JP2006153680A - Device for measuring film thickness/resistance - Google Patents

Device for measuring film thickness/resistance Download PDF

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JP2006153680A
JP2006153680A JP2004345251A JP2004345251A JP2006153680A JP 2006153680 A JP2006153680 A JP 2006153680A JP 2004345251 A JP2004345251 A JP 2004345251A JP 2004345251 A JP2004345251 A JP 2004345251A JP 2006153680 A JP2006153680 A JP 2006153680A
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film thickness
resistance
measurement
measured
measuring
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JP4546227B2 (en
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Tsutomu Kamimura
勉 上村
Kunihiro Akaha
邦宏 赤羽
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NEC Engineering Ltd
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<P>PROBLEM TO BE SOLVED: To accurately measure the film thickness of a printed pattern, etc. on a surface of a glass substrate for a plasma display panel, and the resistance value of an electrode in a stable state using a single device. <P>SOLUTION: This film thickness/resistance measuring instrument 1 is equipped with a positioning/fixing means 20 for positioning and fixing an object 5 under a measurement carried by a carrying means 10; a film thickness measuring means 30 for measuring the thickness of the printed pattern 6 on the surface of the fixed object 5; first and second resistance measuring means 40 and 50 for measuring the resistance value of the printed pattern 6 on the surface of the object 5; a first XY coarse movement robot 60, for mounting thereon the measuring means 30 and 40 to move the measuring means 30 and 40 to arbitrary positions on the object 5; a second XY coarse movement robot 61 for mounting thereon the second resistance measuring means 50, to cause it to operate interlockingly with the first resistance measuring means 40; a choice means 65 for choosing between film thickness measurement and resistance measurement; and a control means 70 for controlling the instrument as a whole. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、膜厚抵抗測定装置に関し、特に、プラズマディスプレイパネルの製造工程において、ガラス基板の表面に形成された印刷パターン等の膜厚と、電極の抵抗値とを測定するための膜厚抵抗測定装置に関する。   The present invention relates to a film thickness resistance measuring apparatus, and in particular, a film thickness resistance for measuring the film thickness of a printed pattern or the like formed on the surface of a glass substrate and the resistance value of an electrode in a plasma display panel manufacturing process. It relates to a measuring device.

従来、印刷配線板の部品搭載用のランドパターン上に供給されたはんだの印刷ずれ、膜厚及び印刷形状を測定するため、例えば、特許文献1に記載の検査装置は、XY直交ロボットのXY移動体に、印刷配線板の上に存在するはんだの膜厚を走査する変位センサと、印刷ずれを検出するITVエリアセンサとを搭載固定し、回転機構によりXY移動体の進行方向に対して変位センサが常に横スキャンを行い、正確な走査が可能である。また、被測定物の印刷配線板は、搬送コンベアにより装置内に供給され、位置決め、測定を行った後、装置から排出される。   Conventionally, in order to measure the printing deviation, film thickness, and printed shape of solder supplied on a land pattern for mounting components on a printed wiring board, for example, the inspection apparatus described in Patent Document 1 uses XY movement of an XY orthogonal robot. A displacement sensor that scans the film thickness of the solder existing on the printed wiring board and an ITV area sensor that detects printing misalignment are mounted and fixed on the body, and the displacement sensor with respect to the traveling direction of the XY moving body by a rotation mechanism Always performs a horizontal scan, and an accurate scan is possible. Moreover, the printed wiring board of a to-be-measured object is supplied in an apparatus with a conveyance conveyor, and after positioning and measuring, it is discharged | emitted from an apparatus.

一方、特許文献2には、2対の正対するXY移動機構と、Y軸アームに所定角度回動可能に保持された相対向する測定プローブとを備え、前記2個の測定プローブは、チェーン駆動による前記XY移動機構により、測定プローブの間隔及びこれらを結ぶ方向を自由に制御することができ、薄膜基板上に形成された抵抗膜等の電気的特性を測定することのできるオートプローブ装置が記載されている。   On the other hand, Patent Document 2 includes two pairs of XY movement mechanisms that face each other and measuring probes that are held opposite to each other by a predetermined angle on a Y-axis arm, and the two measurement probes are chain driven. The auto probe apparatus is capable of measuring the electrical characteristics of a resistive film or the like formed on a thin film substrate by freely controlling the interval between measurement probes and the direction connecting them by the XY movement mechanism according to the above. Has been.

特許第2691789号公報Japanese Patent No. 2691789 特開昭61−180148号公報JP-A-61-180148

しかし、上記特許文献1に記載のはんだ印刷検査装置においては、被測定物である印刷配線板を搬送コンベア上で固定しているため、印刷配線板を水平面内で保持することができず、印刷パターンと変位センサとの間に印刷配線板自身による反り、撓み等によるギャップが生じ、正確な測定結果が得られないという問題があった。   However, in the solder printing inspection apparatus described in Patent Document 1, the printed wiring board that is the object to be measured is fixed on the transport conveyor, so the printed wiring board cannot be held in a horizontal plane, and printing is performed. There is a problem that a warp due to the printed wiring board itself, a gap due to bending or the like occurs between the pattern and the displacement sensor, and an accurate measurement result cannot be obtained.

また、このはんだ印刷検査装置においては、XY直交ロボットによって測定センサを駆動しているため、XY直交ロボットの機構誤差により、測定センサを安定した状態で移動させることができず、膜厚値を安定して測定することができないという問題があった。   In this solder printing inspection device, the measurement sensor is driven by an XY orthogonal robot, so the measurement sensor cannot be moved in a stable state due to a mechanism error of the XY orthogonal robot, and the film thickness value is stabilized. There was a problem that it could not be measured.

さらに、特許文献1に記載のはんだ印刷検査装置には、変位センサのZ軸補正機能が存在しないため、印刷配線板の厚さが変更されると、印刷パターンの膜厚値を測定することができず、変位センサのパラメータ等の変更又は機種の交換が必要となるという問題があった。   Furthermore, since the solder printing inspection apparatus described in Patent Document 1 does not have the Z-axis correction function of the displacement sensor, the thickness value of the printed pattern can be measured when the thickness of the printed wiring board is changed. There is a problem that the displacement sensor parameters or the like need to be changed or the model needs to be replaced.

また、このはんだ印刷検査装置は、印刷配線板に印刷された電極の抵抗値を測定する機能が存在せず、同抵抗値を測定することはできない。   Moreover, this solder printing inspection apparatus does not have a function of measuring the resistance value of the electrode printed on the printed wiring board, and cannot measure the resistance value.

一方、特許文献2に開示されたオートプローブ装置は、XY軸移動の駆動方式がチェーン駆動であるため、印刷パターンへの測定プローブの正確な位置決め動作ができず、測定値に誤差が生じるという問題があった。   On the other hand, the auto-probe device disclosed in Patent Document 2 has a problem that an accurate positioning operation of the measurement probe on the print pattern cannot be performed and an error occurs in the measurement value because the driving method of the XY axis movement is chain drive. was there.

また、このオートプローブ装置は、2端子法を用いて抵抗測定を行っているが、2端子法ではプローブと被測定物との間に生じた接触抵抗まで測定してしまうため、正確な抵抗値を得ることができないという問題があった。   In addition, this auto-probe device measures resistance using the two-terminal method, but the two-terminal method measures even the contact resistance generated between the probe and the object to be measured. There was a problem that could not get.

そこで、本発明は、上記従来の技術における問題点に鑑みてなされたものであって、プラズマディスプレイパネルの製造工程において、ガラス基板の表面に形成された印刷パターン等の膜厚と、電極の抵抗値とを、安定した状態で、正確に、一つの装置で測定することのできる膜厚抵抗測定装置を提供することを目的とする。   Therefore, the present invention has been made in view of the above problems in the prior art, and in the manufacturing process of the plasma display panel, the film thickness of the printed pattern and the like formed on the surface of the glass substrate, and the resistance of the electrode It is an object of the present invention to provide a film thickness resistance measuring apparatus capable of accurately measuring values with a single apparatus in a stable state.

上記目的を達成するため、本発明は、膜厚抵抗測定装置であって、被測定物を搬送する搬送手段と、該搬送手段によって搬送された被測定物を位置決め固定する位置決め固定手段と、該位置決め固定手段によって位置決め固定された被測定物の表面の印刷パターンの厚さを測定する膜厚測定手段と、前記位置決め固定手段によって位置決め固定された被測定物の表面の印刷パターンの抵抗値を測定する測定端子を備えた第1抵抗測定手段及び第2抵抗測定手段と、前記膜厚測定手段と前記第1抵抗測定手段とを搭載し、前記被測定物の任意の位置に前記膜厚測定手段及び前記第1抵抗測定手段を移動させる第1XY粗動ロボットと、前記第2抵抗測定手段を搭載し、抵抗測定時にのみ前記第1抵抗測定手段と連動させて動作する第2XY粗動ロボットと、前記膜厚測定手段による膜厚測定又は前記第1抵抗測定手段及び第2抵抗測定手段による抵抗測定のいずれを行うかを選択する選択手段と、装置全体を制御する制御手段とを備えることを特徴とする。   In order to achieve the above object, the present invention provides a film thickness resistance measuring apparatus, a conveying means for conveying an object to be measured, a positioning fixing means for positioning and fixing an object to be measured conveyed by the conveying means, A film thickness measuring means for measuring the thickness of the printed pattern on the surface of the object to be measured positioned and fixed by the positioning and fixing means, and a resistance value of the printed pattern on the surface of the object to be measured positioned and fixed by the positioning and fixing means. A first resistance measuring means and a second resistance measuring means provided with a measuring terminal, the film thickness measuring means and the first resistance measuring means, and the film thickness measuring means at an arbitrary position of the object to be measured. And a first XY coarse motion robot that moves the first resistance measurement means and a second resistance measurement means, and a second XY coarse motion that operates in conjunction with the first resistance measurement means only during resistance measurement. A bot; selection means for selecting whether to perform film thickness measurement by the film thickness measurement means or resistance measurement by the first resistance measurement means and the second resistance measurement means; and control means for controlling the entire apparatus. It is characterized by that.

そして、本発明によれば、搬送手段と位置決め固定手段により、被測定物を本装置に投入すると、搬送された被測定物を位置決め固定することができ、被測定物の水平方向の安定が保障され、安定した状態で測定作業を行うことができ、測定精度が向上する。   According to the present invention, when the object to be measured is inserted into the apparatus by the conveying means and the positioning and fixing means, the conveyed object to be measured can be positioned and fixed, and the horizontal stability of the object to be measured is guaranteed. Thus, the measurement operation can be performed in a stable state, and the measurement accuracy is improved.

また、第1抵抗測定手段と、第2抵抗測定手段とを別々にXY粗動ロボットに搭載したため、被測定物上の印刷パターンの方向に合わせた抵抗測定が可能となる。   In addition, since the first resistance measuring unit and the second resistance measuring unit are separately mounted on the XY coarse motion robot, it is possible to measure the resistance in accordance with the direction of the printed pattern on the object to be measured.

さらに、選択手段によって、膜厚測定と抵抗測定のいずれを行うかを選択することにより、一台の装置で2種類の測定が可能となる。   Furthermore, by selecting which of the film thickness measurement and the resistance measurement is performed by the selection unit, two types of measurement can be performed with one apparatus.

前記膜厚抵抗測定装置において、前記搬送手段を、前記被測定物の存在を確認する確認センサと、前記被測定物の下方に位置する複数の搬送コロと、該複数の搬送コロを駆動する搬送モータと、前記複数の搬送コロを上下動させるアクチェータとを備えるように構成することができる。   In the film thickness resistance measuring apparatus, the conveying means includes a confirmation sensor for confirming the presence of the object to be measured, a plurality of conveying rollers positioned below the object to be measured, and a conveyance for driving the plurality of conveying rollers. A motor and an actuator for moving the plurality of conveying rollers up and down can be provided.

前記膜厚抵抗測定装置において、前記位置決め固定手段を、搬送された前記被測定物を位置決めする位置決めピンと、該位置決めピンを駆動するアクチェータと、前記被測定物を固定する吸着パッドと、前記被測定物を固定保持する基板固定ベースとを備えるように構成することができる。   In the film thickness resistance measuring apparatus, the positioning fixing means includes a positioning pin for positioning the conveyed object to be measured, an actuator for driving the positioning pin, a suction pad for fixing the object to be measured, and the object to be measured. A substrate fixing base for fixing and holding an object can be provided.

前記膜厚抵抗測定装置において、前記膜厚測定手段を、前記被測定物上の印刷パターンの膜厚を測定するレーザ変位センサと、該レーザ変位センサを保持し、測定高さを微調するZ軸と、該Z軸を搭載して測定動作を行うXY微動ステージと、測定動作を観察するモニタ用光学系とを備えるように構成することができる。   In the film thickness resistance measuring apparatus, the film thickness measuring means includes a laser displacement sensor that measures the film thickness of the printed pattern on the object to be measured, and a Z axis that holds the laser displacement sensor and finely adjusts the measurement height. And an XY fine movement stage that mounts the Z axis and performs a measurement operation, and a monitor optical system that observes the measurement operation.

前記膜厚抵抗測定装置において、前記第1抵抗測定手段及び第2抵抗測定手段の各々が、接触式端子を備えた2個の測定部を、XYZθ軸方向に対し、独立して駆動可能な機構を有するように構成することができる。これによって、測定物を移動させることなく、縦、横いずれの印刷パターン方向も4端子法を用いて測定することができ、より正確な印刷パターンへの接触が可能となり、断線、パターンの欠け等を検出することもできる。   In the film thickness resistance measuring apparatus, each of the first resistance measuring means and the second resistance measuring means can drive two measuring units each having a contact type terminal independently with respect to the XYZθ axis direction. It can comprise so that it may have. This makes it possible to measure both the vertical and horizontal print pattern directions using the four-terminal method without moving the measurement object, enabling more accurate contact with the print pattern, disconnection, missing pattern, etc. Can also be detected.

前記膜厚抵抗測定装置で測定される被測定物を、プラズマディスプレイ用ガラス基板とすることができる。これによって、プラズマディスプレイ用ガラス基板検査工程の品質向上を図りつつ、簡易な構成を有し、安価な測定装置を提供することができる。   An object to be measured that is measured by the film thickness resistance measuring apparatus can be a glass substrate for plasma display. Accordingly, it is possible to provide an inexpensive measuring device having a simple configuration while improving the quality of the plasma display glass substrate inspection process.

以上のように、本発明によれば、プラズマディスプレイパネル用ガラス基板の表面に形成された印刷パターン等の膜厚と、電極の抵抗値とを、安定した状態で、正確に、一つの装置で測定することのできる膜厚抵抗測定装置を提供することができる。   As described above, according to the present invention, the film thickness of the printed pattern and the like formed on the surface of the glass substrate for the plasma display panel and the resistance value of the electrode can be accurately measured in a single device. A film thickness resistance measuring device capable of measuring can be provided.

本発明にかかる膜厚抵抗測定装置によって測定される被測定物の一例として、プラズマディスプレイ用ガラス基板(以下、「ガラス基板」という)を図10に示す。尚、図10は、本発明にかかる膜厚抵抗測定装置によってガラス基板5の抵抗測定を行っている状態を示している。このガラス基板5は、表面に導電性膜が印刷された後、膜厚の測定を行うために膜厚抵抗測定装置に供給され、さらに、ガラス基板5を焼成した後、本発明にかかる膜厚抵抗測定装置に供給して抵抗値が測定される。   FIG. 10 shows a glass substrate for plasma display (hereinafter referred to as “glass substrate”) as an example of an object to be measured measured by the film thickness resistance measuring apparatus according to the present invention. In addition, FIG. 10 has shown the state which is measuring the resistance of the glass substrate 5 with the film thickness resistance measuring apparatus concerning this invention. After the conductive film is printed on the surface of the glass substrate 5, the glass substrate 5 is supplied to a film thickness resistance measuring device to measure the film thickness. Further, after the glass substrate 5 is baked, the film thickness according to the present invention is applied. The resistance value is measured by supplying the resistance measurement device.

図1乃至図3は、本発明にかかる膜厚抵抗測定装置の一実施の形態を示し、この膜厚抵抗測定装置1は、被測定物のガラス基板5を外部から膜厚抵抗測定装置1内に搬送する基板搬送部(搬送手段)10と、ガラス基板5を位置決め固定する基板固定部(位置決め固定手段)20と、ガラス基板5の表面に印刷された導電性のパターン(以下、「印刷パターン」という)6の膜厚を測定する膜厚測定部30と、印刷パターン6の抵抗値を測定する第1抵抗測定部40及び第2抵抗測定部50と、膜厚測定部30と第1抵抗測定部40とを搭載してガラス基板5の任意の位置に移動する第1XY粗動ロボット60と、第2抵抗測定部50を搭載して抵抗測定時にのみ稼動する第2XY粗動ロボット61と、これらを操作して検査データを表示する操作パネル65と、各部を制御する制御部70等で構成される。   1 to 3 show an embodiment of a film thickness resistance measuring apparatus according to the present invention. The film thickness resistance measuring apparatus 1 includes a glass substrate 5 of an object to be measured from the outside in the film thickness resistance measuring apparatus 1. A substrate transporting part (conveying means) 10 for transporting to the substrate, a substrate fixing part (positioning fixing means) 20 for positioning and fixing the glass substrate 5, and a conductive pattern printed on the surface of the glass substrate 5 (hereinafter referred to as "printing pattern" The film thickness measuring unit 30 for measuring the film thickness 6), the first resistance measuring unit 40 and the second resistance measuring unit 50 for measuring the resistance value of the printed pattern 6, the film thickness measuring unit 30 and the first resistance. A first XY coarse motion robot 60 that is mounted with the measurement unit 40 and moves to an arbitrary position of the glass substrate 5; a second XY coarse motion robot 61 that is equipped with the second resistance measurement unit 50 and operates only during resistance measurement; Operate these to display inspection data An operation panel 65, and a control unit 70 for controlling the respective units.

基板搬送部10は、図4に示すように、ガラス基板5の存在を確認する確認センサ11と、搬送コロ12を駆動する搬送モータ13と、搬送コロ12を上下動させるアクチェータ14とで構成され、ガラス基板5を基板固定部20に搬送する。   As shown in FIG. 4, the substrate transport unit 10 includes a confirmation sensor 11 that confirms the presence of the glass substrate 5, a transport motor 13 that drives the transport roller 12, and an actuator 14 that moves the transport roller 12 up and down. Then, the glass substrate 5 is conveyed to the substrate fixing unit 20.

基板固定部20は、図5に示すように、搬送されたガラス基板5を位置決めする位置決めピン21と、位置決めピン21を駆動するアクチェータ22と、ガラス基板5を固定する吸着パッド23と、ガラス基板5を固定保持する基板固定ベース24とで構成される。   As shown in FIG. 5, the substrate fixing unit 20 includes a positioning pin 21 that positions the conveyed glass substrate 5, an actuator 22 that drives the positioning pin 21, a suction pad 23 that fixes the glass substrate 5, and a glass substrate. And a substrate fixing base 24 for fixing and holding 5.

膜厚測定部(膜厚測定手段)30は、図6(a)に示すように、ガラス基板5の表面の印刷パターン6の膜厚を測定するレーザ変位センサ31を保持し、測定高さを微調する第1Z軸32と、第1Z軸32を搭載して測定動作を行うXY微動ステージ33と、測定動作を観察するモニタ用光学系34(図6(b)参照)とで構成される。   The film thickness measuring unit (film thickness measuring means) 30 holds a laser displacement sensor 31 that measures the film thickness of the printed pattern 6 on the surface of the glass substrate 5 as shown in FIG. The first Z axis 32 for fine adjustment, an XY fine movement stage 33 that mounts the first Z axis 32 and performs a measurement operation, and a monitoring optical system 34 (see FIG. 6B) for observing the measurement operation.

第1抵抗測定部(抵抗測定手段)40は、図6(b)に示すように、印刷パターン6の抵抗値を測定する第1測定端子41と、第1測定端子41を保持して上下動及び測定動作を行う第2Z軸42と、第1測定端子41を回転させる回転アクチェータ43と、測定状態を観察するモニタ用光学系44とで構成され、前記したXY微動ステージ33(図6(a)参照)に搭載される。   As shown in FIG. 6B, the first resistance measurement unit (resistance measurement means) 40 holds the first measurement terminal 41 for measuring the resistance value of the printed pattern 6 and moves up and down while holding the first measurement terminal 41. The XY fine movement stage 33 (FIG. 6A) includes the second Z-axis 42 that performs the measurement operation, the rotary actuator 43 that rotates the first measurement terminal 41, and the monitoring optical system 44 that observes the measurement state. ))).

第2測定端子部50は、印刷パターン6の抵抗測定時にのみ稼動し、図7に示すように、第2測定端子51と、第2測定端子51を保持して上下動及び測定動作を行う第3Z軸52と、第2測定端子51を回転させる回転アクチェータ53とで構成される。   The second measurement terminal unit 50 operates only at the time of measuring the resistance of the printed pattern 6, and as shown in FIG. 7, the second measurement terminal 51 holds the second measurement terminal 51 and performs a vertical movement and measurement operation. It is composed of a 3Z axis 52 and a rotary actuator 53 that rotates the second measurement terminal 51.

操作パネル65は、図3に示すように、膜厚抵抗測定装置1の操作を行うタッチパネル66と、膜厚/抵抗測定状態を表示するモニタ67と、膜厚測定コントローラ68と、抵抗測定器69とで構成される。   As shown in FIG. 3, the operation panel 65 includes a touch panel 66 for operating the film thickness resistance measuring device 1, a monitor 67 for displaying a film thickness / resistance measurement state, a film thickness measurement controller 68, and a resistance measuring device 69. It consists of.

制御部70は、膜厚抵抗測定装置1全体の制御及びデータ管理を行い、膜厚抵抗測定装置1を稼動させてガラス基板5の膜厚測定/抵抗測定を行う。   The control unit 70 performs control and data management of the film thickness resistance measuring apparatus 1 as a whole, and operates the film thickness resistance measuring apparatus 1 to perform film thickness measurement / resistance measurement of the glass substrate 5.

次に、上記構成を有する膜厚抵抗測定装置の動作について、図4乃至図10を中心に参照しながら説明する。   Next, the operation of the film thickness resistance measuring apparatus having the above configuration will be described with reference to FIGS.

作業者が図1及び図2に示す基板搬送部10へガラス基板5を供給すると、図4の確認センサ11によってガラス基板5の存在が検出され、搬送モータ13が駆動され、ガラス基板5は、搬送コロ12によって図1の基板固定部20まで搬送される。次に、搬送コロ12がアクチェータ14により下降し、ガラス基板5が基板固定部20に移載される。   When the operator supplies the glass substrate 5 to the substrate transport unit 10 shown in FIGS. 1 and 2, the presence of the glass substrate 5 is detected by the confirmation sensor 11 in FIG. 4, the transport motor 13 is driven, and the glass substrate 5 is It is conveyed to the board | substrate fixing | fixed part 20 of FIG. Next, the conveyance roller 12 is lowered by the actuator 14, and the glass substrate 5 is transferred to the substrate fixing unit 20.

基板固定部20に搬送されたガラス基板5は、設定された基板サイズにより、図5の位置決めピン21がアクチェータ22により移動して位置決めを行い、吸着パッド23によってガラス基板5が固定される。これにより、基板5は基板固定ベース24に固定され、各サイズの基板の水平方向における位置決め精度が安定し、正確な測定作業を行うことができる。   The glass substrate 5 conveyed to the substrate fixing unit 20 is positioned by moving the positioning pin 21 of FIG. 5 by the actuator 22 according to the set substrate size, and the glass substrate 5 is fixed by the suction pad 23. As a result, the substrate 5 is fixed to the substrate fixing base 24, the positioning accuracy in the horizontal direction of each size substrate is stabilized, and an accurate measurement operation can be performed.

膜厚抵抗測定装置1による測定作業は、図3の基板固定後操作パネル65により、作業者が膜厚測定又は抵抗測定のいずれかを選択することによって行う。   The measurement work by the film thickness resistance measuring apparatus 1 is performed by the operator selecting either film thickness measurement or resistance measurement by the operation panel 65 after fixing the substrate in FIG.

作業者が膜厚測定作業を選択すると、膜厚測定コントローラ68が起動し、図6(a)の膜厚測定部30を第1XY粗動ロボット60により測定位置まで移動させ、第1Z軸32によりレーザ変位センサ31を測定高さまで下降させる。そして、図3の膜厚測定コントローラ68による制御によって、図8に示すように、レーザ変位センサ31よりレーザ光35を出射し、図9に示すように、ガラス基板5の表面での0値補正36を行い、図6(a)のXY微動ステージ33により、図8に示すように、レーザ変位センサ31を測定開始位置から印刷パターン6まで往復移動させ、レーザ光35の反射変位により、図9に示すように、印刷パターン6の膜厚37(本装置では10μm〜100μm)を測定する。   When the operator selects the film thickness measurement work, the film thickness measurement controller 68 is activated, and the film thickness measurement unit 30 in FIG. 6A is moved to the measurement position by the first XY coarse movement robot 60, and is moved by the first Z axis 32. The laser displacement sensor 31 is lowered to the measurement height. Then, under the control of the film thickness measurement controller 68 in FIG. 3, the laser displacement sensor 31 emits laser light 35 as shown in FIG. 8, and zero value correction on the surface of the glass substrate 5 as shown in FIG. 36, the laser displacement sensor 31 is reciprocated from the measurement start position to the print pattern 6 as shown in FIG. 8 by the XY fine movement stage 33 of FIG. As shown in FIG. 4, the film thickness 37 of the printed pattern 6 (10 μm to 100 μm in this apparatus) is measured.

膜厚抵抗測定装置1では、1〜50個/基板の測定位置の登録が可能で、0値補正36は、測定位置毎に行い、ガラス基板5の表面粗さによる誤差を最小限に抑えている。その際、図6(b)のモニタ用光学系34で測定状況をモニタし、図3の膜厚測定コントローラ68でモニタ上に測定軌跡と測定データが表示される。   The film thickness resistance measuring apparatus 1 can register 1 to 50 measurement positions per substrate, and the zero value correction 36 is performed for each measurement position to minimize an error due to the surface roughness of the glass substrate 5. Yes. At that time, the measurement state is monitored by the monitoring optical system 34 in FIG. 6B, and the measurement locus and measurement data are displayed on the monitor by the film thickness measurement controller 68 in FIG.

すべての測定データは、制御部(制御手段)70に格納され、上位装置に送信することもできる。また、操作パネル65におけるJOG操作により、測定位置として登録していないガラス基板5上の任意の位置で測定することも可能である。   All the measurement data is stored in the control unit (control means) 70 and can be transmitted to the host device. It is also possible to perform measurement at an arbitrary position on the glass substrate 5 that is not registered as a measurement position by JOG operation on the operation panel 65.

次に、抵抗測定作業を選択すると、図3の抵抗測定器69が起動し、ガラス基板5の上の印刷パターン6の方向に合わせて、図6及び図7の回転アクチェータ43、53を駆動し、第1測定端子41、第2測定端子51を回転させる。これは、4端子法を用いているため、電流端子と電圧端子の方向を電極方向と一致させるためである。その後、第1抵抗測定部40は、第1XY粗動ロボット60により登録された測定位置まで移動し、第2抵抗測定部50も第2XY粗動ロボット61により登録された測定位置まで移動する。   Next, when the resistance measurement operation is selected, the resistance measuring device 69 in FIG. 3 is activated, and the rotary actuators 43 and 53 in FIGS. 6 and 7 are driven in accordance with the direction of the printed pattern 6 on the glass substrate 5. The first measurement terminal 41 and the second measurement terminal 51 are rotated. This is because the direction of the current terminal and the voltage terminal coincides with the electrode direction because the four-terminal method is used. Thereafter, the first resistance measurement unit 40 moves to the measurement position registered by the first XY coarse movement robot 60, and the second resistance measurement unit 50 also moves to the measurement position registered by the second XY coarse movement robot 61.

第1抵抗測定部40の第2Z軸42を駆動し、第1測定端子41を下降させると同時に、第2抵抗測定部50の第3Z軸52を駆動し、第2測定端子51を下降させ、ガラス基板5上の印刷パターン6に第1測定端子41及び第2測定端子51を接触させ、抵抗測定動作を行う。測定状態は、モニタ用光学系44により観察することができる。膜厚抵抗測定装置1では、1〜50個/基板の測定位置を登録することができ、測定データは、操作パネルに表示され、すべての測定データを制御部70に格納し、上位装置に送信することもできる。   Driving the second Z axis 42 of the first resistance measurement unit 40 and lowering the first measurement terminal 41, simultaneously driving the third Z axis 52 of the second resistance measurement unit 50, lowering the second measurement terminal 51, The first measurement terminal 41 and the second measurement terminal 51 are brought into contact with the printed pattern 6 on the glass substrate 5 to perform a resistance measurement operation. The measurement state can be observed by the monitoring optical system 44. The film thickness resistance measuring apparatus 1 can register 1 to 50 measurement positions per substrate, and the measurement data is displayed on the operation panel, and all the measurement data is stored in the control unit 70 and transmitted to the host apparatus. You can also

測定作業終了後は、図5の基板固定部20の吸着パッド23、位置決めピン21を解除し、基板搬送部10のアクチェータ14により搬送コロ13を上昇させ、搬送モータ13を駆動し、ガラス基板5を回収する。   After completion of the measurement operation, the suction pad 23 and the positioning pin 21 of the substrate fixing unit 20 in FIG. 5 are released, the conveyance roller 13 is raised by the actuator 14 of the substrate conveyance unit 10, the conveyance motor 13 is driven, and the glass substrate 5 Recover.

本発明にかかる膜厚抵抗測定装置全体を示す平面図である。It is a top view which shows the whole film thickness resistance measuring apparatus concerning this invention. 図1のA−A断面図である。It is AA sectional drawing of FIG. 図1の膜厚抵抗測定装置の正面図である。It is a front view of the film thickness resistance measuring apparatus of FIG. 図1の膜厚抵抗測定装置の基板搬送部を示す正面図である。It is a front view which shows the board | substrate conveyance part of the film thickness resistance measuring apparatus of FIG. 図1の膜厚抵抗測定装置の基板固定部を示す正面図である。It is a front view which shows the board | substrate fixing | fixed part of the film thickness resistance measuring apparatus of FIG. 図1の膜厚抵抗測定装置の膜厚測定部/第1抵抗測定部を示す図であって、(a)は正面図、(b)は(a)のB−B矢視図である。It is a figure which shows the film thickness measurement part / 1st resistance measurement part of the film thickness resistance measuring apparatus of FIG. 1, Comprising: (a) is a front view, (b) is a BB arrow line view of (a). 図1の膜厚抵抗測定装置の第2抵抗測定部を示す正面図である。It is a front view which shows the 2nd resistance measurement part of the film thickness resistance measuring apparatus of FIG. 図1の膜厚抵抗測定装置による膜厚測定状態を示す図である。It is a figure which shows the film thickness measurement state by the film thickness resistance measuring apparatus of FIG. 図1の膜厚抵抗測定装置による膜厚測定状態を示す図である。It is a figure which shows the film thickness measurement state by the film thickness resistance measuring apparatus of FIG. 図1の膜厚抵抗測定装置による抵抗測定状態を示す図であって、(a)は印刷パターンが縦方向に延設されたガラス基板、(b)は印刷パターンが横方向に延設されたガラス基板を測定している状態を示す。It is a figure which shows the resistance measurement state by the film thickness resistance measuring apparatus of FIG. 1, Comprising: (a) is the glass substrate by which the printing pattern was extended in the vertical direction, (b) was by the printing pattern extended in the horizontal direction. The state which is measuring the glass substrate is shown.

符号の説明Explanation of symbols

1 膜厚抵抗測定装置
5 ガラス基板
6 印刷パターン
10 基板搬送部
11 確認センサ
12 搬送コロ
13 搬送モータ
14 アクチェータ
20 基板固定部
21 位置決めピン
22 アクチェータ
23 吸着パッド
24 基板固定ベース
30 膜厚測定部
31 レーザ変位センサ
32 第1Z軸
33 XY微動ステージ
34 モニタ用光学系
35 レーザ光
36 0値補正
37 膜厚
40 第1抵抗測定部
41 第1測定端子
42 第2Z軸
43 回転アクチェータ
44 モニタ用光学系
50 第2抵抗測定部
51 第2測定端子
52 第3Z軸
53 回転アクチェータ
60 第1XY粗動ロボット
61 第2XY粗動ロボット
65 操作パネル
66 タッチパネル
67 モニタ
68 膜厚測定コントローラ
69 抵抗測定器
70 制御部
DESCRIPTION OF SYMBOLS 1 Film thickness resistance measuring apparatus 5 Glass substrate 6 Print pattern 10 Substrate conveyance part 11 Confirmation sensor 12 Conveyance roller 13 Conveyance motor 14 Actuator 20 Substrate fixing part 21 Positioning pin 22 Actuator 23 Adsorption pad 24 Substrate fixation base 30 Film thickness measurement part 31 Laser Displacement sensor 32 First Z axis 33 XY fine movement stage 34 Monitor optical system 35 Laser light 36 0 value correction 37 Film thickness 40 First resistance measurement unit 41 First measurement terminal 42 Second Z axis 43 Rotating actuator 44 Monitor optical system 50 2 resistance measurement unit 51 2nd measurement terminal 52 3rd Z axis 53 rotary actuator 60 1st XY coarse motion robot 61 2nd XY coarse motion robot 65 operation panel 66 touch panel 67 monitor 68 film thickness measurement controller 69 resistance measurement device 70 control unit

Claims (6)

被測定物を搬送する搬送手段と、
該搬送手段によって搬送された被測定物を位置決め固定する位置決め固定手段と、
該位置決め固定手段によって位置決め固定された被測定物の表面の印刷パターンの厚さを測定する膜厚測定手段と、
前記位置決め固定手段によって位置決め固定された被測定物の表面の印刷パターンの抵抗値を測定する測定端子を備えた第1抵抗測定手段及び第2抵抗測定手段と、
前記膜厚測定手段と前記第1抵抗測定手段とを搭載し、前記被測定物の任意の位置に前記膜厚測定手段及び前記第1抵抗測定手段を移動させる第1XY粗動ロボットと、
前記第2抵抗測定手段を搭載し、抵抗測定時にのみ前記第1抵抗測定手段と連動させて動作する第2XY粗動ロボットと、
前記膜厚測定手段による膜厚測定又は前記第1抵抗測定手段及び第2抵抗測定手段による抵抗測定のいずれを行うかを選択する選択手段と、
装置全体を制御する制御手段とを備えることを特徴とする膜厚抵抗測定装置。
Conveying means for conveying the object to be measured;
Positioning fixing means for positioning and fixing an object to be measured conveyed by the conveying means;
A film thickness measuring means for measuring the thickness of the printed pattern on the surface of the object to be measured positioned and fixed by the positioning and fixing means;
A first resistance measuring means and a second resistance measuring means provided with measuring terminals for measuring the resistance value of the printed pattern on the surface of the object to be measured positioned and fixed by the positioning fixing means;
A first XY coarse movement robot which is equipped with the film thickness measurement means and the first resistance measurement means, and moves the film thickness measurement means and the first resistance measurement means to an arbitrary position of the object to be measured;
A second XY coarse motion robot equipped with the second resistance measuring means and operating in conjunction with the first resistance measuring means only during resistance measurement;
Selection means for selecting whether to perform film thickness measurement by the film thickness measurement means or resistance measurement by the first resistance measurement means and the second resistance measurement means;
A film thickness resistance measuring apparatus comprising a control means for controlling the entire apparatus.
前記搬送手段は、
前記被測定物の存在を確認する確認センサと、
前記被測定物の下方に位置する複数の搬送コロと、
該複数の搬送コロを駆動する搬送モータと、
前記複数の搬送コロを上下動させるアクチェータとを備えることを特徴とする請求項1に記載の膜厚抵抗測定装置。
The conveying means is
A confirmation sensor for confirming the presence of the object to be measured;
A plurality of conveying rollers located below the object to be measured;
A transport motor for driving the plurality of transport rollers;
The film thickness resistance measuring apparatus according to claim 1, further comprising an actuator that moves the plurality of conveying rollers up and down.
前記位置決め固定手段は、
搬送された前記被測定物を位置決めする位置決めピンと、
該位置決めピンを駆動するアクチェータと、
前記被測定物を固定する吸着パッドと、
前記被測定物を固定保持する基板固定ベースとを備えることを特徴とする請求項1又は2に記載の膜厚抵抗測定装置。
The positioning and fixing means includes
A positioning pin for positioning the object to be measured,
An actuator for driving the positioning pin;
A suction pad for fixing the object to be measured;
The film thickness resistance measuring apparatus according to claim 1, further comprising a substrate fixing base that fixes and holds the object to be measured.
前記膜厚測定手段は、
前記被測定物上の印刷パターンの膜厚を測定するレーザ変位センサと、
該レーザ変位センサを保持し、測定高さを微調するZ軸と、
該Z軸を搭載して測定動作を行うXY微動ステージと、
測定動作を観察するモニタ用光学系とを備えることを特徴とする請求項1、2又は3に記載の膜厚抵抗測定装置。
The film thickness measuring means includes
A laser displacement sensor for measuring a film thickness of a printed pattern on the object to be measured;
A Z-axis that holds the laser displacement sensor and finely adjusts the measurement height;
An XY fine movement stage which mounts the Z axis and performs a measurement operation;
The film thickness resistance measuring apparatus according to claim 1, further comprising a monitoring optical system for observing the measuring operation.
前記第1抵抗測定手段及び第2抵抗測定手段の各々は、接触式端子を備えた2個の測定部を、XYZθ軸方向に対し、独立して駆動可能な機構を有することを特徴とする請求項1乃至4のいずれかに記載の膜厚抵抗測定装置。   Each of the first resistance measurement unit and the second resistance measurement unit includes a mechanism capable of independently driving two measurement units including contact-type terminals with respect to the XYZθ axis direction. Item 5. The film thickness resistance measuring device according to any one of Items 1 to 4. 前記被測定物は、プラズマディスプレイ用ガラス基板であることを特徴とする請求項1乃至5のいずれかに記載の膜厚抵抗測定装置。   6. The film thickness resistance measuring apparatus according to claim 1, wherein the object to be measured is a glass substrate for plasma display.
JP2004345251A 2004-11-30 2004-11-30 Film thickness resistance measuring device Expired - Fee Related JP4546227B2 (en)

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Publication number Priority date Publication date Assignee Title
CN101923115A (en) * 2010-08-17 2010-12-22 攀枝花学院 Method for measuring resistivity of material
KR101571585B1 (en) 2008-11-13 2015-11-24 시바우라 메카트로닉스 가부시끼가이샤 Substrate processing apparatus and substrate processing method
CN105372499A (en) * 2015-11-25 2016-03-02 亿和精密工业(苏州)有限公司 Micro-resistance measurement equipment and measurement method
CN112229337A (en) * 2020-10-20 2021-01-15 蚌埠中光电科技有限公司 Online nondestructive thickness measuring device for advanced substrate glass

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JPH07294246A (en) * 1994-04-26 1995-11-10 Sumitomo Rubber Ind Ltd Method and apparatus for measuring surface accuracy of planar body
JP2003075294A (en) * 2001-09-05 2003-03-12 Toray Ind Inc Method for inspecting substrate
JP2004111911A (en) * 2002-07-22 2004-04-08 Dainippon Screen Mfg Co Ltd Device and method for measuring film thickness, and device and method for measuring relative dielectric constant

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Publication number Priority date Publication date Assignee Title
JPH07294246A (en) * 1994-04-26 1995-11-10 Sumitomo Rubber Ind Ltd Method and apparatus for measuring surface accuracy of planar body
JP2003075294A (en) * 2001-09-05 2003-03-12 Toray Ind Inc Method for inspecting substrate
JP2004111911A (en) * 2002-07-22 2004-04-08 Dainippon Screen Mfg Co Ltd Device and method for measuring film thickness, and device and method for measuring relative dielectric constant

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101571585B1 (en) 2008-11-13 2015-11-24 시바우라 메카트로닉스 가부시끼가이샤 Substrate processing apparatus and substrate processing method
CN101923115A (en) * 2010-08-17 2010-12-22 攀枝花学院 Method for measuring resistivity of material
CN101923115B (en) * 2010-08-17 2012-07-18 攀枝花学院 Method for measuring resistivity of material
CN105372499A (en) * 2015-11-25 2016-03-02 亿和精密工业(苏州)有限公司 Micro-resistance measurement equipment and measurement method
CN112229337A (en) * 2020-10-20 2021-01-15 蚌埠中光电科技有限公司 Online nondestructive thickness measuring device for advanced substrate glass

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