JP2006201697A - Light absorbing member and optical device having the same - Google Patents
Light absorbing member and optical device having the same Download PDFInfo
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本発明は光吸収部材及びそれを有する光学素子に関し、例えばデジタルカメラやビデオカメラ等の光学機器において、レンズ鏡筒内に入射した光のうち、光束有効部以外の領域に入射した光束を吸収し、光束有効部以外の領域から反射光や透過光が生じ、これらの光(不要光)が像面に入射するのを防止する際に好適なものである。 The present invention relates to a light absorbing member and an optical element having the light absorbing member. For example, in an optical device such as a digital camera or a video camera, the light absorbing member absorbs a light beam incident on a region other than the light beam effective portion out of the light incident on the lens barrel. This is suitable for preventing reflected light or transmitted light from an area other than the luminous flux effective portion and preventing these lights (unnecessary light) from entering the image plane.
一般にレンズ鏡筒やカメラ本体等の光学機器内で使用される光学部品(光学素子)には光束有効部以外に入射した光がそこから反射又は透過して不要光となり、像面に入射し、画質を低下させるのを防止する為に、光学素子の光束有効部以外の領域に、光吸収部材(遮光膜)を設けている。 In general, in an optical component (optical element) used in an optical device such as a lens barrel or a camera body, light incident on a portion other than the effective portion of the light beam is reflected or transmitted from there to become unnecessary light, and is incident on an image plane. In order to prevent the image quality from being deteriorated, a light absorbing member (light shielding film) is provided in a region other than the light flux effective portion of the optical element.
特に光学素子間の距離が近接しているような光学系内においては不要光が除去されないと、それが多重反射をし、像面に入射しゴーストや散乱光によるフレアとなり、光学性能に悪影響を及ぼす。 Especially in an optical system where the distance between optical elements is close, if unnecessary light is not removed, it will cause multiple reflections, which will enter the image plane and cause flare due to ghost or scattered light, which will adversely affect optical performance. Effect.
また最近は特に光学系の小型化が進み光学素子間の距離が接近する傾向にあるため、不要光の除去効果の高い光吸収部材を光学素子の光束有効部以外の領域に設けることが要望されている。 In recent years, the optical system has become particularly compact and the distance between the optical elements tends to approach. Therefore, it is desired to provide a light absorbing member with a high effect of removing unwanted light in a region other than the effective beam portion of the optical element. ing.
現在、レンズやガラス基板等の透明基板上に不必要な光の吸収(遮光)を目的として形成する光吸収部材(遮光膜)の材料としては、黒色有機塗料がある。この黒色有機塗料をスクリーン印刷等により基板上に印刷して遮光膜を形成するのが一般的である。 Currently, there is a black organic paint as a material of a light absorbing member (light shielding film) formed for the purpose of unnecessary light absorption (light shielding) on a transparent substrate such as a lens or a glass substrate. The black organic paint is generally printed on a substrate by screen printing or the like to form a light shielding film.
スクリーン印刷で作成される遮光膜はその特徴として、遮光性が高い、表面、裏面の残存反射が少ない、容易に加工できる等の優れた特徴を有する。その一方で、通常、光学部品(光学素子)に使用されている光吸収部材に比べて、耐熱性や機械的強度が劣る、遮光の為にはある程度の塗膜厚を必要とする。この為に数μm以下の薄膜で構成するのが難しい、加熱等を伴う二次加工が出来ない等の欠点がある。 The light-shielding film prepared by screen printing has excellent characteristics such as high light-shielding properties, little residual reflection on the front and back surfaces, and easy processing. On the other hand, heat resistance and mechanical strength are generally inferior to light absorbing members used in optical components (optical elements), and a certain coating thickness is required for light shielding. For this reason, there are drawbacks that it is difficult to form a thin film of several μm or less, and that secondary processing involving heating or the like cannot be performed.
このような問題を解決する光吸収部材として、真空成膜による光吸収性の反射防止膜が知られている(特許文献1〜5)。
特許文献1,2では吸収膜として酸化チタン等の金属酸化物のみを用いた薄膜型NDフィルターを開示している。 Patent Documents 1 and 2 disclose a thin-film ND filter using only a metal oxide such as titanium oxide as an absorption film.
特許文献1,2では完全な遮光効果を得る為には吸収膜の層厚を厚くするか、若しくは吸収膜の層数を増加させる等が必要となり、結果的には残存反射光が増加し、更に総膜厚が増加してくる傾向がある。 In Patent Documents 1 and 2, in order to obtain a complete light shielding effect, it is necessary to increase the thickness of the absorbing film or increase the number of absorbing films. As a result, the residual reflected light increases, Furthermore, the total film thickness tends to increase.
特許文献3は、無機物質からなる黒色被膜と、黒色被膜の上に形成され、各界面と隣接しているものと異なる屈折率を有した反射防止膜とからなる黒色反射防止膜を開示している。この構成は裏面反射が生じ、又、表面反射が使用波長域で生じている。 Patent Document 3 discloses a black antireflection film comprising a black coating made of an inorganic substance and an antireflection coating formed on the black coating and having a refractive index different from that adjacent to each interface. Yes. In this configuration, back surface reflection occurs, and surface reflection occurs in the use wavelength region.
特許文献4は、金属膜上に透明誘電体膜と金属薄膜とからなる反射防止膜を形成した中性濃度フィルターを開示している。 Patent Document 4 discloses a neutral density filter in which an antireflection film composed of a transparent dielectric film and a metal thin film is formed on a metal film.
このように金属膜上に直接、透明誘電体膜を形成してなる黒色反射防止膜は、特定波長以外での反射率の軽減が難しく、広い波長域での反射防止が難しい。 As described above, the black antireflection film in which the transparent dielectric film is directly formed on the metal film is difficult to reduce the reflectance at a wavelength other than the specific wavelength, and it is difficult to prevent the reflection in a wide wavelength range.
特許文献5は、基体側から光吸収膜、透明な誘電体膜より成る光吸収性反射防止体を開示している。 Patent Document 5 discloses a light-absorbing antireflection body comprising a light-absorbing film and a transparent dielectric film from the substrate side.
特許文献5は低反射率の波長範囲が広い反射防止膜を開示しているが、金属窒化物などの製造にはプラズマ装置等の専用設備が必要である。 Although Patent Document 5 discloses an antireflection film having a low reflectance and a wide wavelength range, dedicated equipment such as a plasma apparatus is required for manufacturing metal nitrides and the like.
本発明は、入射した光を吸収することによって、入射した光が反射又は透過して外部に出射するのを効果的に防止することができる光吸収部材及びそれを有する光学素子の提供を目的とする。 An object of the present invention is to provide a light absorbing member capable of effectively preventing incident light from being reflected or transmitted and emitted to the outside by absorbing incident light, and an optical element having the same. To do.
この他本発明は、特殊なガス導入やプラズマ装置などを必要とせずに、可視全域(波長400nm−700nm)で透過光、表面、裏面反射光に対して十分な吸収効果(遮光効果)を持ち、なおかつ強度や耐熱性、平面性等の物理的性質に優れ、物理的膜厚が薄い光吸収部材及びそれを有する光学素子の提供を目的とする。 In addition, the present invention has a sufficient absorption effect (light shielding effect) for transmitted light, front surface, and back surface reflected light in the entire visible region (wavelength: 400 nm to 700 nm) without requiring special gas introduction or a plasma apparatus. It is an object of the present invention to provide a light-absorbing member excellent in physical properties such as strength, heat resistance and flatness and having a thin physical film thickness and an optical element having the same.
本発明の光吸収部材は、入射光を吸収する為に透明基板上に設ける光吸収部材であって、該光吸収部材は、該透明基板側から順に光吸収部、遮光部、光吸収部より成ることを特徴としている。 The light-absorbing member of the present invention is a light-absorbing member provided on a transparent substrate to absorb incident light, and the light-absorbing member is sequentially from the light-absorbing portion, the light-shielding portion, and the light-absorbing portion from the transparent substrate side. It is characterized by that.
本発明によれば、入射した光を吸収することによって、入射した光が反射又は透過して外部に出射するのを効果的に防止することができる光吸収部材が得られる。 ADVANTAGE OF THE INVENTION According to this invention, the light absorption member which can prevent effectively that the incident light reflects or permeate | transmits and is radiate | emitted outside by absorbing the incident light is obtained.
図1は、本発明の光吸収部材を施した光学素子100の実施例1の要部断面図である。図2は実施例1の光吸収部材の膜構成の説明図である。実施例1の光吸収部材(黒色反射防止膜)10は、透明基板11の平面又は曲面上に光吸収部(吸収性多層反射防止膜)12、金属単層膜による遮光部(遮光膜)13、光吸収部(吸収性多層反射防止膜)14を設けた構成より成っている。 FIG. 1 is a cross-sectional view of an essential part of Example 1 of an optical element 100 to which a light absorbing member of the present invention is applied. FIG. 2 is an explanatory diagram of a film configuration of the light absorbing member according to the first embodiment. The light absorbing member (black antireflection film) 10 of Example 1 includes a light absorbing portion (absorbing multilayer antireflection film) 12 and a light shielding portion (light shielding film) 13 formed of a metal single layer film on a flat or curved surface of the transparent substrate 11. The light absorbing portion (absorbing multilayer antireflection film) 14 is provided.
具体的には、透明基板11を光学ガラス(商品名S−BSL7(BK7))で、光吸収部12を基板11側からAl2O3/TiO/Al2O3/TiO/Al2O3の5層構成で、遮光部13をクロム(Cr)単層膜で、光吸収部14を基板11側からTiO/Al2O3/TiO/MgF2の4層で構成している。TiOは光吸収層である。 Specifically, the transparent substrate 11 is made of optical glass (trade name S-BSL7 (BK7)), and the light absorption part 12 is made from the substrate 11 side from Al 2 O 3 / TiO / Al 2 O 3 / TiO / Al 2 O 3. The light shielding part 13 is composed of four layers of TiO / Al 2 O 3 / TiO / Mg F 2 from the substrate 11 side. TiO is a light absorption layer.
ここで遮光部13は基準波長550nmでの透過率が0%、反射率が60%程度、光吸収部12,14は透過率が10%以下の多層膜より成っている。 Here, the light-shielding portion 13 is formed of a multilayer film having a transmittance at a reference wavelength of 550 nm of 0% and a reflectance of about 60%, and the light absorbing portions 12 and 14 having a transmittance of 10% or less.
そして本実施例の光学部材は、可視全域(波長400nm−700nm)において透過率が零で、なおかつ表面反射率、裏面反射率ともに0.6%以下と、遮光膜として十分な性能を実現している。実施例1の総膜厚は647.09nmと薄膜化を達成している。尚、裏面反射光とは、光学素子に入射した光のうち、光学素子内部を透過し、光の射出側の界面(図1では不図示)で反射した後、入射側界面に戻ってくる光のことを指す。 The optical member of the present example realizes sufficient performance as a light-shielding film with a transmittance of zero in the entire visible region (wavelength of 400 nm to 700 nm) and a surface reflectance and a back surface reflectance of 0.6% or less. Yes. The total film thickness of Example 1 is 647.09 nm, and a reduction in thickness is achieved. The back surface reflected light refers to light that enters the optical element, passes through the inside of the optical element, is reflected at the light emission side interface (not shown in FIG. 1), and then returns to the incident side interface. Refers to that.
遮光部13のクロム単層膜の総膜厚に対する比率を10%〜20%程度とし、これによって良好なる光吸収部材を構成している。 The ratio with respect to the total film thickness of the chromium single layer film of the light shielding part 13 is set to about 10% to 20%, thereby constituting a good light absorbing member.
実施例1では、光吸収部材10は物理的な総膜厚が1μm以下となっている。 In Example 1, the light absorption member 10 has a total physical film thickness of 1 μm or less.
又、光吸収部材10は、可視全域(波長400nm−700nm)において、光透過率,表面反射率、裏面反射率がいずれも1%以下となるように膜層が構成されている。 Further, the light absorbing member 10 has a film layer configured such that the light transmittance, the surface reflectance, and the back surface reflectance are all 1% or less in the entire visible region (wavelength 400 nm to 700 nm).
実施例1の光吸収部材10は、光反射及び光透過を完全に遮断するための遮光部(遮光層)13を光吸収部12,13との間に設けている。 The light absorbing member 10 of the first embodiment is provided with a light shielding portion (light shielding layer) 13 between the light absorbing portions 12 and 13 for completely blocking light reflection and light transmission.
これによって、遮光効果の大部分を遮光部13により実現して膜構成全体の簡略化と総膜厚の薄膜化を容易にしている。 As a result, most of the light shielding effect is realized by the light shielding portion 13, thereby simplifying the entire film configuration and reducing the total film thickness.
又、図10に示すように光吸収部材10内の光透過が遮光膜13により、基板11側の光吸収部12内の透過光Tbと、大気側(光入射側)の光吸収部14内の透過光Taとに略分割している。 Further, as shown in FIG. 10, the light transmission in the light absorbing member 10 is transmitted by the light shielding film 13, and the transmitted light Tb in the light absorbing portion 12 on the substrate 11 side and the light absorbing portion 14 on the atmosphere side (light incident side). The transmitted light Ta is substantially divided.
ここで図10,図11に示すように大気側(図面,左側)から入射して、光学素子100を構成する光吸収部材10で反射する光が表面反射光Taであり、基板11側から入射し、光吸収部材10の各面で反射して、基板11側へ反射する光が裏面反射光Tbである。 Here, as shown in FIGS. 10 and 11, the light that is incident from the atmosphere side (the drawing, the left side) and reflected by the light absorbing member 10 constituting the optical element 100 is the surface reflected light Ta, and is incident from the substrate 11 side. The light reflected by each surface of the light absorbing member 10 and reflected toward the substrate 11 side is the back surface reflected light Tb.
実施例1は、表面反射光Taと裏面反射光Tbを減少させる為に前述した構成をとっている。 The first embodiment has the above-described configuration in order to reduce the front surface reflected light Ta and the back surface reflected light Tb.
図11は光学素子100としてレンズを用いレンズの表面上の光束有効部以外の領域に設けた光吸収部材10に、光束が入射する様子を示している。 FIG. 11 shows a state in which a light beam is incident on the light absorbing member 10 provided in a region other than the light beam effective portion on the surface of the lens using a lens as the optical element 100.
図11において空気中からの入射光のうち、光吸収部材10に直接入射し反射する光が表面反射光Taであり、レンズ100の基板11の有効領域内に入射した後に、光束有効領域外に設けた光吸収部材10で反射する光が裏面反射光Tbである。 In FIG. 11, the light that directly enters and reflects the light absorbing member 10 out of the incident light from the air is the surface reflected light Ta, and enters the effective region of the substrate 11 of the lens 100 and then enters the effective region of the light flux. The light reflected by the provided light absorbing member 10 is back surface reflected light Tb.
一般に反射防止膜を施した光学素子では、膜表面における表面反射と、膜と基板と境の基板面における裏面反射が異なるために、表面反射と裏面反射の双方を同時に最適化する必要がある。 In general, in an optical element provided with an antireflection film, the surface reflection on the film surface and the back surface reflection on the substrate surface at the boundary between the film and the substrate need to be optimized at the same time.
実際の膜設計においては表面反射と裏面反射は互いに干渉するために膜設計が難しい。 In an actual film design, the surface reflection and the back surface reflection interfere with each other, so that the film design is difficult.
これに対して実施例1の膜構成では、図10に示すように光吸収部材10内の光透過を遮光部13により分断することにより表面反射光Taと裏面反射光Tbの相互干渉を防止している。このため、膜設計においても表面反射率は大気側の光吸収部14の表面反射率、裏面反射率は基板11側の光吸収部12の裏面反射率と、それぞれ独立した設計が可能となり、結果として良好なる光吸収部材10の更なる向上が可能となる。 On the other hand, in the film configuration of Example 1, as shown in FIG. 10, the light transmission in the light absorbing member 10 is divided by the light shielding portion 13 to prevent mutual interference between the front surface reflected light Ta and the back surface reflected light Tb. ing. For this reason, in the film design, the surface reflectance can be designed independently from the surface reflectance of the light absorbing portion 14 on the atmosphere side, and the back surface reflectance can be designed independently from the back surface reflectance of the light absorbing portion 12 on the substrate 11 side. As a result, the light absorbing member 10 can be further improved.
実施例1の分光特性図を図3に示す。また比較例として遮光部13を除いた膜構成を図8に、分光特性図を図9に示す。図3,図9に示すように実施例1の光吸収部材10は透過率、反射率が比較例に比べて改善されていることが確認出来る。 The spectral characteristic diagram of Example 1 is shown in FIG. As a comparative example, a film configuration excluding the light shielding portion 13 is shown in FIG. 8, and a spectral characteristic diagram is shown in FIG. As shown in FIGS. 3 and 9, it can be confirmed that the light absorption member 10 of Example 1 has improved transmittance and reflectance compared to the comparative example.
本発明の光吸収部材10は遮光部13を挟んでいる(前後の)光吸収部12,14をそれぞれ2層以上の光吸収層(光吸収膜)(TiO)を含む吸収多層反射防止膜で構成している。 The light absorbing member 10 of the present invention is an absorption multilayer antireflection film including two or more light absorbing layers (light absorbing films) (TiO) each of the light absorbing portions 12 and 14 (front and rear) sandwiching the light shielding portion 13. It is composed.
特許文献4では金属膜上に、透明誘電体膜と金属薄膜とからなる反射防止膜を形成した中性濃度フィルターを開示している。このような構成で得られる反射防止効果は、例えば図2のように可視域全域で低反射率を得る事が難しい。また、同文献に比較例2としてCr2O3のように吸収を有する薄膜による反射防止膜例が提示されているが、このような構成においても可視全域で低反射率を実現する事が難しい。 Patent Document 4 discloses a neutral density filter in which an antireflection film composed of a transparent dielectric film and a metal thin film is formed on a metal film. The antireflection effect obtained by such a configuration is difficult to obtain a low reflectance over the entire visible range as shown in FIG. Although the anti-reflection film example by thin film having absorption as Cr 2 O 3 as Comparative Example 2 in this document are presented, it is difficult to realize a low reflectance in the entire visible range even in such a configuration .
また、特許文献3では遮光膜として、無機物質からなる黒色被膜を用いた例が、また特許文献5では光吸収性反射防止体およびその製造方法として、金合金や窒酸化シリコン等を使用した例が開示されているが、このような黒色被膜を得る為には、加工設備やガス導入条件等複雑な要素管理が必要であり、特殊なガス導入やプラズマ装置などを用いないと黒色反射防止膜を得る事はできない。 Further, in Patent Document 3, an example using a black film made of an inorganic substance as a light shielding film is used, and in Patent Document 5, an example using a gold alloy, silicon nitride oxide, or the like as a light-absorbing antireflective body and its manufacturing method. However, in order to obtain such a black coating, it is necessary to manage complicated elements such as processing equipment and gas introduction conditions, and a black antireflection film must be used unless a special gas introduction or plasma device is used. Can not get.
これに対して実施例1では遮光部13を金属単層膜より構成している。又、光吸収部12,14にはガス導入手段等を使用せずに安定した光吸収特性が得られる物質として光吸収層としてTiO又はTi2O3又はこれらの混合物を使用し、さらに光吸収の広帯域化を目的として光吸収層を2層以上に分割している。又、光吸収層の前後(間)にAl2O3、SiO2、MgF2等からなる透明誘電体層を配置する構成としている。さらに、遮光部13を構成する金属単層膜からの反射光の低減と膜厚限界の最適値として、光吸収部12,14単独での光透過率を10%以下となるような膜構成としている。 On the other hand, in the first embodiment, the light shielding portion 13 is composed of a metal single layer film. Further, as the light absorbing portions 12 and 14, TiO or Ti 2 O 3 or a mixture thereof is used as a light absorbing layer as a material capable of obtaining a stable light absorbing characteristic without using gas introducing means or the like, and further light absorbing. The light absorption layer is divided into two or more layers for the purpose of widening the bandwidth. In addition, a transparent dielectric layer made of Al 2 O 3 , SiO 2 , Mg F 2 or the like is disposed before and after (between) the light absorption layers. Further, as the optimum value of the reduction of the reflected light from the metal single layer film constituting the light shielding portion 13 and the film thickness limit, the film configuration is such that the light transmittance of the light absorbing portions 12 and 14 alone is 10% or less. Yes.
これによって実際の遮光部13からの反射光の影響量を10%×10%=1%以下に軽減している。例えば遮光部13を金属クロム単層膜で実現した場合は金属クロム単層膜自体の反射率が約60%である為、表面反射光Taと裏面反射光Tbの実際の反射率は0.6%以下となる。尚、遮光膜13は多層の金属膜より構成しても良い。 As a result, the amount of influence of the reflected light from the actual light shielding portion 13 is reduced to 10% × 10% = 1% or less. For example, when the light-shielding portion 13 is realized by a metal chrome single layer film, the reflectivity of the metal chrome single layer film itself is about 60%, so the actual reflectivity of the front surface reflected light Ta and the back surface reflected light Tb is 0.6. % Or less. The light shielding film 13 may be composed of a multilayer metal film.
図4は実施例1として図2に提示した膜構成に対し、大気側の光吸収部14のみを抽出した膜構成と分光特性図である。図5は実施例1として図2に提示した膜構成に対し、基板11側の光吸収部12のみを抽出した膜構成と分光特性図である。このように各光吸収部12,14単独での光透過率が10%以下の場合はそれらの間に光遮光部13を設ければ十分な光吸収効果(反射防止効果)が得られる。 FIG. 4 shows a film configuration and spectral characteristics obtained by extracting only the light absorption part 14 on the atmosphere side from the film configuration presented in FIG. FIG. 5 shows the film configuration and spectral characteristics obtained by extracting only the light absorbing portion 12 on the substrate 11 side from the film configuration presented in FIG. Thus, when the light transmittance of each light absorption part 12 and 14 is 10% or less, if the light-shielding part 13 is provided between them, sufficient light absorption effect (antireflection effect) will be obtained.
本発明の実施例2の光吸収部材の、膜構成を図6に、分光特性図を図7に示す。基板上に設ける膜構成は、図1と同様である。実施例2では光吸収部材を施す基板を図1に示すガラスより成る透明基板11の代わりに透明樹脂(ポリカーボネート)を用いている。光吸収部12を基板側からSiO2/TiO/SiO2/TiO/SiO2の5層構成で、遮光部13をクロム(Cr)単層膜で、光吸収部14を基板11側からTiO/Al2O3/TiO/MgF2の4層で構成している。そして可視全域(波長400nm−700nm)において透過率が零で、なおかつ表面反射率、裏面反射率ともに0.6%以下と、遮光膜として十分な性能を実現している。 FIG. 6 shows a film configuration and FIG. 7 shows a spectral characteristic diagram of the light absorbing member of Example 2 of the present invention. The film structure provided on the substrate is the same as in FIG. In Example 2, a transparent resin (polycarbonate) is used instead of the transparent substrate 11 made of glass as shown in FIG. The light absorbing portion 12 has a five-layer structure of SiO 2 / TiO / SiO 2 / TiO / SiO 2 from the substrate side, the light shielding portion 13 is a chromium (Cr) single layer film, and the light absorbing portion 14 is TiO / from the substrate 11 side. It consists of four layers of Al 2 O 3 / TiO / Mg F 2 . The transmittance is zero in the entire visible region (wavelength 400 nm to 700 nm), and both the surface reflectance and the back surface reflectance are 0.6% or less, realizing a sufficient performance as a light shielding film.
実施例2の総膜厚は618.11nmと1μm以下で薄膜化を達成している。透明基板11はガラス、樹脂いずれの場合でも対応でき、当然のことながら成膜条件も加熱/非加熱の双方に対応できる。 The total film thickness of Example 2 is 618.11 nm, which is 1 μm or less, and a reduction in thickness is achieved. The transparent substrate 11 can cope with either glass or resin, and of course, the film forming conditions can correspond to both heating / non-heating.
以上のように各実施例によれば、可視全域(波長400nm−700nm)で透過光、表面、裏面反射光に対して十分な遮光効果を持つ光吸収部材(黒色反射防止膜)が得られる。さらに各実施例で使用している成膜物質はすべて膜硬度や耐熱性、平面性等の物理的性質に優れ、さらに成膜が容易な物質のみで構成しているため、物理的に優れた品質の光吸収部材を真空蒸着装置のみで容易に得ることが出来る。さらに総膜厚に関しても1μm以下と、スクリーン印刷等では実現が難しい薄さの光吸収部材が得られる。 As described above, according to each embodiment, a light absorbing member (black antireflection film) having a sufficient light blocking effect on transmitted light, front surface, and back surface reflected light in the entire visible region (wavelength 400 nm to 700 nm) can be obtained. Furthermore, all the film-forming materials used in each example are excellent in physical properties such as film hardness, heat resistance, and flatness, and are composed of only materials that can be easily formed, so that they are physically excellent. A quality light-absorbing member can be easily obtained only with a vacuum deposition apparatus. Further, a light absorbing member having a total thickness of 1 μm or less, which is difficult to realize by screen printing or the like, can be obtained.
100:光学素子
10:光吸収部材
11:透明基板
12:光吸収部
13:遮光部
14:光吸収部
Ta:表面反射光
Tb:裏面反射光
100: Optical element 10: Light absorbing member 11: Transparent substrate 12: Light absorbing portion 13: Light shielding portion 14: Light absorbing portion Ta: Front surface reflected light Tb: Back surface reflected light
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015106151A (en) * | 2013-11-28 | 2015-06-08 | エーエーシーアコースティックテクノロジーズ(シンセン)カンパニーリミテッドAAC Acoustic Technologies(Shenzhen)Co.,Ltd | Optical lens |
WO2016104590A1 (en) * | 2014-12-26 | 2016-06-30 | 旭硝子株式会社 | Optical filter and image pickup device |
JP2020109510A (en) * | 2018-12-29 | 2020-07-16 | エーエーシー テクノロジーズ ピーティーイー リミテッド | Lens, manufacturing method therefor, and lens module |
WO2021193652A1 (en) * | 2020-03-26 | 2021-09-30 | 東海光学株式会社 | Light-shielding member |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0763915A (en) * | 1993-08-26 | 1995-03-10 | Canon Inc | Thin film nd filter and its production |
JPH10153704A (en) * | 1996-09-26 | 1998-06-09 | Matsushita Electric Ind Co Ltd | Optical absorbing body, and optical equipment using the same |
-
2005
- 2005-01-24 JP JP2005015732A patent/JP2006201697A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0763915A (en) * | 1993-08-26 | 1995-03-10 | Canon Inc | Thin film nd filter and its production |
JPH10153704A (en) * | 1996-09-26 | 1998-06-09 | Matsushita Electric Ind Co Ltd | Optical absorbing body, and optical equipment using the same |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015106151A (en) * | 2013-11-28 | 2015-06-08 | エーエーシーアコースティックテクノロジーズ(シンセン)カンパニーリミテッドAAC Acoustic Technologies(Shenzhen)Co.,Ltd | Optical lens |
WO2016104590A1 (en) * | 2014-12-26 | 2016-06-30 | 旭硝子株式会社 | Optical filter and image pickup device |
CN107113372A (en) * | 2014-12-26 | 2017-08-29 | 旭硝子株式会社 | optical filter and camera device |
JPWO2016104590A1 (en) * | 2014-12-26 | 2017-10-05 | 旭硝子株式会社 | Optical filter and imaging device |
JP2020109510A (en) * | 2018-12-29 | 2020-07-16 | エーエーシー テクノロジーズ ピーティーイー リミテッド | Lens, manufacturing method therefor, and lens module |
JP7005584B2 (en) | 2018-12-29 | 2022-01-21 | レイテック オプティカル (ジョウシュウ) カンパニーリミテッド | Lens and its manufacturing method and lens module |
WO2021193652A1 (en) * | 2020-03-26 | 2021-09-30 | 東海光学株式会社 | Light-shielding member |
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