JP2006135208A5 - - Google Patents

Download PDF

Info

Publication number
JP2006135208A5
JP2006135208A5 JP2004324641A JP2004324641A JP2006135208A5 JP 2006135208 A5 JP2006135208 A5 JP 2006135208A5 JP 2004324641 A JP2004324641 A JP 2004324641A JP 2004324641 A JP2004324641 A JP 2004324641A JP 2006135208 A5 JP2006135208 A5 JP 2006135208A5
Authority
JP
Japan
Prior art keywords
rare earth
light
earth element
manufacturing
light emitting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004324641A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006135208A (ja
JP4529646B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004324641A priority Critical patent/JP4529646B2/ja
Priority claimed from JP2004324641A external-priority patent/JP4529646B2/ja
Publication of JP2006135208A publication Critical patent/JP2006135208A/ja
Publication of JP2006135208A5 publication Critical patent/JP2006135208A5/ja
Application granted granted Critical
Publication of JP4529646B2 publication Critical patent/JP4529646B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2004324641A 2004-11-09 2004-11-09 希土類元素イオンの拡散領域の製造方法および発光素子の製造方法および発光素子 Expired - Fee Related JP4529646B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004324641A JP4529646B2 (ja) 2004-11-09 2004-11-09 希土類元素イオンの拡散領域の製造方法および発光素子の製造方法および発光素子

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004324641A JP4529646B2 (ja) 2004-11-09 2004-11-09 希土類元素イオンの拡散領域の製造方法および発光素子の製造方法および発光素子

Publications (3)

Publication Number Publication Date
JP2006135208A JP2006135208A (ja) 2006-05-25
JP2006135208A5 true JP2006135208A5 (enExample) 2007-10-25
JP4529646B2 JP4529646B2 (ja) 2010-08-25

Family

ID=36728464

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004324641A Expired - Fee Related JP4529646B2 (ja) 2004-11-09 2004-11-09 希土類元素イオンの拡散領域の製造方法および発光素子の製造方法および発光素子

Country Status (1)

Country Link
JP (1) JP4529646B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB201019725D0 (en) 2010-11-22 2011-01-05 Univ Surrey Optoelectronic devices
US10957815B2 (en) 2017-09-05 2021-03-23 Sharp Kabushiki Kaisha Light-emitting device

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8711373D0 (en) * 1987-05-14 1987-06-17 Secr Defence Electroluminescent silicon device
DE69323884T2 (de) * 1993-10-20 1999-07-22 Consorzio Per La Ricerca Sulla Microelettronica Nel Mezzogiorno, Catania Elektrolumineszente Festkörpervorrichtung und Verfahren zu ihrer Herstellung
JP3027092B2 (ja) * 1994-07-27 2000-03-27 シャープ株式会社 多孔質シリコン発光層の形成法
JP3600872B2 (ja) * 1996-04-30 2004-12-15 独立行政法人理化学研究所 希土類元素ドープSi材料およびその製造方法
JPH1117217A (ja) * 1997-06-27 1999-01-22 Res Dev Corp Of Japan 発光素子材料の製造方法
FR2789496B1 (fr) * 1999-02-10 2002-06-07 Commissariat Energie Atomique Dispositif emetteur et guide de lumiere, avec une region active de silicium contenant des centres radiatifs, et procede de fabrication d'un tel dispositif
JP4410894B2 (ja) * 2000-01-21 2010-02-03 富士通マイクロエレクトロニクス株式会社 半導体装置
JP2002344012A (ja) * 2001-05-17 2002-11-29 Matsushita Electric Ind Co Ltd 多孔性シリコン基板及びそれを用いた発光素子並びに多孔性シリコン基板の製造方法
US7095058B2 (en) * 2003-03-21 2006-08-22 Intel Corporation System and method for an improved light-emitting device
JP4815860B2 (ja) * 2004-11-11 2011-11-16 ソニー株式会社 発光素子及びその製造方法
JP4956916B2 (ja) * 2005-05-30 2012-06-20 ソニー株式会社 発光素子及び発光装置

Similar Documents

Publication Publication Date Title
US7132692B2 (en) Nanosilicon light-emitting element and manufacturing method thereof
US7679102B2 (en) Carbon passivation in solid-state light emitters
KR100442062B1 (ko) 광소자용 박막, 이를 이용한 광방출구조체 및 그 제조방법
US20070012907A1 (en) Doped Semiconductor Nanocrystal Layers And Preparation Thereof
Lin et al. Defect-enhanced visible electroluminescence of multi-energy silicon-implanted silicon dioxide film
JP2009522713A (ja) 固体発光体用の加工構造
US20080035946A1 (en) Rare earth element-doped silicon oxide film electroluminescence device
GB2287825A (en) Forming luminescent silicon material and luminescent device containing the material
Bae et al. Electroluminescence mechanism in SiO x layers containing radiative centers
WO2011004601A1 (ja) 蛍光体結晶薄膜とその作製方法
JP2006164938A5 (enExample)
JP2006135208A5 (enExample)
Ha et al. Er 3+ photoluminescence from Er-doped amorphous SiO x films prepared by pulsed laser deposition at room temperature: The effects of oxygen concentration
Elhouichet et al. Photoluminescence properties of Tb3+ in porous silicon
JP4246424B2 (ja) 量子井戸構造を有するSi系半導体デバイスおよびその製造方法
WO2015072751A1 (ko) 유기발광소자용 광추출 기판, 그 제조방법 및 이를 포함하는 유기발광소자
KR100615430B1 (ko) 광소자용 실리콘 질화물 박막 및 그 제조방법
CN100496177C (zh) 包含硅基稀土掺杂发光材料的电致发光器件及制备方法
WO2007067165A1 (en) Enhanced electrical characteristics of light-emitting si-rich nitride films
JP2001040348A (ja) シリコンナノ結晶発光素子及びその製造方法
CN102934241B (zh) 红外发光元件的制造方法
JP4529646B2 (ja) 希土類元素イオンの拡散領域の製造方法および発光素子の製造方法および発光素子
Prucnal et al. Electronegativity and point defect formation in the ion implanted SiO2 layers
Gelloz et al. Optoelectronic effect of high-pressure water vapor annealing for nanocrystalline silicon films prepared by ion implantation
JP2004083712A (ja) Siナノ結晶発光材料及びその製造方法