JP2006266722A5 - - Google Patents

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Publication number
JP2006266722A5
JP2006266722A5 JP2005081606A JP2005081606A JP2006266722A5 JP 2006266722 A5 JP2006266722 A5 JP 2006266722A5 JP 2005081606 A JP2005081606 A JP 2005081606A JP 2005081606 A JP2005081606 A JP 2005081606A JP 2006266722 A5 JP2006266722 A5 JP 2006266722A5
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Japan
Prior art keywords
substrate
inspection
moving
fine movement
observing
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Pending
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JP2005081606A
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Japanese (ja)
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JP2006266722A (en
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Priority to JP2005081606A priority Critical patent/JP2006266722A/en
Priority claimed from JP2005081606A external-priority patent/JP2006266722A/en
Publication of JP2006266722A publication Critical patent/JP2006266722A/en
Publication of JP2006266722A5 publication Critical patent/JP2006266722A5/ja
Pending legal-status Critical Current

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Claims (7)

基板を浮上させる基板浮上機構と、
浮上した前記基板の端部を保持して一方向に搬送する基板搬送機構と、
前記基板の表面を光学的に拡大して観察する検査部と、
前記基板と平行で、かつ、前記基板の搬送方向に直交する方向に前記検査部を移動する移動機構と、
前記検査部を、前記搬送方向に微動させる微動機構とを備えていることを特徴とする基板検査システム。 A substrate levitating mechanism for levitating the substrate;
A substrate transport mechanism that holds the end of the substrate that has been levitated and transports the substrate in one direction;
An inspection section for optically enlarging and observing the surface of the substrate;
A moving mechanism that moves the inspection unit in a direction parallel to the substrate and perpendicular to the conveyance direction of the substrate;
A substrate inspection system comprising: a fine movement mechanism for finely moving the inspection section in the transport direction. 前記移動機構は、前記検査部の移動方向で前記基板の上方を跨ぐように設けられるアームと、前記アームの水平部に沿って前記検査部を駆動する駆動手段と、を有することを特徴とする請求項１記載の基板検査システム。The moving mechanism includes an arm provided so as to straddle an upper portion of the substrate in a moving direction of the inspection unit, and drive means for driving the inspection unit along a horizontal portion of the arm. The substrate inspection system according to claim 1. 前記検査部は、前記微動機構を介して前記アームに設けられることを特徴とする請求項２記載の基板検査システム。The substrate inspection system according to claim 2, wherein the inspection unit is provided on the arm via the fine movement mechanism. 前記微動機構は、前記搬送方向に沿って設けられ、前記検査部の移動方向を規制する案内手段と、The fine movement mechanism is provided along the transport direction, and guide means for restricting the moving direction of the inspection unit;
前記検査部を微動駆動する微動駆動手段と、を有することを特徴とする請求項１乃至３記載基板検査システム。4. The substrate inspection system according to claim 1, further comprising fine movement driving means for finely driving the inspection section. 前記検査部は、複数の対物レンズを光路上に切換え配置する対物レンズ切換え手段と、前記対物レンズによって得られる光像を観察するための観察光学系と、照明光学系と、前記基板に対する焦点調節を行う焦準手段と、前記光像を撮像する撮像手段と、The inspection unit includes an objective lens switching unit that switches and arranges a plurality of objective lenses on an optical path, an observation optical system for observing a light image obtained by the objective lens, an illumination optical system, and focus adjustment for the substrate Focusing means for performing imaging, imaging means for capturing the optical image,
を有することを特徴とする請求項１乃至４記載の基板検査システム。5. The substrate inspection system according to claim 1, further comprising: 前記複数の対物レンズのうち、前記光路上に配置される前記対物レンズの倍率が低いときに前記基板を浮上させ、前記対物レンズの倍率が高いときに前記基板の浮上を停止させる制御部を備えていることを特徴とする請求項５に記載の基板検査システム。 A control unit configured to float the substrate when the magnification of the objective lens arranged on the optical path is low, and to stop the floating of the substrate when the magnification of the objective lens is high. The substrate inspection system according to claim 5 , wherein: 基板を浮上させる浮上工程と、
浮上した前記基板の端部を保持して搬送する搬送工程と、
前記基板の表面を光学的に拡大して観察する検査部を、前記基板と平行で、かつ、前記 基板の搬送方向に直交する方向に移動する移動工程と、
前記基板の表面を光学的に拡大して観察する観察工程と、
前記基板の浮上を停止する停止工程と、
前記搬送工程よりも高精度で前記基板の搬送方向に前記検査部を移動する微動工程とを備えていることを特徴とする基板検査方法。 A surfacing process for surfacing the substrate;
A transporting process for holding and transporting the end of the substrate that has floated;
A moving step of moving an inspection unit for optically enlarging and observing the surface of the substrate in a direction parallel to the substrate and perpendicular to the conveyance direction of the substrate;
An observation step of optically enlarging and observing the surface of the substrate;
A stopping step of stopping the floating of the substrate;
A substrate inspection method comprising: a fine movement step of moving the inspection portion in the substrate transfer direction with higher accuracy than the transfer step.
JP2005081606A 2005-03-22 2005-03-22 System and method for inspecting substrate Pending JP2006266722A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005081606A JP2006266722A (en) 2005-03-22 2005-03-22 System and method for inspecting substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005081606A JP2006266722A (en) 2005-03-22 2005-03-22 System and method for inspecting substrate

Publications (2)

Publication Number Publication Date
JP2006266722A JP2006266722A (en) 2006-10-05
JP2006266722A5 true JP2006266722A5 (en) 2008-05-01

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Family Applications (1)

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JP2005081606A Pending JP2006266722A (en) 2005-03-22 2005-03-22 System and method for inspecting substrate

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JP (1) JP2006266722A (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4652351B2 (en) * 2007-02-02 2011-03-16 大日本印刷株式会社 Substrate support apparatus and substrate support method
KR100903530B1 (en) * 2007-02-09 2009-06-23 주식회사 탑 엔지니어링 Array tester
KR100890282B1 (en) * 2007-02-09 2009-03-24 주식회사 탑 엔지니어링 Array tester
US7607647B2 (en) * 2007-03-20 2009-10-27 Kla-Tencor Technologies Corporation Stabilizing a substrate using a vacuum preload air bearing chuck
JP5373331B2 (en) * 2008-07-29 2013-12-18 株式会社日立ハイテクノロジーズ Substrate processing equipment
KR101470591B1 (en) * 2008-08-04 2014-12-11 주식회사 탑 엔지니어링 An array tester
KR100971288B1 (en) * 2008-08-22 2010-07-20 주식회사 탑 엔지니어링 An array tester
JP5317618B2 (en) * 2008-10-06 2013-10-16 株式会社日立ハイテクノロジーズ Display panel module assembly apparatus and substrate transfer apparatus
CN101814407B (en) * 2008-10-06 2013-11-06 株式会社日立高新技术 Assembling device and method for display panel and a treatment device thereof and a baseplate delivery mechanism
JP5553532B2 (en) * 2009-06-04 2014-07-16 パナソニック株式会社 Optical inspection device
JP5247664B2 (en) * 2009-11-18 2013-07-24 株式会社日立ハイテクノロジーズ Substrate inspection apparatus and measurement operation system thereof
TW201118972A (en) * 2009-11-30 2011-06-01 Schmid Yaya Technology Co Ltd Wafer testing conveyor and its conveyor detection method
JP2014123769A (en) * 2014-03-06 2014-07-03 Tokyo Ohka Kogyo Co Ltd Ultraviolet irradiation device and ultraviolet irradiation method
TWI735438B (en) * 2015-03-30 2021-08-11 日商尼康股份有限公司 Object carrier device, exposure apparatus, manufacturing method of flat panel display, device manufacturing method, object carrying method, and exposure method
KR102614210B1 (en) * 2017-09-29 2023-12-14 가부시키가이샤 니콘 Substrate handling device, exposure device, method for producing flat panel display, device production method, substrate handling method, and exposure method
KR102231462B1 (en) * 2019-09-25 2021-03-24 주식회사 나노프로텍 Non-contact Type Transferming apparatus for A Cell Phone Cover Grass

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0496679A (en) * 1990-08-08 1992-03-30 Omron Corp Combustion controller
JPH10300676A (en) * 1997-04-23 1998-11-13 Sumitomo Chem Co Ltd Fine defect detection device
JP2000009661A (en) * 1998-06-26 2000-01-14 Ntn Corp Flat panel inspection device
JP3929285B2 (en) * 2001-11-05 2007-06-13 オリンパス株式会社 Board inspection equipment
JP4130552B2 (en) * 2002-03-22 2008-08-06 株式会社ブイ・テクノロジー Glass substrate inspection equipment
JP4789399B2 (en) * 2003-05-01 2011-10-12 オリンパス株式会社 Levitation unit

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