JP2006147654A5 - - Google Patents

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Publication number
JP2006147654A5
JP2006147654A5 JP2004332080A JP2004332080A JP2006147654A5 JP 2006147654 A5 JP2006147654 A5 JP 2006147654A5 JP 2004332080 A JP2004332080 A JP 2004332080A JP 2004332080 A JP2004332080 A JP 2004332080A JP 2006147654 A5 JP2006147654 A5 JP 2006147654A5
Authority
JP
Japan
Prior art keywords
substrate
back surface
substance
vicinity
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004332080A
Other languages
English (en)
Japanese (ja)
Other versions
JP4610308B2 (ja
JP2006147654A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004332080A priority Critical patent/JP4610308B2/ja
Priority claimed from JP2004332080A external-priority patent/JP4610308B2/ja
Priority to US11/274,117 priority patent/US7648581B2/en
Publication of JP2006147654A publication Critical patent/JP2006147654A/ja
Publication of JP2006147654A5 publication Critical patent/JP2006147654A5/ja
Priority to US12/627,685 priority patent/US7913702B2/en
Application granted granted Critical
Publication of JP4610308B2 publication Critical patent/JP4610308B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004332080A 2004-11-16 2004-11-16 基板洗浄方法、基板洗浄装置、基板処理システム、基板洗浄プログラム及び記憶媒体 Expired - Fee Related JP4610308B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004332080A JP4610308B2 (ja) 2004-11-16 2004-11-16 基板洗浄方法、基板洗浄装置、基板処理システム、基板洗浄プログラム及び記憶媒体
US11/274,117 US7648581B2 (en) 2004-11-16 2005-11-16 Substrate cleaning method, substrate cleaning apparatus, substrate processing system, substrate cleaning program and storage medium
US12/627,685 US7913702B2 (en) 2004-11-16 2009-11-30 Substrate cleaning method, substrate cleaning apparatus, substrate processing system, substrate cleaning program and storage medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004332080A JP4610308B2 (ja) 2004-11-16 2004-11-16 基板洗浄方法、基板洗浄装置、基板処理システム、基板洗浄プログラム及び記憶媒体

Publications (3)

Publication Number Publication Date
JP2006147654A JP2006147654A (ja) 2006-06-08
JP2006147654A5 true JP2006147654A5 (enExample) 2007-12-27
JP4610308B2 JP4610308B2 (ja) 2011-01-12

Family

ID=36627020

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004332080A Expired - Fee Related JP4610308B2 (ja) 2004-11-16 2004-11-16 基板洗浄方法、基板洗浄装置、基板処理システム、基板洗浄プログラム及び記憶媒体

Country Status (1)

Country Link
JP (1) JP4610308B2 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5016351B2 (ja) * 2007-03-29 2012-09-05 東京エレクトロン株式会社 基板処理システム及び基板洗浄装置
JP2009267005A (ja) * 2008-04-24 2009-11-12 Tokyo Electron Ltd 基板洗浄方法及び基板洗浄装置並びに基板処理装置
JP5395405B2 (ja) 2008-10-27 2014-01-22 東京エレクトロン株式会社 基板洗浄方法及び装置
JP4950247B2 (ja) 2009-05-12 2012-06-13 東京エレクトロン株式会社 洗浄装置、基板処理システム、洗浄方法、プログラムおよび記憶媒体
JP2013033963A (ja) * 2011-07-29 2013-02-14 Semes Co Ltd 基板処理装置及び基板処理方法
KR101874901B1 (ko) 2011-12-07 2018-07-06 삼성전자주식회사 기판 건조 장치 및 방법
KR102254362B1 (ko) * 2012-06-25 2021-05-24 더 리젠츠 오브 더 유니버시티 오브 미시간 대면적 유기 광전변환 소자
JP6153110B2 (ja) * 2013-06-13 2017-06-28 国立大学法人東北大学 一成分極低温微細固体粒子連続生成装置、および、その一成分極低温微細固体粒子連続生成方法
KR20160065226A (ko) 2014-11-07 2016-06-09 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
KR101934984B1 (ko) * 2016-11-25 2019-01-03 세메스 주식회사 기판 처리 장치 및 방법
KR102037902B1 (ko) * 2018-11-26 2019-10-29 세메스 주식회사 기판 처리 장치 및 방법
TW202147481A (zh) 2020-01-23 2021-12-16 日商東京威力科創股份有限公司 基板處理裝置、基板處理方法及藥液
JP7489885B2 (ja) * 2020-01-23 2024-05-24 東京エレクトロン株式会社 基板処理装置、基板処理方法及び薬液
KR102606621B1 (ko) * 2020-11-03 2023-11-28 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
TWI897361B (zh) * 2024-04-19 2025-09-11 日揚科技股份有限公司 複合式清潔製程及系統

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW252211B (enExample) * 1993-04-12 1995-07-21 Cauldron Ltd Parthership
US5967156A (en) * 1994-11-07 1999-10-19 Krytek Corporation Processing a surface
JP3183214B2 (ja) * 1997-05-26 2001-07-09 日本電気株式会社 洗浄方法および洗浄装置
KR100469133B1 (ko) * 1999-06-24 2005-01-29 스미도모쥬기가이고교 가부시키가이샤 유체스프레이에 의한 세정방법 및 장치
JP2003059883A (ja) * 2001-08-17 2003-02-28 Nec Corp 裏面洗浄方法および装置、動作制御方法および装置、コンピュータプログラム
JP4026750B2 (ja) * 2002-04-24 2007-12-26 東京エレクトロン株式会社 基板処理装置
JP2004186530A (ja) * 2002-12-05 2004-07-02 Sony Corp 洗浄装置及び洗浄方法

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