP3127525B2 (ja) 1991-11-05 2001-01-29 株式会社ニコン 可動ステージ装置
JP4210871B2 (ja) * 1997-10-31 2009-01-21 株式会社ニコン 露光装置
JPH11307430A (ja) * 1998-04-23 1999-11-05 Canon Inc 露光装置およびデバイス製造方法ならびに駆動装置
TWI238292B (en) * 2000-02-10 2005-08-21 Asml Netherlands Bv Lithographic projection apparatus having a temperature controlled heat shield
JP3870002B2 (ja) * 2000-04-07 2007-01-17 キヤノン株式会社 露光装置
JP2002043213A (ja) * 2000-07-25 2002-02-08 Nikon Corp ステージ装置および露光装置
TW200305927A (en) * 2002-03-22 2003-11-01 Nippon Kogaku Kk Exposure apparatus, exposure method and manufacturing method of device
JP4227452B2 (ja) 2002-12-27 2009-02-18 キヤノン株式会社 位置決め装置、及びその位置決め装置を利用した露光装置

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