JP2006245147A5 - - Google Patents
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- Publication number
- JP2006245147A5 JP2006245147A5 JP2005056701A JP2005056701A JP2006245147A5 JP 2006245147 A5 JP2006245147 A5 JP 2006245147A5 JP 2005056701 A JP2005056701 A JP 2005056701A JP 2005056701 A JP2005056701 A JP 2005056701A JP 2006245147 A5 JP2006245147 A5 JP 2006245147A5
- Authority
- JP
- Japan
- Prior art keywords
- reflecting
- reflecting surface
- optical system
- plane
- projection optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000003287 optical effect Effects 0.000 claims 21
- 238000005286 illumination Methods 0.000 claims 10
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005056701A JP2006245147A (ja) | 2005-03-01 | 2005-03-01 | 投影光学系、露光装置及びデバイスの製造方法 |
| US11/365,046 US7224441B2 (en) | 2005-03-01 | 2006-02-28 | Projection optical system, exposure apparatus, and device manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005056701A JP2006245147A (ja) | 2005-03-01 | 2005-03-01 | 投影光学系、露光装置及びデバイスの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006245147A JP2006245147A (ja) | 2006-09-14 |
| JP2006245147A5 true JP2006245147A5 (US20080293856A1-20081127-C00150.png) | 2008-04-17 |
Family
ID=37009953
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005056701A Withdrawn JP2006245147A (ja) | 2005-03-01 | 2005-03-01 | 投影光学系、露光装置及びデバイスの製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7224441B2 (US20080293856A1-20081127-C00150.png) |
| JP (1) | JP2006245147A (US20080293856A1-20081127-C00150.png) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI366004B (en) * | 2005-09-13 | 2012-06-11 | Zeiss Carl Smt Gmbh | Microlithography projection optical system, microlithographic tool comprising such an optical system, method for microlithographic production of microstructured components using such a microlithographic tool, microstructured component being produced by s |
| DE502006009171D1 (de) * | 2005-10-18 | 2011-05-05 | Zeiss Carl Smt Gmbh | Kollektor für beleuchtungssysteme mit einer wellenlänge </= 193 nm |
| DE102006014380A1 (de) * | 2006-03-27 | 2007-10-11 | Carl Zeiss Smt Ag | Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille |
| WO2007115596A1 (en) | 2006-04-07 | 2007-10-18 | Carl Zeiss Smt Ag | Microlithography projection optical system and method for manufacturing a device |
| DE102008000800A1 (de) * | 2008-03-20 | 2009-09-24 | Carl Zeiss Smt Ag | Projektionsobjektiv für die Mikrolithographie |
| CN102819196B (zh) * | 2008-03-20 | 2016-03-09 | 卡尔蔡司Smt有限责任公司 | 用于微光刻的投射物镜 |
| WO2010052961A1 (ja) * | 2008-11-10 | 2010-05-14 | 株式会社ニコン | 結像光学系、露光装置、およびデバイス製造方法 |
| JP5525550B2 (ja) | 2009-03-06 | 2014-06-18 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ用の照明光学系及び光学系 |
| JP5676856B2 (ja) * | 2009-05-08 | 2015-02-25 | キヤノン株式会社 | 補償光学系を備えた画像取得装置 |
| US9007497B2 (en) * | 2010-08-11 | 2015-04-14 | Media Lario S.R.L. | Three-mirror anastigmat with at least one non-rotationally symmetric mirror |
| CN102402135B (zh) | 2011-12-07 | 2013-06-05 | 北京理工大学 | 一种极紫外光刻投影物镜设计方法 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6199991B1 (en) | 1997-11-13 | 2001-03-13 | U.S. Philips Corporation | Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system |
| US6255661B1 (en) | 1998-05-06 | 2001-07-03 | U.S. Philips Corporation | Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system |
| US6600552B2 (en) * | 1999-02-15 | 2003-07-29 | Carl-Zeiss Smt Ag | Microlithography reduction objective and projection exposure apparatus |
| DE59914179D1 (de) | 1999-02-15 | 2007-03-22 | Zeiss Carl Smt Ag | Mikrolithographie-Reduktionsobjektiveinrichtung sowie Projektionsbelichtungsanlage |
| US7151592B2 (en) * | 1999-02-15 | 2006-12-19 | Carl Zeiss Smt Ag | Projection system for EUV lithography |
| US6033079A (en) | 1999-03-15 | 2000-03-07 | Hudyma; Russell | High numerical aperture ring field projection system for extreme ultraviolet lithography |
| EP1093021A3 (en) | 1999-10-15 | 2004-06-30 | Nikon Corporation | Projection optical system as well as equipment and methods making use of said system |
| JP2001185480A (ja) | 1999-10-15 | 2001-07-06 | Nikon Corp | 投影光学系及び該光学系を備える投影露光装置 |
| JP2003015040A (ja) | 2001-07-04 | 2003-01-15 | Nikon Corp | 投影光学系および該投影光学系を備えた露光装置 |
| JP2004022722A (ja) | 2002-06-14 | 2004-01-22 | Nikon Corp | 投影光学系および該投影光学系を備えた露光装置 |
| JP2004031808A (ja) | 2002-06-27 | 2004-01-29 | Nikon Corp | 露光装置の投影光学系、該投影光学系を備えた露光装置及び該露光装置を用いた露光方法 |
| JP2004138926A (ja) | 2002-10-21 | 2004-05-13 | Nikon Corp | 投影光学系および該投影光学系を備えた露光装置 |
| JP2004170869A (ja) | 2002-11-22 | 2004-06-17 | Nikon Corp | 結像光学系、露光装置および露光方法 |
| JP2004258178A (ja) | 2003-02-25 | 2004-09-16 | Nikon Corp | 投影光学系および該投影光学系を備えた露光装置 |
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2005
- 2005-03-01 JP JP2005056701A patent/JP2006245147A/ja not_active Withdrawn
-
2006
- 2006-02-28 US US11/365,046 patent/US7224441B2/en not_active Expired - Fee Related
