JP2006133305A - Device for peeling large pellicle - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a device for peeling a large pellicle in which a pellicle film and a temporary frame can be reliably peeled from a film forming substrate by easy work. <P>SOLUTION: The device for peeling a large pellicle includes: a mounting base to mount a film forming substrate for forming a large pellicle film having at least ≥700 mm length in one side; and a lifting mechanism which abuts on a temporary frame stuck and fixed to a film forming substrate positioned on the mounting base and continuously lifts the frame. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a peeling device for a large pellicle, and more particularly, foreign matter adheres to a photomask used when manufacturing a thin film transistor (TFT) or a color filter (CF) constituting a liquid crystal display (LCD). The present invention relates to a peeling device for a large pellicle that is used when manufacturing a pellicle used for prevention.

(Pellicle)
Conventionally, when manufacturing a thin film transistor (TFT) and a color filter (CF) constituting a liquid crystal display (LCD), a dust-proof means called a pellicle is used to prevent foreign matter from adhering to a photomask used in a lithographic process. Is used. In a lithographic process in manufacturing a TFT constituting an LCD, a pellicle is placed on a photomask to prevent foreign matter from adhering to the photomask.

When foreign matter adheres to the surface of the photomask, the foreign matter forms an image on the photoresist formed on the liquid crystal panel, causing a circuit pattern defect. Here, when the pellicle is placed on the photomask, the foreign matter attached to the surface of the pellicle does not form an image on the photoresist formed on the liquid crystal panel due to the shift of the focus position. As described above, by using the pellicle, it is possible to prevent the circuit pattern from being defective. Here, in particular, a pellicle having an area of 1,000 cm ² or more is referred to as a large pellicle (see, for example, Patent Documents 1 to 5).

(Manufacturing method of large pellicle)
Here, a conventional example of manufacturing a large pellicle will be described. FIG. 5 is a cross-sectional view for explaining a conventional method for producing a large pellicle.

  As shown in FIG. 5 (a), there is no particular designation for the glass plate 102 on the surface of the large-sized pellicle film-forming substrate 101, but nitrocellulose, cellulose derivatives, or CYTOP (trademark) manufactured by Asahi Glass Co. A film material solution 104a in which an amorphous fluoropolymer such as Teflon AF (trademark, manufactured by DuPont) is dissolved in a solvent is dropped from the solvent nozzle 105.

  As a film forming method, a spin coat method or a slit coat method can be used. In the spin coating method, the film material solution 104a is dropped on the surface of the large pellicle film formation substrate 101 while rotating the large pellicle film formation substrate 101 around the rotation axis 106 using a spin coater or the like. 104a is applied uniformly. Thereby, the pellicle film 104 before drying can be formed on the film formation substrate 101. The substrate 101 on which the film material solution 104a is uniformly applied is dried on a hot plate or the like, and the solvent is evaporated to form a dried pellicle film 114.

  After the pellicle film 114 is completely formed on the surface of the large pellicle film formation substrate 101, the large pellicle film formation substrate 101 is moved and placed on the peeling stage 107.

  Subsequently, the temporary frame 108 used for peeling the pellicle film 114 is adhesively fixed to the surface of the pellicle film 114. In this state, as shown in FIG. 5B, the pellicle film 114 is gradually raised from one side surface 108a of the pellicle film 114 to the other side surface 108b together with the temporary frame 108, and the pellicle film 114 is lifted from the surface of the large-sized pellicle film formation substrate 101. It peels (for example, refer patent document 3). Here, these peeling operations are performed by an operator.

JP 2002-296863 A JP 2001-201845 A JP 2001-109135 A JP 2001-042507 A JP 2001-042506 A

  However, the conventional method has the following problems.

  In the peeling operation of the pellicle film 114, it is necessary to raise the pellicle film 114 and the temporary frame 108 as continuously as possible. That is, when the rising speed changes intermittently when the pellicle film 114 or the like is raised, local extension may occur in the pellicle film 114 due to the rising speed change. When such an extension occurs, a trace remains as a streak on the surface of the peeled pellicle film 114, and a high-quality pellicle may not be obtained.

  However, the pellicle film 114 peeled off from the deposition substrate 101 has a size corresponding to 700 mm or more on one side, and thus has a weight corresponding to the size. Further, when the pellicle film 114 is peeled from the deposition substrate by lifting the temporary frame for peeling the large pellicle film, a force greater than the adhesion force between the deposition substrate 101 and the pellicle film 114 is required. This force increases as the area of the pellicle film 114 increases. Further, while the large pellicle is large, in order to obtain a larger pellicle, it is preferable that the width of the temporary frame 108 is configured to be as small as possible.

  Considering such conditions, the area of the temporary frame for the worker involved in the peeling work to raise is small relative to the surface area of the large pellicle, but the worker has only that small part and has a large force. Need to lift. For this reason, the work of continuously raising the pellicle film 114 and the temporary frame 108 requires skill of the worker, and it is very difficult for a worker with little experience to mass-produce a large pellicle.

  The present invention solves the above-described problems, and an object of the present invention is to provide a peeling apparatus for a large pellicle that reliably peels the pellicle film and the temporary frame from the film formation substrate with a simple operation.

  In order to achieve the above object, a first configuration according to the present invention includes a mounting table for mounting a film forming substrate for forming a large pellicle film having at least one side of 700 mm or more, and positioning on the mounting table. A peeling device for a large pellicle, comprising: a lifting mechanism that comes into contact with a temporary frame that is adhesively fixed to the film forming substrate and that raises the temporary frame continuously.

  In the second configuration, the temporary frame has a peeling start side where the peeling operation is started and a peeling final side where the peeling operation is finished, and the lifting mechanism raises the peeling start side. It is the peeling apparatus for large pellicles characterized by arrange | positioning in this way.

  In the third configuration, the temporary frame has a peeling start side where the peeling operation is started and a peeling final side where the peeling operation is finished, and the lifting mechanism raises the peeling final side. It is the peeling apparatus for large pellicles characterized by arrange | positioning in this way.

  According to a fourth configuration, the temporary frame includes a peeling start side at which a peeling operation is started and a peeling final side at which the peeling operation is finished, and the lifting mechanism includes the peeling start side and the peeling side. A peeling device for a large pellicle, which is arranged so as to raise the final side.

  According to the first configuration, since the raising mechanism continuously raises the temporary frame that is adhesively fixed to the positioned film formation substrate, the pellicle film is continuously separated from the film formation substrate. A large change in speed can be suppressed by continuously separating in this way. For this reason, the phenomenon of the extension and contraction of the pellicle film caused by the change in the peeling speed during peeling is less likely to occur.

  According to the second configuration, since the peeling operation can be performed even if the worker does not hold the temporary frame, it is possible to prevent the dust and dirt on the worker's gloves from adhering to the pellicle film.

  According to the third configuration, after the operator grasps the temporary frame and separates from the separation start side, the worker applies a moment to the temporary frame by raising only the final separation side by the lifting mechanism. The trouble of peeling the sides can be saved. For this reason, the peeling operation can be easily performed.

  According to the fourth configuration, since the peeling work is performed only by the push-up member from the peeling start side to the final peeling side of the temporary frame, the peeling work can be easily performed.

  As described above, according to the peeling apparatus for large pellicles of the present invention, the pellicle film and the temporary frame can be reliably peeled from the film formation substrate with a simple operation.

[First Embodiment]
The first embodiment of the present invention will be specifically described with reference to the drawings. FIG. 1 is a perspective view showing a configuration of a peeling device for a large pellicle.

  As shown in FIG. 1, the pellicle film 12 is formed on an octagonal film formation substrate 10 by the same method as in the prior art. The film formation substrate 10 is mounted on the mounting table 20 with the pellicle film 12 formed thereon. At this time, the mounting table 20 vacuum-sucks the film formation substrate 10.

  On the pellicle film 12 formed on the film formation substrate 10, the temporary frame 13 is fixed integrally with an adhesive such as double-sided adhesive tape.

  The temporary frame 13 that is adhesively fixed to the film forming substrate 10 has a protruding portion formed outside the frame main body 13A that is adhered along the outer peripheral surface of the pellicle film. In the present embodiment, four triangular projecting portions 13a, 13b, 13c, and 13d are formed outside the octagonal frame main body 13A.

  The film forming substrate 10 placed on the mounting table 20 is pushed up the temporary frame 13 by the lifting mechanism 30 of the peeling apparatus 1, and the pellicle film 12 is separated from the film forming substrate 10. Next, this will be described in detail.

(Configuration of peeling apparatus 1)
As shown in FIG. 1, the peeling apparatus 1 for a large pellicle of this embodiment is adhesively fixed on a mounting table 20 on which a film forming substrate 10 is mounted and a film forming substrate 10 mounted on the mounting table 20. And a lifting mechanism 30 that lifts the temporary frame 13.

  The mounting table 20 includes a mounting portion 21 on which the film forming substrate 10 is mounted and a positioning mechanism 22 (22a, 22b, 22c) that positions the film forming substrate 10 to be mounted.

  The mounting portion 21 is formed with two notches 21a and 21b for projecting two push-up protrusions 31a and 31b of a lifting mechanism 30 described later. The positioning mechanism 22 includes a back positioning part 22a, a side positioning part 22b, and a front positioning part 22c. Each positioning portion is configured to be movable in the horizontal direction, and the substrate can be set on the mounting table with high accuracy at all times. For this reason, it is possible to ensure positioning with respect to the film formation substrate 10 and make it easy to peel.

  The raising mechanism 30 includes a push-up protrusion 31 (31a, 31b) that raises the temporary frame 13 in a substantially vertical direction, a control unit 32 that controls the moving amount and speed of the push-up protrusion 31, and an operation input unit that operates the control unit 32. 33.

  The push-up protrusion 31 is configured as a flat surface so that the tip abuts against the protruding portion of the temporary frame 13 and is controlled to be raised and lowered by the control of the control unit 32. The push-up protrusions 31a and 31b protrude from the notches 21a and 21b of the mounting portion 21 at the left and right ends on the front side as viewed from the operator side, and raise the protrusions 13a and 13b of the temporary frame 13.

  The control unit 32 performs control to raise the push-up protrusion 31 in a substantially vertical direction by a mechanism such as a pneumatic type, a hydraulic type, an electric type, or a mechanical type (not shown). As the control, the amount of movement and the speed for raising the push-up protrusions 31a and 31b are mainly controlled.

  In the present embodiment, the operation input means 33 is a foot pedal type that operates the apparatus when the operator steps on the foot. Even if it is not a foot pedal type, it is only necessary to prompt the start of operation according to the will of the operator like a lever or a switch.

(Operation of peeling apparatus 1)
With the above configuration, the operation of the peeling apparatus 1 is performed as follows. FIG. 2 is an explanatory diagram of the peeling operation of the first embodiment.

  First, as illustrated in FIG. 1, the film formation substrate 10 on which the pellicle film 12 is formed is placed on the placement unit 21 of the placement table 20. When placing the film formation substrate 10, it is preferable to place the film formation substrate 10 while abutting the back side of the film formation substrate 10 against the back surface positioning portion 22 a. Thereafter, the side surface of the film formation substrate 10 is positioned by the side surface positioning unit 22b, and the front surface of the film formation substrate 10 is positioned by the front surface positioning unit 22c, so that the film formation substrate 10 is reliably positioned.

  The mounting table 20 has a mechanism for vacuum-sucking the deposition substrate 10. For this reason, after the film-forming substrate 10 is positioned, it is vacuum-sucked to the mounting portion 21.

  Next, the temporary frame 13 is adhesively fixed on the film formation substrate 10. For adhesive fixation, an adhesive such as an adhesive tape may be used. When the temporary frame 13 is adhesively fixed, the frame main body 13A is fixed so as to follow the octagonal shape of the film forming substrate 10. Then, the protrusions 13a and 13b of the temporary frame 13 are positioned so as to be above the notches 21a and 21b.

  In this state, when the operator steps on the operation input means 33, the push-up protrusion 31 operates under the conditions set in advance by the control unit 32.

  In the operation of the push-up protrusion 31, the push-up protrusion 31 a and the push-up protrusion 31 b on the left and right sides of the operator are continuously moved upward simultaneously. Then, the lower surface of the protrusion 13a and the protrusion 13b of the temporary frame 13 is pushed up from the push-up protrusion 31a and the push-up protrusion 31b. Since the film formation substrate 10 is vacuum-sucked on the mounting table 20, the temporary frame 13 in which the protrusion 13a and the protrusion 13b are pushed up and the pellicle film 12 adhered thereto are peeled off.

  As the protruding portion 13a and the protruding portion 13b rise continuously, the pellicle film 12 is gradually peeled off continuously from the deposition substrate 10. The peeling direction is the direction from the near side where the protrusions 13a and 13b are located to the back side. When the push-up protrusion 31a and the push-up protrusion 31b are lifted and reach their highest point in this way, the push-up protrusion 31a and the push-up protrusion 31b stop moving up and maintain their postures at the height.

  In this state, the temporary frame 13 is in a state of being separated from the film forming substrate 10 except for the final peeling side 13A2 while the protrusions 13a and 13b are supported by the push-up protrusions 31a and 31b. Here, the peeling final side 13A2 refers to a side opposite to the side that is sandwiched between the protruding portion 13a and the protruding portion 13b as the peeling start side 13A1 of the temporary frame 13.

  Finally, the pellicle film 12 can be completely peeled from the film forming substrate 10 by the operator holding the peeling start side 13A1 of the frame body 13A and separating the temporary frame 13 and the film forming substrate 10 from each other. At this time, most of the pellicle film 12 is peeled off from the film formation substrate 10 by the push-up protrusion 31. For this reason, when separating, an operator can be separated with little force.

  When the peeling operation is performed manually as in the past, it is difficult to continuously peel the pellicle film from the film formation substrate depending on the skill level of the operator, and the peeling operation may be intermittently peeled off. In this case, the pellicle film 12 may be stretched or contracted at the place where the peeling speed has changed greatly, and streaks may occur. On the other hand, in this embodiment, the pellicle film 12 can be continuously separated from the deposition substrate 10 by continuously raising the protruding portion 13a of the temporary frame 13 fixed to the mounting table 20. For this reason, the pellicle film 12 is unlikely to be elongated or contracted, the streak of the pellicle film 12 is prevented from occurring, and a large pellicle with high quality can be obtained more reliably.

  Further, conventionally, since the worker grasps the temporary frame itself and performs the peeling work, there is a possibility that dust and dirt on the clothes and gloves of the worker may adhere to the pellicle film during the peeling work. According to the present embodiment, it is the push-up protrusion 31 that raises the temporary frame 13, so that the peeling operation can be performed even if the operator does not approach the pellicle film 12. For this reason, it is possible to prevent dust and dirt on the clothes and gloves of the worker from adhering to the pellicle film 12, and to obtain a large pellicle with high quality.

  In the present embodiment, the push-up protrusions 31a and 31b are simultaneously raised, but the present invention is not limited to this. For example, you may raise one by one in order. If it does in this way, the surface to be peeled will gradually become a large surface from a small surface, and it is difficult to apply an excessive force. For this reason, it can peel efficiently.

  In the present embodiment, the protruding portion 13a is continuously raised. Here, in the case of continuous ascent, it is desirable to raise without stopping even once, but it may be configured to be continuously raised in multiple stages.

[Second Embodiment]
The second embodiment of the present invention will be specifically described with reference to the drawings. FIG. 3 is an explanatory diagram of the peeling operation of the second embodiment.

(Configuration of peeling device 51)
As shown in FIG. 3, in the peeling device 51 of the present embodiment, push-up protrusions 31 a and 31 b are arranged at positions facing the operator across the mounting table 20. Since other configurations are the same as those described above, description thereof will be omitted.

(Operation of peeling device 51)
As shown in FIG. 3, also in the peeling apparatus 51 of the present embodiment, first, the film formation substrate 10 is placed on the mounting table 20 and positioned by the positioning mechanism 22. At the same time, the temporary frame 13 is adhesively fixed on the film formation substrate 10.

  Thereafter, when the operator operates the operation input means 33, the push-up protrusions 31a and 31b of the lifting mechanism 30 are sequentially raised continuously. Since the push-up protrusion 31 continuously rises, the pellicle film 12 is also continuously peeled from the film formation substrate 10, and a pellicle with good quality can be obtained as described above.

  In the present embodiment, in the state where both the push-up protrusion 31a and the push-up protrusion 31b are raised, the operator side becomes the final peeling side 13A2. Therefore, the operator does not need to go to a position where the opposite sides are located, and can more easily separate the pellicle film 12 from the deposition substrate 10 more easily.

  Note that only the final peeling side 13A2 can be raised by the push-up protrusion 31 using the configuration of the present embodiment. That is, peeling of the pellicle film 12 from the film formation substrate 10 is performed manually by a skilled worker, and the push-up protrusion 31 can be raised only to separate the final peeling side 13A2.

  A large pellicle has a large surface area and weight. For this reason, conventionally, it has been necessary to give a large moment to the temporary frame 13 to separate the final peeling side 13A2 while grasping the frame main body 13A, which is a great effort even for a skilled worker. In the present embodiment, this work can be reduced, and a large pellicle can be obtained more easily.

[Third Embodiment]
The third embodiment of the present invention will be specifically described with reference to the drawings. FIG. 4 is an explanatory diagram of the peeling operation of the third embodiment.

(Configuration of peeling device 61)
As shown in FIG. 4, the peeling apparatus 61 of this embodiment has push-up protrusions 31 (31a, 31b, 31c, 31d) on both the peeling start side 13A1 side and the final peeling side 13A2 side of the temporary frame 13.

(Operation of peeling device 61)
In the same manner as in the above-described embodiment, the push-up protrusion 31 continuously pushes up the temporary frame 13 that is adhesively fixed to the placed and positioned film formation substrate 10. The order of pushing up the four push-up protrusions 31 is arbitrary. Further, the push-up protrusions 31 may be pushed up one by one, or the four push-up protrusions 31 may be pushed up simultaneously. Further, after the push-up protrusions 31a and 31b on the peeling start side 13A1 side of the temporary frame 13 are pushed up, the push-up protrusions 31c and 31d may be raised to separate the final peel side 13A2.

  According to this embodiment, the pellicle film 12 together with the temporary frame 13 is completely separated from the film formation substrate 10 without using the hand of the operator. In this way, since the operator's hand is not used, dust and dirt on the worker's clothing and gloves are prevented from adhering to the pellicle membrane 12 during the peeling operation, and a large pellicle with high quality is obtained. be able to. Moreover, since a worker's hand is not used, a large pellicle can be easily obtained.

[Other Embodiments]
In addition to the above-described embodiment, only the final peeling edge 13A2 may be raised by the push-up protrusion 31 using a device such as the peeling device 61 of the second embodiment. That is, an operator stands on the peeling start side 13A1 side, and the worker gradually raises the temporary frame 13 from the peeling start side 13A1. Then, when peeling other than the final peeling side 13A2 is completed, only the final peeling side 13A2 may be raised by the push-up protrusion 31.

  In the embodiment described above, the protruding portion of the temporary frame is raised. However, the present invention is not limited to this, and the temporary frame itself having no protruding portion may be raised.

  In the embodiment described above, the mounting table 20 has the notches 21a and 21b, and the temporary frame 13 is raised by the push-up protrusion 31 from below the notches 21a and 21b. However, the notches are not necessarily required. For example, the temporary frame may be configured to have a portion protruding from the mounting table, and the protruding portion may be pushed up by the push-up protrusion 31 to peel the pellicle film from the deposition substrate.

  The present invention can be used when manufacturing a large pellicle used in manufacturing a thin film transistor (TFT) or a color filter (CF) constituting a large liquid crystal display (LCD).

The perspective view which shows the structure of the peeling apparatus for large pellicles. Explanatory drawing of the peeling operation | work of 1st Embodiment. Explanatory drawing of the peeling operation | work of 2nd Embodiment. Explanatory drawing of the peeling operation | work of 3rd Embodiment. Explanatory drawing of the conventional pellicle peeling work.

Explanation of symbols

1 ... peeling device,
10 ... deposition substrate,
12… pellicle membrane,
13 ... Temporary frame,
13A ... Frame body,
13A1 ... peeling start side,
13A2 ... last side of peeling,
13a ... protrusion,
13b ... protruding part,
13c ... protruding part,
13d ... protruding part,
20… mounting table,
21… Placement part
21a ... Notch,
21b ... Notch,
22… positioning mechanism,
22a ... rear positioning part,
22b ... side positioning part,
22c ... front positioning part,
30 ... ascent mechanism,
31… Push-up projection,
31a ... push-up protrusion,
31b ... Push-up protrusion,
31c ... Push-up protrusion,
32… control part,
33 ... operation input means,
51 ... peeling device,
61… peeling device,
101 ... deposition substrate,
102 ... a glass plate,
104a ... membrane material solution,
105 ... solvent nozzle,
106… rotating shaft,
107… peeling stage,
108… temporary frame,
108a ... one side,
108b ... the other side,
114… Pellicle membrane

Claims (4)

A mounting table on which a film formation substrate for forming a large pellicle film having at least one side of 700 mm or more is mounted;
A peeling apparatus for a large pellicle, comprising: a lifting mechanism that comes into contact with a temporary frame that is adhesively fixed to the film forming substrate positioned on the mounting table and continuously raises the temporary frame. The temporary frame has a peeling start side where the peeling operation is started and a peeling final side where the peeling operation is finished,
2. The peeling apparatus for a large pellicle according to claim 1, wherein the raising mechanism is arranged to raise the peeling start side. The temporary frame has a peeling start side where a peeling operation is started and a peeling final side where the peeling operation is finished,
2. The peeling device for a large pellicle according to claim 1, wherein the raising mechanism is arranged to raise the last side of the peeling. The temporary frame has a peeling start side where a peeling operation is started and a peeling final side where the peeling operation is finished,
The peeling device for a large pellicle according to claim 1, wherein the raising mechanism is arranged to raise the peeling start side and the peeling final side.

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