JP2006120851A - Substrate storing container - Google Patents

Substrate storing container Download PDF

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JP2006120851A
JP2006120851A JP2004307049A JP2004307049A JP2006120851A JP 2006120851 A JP2006120851 A JP 2006120851A JP 2004307049 A JP2004307049 A JP 2004307049A JP 2004307049 A JP2004307049 A JP 2004307049A JP 2006120851 A JP2006120851 A JP 2006120851A
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piece
retainer
semiconductor wafer
substrate
lid
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JP4459015B2 (en
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Hiroshi Mimura
博 三村
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Shin Etsu Polymer Co Ltd
Shin Etsu Chemical Co Ltd
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Shin Etsu Polymer Co Ltd
Shin Etsu Chemical Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate storing container capable of suppressing and preventing a substrate from rotating to catch wearing scrap or the like, with easy alignment of substrates. <P>SOLUTION: The container comprises a container body 1 in which semiconductor wafers W are aligned and stored, a lid for opening/closing the opening front surface of the container body 1, and a pair of, left and right, rear retainers 20/20A which are attached to the inside surface of the rear surface wall 8 of the container body 1 to hold the rear periphery of the semiconductor wafer W. The rear retainers 20/20A are formed of a flexible inside piece 21, an outside piece 22 which faces the inside piece 21, and a support block 23 which is bridged between the inside piece 21 and the outside piece 22 to pinch the rear periphery of the semiconductor wafer W. The inside piece 21 is closer to a center line CL that penetrates the centroid C of the semiconductor wafer W than the outside piece 22 is to the center line, and the amount of flexure of the inside piece 21 is set larger than that of the outside piece 22, to regulate large rotation of the semiconductor wafer W. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、シリコンやガラス等からなる基板を収納する基板収納容器に関し、より詳しくは、容器本体や蓋体に取り付けられて基板の周縁部を保持する基板収納容器のリテーナに関するものである。   The present invention relates to a substrate storage container that stores a substrate made of silicon, glass, or the like, and more particularly to a retainer of a substrate storage container that is attached to a container body or a lid and holds a peripheral edge of the substrate.

近年、200mmから300mmという半導体ウェーハの大口径化に伴い、フロントオープンボックスタイプの基板収納容器が製造・販売されているが、この種の基板収納容器は、図示しない複数枚の半導体ウェーハを整列収納するフロントオープンボックスの容器本体と、この容器本体の開口正面を開閉する着脱自在の蓋体とから構成されている(特許文献1参照)。   In recent years, with the increase in diameter of semiconductor wafers from 200 mm to 300 mm, front open box type substrate storage containers are manufactured and sold. This type of substrate storage container aligns and stores a plurality of semiconductor wafers (not shown). The container main body of the front open box and the detachable lid that opens and closes the front of the opening of the container main body (see Patent Document 1).

容器本体の背面壁の内面には、左右一対のリヤリテーナが装着され、蓋体の裏面には、一対のリヤリテーナに対向するフロントリテーナが装着されており、これら一対のリヤリテーナとフロントリテーナとの間に、容器本体に収納された半導体ウェーハが水平に挟持される。各リヤリテーナは、内側片と、この内側片に対向する外側片と、これら内側片と外側片との間に架設されて半導体ウェーハの後部周縁を溝を介して挟持する支持ブロックとから形成されている。
特開2003‐174081号公報
A pair of left and right rear retainers are mounted on the inner surface of the rear wall of the container body, and a front retainer facing the pair of rear retainers is mounted on the back surface of the lid, and the pair of rear retainers are disposed between the pair of rear retainers and the front retainer. The semiconductor wafer accommodated in the container body is horizontally held. Each rear retainer is formed of an inner piece, an outer piece facing the inner piece, and a support block that is spanned between the inner piece and the outer piece and sandwiches the rear periphery of the semiconductor wafer via a groove. Yes.
Japanese Patent Laid-Open No. 2003-174081

従来の基板収納容器は、以上のように構成され、各リヤリテーナの内側片と外側片とに半導体ウェーハの荷重が略均等に作用する筈であるが、各リヤリテーナの内側片と外側片のいずれか一方が余計に撓むと、その撓んだ方向に半導体ウェーハが回転しやすくなる。そして例えば、基板収納容器の搬送時の振動や衝撃に伴い、一対のリヤリテーナが同じ方向に撓むと、その撓んだ方向に半導体ウェーハが大きく回転して磨耗粉が付着してしまうという大きな問題が生じる。   The conventional substrate storage container is configured as described above, and the load of the semiconductor wafer should act on the inner piece and the outer piece of each rear retainer substantially evenly. Either the inner piece or the outer piece of each rear retainer If one side bends excessively, the semiconductor wafer is likely to rotate in the bending direction. And, for example, if the pair of rear retainers bend in the same direction due to vibration or impact during transport of the substrate storage container, there is a big problem that the semiconductor wafer rotates greatly in the bent direction and wear powder adheres. Arise.

また、半導体ウェーハがランダムに大きく回転してしまうと、半導体ウェーハの表面に電子回路を形成する際、半導体ウェーハの周縁部に切り欠かれた位置決め用のノッチを揃え直さなければならず、作業に時間を要するという問題もある。   In addition, if the semiconductor wafer rotates at random, when the electronic circuit is formed on the surface of the semiconductor wafer, the positioning notch cut out on the peripheral edge of the semiconductor wafer must be realigned. There is also the problem of taking time.

本発明は上記に鑑みなされたもので、基板が回転して磨耗粉等が付着するのを抑制防止したり、基板を容易に整列させることのできる基板収納容器を提供することを目的としている。   The present invention has been made in view of the above, and an object of the present invention is to provide a substrate storage container that can suppress and prevent the substrate from rotating and wear powder or the like from adhering to the substrate or can easily align the substrate.

本発明においては上記課題を解決するため、基板を収納する容器本体と、この容器本体の開口部を開閉する蓋体と、これら容器本体と蓋体の少なくともいずれか一方の対向部に設けられて基板の周縁部を保持する複数のリテーナとを含んでなるものであって、
各リテーナは、可撓性の内側片と、この内側片に対向する外側片と、これら内側片と外側片との間に設けられて基板の周縁部を支持する支持ブロックとを有し、内側片を外側片よりも基板の重心を通る中心線に接近させるとともに、内側片の撓み量を外側片の撓み量よりも大きくし、基板の回転を抑制するようにしたことを特徴としている。
In the present invention, in order to solve the above problems, a container main body for storing a substrate, a lid body for opening and closing the opening of the container main body, and at least one of the container main body and the lid body are provided at the opposing portion. A plurality of retainers for holding the peripheral edge of the substrate,
Each retainer includes a flexible inner piece, an outer piece facing the inner piece, and a support block provided between the inner piece and the outer piece to support the peripheral edge of the substrate. It is characterized in that the piece is brought closer to the center line passing through the center of gravity of the substrate than the outer piece, and the amount of bending of the inner piece is made larger than the amount of bending of the outer piece to suppress the rotation of the substrate.

なお、容器本体と蓋体の少なくともいずれか一方の対向部に、各リテーナの内側片と外側片とをそれぞれ接触させ、内側片を外側片よりも薄く形成することができる。
また、容器本体と蓋体の少なくともいずれか一方の対向部に、各リテーナの外側片を接触させるとともに、内側片を隙間を介して対向させることができる。
また、各リテーナの外側片に補強部材を設けることができる。
In addition, the inner piece and the outer piece of each retainer can be brought into contact with at least one of the opposing portions of the container body and the lid, respectively, so that the inner piece can be formed thinner than the outer piece.
In addition, the outer piece of each retainer can be brought into contact with the facing portion of at least one of the container main body and the lid, and the inner piece can be made to face through the gap.
Further, a reinforcing member can be provided on the outer piece of each retainer.

また、各リテーナの支持ブロックを、内側片と外側片との中心部よりも外側片寄りに位置させることもできる。
さらに、容器本体と蓋体の少なくともいずれか一方の対向部に、各リテーナの内側片と外側片とをそれぞれ接触させ、対向部と内側片とが形成する角度θ1を対向部と外側片とが形成する角度θ2よりも小さくすることが可能である。
In addition, the support block of each retainer can be positioned closer to the outer side than the center part of the inner and outer pieces.
Furthermore, the inner piece and the outer piece of each retainer are brought into contact with the facing portion of at least one of the container main body and the lid, respectively, and the angle θ1 formed by the facing portion and the inner piece is set to the angle between the facing portion and the outer piece. It is possible to make it smaller than the forming angle θ2.

ここで、特許請求の範囲における基板には、少なくとも200mm、300mm、450mmのシリコンウェーハ等の半導体ウェーハ、マスクガラス、液晶ガラス等が含まれる。容器本体は、透明、半透明、不透明のいずれでも良い。この容器本体の背面壁は、透視窓とすることができる。また、リテーナには、リヤリテーナの他、フロントリテーナが含まれる。基板収納容器は、フロントオープンボックスタイプでも良いが、直径200mmの複数枚の半導体ウェーハを縦に収納するトップオープンボックスタイプでも良い。   Here, the substrate in the claims includes at least a semiconductor wafer such as a silicon wafer of 200 mm, 300 mm, and 450 mm, mask glass, liquid crystal glass, and the like. The container body may be transparent, translucent, or opaque. The back wall of the container body can be a see-through window. The retainer includes a front retainer in addition to a rear retainer. The substrate storage container may be a front open box type, or may be a top open box type that vertically stores a plurality of semiconductor wafers having a diameter of 200 mm.

基板収納容器は、トップオープンボックスタイプの場合、有底角筒形の外箱と、この外箱内に着脱自在に収納され、複数枚の基板を縦に整列収納する角筒形の内箱と、外箱の開口上面を被覆して基板の上部周縁を基板押さえにより押さえる着脱自在の蓋体とから構成され、外箱の内部底面、及び又は蓋体の基板押さえに、リテーナが設けられる。   In the case of the top open box type, the substrate storage container is a bottomed rectangular tube-shaped outer box, and a rectangular tube-shaped inner box that is detachably stored in the outer box and stores a plurality of substrates vertically aligned. The detachable lid body covers the upper surface of the opening of the outer box and presses the upper peripheral edge of the substrate by pressing the substrate. A retainer is provided on the inner bottom surface of the outer box and / or the substrate holder of the lid body.

本発明によれば、各リテーナの内側片が外側片よりも撓みやすいので、容器本体に収納された基板は、一のリテーナ部分においては時計方向に回転し、他のリテーナ部分においては反時計方向に回転しようとする。この結果、基板の回転方向の動きが相殺され、基板の回転が規制される。   According to the present invention, since the inner piece of each retainer is more flexible than the outer piece, the substrate housed in the container body rotates clockwise in one retainer portion and counterclockwise in the other retainer portion. Try to rotate to. As a result, the movement in the rotation direction of the substrate is canceled, and the rotation of the substrate is restricted.

本発明によれば、基板が回転して磨耗粉等が付着するのを抑制したり、基板の整列を容易に行なうことができるという効果がある。
また、容器本体と蓋体の少なくともいずれか一方の対向部に、各リテーナの外側片を接触させるとともに、内側片を隙間を介して対向させれば、対向部に対して非接触の内側片が撓んで接触することとなり、撓み量が増大する。
また、各リテーナの外側片に補強部材を設ければ、内側片と外側片の厚みや形状を大きく変更しなくても、内側片より外側片の剛性を高めることができる。
ADVANTAGE OF THE INVENTION According to this invention, there exists an effect that it can suppress that a board | substrate rotates and an abrasion powder etc. adhere and can align a board | substrate easily.
In addition, when the outer piece of each retainer is brought into contact with at least one of the opposing portions of the container main body and the lid, and the inner piece is made to face through the gap, the inner piece that is not in contact with the facing portion is obtained. It will bend and contact, and the amount of bending will increase.
Further, if a reinforcing member is provided on the outer piece of each retainer, the rigidity of the outer piece can be increased more than the inner piece without greatly changing the thickness and shape of the inner piece and the outer piece.

以下、図面を参照して本発明の好ましい実施の形態を説明すると、本実施形態における基板収納容器は、図1ないし図5に示すように、複数枚の半導体ウェーハWを収納する容器本体1と、この容器本体1の開口正面を開閉する着脱自在の蓋体10と、容器本体1の背面壁8に装着されて半導体ウェーハWの後部周縁を弾発的に保持する左右一対のリヤリテーナ20・20Aとを備え、各リヤリテーナ20・20Aに、半導体ウェーハWの自由回転を規制する機能を付与している。   Hereinafter, a preferred embodiment of the present invention will be described with reference to the drawings. A substrate storage container in this embodiment includes a container main body 1 for storing a plurality of semiconductor wafers W, as shown in FIGS. A detachable lid 10 that opens and closes the opening front of the container body 1 and a pair of left and right rear retainers 20 and 20A that are attached to the rear wall 8 of the container body 1 and elastically hold the rear periphery of the semiconductor wafer W. The rear retainers 20 and 20A are provided with a function of restricting free rotation of the semiconductor wafer W.

各半導体ウェーハWは、図4に示すように、例えば直径300mmの丸い円板形のシリコンウェーハからなり、表裏両面がそれぞれ鏡面に形成されており、専用のロボットにより左右の両側部周縁がハンドリングされた状態で出し入れされる。この半導体ウェーハWの周縁部には、結晶方向の判別や整列を容易にするノッチNが平面略半円形に切り欠かれる。   As shown in FIG. 4, each semiconductor wafer W is made of, for example, a round disk-shaped silicon wafer having a diameter of 300 mm. Both front and back surfaces are formed as mirror surfaces. In and out. At the periphery of the semiconductor wafer W, a notch N that facilitates discrimination and alignment of the crystal direction is cut out in a substantially semicircular plane.

容器本体1は、図1や図2に示すように、所定の樹脂を使用して正面の開口した透明のフロントオープンボックスに成形され、複数枚(例えば25枚)の半導体ウェーハWを上下方向に並べて整列収納するよう機能する。この容器本体1の両側壁の内面には図3に示すように、相互に対向して半導体ウェーハWを略水平に支持搭載する左右一対のティース2が形成され、この一対のティース2が上下方向に所定のピッチで複数配列される。   As shown in FIGS. 1 and 2, the container body 1 is formed into a transparent front open box having a front opening using a predetermined resin, and a plurality of (for example, 25) semiconductor wafers W are vertically arranged. Functions to store side by side. As shown in FIG. 3, a pair of left and right teeth 2 that support and mount the semiconductor wafer W substantially horizontally are formed on the inner surfaces of both side walls of the container main body 1. Are arranged at a predetermined pitch.

ティース2は、平面略長方形、略く字形、あるいは略半円弧形に形成されて半導体ウェーハWの側部周縁に沿う平板3と、この平板3の前部内側上に一体形成される平坦な前部中肉領域と、平板3の前部外側上に一体形成されて前部中肉領域の外側、換言すれば、容器本体1の側壁側に位置する平坦な前部厚肉領域と、平板3の後部に一体形成される後部中肉領域と、平板3の後部に形成されて後部中肉領域の前方に位置し、容器本体1の側壁寄りに僅かな面積で位置する平坦な後部厚肉領域とから形成される。   The teeth 2 are formed in a substantially rectangular shape, a substantially square shape, or a substantially semicircular arc shape, and a flat plate 3 that is formed on the front inner side of the flat plate 3 and a flat plate 3 that extends along the peripheral edge of the semiconductor wafer W. The front middle wall region, the flat front thick region that is integrally formed on the front outer side of the flat plate 3 and located outside the front middle wall region, in other words, on the side wall side of the container body 1, and the flat plate A rear middle thickness region integrally formed at the rear portion of the flat plate 3, and a flat rear thick portion formed at the rear portion of the flat plate 3 and positioned in front of the rear middle thickness region and located in a small area near the side wall of the container body 1 Region.

前部中肉領域と前部厚肉領域との間には、半導体ウェーハWの側部周縁に接触する垂直の段差が僅かに形成され、前部厚肉領域は蓋体10の取り外し時に半導体ウェーハWが容器本体1から飛び出すのを規制するよう機能する。前部中肉領域と後部中肉領域との間には、僅かに凹んだ薄肉領域が形成され、この薄肉領域が半導体ウェーハWの側部周縁に僅かな隙間を介して対向する。   A slight vertical step contacting the side periphery of the semiconductor wafer W is formed between the front middle wall region and the front thick wall region. The front thick wall region is formed when the lid 10 is removed. It functions to restrict W from jumping out of the container body 1. A slightly recessed thin region is formed between the front middle region and the rear middle region, and this thin region is opposed to the peripheral edge of the side of the semiconductor wafer W with a slight gap.

このような構成のティース2は、平坦な前部中肉領域と後部中肉領域とに半導体ウェーハWの側部周縁を高い精度を維持しつつ水平に支持し、半導体ウェーハWが上下方向に傾斜してロボットのフォークによる出し入れが困難になるのを防止するよう機能する。   The teeth 2 having such a structure horizontally supports the peripheral edge of the semiconductor wafer W in a flat front middle region and rear middle region while maintaining high accuracy, and the semiconductor wafer W is inclined in the vertical direction. Thus, it functions to prevent the robot fork from being taken in and out.

容器本体1の底面の前部両側と後部中央とには、基板収納容器を搭載する加工装置に位置決めされる位置決め具4がそれぞれ一体形成され、容器本体1の底面後部には、薄板で小型のボトムプレートが後方から着脱自在に装着されており、このボトムプレートに下方から着脱自在に嵌入された単数複数の識別体が加工装置に識別されることにより、基板収納容器のタイプや半導体ウェーハWの枚数等が把握される。   Positioning tools 4 that are positioned by a processing apparatus on which the substrate storage container is mounted are integrally formed on both the front side and the rear center of the bottom surface of the container body 1, and a thin and small plate is formed on the rear surface of the bottom surface of the container body 1. A bottom plate is detachably mounted from the rear, and a plurality of identifiers detachably fitted to the bottom plate from below are identified by the processing apparatus, so that the type of the substrate storage container and the semiconductor wafer W The number of sheets is grasped.

各位置決め具4は、断面略M字形、略逆Y字形、あるいは凹んだ小判形等に形成される。ボトムプレートは、平面略凹字形、略Y字形、又は多角形等に形成され、必要に応じて取り付けられたり、大小が変更される。   Each positioning tool 4 is formed in a substantially M-shaped cross section, a substantially inverted Y shape, or a concave oval shape. The bottom plate is formed in a plane substantially concave shape, a substantially Y shape, or a polygonal shape, and is attached or changed in size as necessary.

容器本体1の天井中央部には図1や図3に示すように、平面矩形のロボティックフランジ5が一体的あるいは着脱自在に装着され、このロボティックフランジ5がOHTと呼ばれる図示しない自動搬送機に保持されることにより、基板収納容器が工程内を搬送する。また、容器本体1の開口正面の周縁部は断面略L字形に形成されることにより、外方向に張り出されてリム部6を形成(図2、図3参参照)し、このリム部6内の上下には、蓋体施錠用の係止穴7がそれぞれ複数凹み形成される。   As shown in FIGS. 1 and 3, a flat rectangular robotic flange 5 is integrally or detachably attached to the center of the ceiling of the container body 1, and this robotic flange 5 is called an OHT and is not shown in the figure. As a result, the substrate container transports the inside of the process. Moreover, the peripheral part of the opening front of the container main body 1 is formed in a substantially L-shaped cross section so that it protrudes outward to form a rim part 6 (see FIGS. 2 and 3). A plurality of recesses for locking the lid are formed on the upper and lower sides.

容器本体1の両側壁には肉厚の円板形あるいは倒U字形の搬送ハンドル(図示せず)がそれぞれ選択的に装着され、この搬送ハンドルが把持されることにより基板収納容器が搬送される。   Thick disk-shaped or inverted U-shaped transport handles (not shown) are selectively mounted on both side walls of the container body 1, and the substrate storage container is transported by gripping the transport handles. .

なお、容器本体1、ティース2、位置決め具4、ボトムプレート、ロボティックフランジ5、及び搬送ハンドルは、例えばポリカーボネート、ポリエーテルイミド、ポリエーテルエーテルケトン、又は環状オレフィン樹脂等を使用して成形される。これらの材料には、カーボンブラック、アセチレンブラック、炭素繊維、カーボンナノチューブ、金属繊維、帯電防止剤等を適宜添加することができる。   The container body 1, the teeth 2, the positioning tool 4, the bottom plate, the robotic flange 5, and the transport handle are molded using, for example, polycarbonate, polyetherimide, polyetheretherketone, or cyclic olefin resin. . Carbon black, acetylene black, carbon fiber, carbon nanotube, metal fiber, antistatic agent and the like can be appropriately added to these materials.

蓋体10は、図1ないし図3に示すように、容器本体1のリム部6内に着脱自在に嵌合される嵌合体11と、この嵌合体11の開口した表面両側部にそれぞれセットされる左右一対の施錠機構15と、嵌合体11の開口した表面両側部にそれぞれ着脱自在に装着されて施錠機構15を被覆する一対のカバープレート16とから構成され、容器本体1の開口正面であるリム部6内に着脱自在に押圧嵌合されてシール状態に嵌合閉鎖する。   As shown in FIGS. 1 to 3, the lid body 10 is set on a fitting body 11 that is detachably fitted into the rim portion 6 of the container body 1, and on both sides of the opening surface of the fitting body 11. A pair of left and right locking mechanisms 15 and a pair of cover plates 16 that are detachably attached to both sides of the opening surface of the fitting body 11 and cover the locking mechanism 15, respectively, and are the opening front of the container body 1. The rim portion 6 is detachably pressed and fitted and closed in a sealed state.

嵌合体11は、基本的には断面略皿形あるいは略ハット形に形成されるとともに、横長の正面略矩形に形成され、周壁が剛性を確保できるよう断面略H字形、断面略L字形、あるいは断面略Z字形に形成されており、この屈曲した周壁に、容器本体1と蓋体10との間に介在するシールガスケット12が着脱自在に嵌合される。シールガスケット12は、例えばフッ素ゴムやシリコーンゴム等を使用してエンドレスに成形され、蓋体10の嵌合時にリム部6の内周に圧接変形し、容器本体1の外部から内部に塵埃を含む気体が流入するのを抑制防止するよう機能する。   The fitting body 11 is basically formed in a substantially dish-shaped or substantially hat-shaped cross section, is formed in a horizontally long frontal rectangular shape, and has a substantially H-shaped cross section, a substantially L-shaped cross section so that the peripheral wall can ensure rigidity, or The seal gasket 12 interposed between the container main body 1 and the cover body 10 is detachably fitted to the bent peripheral wall. The seal gasket 12 is formed endlessly using, for example, fluorine rubber, silicone rubber, or the like, is pressed and deformed to the inner periphery of the rim portion 6 when the lid body 10 is fitted, and contains dust from the outside to the inside of the container body 1. It functions to suppress and prevent the inflow of gas.

嵌合体11の裏面(容器本体1の背面壁8に対向する面、対向部)には、平面略U字形を呈する弾性のフロントリテーナ13が装着され、このフロントリテーナ13が容器本体1に収納された各半導体ウェーハWの前部周縁を挟持する。このフロントリテーナ13は、嵌合体11の裏面の中央部に装着される縦長の支持枠体と、この支持枠体の両側部間に架設されて上下方向に並ぶ複数の弾性片と、各弾性片の略中央部に一体形成され、半導体ウェーハWの前部周縁を溝を介して保持する誘導ブロック14とから形成され、各弾性片の略両側部には、半導体ウェーハWの前部周縁を溝を介して挟持する被誘導ブロック14が選択的に形成される。   An elastic front retainer 13 having a substantially U-shaped plane is mounted on the back surface of the fitting body 11 (the surface facing the back wall 8 of the container body 1, the facing portion), and the front retainer 13 is accommodated in the container body 1. The front peripheral edge of each semiconductor wafer W is clamped. The front retainer 13 includes a vertically long support frame that is attached to the center of the back surface of the fitting body 11, a plurality of elastic pieces that are installed between both sides of the support frame and are arranged in the vertical direction, and each elastic piece. And a guide block 14 that holds the front peripheral edge of the semiconductor wafer W through a groove, and the front peripheral edge of the semiconductor wafer W is formed in a groove on substantially both sides of each elastic piece. A guided block 14 is selectively formed so as to be sandwiched therebetween.

各施錠機構15は、嵌合体11の表面側部に軸支され、図示しない蓋体開閉装置の外部からの操作で回転する回転リールと、嵌合体11にスライド可能に支持されて回転リールに連結され、回転リールの回転に基づいて蓋体10の内外上下方向に直線的にスライドする複数の進退動バーと、各進退動バーの先端部に形成され、嵌合体11の周壁の開口から出没してリム部6の係止穴7に嵌合係止する係止爪とから構成され、容器本体1のリム部6を嵌合閉鎖した蓋体10を施錠する。   Each locking mechanism 15 is pivotally supported on the surface side portion of the fitting body 11 and is rotated by an operation from the outside of a lid opening / closing device (not shown) and is slidably supported by the fitting body 11 and connected to the rotation reel. And a plurality of advancing / retracting bars that slide linearly in the up / down direction of the lid 10 based on the rotation of the rotary reel, and formed at the front end of each advancing / retracting bar, and protrudes and disappears from the opening of the peripheral wall of the fitting 11. And a locking claw that is engaged with and locked to the locking hole 7 of the rim portion 6 and locks the lid body 10 that is fitted and closed to the rim portion 6 of the container body 1.

各カバープレート16は、嵌合体11の開口領域に対応する形状に形成され、回転リールの表面中心部に対向する施錠機構15用の貫通操作孔17が正面矩形に穿孔されており、この貫通操作孔17が蓋体開閉装置のキーに貫通される。   Each cover plate 16 is formed in a shape corresponding to the opening area of the fitting body 11, and a through operation hole 17 for the locking mechanism 15 facing the center of the surface of the rotary reel is formed in a front rectangle. The hole 17 is penetrated by the key of the lid opening / closing device.

なお、蓋体10の嵌合体11、施錠機構15、カバープレート16等は、例えばポリカーボネート、フッ素を含有したポリカーボネート、ポリブチレンテレフタレート、ポリエーテルエーテルケトン、ポリエーテルイミド、ポリアセタール等を使用して成形される。   Note that the fitting body 11, the locking mechanism 15, the cover plate 16 and the like of the lid body 10 are formed using, for example, polycarbonate, polycarbonate containing fluorine, polybutylene terephthalate, polyetheretherketone, polyetherimide, polyacetal, or the like. The

一対のリヤリテーナ20・20Aは、図2や図4に示すように、容器本体1の背面壁8の内面(対向部)に間隔をおいて装着されるとともに、半導体ウェーハWの重心Cを通る中心線CLを挟むよう対称に配列され、蓋体10の嵌合閉鎖時にフロントリテーナ13と対向して半導体ウェーハWを一対のティース2から僅かに浮かせた状態で略水平に挟持する。   As shown in FIGS. 2 and 4, the pair of rear retainers 20, 20 </ b> A are mounted on the inner surface (opposing portion) of the back wall 8 of the container body 1 with a space therebetween and the center passing through the center of gravity C of the semiconductor wafer W. The semiconductor wafers W are arranged substantially symmetrically so as to sandwich the line CL, and are held substantially horizontally in a state where the semiconductor wafer W is slightly lifted from the pair of teeth 2 so as to face the front retainer 13 when the lid 10 is fitted and closed.

各リヤリテーナ20・20Aは、図5に示すように、容器本体1の背面壁8に接触する可撓性の内側片21と、容器本体1の背面壁8に接触して内側片21に隙間をおいて対向する可撓性の外側片22と、これら内側片21と外側片22との間に架設され、半導体ウェーハWを挟持する弾性の支持ブロック23とから断面略U字形の縦長に形成され、容器本体1の上下方向に指向する(この点に関しては、図8参照)。   As shown in FIG. 5, each of the rear retainers 20, 20 </ b> A has a flexible inner piece 21 that contacts the back wall 8 of the container body 1 and a gap between the inner piece 21 that contacts the back wall 8 of the container body 1. Are formed in a vertically long shape having a substantially U-shaped cross section from a flexible outer piece 22 facing each other and an elastic support block 23 sandwiched between the inner piece 21 and the outer piece 22 and sandwiching the semiconductor wafer W. , Oriented in the vertical direction of the container body 1 (see FIG. 8 for this point).

各リヤリテーナ20・20Aは、例えばポリオレフィン系、ポリエステル系の熱可塑性エラストマーやフッ素ゴム、EPDM、ポリウレタン等のゴム、ポリエチレンやポリプロピレン等のポリオレフィン系樹脂、ポリエチレンテレフタレートやポリブチレンテレフタレート等のポリエステル系樹脂、ポリエーテルエーテルケトン材料として形成される。   Each of the rear retainers 20 and 20A is made of, for example, a polyolefin-based or polyester-based thermoplastic elastomer, fluorine rubber, rubber such as EPDM, polyurethane, polyolefin-based resin such as polyethylene or polypropylene, polyester-based resin such as polyethylene terephthalate or polybutylene terephthalate, poly It is formed as an ether ether ketone material.

各リヤリテーナ20・20Aは、その内側片21と外側片22とに、凹部や凸部等からなる嵌合部24が上下方向に間隔をおいて複数形成され、各嵌合部24が容器本体1の背面壁内面の被嵌合部24に嵌合することにより、容器本体1の背面壁8に固定される。内側片21と外側片22とは、同じ高さに形成され、内側片21の前後長(図5の上下方向の長さ)よりも外側片22の前後長が長く形成される。内側片21は、外側片22よりも半導体ウェーハWの重心Cを通る中心線CLに接近し、外側片22の30〜90%の厚みの薄肉に形成されており、撓み量が外側片22の撓み量より大きく設定される。   Each of the rear retainers 20, 20 </ b> A is formed with a plurality of fitting portions 24 formed of concave portions, convex portions, and the like at intervals between the inner piece 21 and the outer piece 22 in the vertical direction. It is fixed to the back wall 8 of the container body 1 by being fitted to the fitted portion 24 on the inner surface of the back wall. The inner piece 21 and the outer piece 22 are formed at the same height, and the front and rear length of the outer piece 22 is longer than the front and rear length of the inner piece 21 (length in the vertical direction in FIG. 5). The inner piece 21 is closer to the center line CL passing through the center of gravity C of the semiconductor wafer W than the outer piece 22, and is formed in a thin thickness of 30 to 90% of the outer piece 22. It is set larger than the deflection amount.

内側片21の厚みが外側片22の厚みの30〜90%の範囲なのは、30%未満の場合には、内側片21の強度が低下して半導体ウェーハWを安全に保持できなくなるおそれがあり、しかも、成形の困難化を招くからである。逆に、90%を超える場合には、リヤリテーナ20・20Aが容器本体1の中心線CL方向に撓まないおそれがあるからである。   The thickness of the inner piece 21 is in the range of 30 to 90% of the thickness of the outer piece 22. If the thickness is less than 30%, the strength of the inner piece 21 may be reduced and the semiconductor wafer W may not be safely held. Moreover, it is difficult to mold. Conversely, if it exceeds 90%, the rear retainers 20 and 20A may not bend in the direction of the center line CL of the container body 1.

支持ブロック23は、内側片21と外側片22との端部間に斜めに架設され、各半導体ウェーハWの後部周縁をV溝を介して挟持する複数のブロック25が内側片21と外側片22との略中間部付近に位置する。   The support block 23 is obliquely installed between the end portions of the inner piece 21 and the outer piece 22, and a plurality of blocks 25 that sandwich the rear periphery of each semiconductor wafer W via the V-grooves are formed by the inner piece 21 and the outer piece 22. It is located near the middle part.

上記構成によれば、各リヤリテーナ20・20Aの内側片21が外側片22よりも撓みやすく形成されているので、フロントリテーナ13とリヤリテーナ20・20Aとに半導体ウェーハWが挟持される際、半導体ウェーハWは、図4に示す左側のリヤリテーナ20では時計方向に水平に回転(図4の矢印参照)し、右側のリヤリテーナ20Aでは反時計方向に水平に回転(同図の矢印参照)しようとする。すなわち、半導体ウェーハWに左右のリヤリテーナ20・20Aからそれぞれ逆方向の力が加わり、回転方向が逆向きになるので、相互に打ち消し合って半導体ウェーハWの大きな回転が防止されることとなる。   According to the above configuration, since the inner piece 21 of each rear retainer 20 / 20A is formed to be more easily bent than the outer piece 22, when the semiconductor wafer W is sandwiched between the front retainer 13 and the rear retainer 20 / 20A, the semiconductor wafer The left rear retainer 20 shown in FIG. 4 attempts to rotate horizontally in the clockwise direction (see the arrow in FIG. 4), and the right rear retainer 20A attempts to rotate in the counterclockwise direction (see the arrow in the same figure). That is, reverse force is applied to the semiconductor wafer W from the left and right rear retainers 20 and 20A, respectively, and the rotation directions are reversed, so that they cancel each other and prevent the semiconductor wafer W from rotating significantly.

このような回転規制作用により、基板収納容器の搬送時の振動や衝撃に伴い、一対のリヤリテーナ20・20Aが撓んでも、半導体ウェーハWが大きく回転して磨耗粉が付着するという問題をきわめて有効に解消することができる。また、半導体ウェーハWのノッチNの位置を大幅に揃え直す必要がなくなるので、生産効率や作業性の向上が大いに期待できる。さらに、例え半導体ウェーハWに振動や衝撃が作用しても、リヤリテーナ20・20Aが撓んで衝撃を吸収するので、半導体ウェーハWの周縁部が傷付くのを有効に抑制防止することができる。   Due to such a rotation restricting action, the problem that the semiconductor wafer W rotates greatly and wear powder adheres even if the pair of rear retainers 20 and 20A bends due to vibrations and shocks when the substrate storage container is transported is extremely effective. Can be resolved. In addition, since it is not necessary to realign the position of the notch N of the semiconductor wafer W, improvement in production efficiency and workability can be greatly expected. Further, even if vibration or impact acts on the semiconductor wafer W, the rear retainers 20 and 20A bend and absorb the impact, so that it is possible to effectively suppress and prevent the peripheral portion of the semiconductor wafer W from being damaged.

次に、図6は本発明の第2の実施形態を示すもので、この場合には、容器本体1の背面壁8の内面に、各リヤリテーナ20・20Aの外側片22を接触させるとともに、内側片21を隙間Gを介して非接触に対向させ、内側片21を外側片22よりも薄肉に形成しており、半導体ウェーハWの挟持時に容器本体1の背面壁内面に内側片21を撓ませて接触させるようにしている。   Next, FIG. 6 shows a second embodiment of the present invention. In this case, the outer piece 22 of each of the rear retainers 20 and 20A is brought into contact with the inner surface of the rear wall 8 of the container body 1 and the inner side The piece 21 is opposed in a non-contact manner through the gap G, the inner piece 21 is formed thinner than the outer piece 22, and the inner piece 21 is bent on the inner surface of the back wall of the container body 1 when the semiconductor wafer W is sandwiched. To make contact.

容器本体1の背面壁内面とリヤリテーナ20・20Aの内側片21との間には、0.5〜2mmの隙間Gが形成される。これは、隙間Gが0.5mm未満の場合には、半導体ウェーハWの回転規制が不十分になるからである。逆に、2mmを超える場合には、リヤリテーナ20・20Aの変形ストロークが大き過ぎ、外側片22に荷重が集中して変形が生じやすく、半導体ウェーハWの搭載位置が前後にばらつくからである。リヤリテーナ20・20Aの内側片21は、薄肉でも良いが、外側片22と同じ肉厚でも良い。その他の部分については、上記実施形態と同様であるので説明を省略する。   A gap G of 0.5 to 2 mm is formed between the inner surface of the rear wall of the container body 1 and the inner piece 21 of the rear retainer 20 / 20A. This is because when the gap G is less than 0.5 mm, the rotation regulation of the semiconductor wafer W becomes insufficient. On the other hand, if it exceeds 2 mm, the deformation stroke of the rear retainers 20 and 20A is too large, the load concentrates on the outer piece 22 and deformation easily occurs, and the mounting position of the semiconductor wafer W varies back and forth. The inner piece 21 of the rear retainer 20, 20 </ b> A may be thin, but may be the same thickness as the outer piece 22. The other parts are the same as those in the above embodiment, and the description thereof is omitted.

本実施形態においても上記実施形態と同様の作用効果が期待でき、しかも、上記実施形態を採用できない場合に有意義なのは明らかである。   In the present embodiment, it is obvious that the same effects as those in the above embodiment can be expected, and that it is significant when the above embodiment cannot be adopted.

次に、図7は本発明の第3の実施形態を示すもので、この場合には、各リヤリテーナ20・20Aの外側片22内に補強部材26をインサート成形して一体化し、半導体ウェーハWの挟持時に容器本体1の背面壁内面に内側片21を撓ませて接触させるようにしている。   Next, FIG. 7 shows a third embodiment of the present invention. In this case, a reinforcing member 26 is insert-molded and integrated into the outer piece 22 of each rear retainer 20, 20 A, and the semiconductor wafer W is integrated. The inner piece 21 is bent and brought into contact with the inner surface of the back wall of the container body 1 when sandwiched.

補強部材26は、各種の金属、ポリエーテルエーテルケトン、炭素繊維が添加された各種熱可塑性樹脂等からなる剛性の良好な樹脂等からなり、外側片22の剛性を内側片21よりも向上させるよう機能する。リヤリテーナ20・20Aの内側片21は、薄肉でも良いが、外側片22と同じ肉厚でも良い。その他の部分については、上記実施形態と同様であるので説明を省略する。
本実施形態においても上記実施形態と同様の作用効果が期待でき、しかも、内側片21を特に薄くする必要がないのは明らかである。
The reinforcing member 26 is made of a resin having good rigidity made of various metals, polyetheretherketone, various thermoplastic resins to which carbon fibers are added, and the like, so that the rigidity of the outer piece 22 is improved as compared with the inner piece 21. Function. The inner piece 21 of the rear retainer 20, 20 </ b> A may be thin, but may be the same thickness as the outer piece 22. Other parts are the same as those in the above embodiment, and thus the description thereof is omitted.
In this embodiment, the same effect as the above embodiment can be expected, and it is clear that the inner piece 21 does not need to be particularly thin.

次に、図8は本発明の第4の実施形態を示すもので、この場合には、各リヤリテーナ20・20Aにおける支持ブロック23の各ブロック25を、内側片21と外側片22との中心部よりも外側片22寄りに偏移させ、内側片21の撓み量を増大させるようにしている。その他の部分については、上記実施形態と同様であるので説明を省略する。
本実施形態においても上記実施形態と同様の作用効果が期待でき、しかも、内側片21を敢えて薄くする必要がなく、リヤリテーナ20・20Aの構成の多様化を図ることができるのは明白である。
Next, FIG. 8 shows a fourth embodiment of the present invention. In this case, each block 25 of the support block 23 in each of the rear retainers 20 and 20A is connected to the central portion of the inner piece 21 and the outer piece 22. In this case, the inner piece 21 is deflected closer to the outer piece 22 to increase the amount of bending of the inner piece 21. Other parts are the same as those in the above embodiment, and thus the description thereof is omitted.
In this embodiment, the same effect as the above embodiment can be expected, and it is clear that the inner piece 21 does not need to be thinned and the configuration of the rear retainers 20 and 20A can be diversified.

次に、図9は本発明の第5の実施形態を示すもので、この場合には、容器本体1の背面壁内面と各リテーナの内側片21とが形成する角度θ1を背面壁内面と外側片22とが形成する角度θ2よりも小さくし、内側片21の撓み量を増大させるようにしている。その他の部分については、上記実施形態と同様であるので説明を省略する。
本実施形態においても上記実施形態と同様の作用効果が期待でき、しかも、リヤリテーナ20・20Aの構成の多様化を図ることができるのは明白である。
Next, FIG. 9 shows a fifth embodiment of the present invention. In this case, the angle θ1 formed by the inner surface 21 of the back wall of the container body 1 and the inner piece 21 of each retainer is set to the inner surface of the rear wall and the outer surface. The angle θ2 formed by the piece 22 is made smaller, and the amount of bending of the inner piece 21 is increased. Other parts are the same as those in the above embodiment, and thus the description thereof is omitted.
In the present embodiment, it is obvious that the same effects as those of the above-described embodiment can be expected, and the configuration of the rear retainers 20 and 20A can be diversified.

なお、上記実施形態のロック機構を、蓋体10に支持されて外部からの操作で回転する回転体と、蓋体10にスライド可能に支持されて回転体に連結され、回転体の回転に基づいて蓋体10の内外方向に進退動する複数の進退動バーと、蓋体周壁の開口付近に回転可能に支持されて進退動バーの先端部に連結され、この進退動作バーの進退動に基づいて蓋体10の開口から出没する係止ローラとから構成することができる。   Note that the lock mechanism of the above-described embodiment includes a rotating body that is supported by the lid body 10 and rotates by an external operation, and is slidably supported by the lid body 10 and connected to the rotating body, and is based on rotation of the rotating body. A plurality of advancing and retracting bars that move forward and backward in and out of the lid body 10, and rotatably supported near the opening of the peripheral wall of the lid body and coupled to the tip of the advancing and retracting bar. The locking roller can be configured to protrude from the opening of the lid body 10.

また、上記実施形態では容器本体1の背面壁8に一対のリヤリテーナ20・20Aを直接装着したが、何らこれに限定されるものではない。例えば、容器本体1の背面壁8に一対のリヤリテーナ20・20Aをプレート等を介し間接的に装着しても良い。また、一対のリヤリテーナ20・20Aを一又は複数の連結片を介し略H字形や略ロの字形等に連結した構造にすることもできる。この場合、リヤリテーナ20・20Aを一つの部品にすることができるので、一回の作業で取り付け取り外しすることが可能になる。   In the above embodiment, the pair of rear retainers 20 and 20A are directly mounted on the back wall 8 of the container body 1. However, the present invention is not limited to this. For example, a pair of rear retainers 20 and 20A may be indirectly attached to the back wall 8 of the container body 1 via a plate or the like. Moreover, it can also be set as the structure which connected a pair of rear retainer 20 * 20A to the substantially H shape, the substantially square shape, etc. via the one or several connection piece. In this case, since the rear retainers 20 and 20A can be made into one part, it becomes possible to attach and remove them in one operation.

また、容器本体1の背面壁内面、換言すれば、取付領域の中心点に対して一対のリヤリテーナ20・20Aを点対称に配列しても良い。このように点対称に配列すれば、一のリヤリテーナ20・20Aを設けるだけで、容器本体1の背面壁8の左右どちらにも取り付け可能になる。この場合、左右に取り付ける際の上下の目印を刻印しておけば、取付作業が実に容易となる。さらに、蓋体10のフロントリテーナ13を一対のリヤリテーナ20・20Aのように構成しても良い。   Further, the pair of rear retainers 20 and 20A may be arranged point-symmetrically with respect to the inner surface of the back wall of the container body 1, in other words, with respect to the center point of the attachment region. If arranged in a point-symmetric manner in this way, it can be attached to either the left or right side of the back wall 8 of the container body 1 simply by providing one rear retainer 20 or 20A. In this case, if the top and bottom marks for mounting on the left and right are marked, the mounting operation is really easy. Further, the front retainer 13 of the lid 10 may be configured as a pair of rear retainers 20 and 20A.

本発明に係る基板収納容器の実施形態を示す全体斜視説明図である。It is a whole perspective explanatory view showing an embodiment of a substrate storage container concerning the present invention. 図1のII−II線断面図である。It is the II-II sectional view taken on the line of FIG. 図1のIII−III線断面図である。It is the III-III sectional view taken on the line of FIG. 本発明に係る基板収納容器の実施形態における半導体ウェーハと一対のリヤリテーナとの関係を示す平面説明図である。It is a plane explanatory view showing the relation between a semiconductor wafer and a pair of rear retainers in an embodiment of a substrate storage container concerning the present invention. 本発明に係る基板収納容器の実施形態におけるリヤリテーナを示す説明図である。It is explanatory drawing which shows the rear retainer in embodiment of the substrate storage container which concerns on this invention. 本発明に係る基板収納容器の第2の実施形態におけるリヤリテーナを示す説明図である。It is explanatory drawing which shows the rear retainer in 2nd Embodiment of the substrate storage container which concerns on this invention. 本発明に係る基板収納容器の第3の実施形態におけるリヤリテーナを示す説明図である。It is explanatory drawing which shows the rear retainer in 3rd Embodiment of the substrate storage container which concerns on this invention. 本発明に係る基板収納容器の第4の実施形態における一対のリヤリテーナを示す斜視説明図である。It is a perspective explanatory view showing a pair of rear retainers in a 4th embodiment of a substrate storage container concerning the present invention. 本発明に係る基板収納容器の第5の実施形態におけるリヤリテーナを示す説明図である。It is explanatory drawing which shows the rear retainer in 5th Embodiment of the substrate storage container which concerns on this invention.

符号の説明Explanation of symbols

1 容器本体
2 ティース
6 リム部
8 背面壁(対向部)
10 蓋体
13 フロントリテーナ
20 リヤリテーナ(リテーナ)
20A リヤリテーナ(リテーナ)
21 内側片
22 外側片
23 支持ブロック
25 ブロック
26 補強部材
C 重心
CL 中心線
G 隙間
N ノッチ
W 半導体ウェーハ(基板)
1 Container body 2 Teeth 6 Rim part 8 Back wall (opposite part)
10 Lid 13 Front Retainer 20 Rear Retainer (Retainer)
20A Rear retainer (Retainer)
21 Inner piece 22 Outer piece 23 Support block 25 Block 26 Reinforcement member C Center of gravity CL Center line G Clearance N Notch W Semiconductor wafer (substrate)

Claims (6)

基板を収納する容器本体と、この容器本体の開口部を開閉する蓋体と、これら容器本体と蓋体の少なくともいずれか一方の対向部に設けられて基板の周縁部を保持する複数のリテーナとを含んでなる基板収納容器であって、
各リテーナは、可撓性の内側片と、この内側片に対向する外側片と、これら内側片と外側片との間に設けられて基板の周縁部を支持する支持ブロックとを有し、内側片を外側片よりも基板の重心を通る中心線に接近させるとともに、内側片の撓み量を外側片の撓み量よりも大きくし、基板の回転を抑制するようにしたことを特徴とする基板収納容器。
A container main body for storing the substrate, a lid for opening and closing the opening of the container main body, and a plurality of retainers for holding the peripheral edge of the substrate provided at an opposing portion of at least one of the container main body and the lid. A substrate storage container comprising:
Each retainer includes a flexible inner piece, an outer piece facing the inner piece, and a support block provided between the inner piece and the outer piece to support the peripheral edge of the substrate. The board storage is characterized in that the piece is moved closer to the center line passing through the center of gravity of the board than the outer piece, and the amount of bending of the inner piece is made larger than the amount of bending of the outer piece to suppress the rotation of the board. container.
容器本体と蓋体の少なくともいずれか一方の対向部に、各リテーナの内側片と外側片とをそれぞれ接触させ、内側片を外側片よりも薄く形成した請求項1記載の基板収納容器。   The substrate storage container according to claim 1, wherein an inner piece and an outer piece of each retainer are brought into contact with at least one of the container main body and the cover, respectively, and the inner piece is formed thinner than the outer piece. 容器本体と蓋体の少なくともいずれか一方の対向部に、各リテーナの外側片を接触させるとともに、内側片を隙間を介して対向させた請求項1記載の基板収納容器。   The substrate storage container according to claim 1, wherein an outer piece of each retainer is brought into contact with at least one of the container main body and the lid, and the inner piece is opposed through a gap. 各リテーナの外側片に補強部材を設けた請求項1、2、又は3記載の基板収納容器。   4. The substrate storage container according to claim 1, wherein a reinforcing member is provided on an outer piece of each retainer. 各リテーナの支持ブロックを、内側片と外側片との中心部よりも外側片寄りに位置させた請求項1ないし4いずれかに記載の基板収納容器。   The substrate storage container according to claim 1, wherein the support block of each retainer is positioned closer to the outer side than the center part of the inner and outer pieces. 容器本体と蓋体の少なくともいずれか一方の対向部に、各リテーナの内側片と外側片とをそれぞれ接触させ、対向部と内側片とが形成する角度θ1を対向部と外側片とが形成する角度θ2よりも小さくした請求項1ないし5いずれかに記載の基板収納容器。   The inner piece and the outer piece of each retainer are brought into contact with at least one of the opposing portions of the container main body and the lid body, and the opposing portion and the outer piece form an angle θ1 formed by the opposing portion and the inner piece. The substrate storage container according to claim 1, wherein the substrate storage container is smaller than the angle θ2.
JP2004307049A 2004-10-21 2004-10-21 Substrate storage container Active JP4459015B2 (en)

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2207199A1 (en) * 2007-11-09 2010-07-14 Shin-Etsu Polymer Co. Ltd. Retainer and substrate storing container
JP2011018878A (en) * 2009-06-08 2011-01-27 Gold Kogyo Kk Precise substrate storage container, and method of manufacturing the same
WO2011102318A1 (en) * 2010-02-19 2011-08-25 信越ポリマー株式会社 Substrate storing container
JP2013157395A (en) * 2012-01-27 2013-08-15 Disco Abrasive Syst Ltd Wafer cassette
WO2013183138A1 (en) * 2012-06-07 2013-12-12 ミライアル株式会社 Substrate housing container provided with impact absorbing function
WO2017136743A1 (en) * 2016-02-05 2017-08-10 Entegris, Inc. Cushion retainer for substrate container
JP2019127272A (en) * 2018-01-22 2019-08-01 信越ポリマー株式会社 Panel storage container

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2207199A1 (en) * 2007-11-09 2010-07-14 Shin-Etsu Polymer Co. Ltd. Retainer and substrate storing container
EP2207199A4 (en) * 2007-11-09 2012-11-07 Shinetsu Polymer Co Retainer and substrate storing container
US8356713B2 (en) 2007-11-09 2013-01-22 Shin-Etsu Polymer Co., Ltd. Retainer and substrate storage container
JP2011018878A (en) * 2009-06-08 2011-01-27 Gold Kogyo Kk Precise substrate storage container, and method of manufacturing the same
WO2011102318A1 (en) * 2010-02-19 2011-08-25 信越ポリマー株式会社 Substrate storing container
JPWO2011102318A1 (en) * 2010-02-19 2013-06-17 信越ポリマー株式会社 Substrate storage container
JP2013157395A (en) * 2012-01-27 2013-08-15 Disco Abrasive Syst Ltd Wafer cassette
WO2013183138A1 (en) * 2012-06-07 2013-12-12 ミライアル株式会社 Substrate housing container provided with impact absorbing function
JPWO2013183138A1 (en) * 2012-06-07 2016-01-21 ミライアル株式会社 Substrate storage container with shock absorption function
WO2017136743A1 (en) * 2016-02-05 2017-08-10 Entegris, Inc. Cushion retainer for substrate container
US10872795B2 (en) 2016-02-05 2020-12-22 Entegris, Inc. Substrate cushion brace retainer
JP2019127272A (en) * 2018-01-22 2019-08-01 信越ポリマー株式会社 Panel storage container

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