JP2006194899A - ワークピースを光学的に検査するテストヘッド - Google Patents
ワークピースを光学的に検査するテストヘッド Download PDFInfo
- Publication number
- JP2006194899A JP2006194899A JP2006033042A JP2006033042A JP2006194899A JP 2006194899 A JP2006194899 A JP 2006194899A JP 2006033042 A JP2006033042 A JP 2006033042A JP 2006033042 A JP2006033042 A JP 2006033042A JP 2006194899 A JP2006194899 A JP 2006194899A
- Authority
- JP
- Japan
- Prior art keywords
- light
- workpiece
- platter
- optical paths
- detector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000012360 testing method Methods 0.000 title claims abstract description 37
- 230000003287 optical effect Effects 0.000 claims abstract description 106
- 238000000034 method Methods 0.000 claims abstract description 34
- 239000000463 material Substances 0.000 claims abstract description 21
- 239000012141 concentrate Substances 0.000 claims description 6
- 239000006117 anti-reflective coating Substances 0.000 claims description 4
- 238000003801 milling Methods 0.000 claims description 3
- 239000011358 absorbing material Substances 0.000 claims 2
- 230000003667 anti-reflective effect Effects 0.000 claims 1
- 230000000903 blocking effect Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract description 23
- 210000003128 head Anatomy 0.000 description 93
- 238000007689 inspection Methods 0.000 description 21
- 230000007547 defect Effects 0.000 description 20
- 230000015654 memory Effects 0.000 description 20
- 238000004519 manufacturing process Methods 0.000 description 14
- 210000000554 iris Anatomy 0.000 description 10
- 238000012545 processing Methods 0.000 description 7
- 238000000576 coating method Methods 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000006073 displacement reaction Methods 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 230000010287 polarization Effects 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 238000007792 addition Methods 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000002310 reflectometry Methods 0.000 description 3
- 230000004044 response Effects 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000003111 delayed effect Effects 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
- 230000013011 mating Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000010606 normalization Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000013519 translation Methods 0.000 description 2
- 230000001960 triggered effect Effects 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910001096 P alloy Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 241001504505 Troglodytes troglodytes Species 0.000 description 1
- 208000027418 Wounds and injury Diseases 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 125000001475 halogen functional group Chemical group 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9506—Optical discs
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US64374805P | 2005-01-13 | 2005-01-13 | |
| US11/112,172 US7302148B2 (en) | 2005-01-13 | 2005-04-22 | Test head for optically inspecting workpieces |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006194899A true JP2006194899A (ja) | 2006-07-27 |
| JP2006194899A5 JP2006194899A5 (enExample) | 2009-04-23 |
Family
ID=36653326
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006033042A Pending JP2006194899A (ja) | 2005-01-13 | 2006-01-13 | ワークピースを光学的に検査するテストヘッド |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US7302148B2 (enExample) |
| JP (1) | JP2006194899A (enExample) |
| MY (1) | MY137696A (enExample) |
Families Citing this family (81)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007523321A (ja) * | 2003-12-31 | 2007-08-16 | ユニヴァーシティー オブ サウスカロライナ | 気体及び他の流体のための薄層多孔光センサ |
| US20070201136A1 (en) * | 2004-09-13 | 2007-08-30 | University Of South Carolina | Thin Film Interference Filter and Bootstrap Method for Interference Filter Thin Film Deposition Process Control |
| US20070166245A1 (en) | 2005-11-28 | 2007-07-19 | Leonard Mackles | Propellant free foamable toothpaste composition |
| US8208147B2 (en) | 2005-11-28 | 2012-06-26 | Halliburton Energy Services, Inc. | Method of high-speed monitoring based on the use of multivariate optical elements |
| WO2007064575A1 (en) | 2005-11-28 | 2007-06-07 | Ometric Corporation | Optical analysis system and method for real time multivariate optical computing |
| US8345234B2 (en) | 2005-11-28 | 2013-01-01 | Halliburton Energy Services, Inc. | Self calibration methods for optical analysis system |
| EP2033196A2 (en) | 2006-06-26 | 2009-03-11 | University of South Carolina | Data validation and classification in optical analysis systems |
| EP2078187A2 (en) * | 2006-11-02 | 2009-07-15 | University of South Carolina | Multi-analyte optical computing system |
| US8213006B2 (en) * | 2007-03-30 | 2012-07-03 | Halliburton Energy Services, Inc. | Multi-analyte optical computing system |
| WO2008121715A1 (en) | 2007-03-30 | 2008-10-09 | Ometric Corporation | In-line process measurement systems and methods |
| US8184295B2 (en) * | 2007-03-30 | 2012-05-22 | Halliburton Energy Services, Inc. | Tablet analysis and measurement system |
| US8283633B2 (en) * | 2007-11-30 | 2012-10-09 | Halliburton Energy Services, Inc. | Tuning D* with modified thermal detectors |
| JP5117895B2 (ja) | 2008-03-17 | 2013-01-16 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 磁気記録媒体及びその製造方法 |
| JP2009238299A (ja) | 2008-03-26 | 2009-10-15 | Hoya Corp | 垂直磁気記録媒体および垂直磁気記録媒体の製造方法 |
| JP5453666B2 (ja) | 2008-03-30 | 2014-03-26 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 磁気ディスク及びその製造方法 |
| US8212213B2 (en) | 2008-04-07 | 2012-07-03 | Halliburton Energy Services, Inc. | Chemically-selective detector and methods relating thereto |
| WO2010038773A1 (ja) | 2008-09-30 | 2010-04-08 | Hoya株式会社 | 磁気ディスク及びその製造方法 |
| US8877359B2 (en) | 2008-12-05 | 2014-11-04 | Wd Media (Singapore) Pte. Ltd. | Magnetic disk and method for manufacturing same |
| WO2010116908A1 (ja) | 2009-03-28 | 2010-10-14 | Hoya株式会社 | 磁気ディスク用潤滑剤化合物及び磁気ディスク |
| JP2010257567A (ja) | 2009-03-30 | 2010-11-11 | Wd Media Singapore Pte Ltd | 垂直磁気記録媒体およびその製造方法 |
| US20100300884A1 (en) | 2009-05-26 | 2010-12-02 | Wd Media, Inc. | Electro-deposited passivation coatings for patterned media |
| US9330685B1 (en) | 2009-11-06 | 2016-05-03 | WD Media, LLC | Press system for nano-imprinting of recording media with a two step pressing method |
| US8496466B1 (en) | 2009-11-06 | 2013-07-30 | WD Media, LLC | Press system with interleaved embossing foil holders for nano-imprinting of recording media |
| JP5643516B2 (ja) | 2010-01-08 | 2014-12-17 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 垂直磁気記録媒体 |
| JP5574414B2 (ja) | 2010-03-29 | 2014-08-20 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 磁気ディスクの評価方法及び磁気ディスクの製造方法 |
| JP5645476B2 (ja) | 2010-05-21 | 2014-12-24 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 垂直磁気ディスク |
| JP5634749B2 (ja) | 2010-05-21 | 2014-12-03 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 垂直磁気ディスク |
| JP2011248967A (ja) | 2010-05-28 | 2011-12-08 | Wd Media (Singapore) Pte. Ltd | 垂直磁気ディスクの製造方法 |
| JP2011248969A (ja) | 2010-05-28 | 2011-12-08 | Wd Media (Singapore) Pte. Ltd | 垂直磁気ディスク |
| JP2011248968A (ja) | 2010-05-28 | 2011-12-08 | Wd Media (Singapore) Pte. Ltd | 垂直磁気ディスク |
| JP2012009086A (ja) | 2010-06-22 | 2012-01-12 | Wd Media (Singapore) Pte. Ltd | 垂直磁気記録媒体及びその製造方法 |
| US8889275B1 (en) | 2010-08-20 | 2014-11-18 | WD Media, LLC | Single layer small grain size FePT:C film for heat assisted magnetic recording media |
| US8743666B1 (en) | 2011-03-08 | 2014-06-03 | Western Digital Technologies, Inc. | Energy assisted magnetic recording medium capable of suppressing high DC readback noise |
| US8711499B1 (en) | 2011-03-10 | 2014-04-29 | WD Media, LLC | Methods for measuring media performance associated with adjacent track interference |
| US8491800B1 (en) | 2011-03-25 | 2013-07-23 | WD Media, LLC | Manufacturing of hard masks for patterning magnetic media |
| US9028985B2 (en) | 2011-03-31 | 2015-05-12 | WD Media, LLC | Recording media with multiple exchange coupled magnetic layers |
| US8565050B1 (en) | 2011-12-20 | 2013-10-22 | WD Media, LLC | Heat assisted magnetic recording media having moment keeper layer |
| US9029308B1 (en) | 2012-03-28 | 2015-05-12 | WD Media, LLC | Low foam media cleaning detergent |
| US9269480B1 (en) | 2012-03-30 | 2016-02-23 | WD Media, LLC | Systems and methods for forming magnetic recording media with improved grain columnar growth for energy assisted magnetic recording |
| US8941950B2 (en) | 2012-05-23 | 2015-01-27 | WD Media, LLC | Underlayers for heat assisted magnetic recording (HAMR) media |
| US8993134B2 (en) | 2012-06-29 | 2015-03-31 | Western Digital Technologies, Inc. | Electrically conductive underlayer to grow FePt granular media with (001) texture on glass substrates |
| US9034492B1 (en) | 2013-01-11 | 2015-05-19 | WD Media, LLC | Systems and methods for controlling damping of magnetic media for heat assisted magnetic recording |
| US10115428B1 (en) | 2013-02-15 | 2018-10-30 | Wd Media, Inc. | HAMR media structure having an anisotropic thermal barrier layer |
| US9153268B1 (en) | 2013-02-19 | 2015-10-06 | WD Media, LLC | Lubricants comprising fluorinated graphene nanoribbons for magnetic recording media structure |
| US9183867B1 (en) | 2013-02-21 | 2015-11-10 | WD Media, LLC | Systems and methods for forming implanted capping layers in magnetic media for magnetic recording |
| US9196283B1 (en) | 2013-03-13 | 2015-11-24 | Western Digital (Fremont), Llc | Method for providing a magnetic recording transducer using a chemical buffer |
| US9190094B2 (en) | 2013-04-04 | 2015-11-17 | Western Digital (Fremont) | Perpendicular recording media with grain isolation initiation layer and exchange breaking layer for signal-to-noise ratio enhancement |
| US9093122B1 (en) | 2013-04-05 | 2015-07-28 | WD Media, LLC | Systems and methods for improving accuracy of test measurements involving aggressor tracks written to disks of hard disk drives |
| US8947987B1 (en) | 2013-05-03 | 2015-02-03 | WD Media, LLC | Systems and methods for providing capping layers for heat assisted magnetic recording media |
| US8867322B1 (en) | 2013-05-07 | 2014-10-21 | WD Media, LLC | Systems and methods for providing thermal barrier bilayers for heat assisted magnetic recording media |
| US9296082B1 (en) | 2013-06-11 | 2016-03-29 | WD Media, LLC | Disk buffing apparatus with abrasive tape loading pad having a vibration absorbing layer |
| US9406330B1 (en) | 2013-06-19 | 2016-08-02 | WD Media, LLC | Method for HDD disk defect source detection |
| US9607646B2 (en) | 2013-07-30 | 2017-03-28 | WD Media, LLC | Hard disk double lubrication layer |
| US9389135B2 (en) | 2013-09-26 | 2016-07-12 | WD Media, LLC | Systems and methods for calibrating a load cell of a disk burnishing machine |
| US9177585B1 (en) | 2013-10-23 | 2015-11-03 | WD Media, LLC | Magnetic media capable of improving magnetic properties and thermal management for heat-assisted magnetic recording |
| US9581510B1 (en) | 2013-12-16 | 2017-02-28 | Western Digital Technologies, Inc. | Sputter chamber pressure gauge with vibration absorber |
| US9382496B1 (en) | 2013-12-19 | 2016-07-05 | Western Digital Technologies, Inc. | Lubricants with high thermal stability for heat-assisted magnetic recording |
| US9824711B1 (en) | 2014-02-14 | 2017-11-21 | WD Media, LLC | Soft underlayer for heat assisted magnetic recording media |
| US9447368B1 (en) | 2014-02-18 | 2016-09-20 | WD Media, LLC | Detergent composition with low foam and high nickel solubility |
| US9431045B1 (en) | 2014-04-25 | 2016-08-30 | WD Media, LLC | Magnetic seed layer used with an unbalanced soft underlayer |
| US9042053B1 (en) | 2014-06-24 | 2015-05-26 | WD Media, LLC | Thermally stabilized perpendicular magnetic recording medium |
| US9159350B1 (en) | 2014-07-02 | 2015-10-13 | WD Media, LLC | High damping cap layer for magnetic recording media |
| US10054363B2 (en) | 2014-08-15 | 2018-08-21 | WD Media, LLC | Method and apparatus for cryogenic dynamic cooling |
| US9082447B1 (en) | 2014-09-22 | 2015-07-14 | WD Media, LLC | Determining storage media substrate material type |
| US8995078B1 (en) | 2014-09-25 | 2015-03-31 | WD Media, LLC | Method of testing a head for contamination |
| US9227324B1 (en) | 2014-09-25 | 2016-01-05 | WD Media, LLC | Mandrel for substrate transport system with notch |
| US9685184B1 (en) | 2014-09-25 | 2017-06-20 | WD Media, LLC | NiFeX-based seed layer for magnetic recording media |
| US9449633B1 (en) | 2014-11-06 | 2016-09-20 | WD Media, LLC | Smooth structures for heat-assisted magnetic recording media |
| US9818442B2 (en) | 2014-12-01 | 2017-11-14 | WD Media, LLC | Magnetic media having improved magnetic grain size distribution and intergranular segregation |
| US9401300B1 (en) | 2014-12-18 | 2016-07-26 | WD Media, LLC | Media substrate gripper including a plurality of snap-fit fingers |
| US9218850B1 (en) | 2014-12-23 | 2015-12-22 | WD Media, LLC | Exchange break layer for heat-assisted magnetic recording media |
| US9257134B1 (en) | 2014-12-24 | 2016-02-09 | Western Digital Technologies, Inc. | Allowing fast data zone switches on data storage devices |
| US9990940B1 (en) | 2014-12-30 | 2018-06-05 | WD Media, LLC | Seed structure for perpendicular magnetic recording media |
| US9280998B1 (en) | 2015-03-30 | 2016-03-08 | WD Media, LLC | Acidic post-sputter wash for magnetic recording media |
| US9822441B2 (en) | 2015-03-31 | 2017-11-21 | WD Media, LLC | Iridium underlayer for heat assisted magnetic recording media |
| US9275669B1 (en) | 2015-03-31 | 2016-03-01 | WD Media, LLC | TbFeCo in PMR media for SNR improvement |
| US11074934B1 (en) | 2015-09-25 | 2021-07-27 | Western Digital Technologies, Inc. | Heat assisted magnetic recording (HAMR) media with Curie temperature reduction layer |
| US10236026B1 (en) | 2015-11-06 | 2019-03-19 | WD Media, LLC | Thermal barrier layers and seed layers for control of thermal and structural properties of HAMR media |
| US9406329B1 (en) | 2015-11-30 | 2016-08-02 | WD Media, LLC | HAMR media structure with intermediate layer underlying a magnetic recording layer having multiple sublayers |
| US10121506B1 (en) | 2015-12-29 | 2018-11-06 | WD Media, LLC | Magnetic-recording medium including a carbon overcoat implanted with nitrogen and hydrogen |
| KR20240091384A (ko) * | 2022-12-13 | 2024-06-21 | 삼성디스플레이 주식회사 | 검사 장치 및 검사 방법 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6367549A (ja) * | 1986-09-10 | 1988-03-26 | Pioneer Electronic Corp | 光ディスク用レジスト原盤の欠陥検査及び膜厚測定装置 |
| JPH07286967A (ja) * | 1994-04-15 | 1995-10-31 | Sony Corp | 光ディスクの検査方法と検査装置 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3089484A (en) * | 1961-01-26 | 1963-05-14 | American Cystoscope Makers Inc | Flexible optical instrument particularly for carrying out surgical procedures |
| US3335715A (en) * | 1964-09-18 | 1967-08-15 | American Optical Corp | Fiber optic catheter |
| US4794265A (en) * | 1987-05-08 | 1988-12-27 | Qc Optics, Inc. | Surface pit detection system and method |
| US4794264A (en) * | 1987-05-08 | 1988-12-27 | Qc Optics, Inc. | Surface defect detection and confirmation system and method |
| US5637863A (en) * | 1994-08-24 | 1997-06-10 | Mdt Corporation | Surgical light with touchless switch |
| US5649897A (en) * | 1994-11-02 | 1997-07-22 | Terumo Kabushiki Kaisha | Endoscope apparatus for compensating for change in polarization state during image transmission |
| US5677769A (en) * | 1995-05-30 | 1997-10-14 | Imra America | Optical sensor utilizing rare-earth-doped integrated-optic lasers |
| WO1997026529A1 (en) * | 1996-01-19 | 1997-07-24 | Phase Metrics | Surface inspection apparatus and method |
| US5943130A (en) * | 1996-10-21 | 1999-08-24 | Insitec, Inc. | In situ sensor for near wafer particle monitoring in semiconductor device manufacturing equipment |
| US5719840A (en) * | 1996-12-30 | 1998-02-17 | Phase Metrics | Optical sensor with an elliptical illumination spot |
| CA2303885A1 (en) * | 1997-09-22 | 1999-04-01 | Infineon Technologies Ag | Optical system for injecting laser radiation into an optical conductor, and a method for its production |
| US6548821B1 (en) * | 1999-06-21 | 2003-04-15 | Komag, Inc. | Method and apparatus for inspecting substrates |
| US6566674B1 (en) * | 1999-06-21 | 2003-05-20 | Komag, Inc. | Method and apparatus for inspecting substrates |
| US7079472B2 (en) * | 1999-06-23 | 2006-07-18 | Dphi Acquisitions, Inc. | Beamshaper for optical head |
| US7227817B1 (en) * | 1999-12-07 | 2007-06-05 | Dphi Acquisitions, Inc. | Low profile optical head |
| GB0201969D0 (en) * | 2002-01-29 | 2002-03-13 | Qinetiq Ltd | Integrated optics devices |
| US6888988B2 (en) * | 2003-03-14 | 2005-05-03 | Agilent Technologies, Inc. | Small form factor all-polymer optical device with integrated dual beam path based on total internal reflection optical turn |
| US20050088748A1 (en) * | 2003-10-28 | 2005-04-28 | Leupold & Stevens, Inc. | Molded baffles for controlling stray light in an optical system |
-
2005
- 2005-04-22 US US11/112,172 patent/US7302148B2/en not_active Expired - Fee Related
- 2005-12-14 MY MYPI20055875A patent/MY137696A/en unknown
-
2006
- 2006-01-13 JP JP2006033042A patent/JP2006194899A/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6367549A (ja) * | 1986-09-10 | 1988-03-26 | Pioneer Electronic Corp | 光ディスク用レジスト原盤の欠陥検査及び膜厚測定装置 |
| JPH07286967A (ja) * | 1994-04-15 | 1995-10-31 | Sony Corp | 光ディスクの検査方法と検査装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20060153492A1 (en) | 2006-07-13 |
| US7302148B2 (en) | 2007-11-27 |
| MY137696A (en) | 2009-02-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2006194899A (ja) | ワークピースを光学的に検査するテストヘッド | |
| US7375362B2 (en) | Method and apparatus for reducing or eliminating stray light in an optical test head | |
| JP2006215040A (ja) | ワークピースを光学的に検査するための円偏光 | |
| JP2006220656A (ja) | ワークピースを光学的に検査するテストヘッド | |
| JP2006227006A (ja) | ワークピース上のレーザスポットを延長するためのレンズを備えた光学的ワークピース検査用テストヘッド | |
| JP2007147583A (ja) | ワークピースを光学的に検査するテストヘッド | |
| JP2006194900A (ja) | テストヘッドからプロセッサへデータを選択的に供給する方法及び装置 | |
| JP2006221790A (ja) | ワークピースを光学的に検査するためのロボットシステム | |
| JP3801635B2 (ja) | 製品表面の検査システムおよび方法 | |
| US5914495A (en) | Inspection apparatus for inspecting a defect of an optical disc | |
| US5625451A (en) | Methods and apparatus for characterizing a surface | |
| US5159412A (en) | Optical measurement device with enhanced sensitivity | |
| US7656519B2 (en) | Wafer edge inspection | |
| CN101171506A (zh) | 晶片边缘检测 | |
| US11988615B2 (en) | Region prober optical inspector | |
| JP5263783B2 (ja) | 光学特性測定装置及び測定方法 | |
| JPH05232035A (ja) | 空間フィルタと面構造をモニタするシステム | |
| US12405209B2 (en) | Apparatus and method for grazing angle measurement | |
| US6688743B1 (en) | Method and apparatus to determine fly height of a recording head | |
| US10648928B1 (en) | Scattered radiation optical scanner | |
| KR20010041003A (ko) | 레코딩 헤드의 부양 높이를 결정하는 방법 및 장치 | |
| JP5282009B2 (ja) | 光学式磁気ディスク両面欠陥検査装置及びその方法 | |
| JP2845041B2 (ja) | パーティクル計数装置 | |
| US20070242267A1 (en) | Optical Focusing Devices | |
| JPS5870109A (ja) | 組立精度測定装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090113 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20090113 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090310 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20110112 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110117 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20110808 |