JP2006156729A5 - - Google Patents

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Publication number
JP2006156729A5
JP2006156729A5 JP2004345415A JP2004345415A JP2006156729A5 JP 2006156729 A5 JP2006156729 A5 JP 2006156729A5 JP 2004345415 A JP2004345415 A JP 2004345415A JP 2004345415 A JP2004345415 A JP 2004345415A JP 2006156729 A5 JP2006156729 A5 JP 2006156729A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004345415A
Other languages
Japanese (ja)
Other versions
JP2006156729A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004345415A priority Critical patent/JP2006156729A/ja
Priority claimed from JP2004345415A external-priority patent/JP2006156729A/ja
Priority to US11/281,364 priority patent/US20060115227A1/en
Publication of JP2006156729A publication Critical patent/JP2006156729A/ja
Publication of JP2006156729A5 publication Critical patent/JP2006156729A5/ja
Priority to US12/475,688 priority patent/US7941025B2/en
Pending legal-status Critical Current

Links

JP2004345415A 2004-11-30 2004-11-30 コーティング膜の膜厚設計方法及び半導体光装置 Pending JP2006156729A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004345415A JP2006156729A (ja) 2004-11-30 2004-11-30 コーティング膜の膜厚設計方法及び半導体光装置
US11/281,364 US20060115227A1 (en) 2004-11-30 2005-11-18 Method of designing thickness of coating film and semiconductor photonic device
US12/475,688 US7941025B2 (en) 2004-11-30 2009-06-01 Semiconductor photonic device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004345415A JP2006156729A (ja) 2004-11-30 2004-11-30 コーティング膜の膜厚設計方法及び半導体光装置

Publications (2)

Publication Number Publication Date
JP2006156729A JP2006156729A (ja) 2006-06-15
JP2006156729A5 true JP2006156729A5 (enExample) 2007-12-06

Family

ID=36567494

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004345415A Pending JP2006156729A (ja) 2004-11-30 2004-11-30 コーティング膜の膜厚設計方法及び半導体光装置

Country Status (2)

Country Link
US (2) US20060115227A1 (enExample)
JP (1) JP2006156729A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8310679B2 (en) 2011-01-31 2012-11-13 Indian Institute Of Science Apparatus and methods for sensing or imaging using stacked thin films
CN121488371A (zh) * 2023-07-12 2026-02-06 三菱电机株式会社 光半导体装置的制造方法以及低反射率膜的设计方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2530029B2 (ja) * 1989-09-26 1996-09-04 オリンパス光学工業株式会社 多層膜分光器
JPH04350600A (ja) * 1991-05-28 1992-12-04 Olympus Optical Co Ltd X線用ハーフミラー
JP3014208B2 (ja) * 1992-02-27 2000-02-28 三菱電機株式会社 半導体光素子
JPH07201859A (ja) * 1993-12-29 1995-08-04 Sony Corp 配線形成方法および半導体装置
JP3353473B2 (ja) * 1994-07-26 2002-12-03 ソニー株式会社 半導体装置の製造方法
US5729323A (en) * 1994-07-29 1998-03-17 Baush & Lomb Incorporated Light-absorbing and anti-reflective coating for sunglasses
JPH0955351A (ja) * 1995-08-15 1997-02-25 Sony Corp 半導体装置の製造方法
JP2000114639A (ja) * 1998-10-01 2000-04-21 Sony Corp 半導体レーザ
JP2004088049A (ja) * 2002-03-08 2004-03-18 Mitsubishi Electric Corp 光半導体装置
JP2004111622A (ja) * 2002-09-18 2004-04-08 Mitsubishi Electric Corp 半導体レーザ素子
JP2004289108A (ja) 2002-09-27 2004-10-14 Mitsubishi Electric Corp 半導体光素子
US6990283B2 (en) * 2003-02-15 2006-01-24 Electronics And Telecommnications Research Institute Polymeric optical device having low polarization dependence and method of fabricating the same
TWI246240B (en) * 2003-03-11 2005-12-21 Pioneer Corp Multi-wavelength semiconductor laser device and manufacturing method thereof

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