JP2006140460A5 - - Google Patents

Download PDF

Info

Publication number
JP2006140460A5
JP2006140460A5 JP2005299354A JP2005299354A JP2006140460A5 JP 2006140460 A5 JP2006140460 A5 JP 2006140460A5 JP 2005299354 A JP2005299354 A JP 2005299354A JP 2005299354 A JP2005299354 A JP 2005299354A JP 2006140460 A5 JP2006140460 A5 JP 2006140460A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005299354A
Other languages
Japanese (ja)
Other versions
JP2006140460A (ja
JP4385016B2 (ja
Filing date
Publication date
Priority claimed from US10/962,550 external-priority patent/US7119883B2/en
Application filed filed Critical
Publication of JP2006140460A publication Critical patent/JP2006140460A/ja
Publication of JP2006140460A5 publication Critical patent/JP2006140460A5/ja
Application granted granted Critical
Publication of JP4385016B2 publication Critical patent/JP4385016B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2005299354A 2004-10-13 2005-10-13 光のテレセントリック性を歪めることなく照明フィールド内の光の強度の変動を修正する装置 Expired - Fee Related JP4385016B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/962,550 US7119883B2 (en) 2004-10-13 2004-10-13 Correcting variations in the intensity of light within an illumination field without distorting the telecentricity of the light

Publications (3)

Publication Number Publication Date
JP2006140460A JP2006140460A (ja) 2006-06-01
JP2006140460A5 true JP2006140460A5 (enExample) 2006-09-14
JP4385016B2 JP4385016B2 (ja) 2009-12-16

Family

ID=36144874

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005299354A Expired - Fee Related JP4385016B2 (ja) 2004-10-13 2005-10-13 光のテレセントリック性を歪めることなく照明フィールド内の光の強度の変動を修正する装置

Country Status (2)

Country Link
US (2) US7119883B2 (enExample)
JP (1) JP4385016B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7119883B2 (en) * 2004-10-13 2006-10-10 Asml Holding N.V. Correcting variations in the intensity of light within an illumination field without distorting the telecentricity of the light
US7173688B2 (en) * 2004-12-28 2007-02-06 Asml Holding N.V. Method for calculating an intensity integral for use in lithography systems
JP5902884B2 (ja) * 2007-10-26 2016-04-13 カール・ツァイス・エスエムティー・ゲーエムベーハー 結像光学系及びこの種の結像光学系を含むマイクロリソグラフィ用の投影露光装置
JP2009164355A (ja) * 2008-01-07 2009-07-23 Canon Inc 走査露光装置およびデバイス製造方法
JPWO2011010560A1 (ja) * 2009-07-24 2012-12-27 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
US10866519B1 (en) * 2019-10-01 2020-12-15 Taiwan Semiconductor Manufacturing Company Ltd. Reticle-masking structure, extreme ultraviolet apparatus, and method of forming the same

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58115725U (ja) * 1982-02-01 1983-08-08 株式会社ニコン 光制御装置用遮光羽根
US5315629A (en) 1990-10-10 1994-05-24 At&T Bell Laboratories Ringfield lithography
US5361292A (en) 1993-05-11 1994-11-01 The United States Of America As Represented By The Department Of Energy Condenser for illuminating a ring field
US5631721A (en) 1995-05-24 1997-05-20 Svg Lithography Systems, Inc. Hybrid illumination system for use in photolithography
JP3711586B2 (ja) * 1995-06-02 2005-11-02 株式会社ニコン 走査露光装置
JPH10106942A (ja) 1996-10-02 1998-04-24 Canon Inc 走査型露光装置及びそれを用いた半導体デバイスの製造方法
US6013401A (en) * 1997-03-31 2000-01-11 Svg Lithography Systems, Inc. Method of controlling illumination field to reduce line width variation
US6014252A (en) 1998-02-20 2000-01-11 The Regents Of The University Of California Reflective optical imaging system
US6186632B1 (en) 1998-12-31 2001-02-13 The Regents Of The University Of California Condenser for ring-field deep-ultraviolet and extreme-ultraviolet lithography
US6195201B1 (en) 1999-01-27 2001-02-27 Svg Lithography Systems, Inc. Reflective fly's eye condenser for EUV lithography
US6476905B1 (en) * 2000-01-20 2002-11-05 Taiwan Semiconductor Manufacturing Co., Ltd. Step and scan exposure system equipped with a plurality of attenuator blades for exposure control
TWI283798B (en) 2000-01-20 2007-07-11 Asml Netherlands Bv A microlithography projection apparatus
US6307682B1 (en) 2000-02-16 2001-10-23 Silicon Valley Group, Inc. Zoom illumination system for use in photolithography
JP2001244183A (ja) 2000-02-29 2001-09-07 Canon Inc 投影露光装置
JP3599629B2 (ja) 2000-03-06 2004-12-08 キヤノン株式会社 照明光学系及び前記照明光学系を用いた露光装置
JP2002184676A (ja) 2000-12-18 2002-06-28 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
US6741329B2 (en) * 2001-09-07 2004-05-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4923370B2 (ja) 2001-09-18 2012-04-25 株式会社ニコン 照明光学系、露光装置、及びマイクロデバイスの製造方法
US6563907B1 (en) 2001-12-07 2003-05-13 Euv Llc Radiation source with shaped emission
TWI251116B (en) * 2002-12-19 2006-03-11 Asml Netherlands Bv Device manufacturing method, computer-readable medium and lithographic apparatus
US6853493B2 (en) 2003-01-07 2005-02-08 3M Innovative Properties Company Folded, telecentric projection lenses for use with pixelized panels
US7119883B2 (en) 2004-10-13 2006-10-10 Asml Holding N.V. Correcting variations in the intensity of light within an illumination field without distorting the telecentricity of the light

Similar Documents

Publication Publication Date Title
BE2021C519I2 (enExample)
BE2021C524I2 (enExample)
BE2013C074I2 (enExample)
BE2013C014I2 (enExample)
BE2012C042I2 (enExample)
BRPI0601358B8 (pt) Aplicador de clipe cirúrgico
BRPI0601402B8 (pt) Aplicador de grampos cirúrgicos
BR122017004707A2 (enExample)
BRPI0609157A8 (enExample)
BE2019C013I2 (enExample)
BRPI0608519A2 (enExample)
BR122020005056A2 (enExample)
AP2140A (enExample)
BR122016029989A2 (enExample)
BRPI0604219A (enExample)
BRPI0618215B8 (enExample)
BY2237U (enExample)
BE2017C062I2 (enExample)
CN105122969C (enExample)
CN300725998S (zh) 鞋帮
CN300726000S (zh) 鞋帮
CN300726591S (zh) 冷冰食品制作器
CN300726508S (zh) 头部遮挡板
CN300726222S (zh) 包装纸(金色高金火腿肠)
CN300726004S (zh) 鞋帮