JP2008135434A - Substrate storing container - Google Patents

Substrate storing container Download PDF

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JP2008135434A
JP2008135434A JP2006318318A JP2006318318A JP2008135434A JP 2008135434 A JP2008135434 A JP 2008135434A JP 2006318318 A JP2006318318 A JP 2006318318A JP 2006318318 A JP2006318318 A JP 2006318318A JP 2008135434 A JP2008135434 A JP 2008135434A
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Prior art keywords
substrate
holding groove
piece
semiconductor wafer
elastic
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JP2006318318A
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JP5072067B2 (en
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Hiroshi Mimura
博 三村
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Shin Etsu Polymer Co Ltd
Shin Etsu Chemical Co Ltd
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Shin Etsu Polymer Co Ltd
Shin Etsu Chemical Co Ltd
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Priority to JP2006318318A priority Critical patent/JP5072067B2/en
Application filed by Shin Etsu Polymer Co Ltd, Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Polymer Co Ltd
Priority to PCT/JP2007/070929 priority patent/WO2008056549A1/en
Priority to CN2007800414081A priority patent/CN101536174B/en
Priority to US12/513,304 priority patent/US7967147B2/en
Priority to EP07830663A priority patent/EP2081223A4/en
Priority to KR1020097008151A priority patent/KR101472145B1/en
Priority to TW096141713A priority patent/TWI466221B/en
Publication of JP2008135434A publication Critical patent/JP2008135434A/en
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Publication of JP5072067B2 publication Critical patent/JP5072067B2/en
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate storing container capable of reducing the contact region of a retainer to a substrate and the contamination of the substrate. <P>SOLUTION: In the substrate storing container, the retainer 30 holding a semiconductor wafer W is interposed between a container body 10 capable of aligning and storing a plurality of semiconductor wafers W and a lid body 20. The retainer 30 is formed by a plurality of flexible elastic pieces 31 that are extended in the direction of the semiconductor wafer W stored in the container body 10 from the ceiling inner surface of the lid body 20 and are arranged in the alignment direction of the plurality of semiconductor wafers W and a holding groove piece 34 that is formed at the tip of each elastic piece 31 and holds the upper end of the periphery in the semiconductor wafer W in contact. The elastic piece 31 and the holding groove piece 34 are bent gradually in the direction of the semiconductor wafer W from the ceiling inner surface side of the lid body 20 to reduce the contact holding region of the holding groove piece 34 to the upper end of the periphery of the semiconductor wafer W toward the radius outer direction of the semiconductor wafer W. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、半導体ウェーハやマスクガラスを収納して加工、搬送、輸送等する基板収納容器に関するものである。   The present invention relates to a substrate storage container for storing, processing, transporting, transporting, etc. a semiconductor wafer or mask glass.

薄くて丸い半導体ウェーハWを収納等する従来の基板収納容器は、図13に部分的に示すように、垂直に起立した複数枚の半導体ウェーハWを整列収納する容器本体と、この容器本体の開口した上部に着脱自在に嵌合されて複数枚の半導体ウェーハWの上部を被覆保護する蓋体20とを備えて構成され、この蓋体20の天井内面には、各半導体ウェーハWを保持するリテーナ30Aが設けられており、脆い半導体ウェーハWを汚染や損傷等から保護する(特許文献1、2参照)。   As shown in FIG. 13, a conventional substrate storage container for storing a thin and round semiconductor wafer W includes a container body for aligning and storing a plurality of vertically standing semiconductor wafers W, and an opening of the container body. And a lid 20 that is detachably fitted to the upper portion and covers and protects the upper portions of the plurality of semiconductor wafers W. A retainer for holding each semiconductor wafer W is provided on the ceiling inner surface of the lid 20. 30A is provided to protect the fragile semiconductor wafer W from contamination and damage (see Patent Documents 1 and 2).

リテーナ30Aは、図13に示すように、蓋体20の内面から容器本体に収納された半導体ウェーハWの周縁部上端方向に直線的に水平に伸長し、複数枚の半導体ウェーハWの整列方向に並ぶ可撓性の複数の弾性保持片38を備え、各弾性保持片38の先端部の凹んだ保持溝39に半導体ウェーハWの周縁部を接触保持させるよう機能する。   As shown in FIG. 13, the retainer 30 </ b> A extends linearly and horizontally from the inner surface of the lid 20 toward the upper edge of the peripheral edge of the semiconductor wafer W accommodated in the container body, and in the alignment direction of the plurality of semiconductor wafers W. A plurality of flexible elastic holding pieces 38 arranged in a line are provided, and the peripheral edge portion of the semiconductor wafer W functions to be held in contact with the holding groove 39 that is recessed at the tip of each elastic holding piece 38.

このようなリテーナ30Aは、容器本体の開口した上部に蓋体20が嵌合して押圧されるに伴い、各半導体ウェーハWの周縁部上端に弾性保持片38が接触して徐々に上方に撓み、各半導体ウェーハWに保持力を作用させた状態で保持する。この際、弾性保持片38は、半導体ウェーハWの周縁部上端に対する接触開始時には、保持溝39の先端部39aが部分的に接触し、上方に撓むにしたがい保持溝39の全域39bが接触し、接触終了時には保持溝39の根元側の末端部39cが接触する。
特公平7‐66939号公報 特開2005‐5396号公報
In such a retainer 30 </ b> A, as the lid body 20 is fitted and pressed on the opened upper portion of the container body, the elastic holding piece 38 comes into contact with the upper end of the peripheral edge of each semiconductor wafer W and gradually bends upward. Each semiconductor wafer W is held in a state where a holding force is applied. At this time, when the elastic holding piece 38 starts to contact the upper end of the peripheral edge of the semiconductor wafer W, the tip end portion 39a of the holding groove 39 is partially in contact with the entire area 39b of the holding groove 39 as it bends upward. At the end of the contact, the base end portion 39c of the holding groove 39 comes into contact.
Japanese Patent Publication No. 7-66939 Japanese Patent Laying-Open No. 2005-5396

従来における基板収納容器は、以上のように半導体ウェーハWの周縁部上端に対する弾性保持片38の接触開始時には、弾性保持片38の保持溝39の先端部39aが接触し、上方に撓むにしたがい保持溝39の全域39bが接触し、接触終了時には保持溝39の根元側の末端部39cが接触するので、半導体ウェーハWの周縁部に保持溝39の先端部39aから末端部39cに亘る全域39bが相対的に移動して接触し、少なからず擦れることとなる。したがって、蓋体20のセットの度に半導体ウェーハWの汚染を招くおそれがある。   As described above, in the conventional substrate storage container, when the elastic holding piece 38 starts to contact the upper end of the peripheral edge of the semiconductor wafer W, the tip end portion 39a of the holding groove 39 of the elastic holding piece 38 comes into contact and bends upward. Since the entire region 39b of the holding groove 39 comes into contact, and the end portion 39c on the base side of the holding groove 39 comes into contact at the end of the contact, the entire region 39b extending from the front end portion 39a to the end portion 39c of the holding groove 39 on the peripheral portion of the semiconductor wafer W Will move relative to each other and come into contact with each other. Therefore, the semiconductor wafer W may be contaminated every time the lid 20 is set.

本発明は上記に鑑みなされたもので、基板に対するリテーナの接触領域を減少させ、基板の汚染を低減することのできる基板収納容器を提供することを目的としている。   The present invention has been made in view of the above, and an object of the present invention is to provide a substrate storage container that can reduce the contact area of the retainer with respect to the substrate and reduce contamination of the substrate.

本発明においては上記課題を解決するため、複数枚の基板を整列収納可能な容器本体とその蓋体との間に、基板を保持するリテーナを介在したものであって、
リテーナは、蓋体の内側から容器本体に収納される基板方向に伸び、複数枚の基板の整列方向に並ぶ可撓性の複数の弾性片と、弾性片に形成されて基板の周縁部を接触保持する保持溝片とを含み、これら弾性片と保持溝片とを蓋体の内側から基板方向に向かうに従い徐々に曲げて基板の幅方向外側に向け、基板の周縁部に対する保持溝片の接触保持領域を減少させるようにしたことを特徴としている。
In the present invention, in order to solve the above problems, a retainer for holding the substrate is interposed between the container body capable of aligning and storing a plurality of substrates and the lid,
The retainer extends from the inside of the lid toward the substrate housed in the container body, and is formed on the elastic piece and contacts the peripheral edge of the substrate. The elastic piece is arranged in the alignment direction of the plurality of substrates. Holding the holding groove pieces, and gradually bending the elastic pieces and the holding groove pieces toward the substrate direction from the inside of the lid body toward the outside in the width direction of the substrate, and the contact of the holding groove pieces with the peripheral portion of the substrate It is characterized in that the holding area is reduced.

なお、容器本体を上部の開口した略箱形に形成してその内部には少なくとも上部の開口したカセットを着脱自在に嵌め入れ、このカセットの両側壁内面には、基板用の整列支持溝をそれぞれ並べて形成することができる。
また、基板の周縁部に略対向する一対の弾性片を備え、この一対の弾性片を複数枚の基板の整列方向に配列し、各弾性片を蓋体の内面から突出させてその先端部には保持溝片を形成し、これら弾性片と保持溝片とを略半円弧形に湾曲させて基板の幅方向外側に向けることができる。
The container body is formed in a substantially box shape having an upper opening, and at least the upper opening cassette is detachably fitted therein, and alignment support grooves for substrates are respectively provided on the inner surfaces of both side walls of the cassette. Can be formed side by side.
In addition, a pair of elastic pieces that are substantially opposed to the peripheral edge of the substrate are provided, the pair of elastic pieces are arranged in the alignment direction of the plurality of substrates, and each elastic piece protrudes from the inner surface of the lid body at the tip thereof. Can form holding groove pieces, and these elastic pieces and holding groove pieces can be curved in a substantially semicircular arc shape and directed outward in the width direction of the substrate.

また、容器本体を正面の開口した略箱形に形成してその両側壁の内面には、基板用の整列支持溝をそれぞれ並べて形成し、基板の周縁部に略対向する一対の弾性片を備え、この一対の弾性片を複数枚の基板の整列方向に配列して取付板に取り付けるとともに、この取付板を蓋体の内面に設け、各弾性片の先端部に保持溝片を形成することができる。
また、隣接する複数の弾性片と保持溝片の少なくともいずれか一方に干渉回避面を形成し、この干渉回避面により、隣接する複数の弾性片及び又は保持溝片同士の干渉を回避するようにすることも可能である。
In addition, the container body is formed in a substantially box shape with an opening on the front, and the inner surface of both side walls is formed with alignment support grooves for the substrates arranged side by side, and includes a pair of elastic pieces substantially facing the peripheral edge of the substrate. The pair of elastic pieces may be arranged in the alignment direction of the plurality of substrates and attached to the attachment plate, and the attachment plate may be provided on the inner surface of the lid, and a holding groove piece may be formed at the tip of each elastic piece. it can.
Further, an interference avoidance surface is formed on at least one of the plurality of adjacent elastic pieces and the holding groove pieces, and the interference avoidance surface is used to avoid interference between the adjacent elastic pieces and / or the holding groove pieces. It is also possible to do.

また、弾性片の隣接する他の弾性片に対向する両対向面のうち、一方の対向面に凹部を、他方の対向面に凸部をそれぞれ形成し、これら凹部と凸部の少なくとも一部を傾斜させて干渉回避面とし、凹部と凸部を用いて隣接する複数の弾性片を位置合わせすることも可能である。
さらに、保持溝片の隣接する他の保持溝片に対向する両対向面のうち、一方の対向面に凹部を、他方の対向面に凸部をそれぞれ形成し、これら凹部と凸部の少なくとも一部を傾斜させて干渉回避面とし、凹部と凸部を用いて隣接する複数の保持溝片を位置合わせすることも可能である。
In addition, a concave portion is formed on one opposing surface, and a convex portion is formed on the other opposing surface among both opposing surfaces facing the other elastic piece adjacent to the elastic piece, and at least a part of the concave portion and the convex portion is formed. It is also possible to align the plurality of adjacent elastic pieces using the concave and convex portions by inclining the surface to avoid interference.
Furthermore, a concave portion is formed on one opposing surface and a convex portion is formed on the other opposing surface of both opposing surfaces facing the other holding groove pieces adjacent to the holding groove piece, and at least one of the concave and convex portions is formed. It is also possible to align the plurality of adjacent holding groove pieces using the concave and convex portions by inclining the portion to form an interference avoiding surface.

さらにまた、撓んだ弾性片が隣接する他の弾性片に干渉するのを防いだり、位置ずれした基板を良好に位置補正するため、干渉回避面を110°〜175°の角度で傾斜させたり、あるいは135°〜160°の角度で傾斜させると良い。   Furthermore, in order to prevent the bent elastic piece from interfering with other adjacent elastic pieces, or to correct the position of the misaligned substrate, the interference avoiding surface is inclined at an angle of 110 ° to 175 °. Alternatively, it may be inclined at an angle of 135 ° to 160 °.

ここで、特許請求の範囲における基板には、少なくとも単数複数の半導体ウェーハ(口径150mm、200mm、300mm、450mmタイプ等)、液晶基板、ガラス基板、化合物ウェーハ、カーボンウェーハ、マスクガラス等が含まれる。容器本体は、複数枚の基板を直接整列収納するタイプでも良いし、カセットを介し間接的に整列収納するものでも良い。蓋体とリテーナとは、一体構成でも良いし、着脱自在の別体構成でも良い。基板の周縁部と保持溝片との接触点は、点接触あるいは線接触して略一定であることが好ましい。   Here, the substrate in the claims includes at least one or more semiconductor wafers (diameter 150 mm, 200 mm, 300 mm, 450 mm type, etc.), liquid crystal substrate, glass substrate, compound wafer, carbon wafer, mask glass, and the like. The container body may be of a type in which a plurality of substrates are directly aligned and stored, or may be indirectly aligned and stored via a cassette. The lid body and the retainer may have an integrated configuration or a detachable separate configuration. The contact point between the peripheral edge of the substrate and the holding groove piece is preferably substantially constant by point contact or line contact.

基板の周縁部と保持溝片との接触点は当初の接触点から容器本体に蓋体が嵌め合わされるにつれ、弾性片が撓んで変位しても、基板上の接触点が殆ど変化するものではない。この一方、保持溝片側の接触点は保持溝片の変位により最終的な接触点まで移動するが、この接触点の移動範囲は、当初の接触点から±1.5mmの範囲内であることが好ましい。さらに、保持溝片は、弾性片の先端部に形成される凹んだガイド溝部と、このガイド溝部に凹み形成され、ガイド溝部の斜面に案内されてきた基板の周縁部を保持する最深溝部とを備えると良い。   The contact point between the peripheral edge of the substrate and the holding groove piece is such that the contact point on the substrate hardly changes even when the elastic piece is bent and displaced as the lid body is fitted from the initial contact point to the container body. Absent. On the other hand, the contact point on the holding groove piece side moves to the final contact point due to the displacement of the holding groove piece, and the movement range of this contact point is within ± 1.5 mm from the initial contact point. preferable. Further, the holding groove piece includes a recessed guide groove portion formed at the tip portion of the elastic piece, and a deepest groove portion that is recessed in the guide groove portion and holds the peripheral edge portion of the substrate guided by the slope of the guide groove portion. It is good to prepare.

本発明によれば、基板収納容器に基板を収納する場合には、基板を収納した容器本体の開口部を蓋体により被覆し、基板の周縁部にリテーナの弾性片を保持溝片を介して干渉させれば、リテーナの弾性片が蓋体の内側に撓んで基板に保持力を作用させ、基板を収納することができる。   According to the present invention, when the substrate is stored in the substrate storage container, the opening of the container body storing the substrate is covered with the lid, and the elastic piece of the retainer is disposed on the peripheral edge of the substrate via the holding groove piece. If the interference occurs, the elastic piece of the retainer bends to the inside of the lid body to apply a holding force to the substrate, and the substrate can be stored.

この際、弾性片と保持溝片とが曲がって保持溝片の先端部が基板の幅方向外側を向き、基板上の接触点は弾性片が撓んだ後でも略垂直な位置に移動するだけで殆ど変化せず、保持溝片の接触点は保持溝片の曲率が小さくなったときの接触点までという僅かな領域に変位するに止まる。このように基板上の接触点が殆ど変わらないので、接触に伴う基板の汚染や損傷を極力小さな範囲に止めることができる。   At this time, the elastic piece and the holding groove piece are bent so that the tip of the holding groove piece faces outward in the width direction of the substrate, and the contact point on the substrate only moves to a substantially vertical position even after the elastic piece is bent. However, the contact point of the holding groove piece is only displaced to a slight region up to the contact point when the curvature of the holding groove piece becomes small. As described above, since the contact point on the substrate hardly changes, the contamination and damage of the substrate due to the contact can be kept in a small range as much as possible.

また、保持溝片は、その先端部が外向きに曲がって略中間部で基板と接線状に接触するが、当初の接触点と、この近傍にある保持状態の接触点との狭い範囲で接触するだけなので、広範囲に亘って基板と接触することがない。したがって、基板と保持溝片との接触に伴うパーティクルの発生を低減することができる。   In addition, the holding groove piece bends outward and comes into contact with the substrate in a tangential manner at a substantially intermediate portion, but in a narrow range between the initial contact point and the holding contact point in the vicinity. Therefore, it does not come into contact with the substrate over a wide range. Therefore, the generation of particles accompanying the contact between the substrate and the holding groove piece can be reduced.

本発明によれば、基板に対するリテーナの接触領域を減少させ、基板の汚染を低減することができるという効果がある。
また、容器本体を上部の開口した略箱形に形成してその内部には少なくとも上部の開口したカセットを着脱自在に嵌め入れ、このカセットの両側壁内面には、基板用の整列支持溝をそれぞれ並べて形成すれば、例え容器本体が汚れていても、基板を二重構造に収納するので、基板のクリーン化を確保することができる。
According to the present invention, there is an effect that the contact area of the retainer with respect to the substrate can be reduced and contamination of the substrate can be reduced.
Further, the container body is formed in a substantially box shape having an upper opening, and at least the upper opening cassette is detachably fitted therein, and the alignment support grooves for the substrates are respectively provided on the inner surfaces of both side walls of the cassette. If they are formed side by side, even if the container body is dirty, the substrate is housed in a double structure, so that the substrate can be kept clean.

また、基板の周縁部に略対向する一対の弾性片を備え、この一対の弾性片を複数枚の基板の整列方向に配列し、各弾性片を蓋体の内面から突出させてその先端部には保持溝片を形成し、これら弾性片と保持溝片とを略半円弧形に曲げて基板の幅方向外側に向ければ、基板の周縁部に保持溝片を僅かな面積で接触(点接触あるいは線接触等)させることができ、基板と保持溝片との接触点の移動方向を弾性片の整列方向以外の方向に向けることができる。したがって、保持溝片の接触部分以外が隣接する保持溝片方向に動いて接触するのを回避することができ、基板の摺れや汚染を防止することができる。   In addition, a pair of elastic pieces that are substantially opposed to the peripheral edge of the substrate are provided, the pair of elastic pieces are arranged in the alignment direction of the plurality of substrates, and each elastic piece protrudes from the inner surface of the lid body at the tip thereof. Forms a holding groove piece, and if the elastic piece and the holding groove piece are bent into a substantially semicircular arc shape and directed outward in the width direction of the substrate, the holding groove piece is brought into contact with the peripheral edge of the substrate with a small area (dots). The contact point between the substrate and the holding groove piece can be directed in a direction other than the alignment direction of the elastic pieces. Therefore, it is possible to avoid the contact other than the contact portion of the holding groove piece from moving in the direction of the adjacent holding groove piece, thereby preventing the substrate from sliding or contaminating.

以下、図面を参照して本発明の好ましい実施の形態を説明すると、本実施形態における基板収納容器は、図1ないし図6に示すように、複数枚の半導体ウェーハWをカセット1を介し整列収納可能な容器本体10と、この容器本体10の開口した上部にシールガスケットを介し着脱自在に嵌合されて複数枚の半導体ウェーハWを密封状態に被覆・保護する蓋体20と、これら容器本体10と蓋体20との間に介在されて各半導体ウェーハWを弾発的に保持するリテーナ30とを備えている。   Hereinafter, a preferred embodiment of the present invention will be described with reference to the drawings. A substrate storage container according to the present embodiment arranges and stores a plurality of semiconductor wafers W via a cassette 1 as shown in FIGS. A container body 10 that is possible, a lid 20 that is detachably fitted to the opened upper portion of the container body 10 via a seal gasket to cover and protect a plurality of semiconductor wafers W in a sealed state, and the container body 10 And a retainer 30 that is interposed between the lid body 20 and elastically holds each semiconductor wafer W.

複数枚の半導体ウェーハWは、例えば13枚、25枚、あるいは26枚の枚数でカセット1に整列収納され、縦に起立した状態でカセット1の前後方向(図2の奥方向)に一列に並んで配列される。各半導体ウェーハWは、例えば薄く丸くスライスされた口径150mmのタイプからなり、周縁部の一部分に位置合わせ用のオリフラやノッチが選択的に形成される。   The plurality of semiconductor wafers W are aligned and stored in the cassette 1 in the number of 13, 25, or 26, for example, and are arranged in a line in the front-rear direction of the cassette 1 (backward direction in FIG. 2) in a vertically standing state. Arranged in Each semiconductor wafer W is, for example, a thin and round slice type having a diameter of 150 mm, and an alignment flat or notch is selectively formed in a part of the peripheral edge.

カセット1、容器本体10、蓋体20、リテーナ30は、例えばポリプロピレン、ポリエチレン、ポリカーボネート、シクロオレフィンポリマー、ポリブチレンテレフタレート等の熱可塑性樹脂からなる成形材料を使用して射出成形される。これらの成形材料の中でも半導体ウェーハWを視認して把握する観点から、半透明のポリプロピレンや透明のポリカーボネートの選択が好ましい。   The cassette 1, the container body 10, the lid body 20, and the retainer 30 are injection molded using a molding material made of a thermoplastic resin such as polypropylene, polyethylene, polycarbonate, cycloolefin polymer, polybutylene terephthalate, or the like. Among these molding materials, from the viewpoint of visually grasping and grasping the semiconductor wafer W, selection of translucent polypropylene or transparent polycarbonate is preferable.

カセット1は、図1や図2に示すように、半導体ウェーハWの直径以上の間隔をおいて相対向する左右一対の側壁2と、この一対の側壁2の前端部間に架設して連結される正面略H字形の正面板3と、一対の側壁2の後端部間に架設して連結される背面板4とを備えて半透明に形成され、容器本体10内に上方から着脱自在に嵌合して収納される。このカセット1は、上下部がそれぞれ開口した略角筒形に成形され、開口した広い上部が半導体ウェーハW用の出し入れ口5とされる。   As shown in FIG. 1 and FIG. 2, the cassette 1 is erected between a pair of left and right side walls 2 facing each other with an interval equal to or larger than the diameter of the semiconductor wafer W, and a front end portion of the pair of side walls 2. The front plate 3 is substantially H-shaped, and the back plate 4 is connected between the rear end portions of the pair of side walls 2 so as to be translucent and detachable from above in the container body 10. Fitted and stored. The cassette 1 is formed into a substantially rectangular tube shape having upper and lower portions opened, and a wide upper portion opened is used as a loading / unloading port 5 for the semiconductor wafer W.

各側壁2は、上方から下方に向かうに従い徐々に内側に湾曲する断面略く字形に屈曲形成され、内面には、略櫛歯形で先細りのティース6が所定のピッチで前後方向に複数並設されており、この複数のティース6の間の隙間が半導体ウェーハW挿入用の整列支持溝7に区画形成される。   Each side wall 2 is bent and formed in a substantially square shape that gradually curves inward as it goes from the top to the bottom, and a plurality of teeth 6 that are substantially comb-shaped and tapered are arranged in parallel in the front-rear direction at a predetermined pitch. The gaps between the plurality of teeth 6 are partitioned and formed in the alignment support grooves 7 for inserting the semiconductor wafer W.

容器本体10は、図1や図2に示すように、上部の開口した半透明のトップオープンボックスに形成され、内部両側には、カセット1の両側壁2の湾曲した下部に隙間をおいて対向する一対の対向部11が対設されており、外装用の外箱として機能する。この容器本体10は、開口した上部周縁に気密性を維持するエンドレスのシールガスケットが嵌合可能とされる。このシールガスケットは、例えばシリコーンゴムやフッ素ゴム等を使用して弾性の平面略枠形に成形される。また、容器本体10の両側壁の上部には、外方向に凹んだ蓋体20用の係止溝12がそれぞれ形成される。   As shown in FIG. 1 and FIG. 2, the container body 10 is formed in a semi-transparent top open box having an upper opening, and is opposed to the curved lower portions of both side walls 2 of the cassette 1 with a gap on both sides inside. A pair of opposing portions 11 are provided so as to function as an outer case for the exterior. The container body 10 can be fitted with an endless seal gasket that maintains hermeticity at the opened upper peripheral edge. This seal gasket is formed into an elastic flat substantially frame shape using, for example, silicone rubber, fluoro rubber, or the like. In addition, locking grooves 12 for the lid 20 that are recessed outward are formed in the upper portions of both side walls of the container body 10.

蓋体20は、図1ないし図3に示すように、中空で半透明の断面略ハット形あるいは断面略逆U字形に形成され、両側部には、容器本体10の係止溝12に係止する可撓性の係止片21がそれぞれ一体形成されており、カセット1や複数枚の半導体ウェーハWの略上半分を被覆・保護するよう機能する。   As shown in FIGS. 1 to 3, the lid body 20 is formed into a hollow, semitransparent cross-sectional substantially hat shape or a substantially inverted U-shaped cross section, and is engaged with a locking groove 12 of the container body 10 on both sides. The flexible locking pieces 21 are integrally formed and function to cover and protect the cassette 1 and substantially the upper half of the plurality of semiconductor wafers W.

リテーナ30は、図2ないし図6に示すように、蓋体20の天井から容器本体10の半導体ウェーハW方向に伸長し、複数枚の半導体ウェーハWの整列方向に並ぶ可撓性の複数の弾性片31と、各弾性片31に形成されて半導体ウェーハWの周縁部上端を保持する保持溝片34と、各弾性片31と保持溝片34に形成される複数の干渉回避面37とを備え、蓋体20の天井内面の中央部付近に一体成形される。   As shown in FIGS. 2 to 6, the retainer 30 extends from the ceiling of the lid 20 in the direction of the semiconductor wafer W of the container body 10, and is a plurality of flexible elastics arranged in the alignment direction of the plurality of semiconductor wafers W. A piece 31, a holding groove piece 34 formed on each elastic piece 31 and holding the upper edge of the peripheral edge of the semiconductor wafer W, and a plurality of interference avoidance surfaces 37 formed on each elastic piece 31 and holding groove piece 34. The cover body 20 is integrally molded in the vicinity of the center portion of the ceiling inner surface.

複数の弾性片31は、図2、図3、図6に示すように、略八字形を呈して半導体ウェーハWの周縁部上端に間隔をおいて対向する左右一対の弾性片31を備え、この一対の弾性片31が複数枚の半導体ウェーハWの整列方向に所定のピッチで配列される。各弾性片31は、例えば細長い弾性の線条に形成され、蓋体20の天井内面に一体形成されてその撓み量の大きい自由端部である先端部の表面に保持溝片34が一体形成されており、これら一体化した弾性片31と保持溝片34とが略半円弧形に徐々に湾曲して保持溝片34の先端部が半導体ウェーハWの半径外方向に指向する。   As shown in FIGS. 2, 3, and 6, the plurality of elastic pieces 31 include a pair of left and right elastic pieces 31 that are substantially octagonal and face each other at the upper end of the peripheral edge of the semiconductor wafer W with a space therebetween. A pair of elastic pieces 31 are arranged at a predetermined pitch in the alignment direction of the plurality of semiconductor wafers W. Each elastic piece 31 is formed in, for example, an elongated elastic wire, and is integrally formed on the inner surface of the ceiling of the lid 20, and a holding groove piece 34 is integrally formed on the surface of the distal end portion which is a free end portion having a large amount of bending. The integrated elastic piece 31 and holding groove piece 34 are gradually curved into a substantially semicircular arc shape, and the tip end portion of the holding groove piece 34 is directed outward in the radius of the semiconductor wafer W.

弾性片31の隣接する他の保持溝片34に対向する両対向面のうち、一方の対向面の保持溝片34側には、ガイド機能を有する凹部32が、他方の対向面の保持溝片34側には、凹部32に近接する凸部33がそれぞれ形成され、これら互い違いの凹部32と凸部33とが対向して隣接する複数の弾性片31や保持溝片34を位置合わせし、保持溝片34に半導体ウェーハWの周縁部上端を適切に嵌合保持させるよう機能する。   Of both opposing surfaces of the elastic piece 31 facing the other holding groove piece 34, a recess 32 having a guide function is provided on the holding groove piece 34 side of one of the opposing surfaces, and the holding groove piece on the other opposing surface. On the side of 34, convex portions 33 adjacent to the concave portions 32 are respectively formed, and a plurality of elastic pieces 31 and holding groove pieces 34 which are adjacent to each other with the alternate concave portions 32 and the convex portions 33 facing each other are positioned and held. The groove piece 34 functions to properly fit and hold the upper end of the peripheral edge of the semiconductor wafer W.

各保持溝片34は、図4や図5に示すように、弾性片31の先端部に一体形成される断面略U字形、略V字形、又は断面略へ字形のガイド溝部35と、このガイド溝部35の中央に凹み形成され、ガイド溝部35の斜面に案内されてきた半導体ウェーハWの周縁部上端を嵌合保持する断面略半円形の最深溝部36とを備え、半導体ウェーハWの周縁部に対する接触点を常に略一定とするよう機能する。   As shown in FIGS. 4 and 5, each holding groove piece 34 includes a guide groove portion 35 having a substantially U-shaped cross section, a substantially V-shaped cross section, or a substantially H-shaped cross section formed integrally with the distal end portion of the elastic piece 31. A deepest groove portion 36 having a substantially semicircular cross section that fits and holds the upper end of the peripheral edge of the semiconductor wafer W that is recessed at the center of the groove 35 and guided by the slope of the guide groove 35, with respect to the peripheral edge of the semiconductor wafer W It functions to keep the contact point substantially constant at all times.

干渉回避面37は、各弾性片31から保持溝片34に亘る凹部32と凸部33のコーナ部がそれぞれ厚さ方向に斜めに切り欠かれることにより傾斜形成され、隣接する複数の弾性片31や保持溝片34同士の干渉を回避するよう機能する。この干渉回避面37は、110°〜175°、好ましくは135°〜160°の鈍角で傾斜し、凹部32と凸部33のコーナ部の他、その近傍部にも適宜形成される。   The interference avoiding surface 37 is formed by inclining the corners of the concave portion 32 and the convex portion 33 extending from each elastic piece 31 to the holding groove piece 34 in the thickness direction, and a plurality of adjacent elastic pieces 31 are formed. And the function of avoiding interference between the holding groove pieces 34. The interference avoidance surface 37 is inclined at an obtuse angle of 110 ° to 175 °, preferably 135 ° to 160 °, and is appropriately formed in the vicinity of the corner portion of the concave portion 32 and the convex portion 33.

干渉回避面37の傾斜角度が110°〜175°の範囲なのは、110°未満の角度の場合には、撓んだ弾性片31が隣接する弾性片31に嵌合して干渉するのを防ぐことができないおそれがあるからである。逆に、175°を超える場合には、位置ずれした半導体ウェーハWを確実に位置補正することができないからである。干渉回避面37の傾斜角度は、135°〜160°の好適な範囲であれば、撓んだ弾性片31が隣接する弾性片31に嵌合しても、弾性片31を滑動させて嵌合を防止することができ、しかも、位置ずれした半導体ウェーハWを確実に位置補正することができる。   The reason why the inclination angle of the interference avoiding surface 37 is in the range of 110 ° to 175 ° is to prevent the bent elastic piece 31 from interfering with the adjacent elastic piece 31 when the angle is less than 110 °. It is because there is a possibility that it cannot be done. On the other hand, if the angle exceeds 175 °, the position of the semiconductor wafer W that has been displaced cannot be reliably corrected. If the inclination angle of the interference avoiding surface 37 is within a suitable range of 135 ° to 160 °, even if the elastic piece 31 is bent, the elastic piece 31 is slid and fitted. In addition, it is possible to reliably correct the position of the semiconductor wafer W that is misaligned.

上記において、基板収納容器に半導体ウェーハWを適切に収納する場合には、半導体ウェーハWを収納した容器本体10に蓋体20を上方から嵌合して押圧し、各半導体ウェーハWの周縁部上端にリテーナ30の弾性片31を保持溝片34を介して嵌合させれば、このリテーナ30の弾性片31が蓋体20の天井内面側に撓み、各半導体ウェーハWに保持力を上方から作用させて位置決めしつつ適切に収納することができる。   In the above, when the semiconductor wafer W is appropriately stored in the substrate storage container, the lid body 20 is fitted and pressed from above on the container body 10 storing the semiconductor wafer W, and the upper end of the peripheral edge of each semiconductor wafer W is pressed. If the elastic piece 31 of the retainer 30 is fitted to the retainer 30 via the holding groove piece 34, the elastic piece 31 of the retainer 30 bends toward the ceiling inner surface side of the lid 20, and the holding force acts on each semiconductor wafer W from above. It can be stored properly while being positioned.

各半導体ウェーハWに作用する保持力は、各弾性片31及び保持溝片34が半導体ウェーハWに押し上げられて撓む際の反力により得られるが、このとき、半導体ウェーハWと保持溝片34との接触点も変化する。以下、この接触点の変化の詳細につき、図6に基づいて説明する。   The holding force acting on each semiconductor wafer W is obtained by a reaction force when each elastic piece 31 and the holding groove piece 34 are pushed up and bent by the semiconductor wafer W. At this time, the semiconductor wafer W and the holding groove piece 34 are obtained. The point of contact with also changes. Hereinafter, the details of the change of the contact point will be described with reference to FIG.

なお、本来的には、半導体ウェーハWの位置が変わることなく蓋体20のリテーナ30の位置が半導体ウェーハWに接近する方向に変位することになるが、図6においては、説明の容易化を考慮し、蓋体20のリテーナ30の位置を固定とし、半導体ウェーハWがリテーナ30に当初に接触した状態と接近して保持する状態とが重ならないように図示する。   Originally, the position of the retainer 30 of the lid 20 is displaced in a direction approaching the semiconductor wafer W without changing the position of the semiconductor wafer W. However, in FIG. Considering this, the position of the retainer 30 of the lid 20 is fixed, and the state in which the semiconductor wafer W is initially in contact with the retainer 30 and the state of being held close to the retainer 30 are illustrated so as not to overlap.

半導体ウェーハWを保持する際、各弾性片31と保持溝片34とが単なる直線形ではなく、これらの先端部や末端部が半導体ウェーハWの周縁部から離隔するよう略半円弧形に湾曲し、保持溝片34の先端部が半導体ウェーハWの半径外方向に指向(図6参照)するので、当初の接触点において、半導体ウェーハWの周縁部上端に保持溝片34のガイド溝部35や最深溝部36を点接触、又は短く線接触させることができる。   When the semiconductor wafer W is held, the elastic pieces 31 and the holding groove pieces 34 are not simply linear shapes, but are curved in a substantially semicircular arc shape so that their front end portions and end portions are separated from the peripheral edge portions of the semiconductor wafer W. Since the tip of the holding groove piece 34 is directed outward in the radius direction of the semiconductor wafer W (see FIG. 6), the guide groove portion 35 of the holding groove piece 34 and the upper edge of the peripheral edge portion of the semiconductor wafer W are formed at the initial contact point. The deepest groove portion 36 can be brought into point contact or short line contact.

また、弾性片31が撓んで保持する状態においても、半導体ウェーハWと保持溝片34との接触点の移動方向を曲率半径の小さくなる上方向、換言すれば、垂直上方のみの不変にすることができる。また、保持溝片34の接触点の移動についても、曲率が小さくなったときの保持溝片34の接線状の接触点という僅かな範囲に止めることができる。   Further, even in a state where the elastic piece 31 is bent and held, the moving direction of the contact point between the semiconductor wafer W and the holding groove piece 34 is set to be the upward direction in which the radius of curvature becomes smaller, in other words, only in the vertically upward direction. Can do. Further, the movement of the contact point of the holding groove piece 34 can also be stopped within a slight range of the tangential contact point of the holding groove piece 34 when the curvature becomes small.

すなわち、半導体ウェーハWを保持するため、弾性片31が圧縮されて撓んでも、半導体ウェーハWの接触点は変わらないし、保持溝片34の接触領域も半導体ウェーハWと接線状に接触する湾曲部の僅かな範囲とすることができる。具体的には、保持溝片34の先端部から末端部にかけて、接触点が保持溝片34の長手方向に連続的に変化するのではなく、当初の接触点と、弾性片31が撓んだ後の湾曲部の接触位置までの変位である±1.5mmの狭い範囲に限定することが可能になる。したがって、半導体ウェーハWと保持溝片34との擦れを大幅に削減することが可能になる。   That is, even if the elastic piece 31 is compressed and bent to hold the semiconductor wafer W, the contact point of the semiconductor wafer W does not change, and the contact area of the holding groove piece 34 also contacts the semiconductor wafer W in a tangential manner. A slight range of Specifically, the contact point does not continuously change in the longitudinal direction of the holding groove piece 34 from the front end portion to the end portion of the holding groove piece 34, but the initial contact point and the elastic piece 31 are bent. It becomes possible to limit to the narrow range of ± 1.5 mm which is the displacement to the contact position of the subsequent curved portion. Therefore, rubbing between the semiconductor wafer W and the holding groove piece 34 can be greatly reduced.

よって、半導体ウェーハWの周縁部と保持溝片34との接触点を当初の接触点から蓋体20の内側に±1.5mm移動した少ない範囲とし、半導体ウェーハWの周縁部に対する保持溝片34の接触保持領域を大幅に減少させることができるので、半導体ウェーハWの周縁部に保持溝片34の全域が相対的に移動して接触したり、擦れてパーティクルの発生することがなく、蓋体20のセットの度に半導体ウェーハWの汚染を招くおそれを有効に排除することが期待できる。   Therefore, the contact point between the peripheral edge of the semiconductor wafer W and the holding groove piece 34 is set to a small range within ± 1.5 mm from the initial contact point to the inside of the lid 20, and the holding groove piece 34 with respect to the peripheral edge of the semiconductor wafer W is set. Since the contact holding area of the semiconductor wafer W can be significantly reduced, the entire area of the holding groove piece 34 is relatively moved and brought into contact with the peripheral edge of the semiconductor wafer W, and no particles are generated due to rubbing. It can be expected that the possibility of causing contamination of the semiconductor wafer W every 20 sets is effectively eliminated.

また、半導体ウェーハWを収納する際に弾性片31や保持溝片34が湾曲半径の小さくなる上方向に撓み、保持溝片34の接触部分以外が隣接する保持溝片34方向に動いて接触するのを回避することができるので、半導体ウェーハWの摺れや汚染の防止を図ることができる。   Further, when the semiconductor wafer W is stored, the elastic piece 31 and the holding groove piece 34 bend upward so as to decrease the curvature radius, and the portions other than the contact portion of the holding groove piece 34 move toward the adjacent holding groove piece 34 and come into contact with each other. Therefore, it is possible to prevent the semiconductor wafer W from slipping and contamination.

また、弾性片31や保持溝片34が上方向だけではなく、配列方向にも撓みながら隣接する弾性片31や保持溝片34に嵌合することがあるが、弾性片31の傾いた干渉回避面37が接触せずに嵌合を回避するので、例え蓋体20を繰り返し使用しても、隣接する弾性片31や保持溝片34同士が干渉し合うことがない。したがって、容器本体10から蓋体20が取り外されても、撓んだ弾性片31を元の位置に確実に復帰させることができ、これにより、半導体ウェーハWの適切な保持に支障を来たしたり、半導体ウェーハWのがたつきや回転に伴う摺れ、損傷、汚染等を招くのを抑制防止することが可能になる。   Further, the elastic piece 31 and the holding groove piece 34 may be fitted to the adjacent elastic piece 31 and holding groove piece 34 while bending not only in the upward direction but also in the arrangement direction. Since the surface 37 does not contact and avoids fitting, even if the lid 20 is repeatedly used, the adjacent elastic pieces 31 and holding groove pieces 34 do not interfere with each other. Therefore, even when the lid body 20 is removed from the container body 10, the bent elastic piece 31 can be reliably returned to the original position, thereby hindering proper holding of the semiconductor wafer W, It is possible to prevent the semiconductor wafer W from being slid, damaged, contaminated, etc. due to rattling or rotation.

さらに、各弾性片31の干渉回避面37が接触せずに嵌合を回避するので、複数の弾性片31間のピッチを広く確保して嵌合を回避する必要が全くなく、簡易な構成で弾性片31の低ピッチ化を容易に図ることが可能になる。さらにまた、蓋体20の天井内面にリテーナ30を一体形成するので、部品点数の削減や洗浄性の向上が大いに期待できる。   Further, since the interference avoiding surface 37 of each elastic piece 31 is not brought into contact with each other to avoid fitting, it is not necessary to avoid a fitting by ensuring a wide pitch between the plurality of elastic pieces 31 with a simple configuration. The pitch of the elastic pieces 31 can be easily reduced. Furthermore, since the retainer 30 is integrally formed on the ceiling inner surface of the lid 20, reduction in the number of parts and improvement in cleaning properties can be greatly expected.

次に、図7は本発明の第2の実施形態を示すもので、この場合には、弾性片31の撓み量の大きい先端部の両対向面に傾斜面ではなく、角張っていないC面を形成することにより、複数の干渉回避面37を形成するようにしている。その他の部分については、上記実施形態と同様であるので説明を省略する。
本実施形態においても上記実施形態と同様の作用効果が期待でき、しかも、干渉回避面37の形状の多様化を図ることができるのは明らかである。
Next, FIG. 7 shows a second embodiment of the present invention. In this case, the opposing surfaces of the distal end portion of the elastic piece 31 having a large amount of bending are not inclined surfaces but are not angular. By forming, a plurality of interference avoidance surfaces 37 are formed. The other parts are the same as those in the above embodiment, and the description thereof is omitted.
In the present embodiment, it is obvious that the same operational effects as those of the above embodiment can be expected, and the shape of the interference avoidance surface 37 can be diversified.

次に、図8は本発明の第3の実施形態を示すもので、この場合には、弾性片31の先端部を含む全対向面に傾斜面ではなく、角張っていないC面を形成することにより、複数の干渉回避面37を形成するようにしている。   Next, FIG. 8 shows a third embodiment of the present invention. In this case, not an inclined surface but an angular C surface is formed on the entire facing surface including the tip of the elastic piece 31. Thus, a plurality of interference avoidance surfaces 37 are formed.

干渉回避面37は、弾性片31の全対向面以外にも、図9に太線で示す弾性片31の領域であれば、適宜形成することができる。その他の部分については、上記実施形態と同様であるので説明を省略する。
本実施形態においても上記実施形態と同様の作用効果が期待でき、しかも、干渉回避面37の位置や形状の多様化を図ることができるのは明らかである。
The interference avoiding surface 37 can be appropriately formed as long as it is a region of the elastic piece 31 indicated by a thick line in FIG. The other parts are the same as those in the above embodiment, and the description thereof is omitted.
In this embodiment, it is obvious that the same effects as those of the above embodiment can be expected, and that the position and shape of the interference avoidance surface 37 can be diversified.

次に、図10は本発明の第4の実施形態を示すもので、この場合には、保持溝片34の表面に傾斜面ではなく、R面や湾曲面を適宜形成することにより、滑らかな複数の干渉回避面37を形成するようにしている。その他の部分については、上記実施形態と同様であるので説明を省略する。
本実施形態においても上記実施形態と同様の作用効果が期待でき、しかも、干渉回避面37の位置や形状の多様化が期待できる。
Next, FIG. 10 shows a fourth embodiment of the present invention. In this case, a smooth surface is formed by appropriately forming an R surface or a curved surface on the surface of the holding groove piece 34 instead of an inclined surface. A plurality of interference avoidance surfaces 37 are formed. The other parts are the same as those in the above embodiment, and the description thereof is omitted.
Also in this embodiment, the same effect as the above embodiment can be expected, and further, the position and shape of the interference avoidance surface 37 can be expected to be diversified.

次に、図11と図12は本発明の第5の実施形態を示すもので、この場合には、容器本体10Aを正面の開口したフロントオープンボックスに形成してその両側壁の内面上下方向には、口径300mmタイプの半導体ウェーハW用の整列支持溝7Aをそれぞれ並べて形成し、半導体ウェーハWの周縁部前端を対向保持するリテーナ30の左右一対の弾性片31を複数枚の半導体ウェーハWの整列方向、換言すれば、上下方向に配列して取付板40内に一体形成するとともに、この取付板40を蓋体20Aの内面である裏面の中央部に着脱自在に装着し、各弾性片31を蓋体20Aの内面側から容器本体10Aの背面側方向にやや斜めに突出させてその先端部にはブロック形の保持溝片34を一体的に膨出形成するようにしている。   Next, FIG. 11 and FIG. 12 show a fifth embodiment of the present invention. In this case, the container body 10A is formed in a front open box having a front opening, and the inner surfaces of both side walls are formed vertically. Is formed by arranging alignment support grooves 7A for a semiconductor wafer W having a diameter of 300 mm, and arranging a pair of left and right elastic pieces 31 of a retainer 30 that holds the front end of the peripheral edge of the semiconductor wafer W opposite to each other. Direction, in other words, arranged in the vertical direction and integrally formed in the mounting plate 40, and the mounting plate 40 is detachably attached to the center of the back surface, which is the inner surface of the lid 20 </ b> A, and each elastic piece 31 is attached. A block-shaped holding groove piece 34 is integrally bulged and formed at the tip of the lid body 20A so as to protrude slightly obliquely from the inner surface side of the lid body 20A toward the back side of the container body 10A.

蓋体20Aは、蓋体20とは異なり、横長の矩形に成形され、容器本体10Aに対する嵌合時に施錠する施錠機構が内蔵される。また、取付板40は、所定の成形材料を使用して縦長の枠形に成形され、内部両側には、複数の弾性片31が上下方向に並べて配列される。その他の部分については、上記実施形態と同様であるので説明を省略する。   Unlike the lid 20, the lid 20 </ b> A is formed into a horizontally long rectangle and incorporates a locking mechanism that locks when fitted to the container body 10 </ b> A. The mounting plate 40 is formed into a vertically long frame shape using a predetermined molding material, and a plurality of elastic pieces 31 are arranged side by side in the vertical direction on both sides inside. The other parts are the same as those in the above embodiment, and the description thereof is omitted.

本実施形態においても上記実施形態と同様の作用効果が期待でき、しかも、トップオープンボックスタイプの基板収納容器の他、フロントオープンボックスタイプの基板収納容器にもリテーナ30を使用して汎用性を向上させることができるのは明らかである。   In this embodiment, the same effect as the above embodiment can be expected, and the retainer 30 is used for the front open box type substrate storage container as well as the front open box type substrate storage container to improve versatility. Obviously you can make it happen.

なお、上記実施形態では上下部の開口したカセット1を使用して半導体ウェーハWを下方から突き上げ、半導体ウェーハWの取り出しの自動化に資するようにしたが、何らこれに限定されるものではなく、上部のみ開口したカセット1を使用しても良い。また、蓋体20の周縁部にエンドレスのシールガスケットを嵌合しても良い。また、容器本体10の開口部に着脱自在の蓋体20を粘着テープを介し嵌合しても良い。   In the above-described embodiment, the semiconductor wafer W is pushed up from below using the cassette 1 having upper and lower openings, which contributes to automation of the removal of the semiconductor wafer W. However, the present invention is not limited to this. Only the opened cassette 1 may be used. Further, an endless seal gasket may be fitted to the peripheral portion of the lid 20. Moreover, you may fit the detachable cover body 20 to the opening part of the container main body 10 via the adhesive tape.

また、上記実施形態では弾性片31から保持溝片34にかけて凹部32、凸部33、干渉回避面37を配設したが、上記と同様の作用効果が期待できるのであれば、凹部32、凸部33、干渉回避面37の位置等を適宜変更することができる。例えば、各弾性片31の隣接する弾性片31に対向する両対向面のうち、一方の対向面に凹部32を、他方の対向面に凸部33をそれぞれ形成し、これらの対向する凹部32と凸部33のコーナ部やその近傍をそれぞれ傾斜させて干渉回避面37とし、凹部32と凸部33を用いて隣接する複数の弾性片31や半導体ウェーハWを位置合わせしても良い。   In the above embodiment, the concave portion 32, the convex portion 33, and the interference avoiding surface 37 are disposed from the elastic piece 31 to the holding groove piece 34. However, if the same effect as described above can be expected, the concave portion 32, the convex portion 33, the position of the interference avoidance surface 37 and the like can be changed as appropriate. For example, a concave portion 32 is formed on one opposing surface, and a convex portion 33 is formed on the other opposing surface, of both opposing surfaces of each elastic piece 31 facing the adjacent elastic piece 31. The corner portion of the convex portion 33 and the vicinity thereof may be inclined to form the interference avoidance surface 37, and the adjacent elastic pieces 31 and the semiconductor wafer W may be aligned using the concave portion 32 and the convex portion 33.

同様に、各保持溝片34の隣接する保持溝片34に対向する両対向面のうち、一方の対向面に凹部32を、他方の対向面に凸部33をそれぞれ形成し、これらの対向する凹部32と凸部33のコーナ部やその近傍をそれぞれ傾斜させて干渉回避面37とし、凹部32と凸部33を用いて隣接する複数の保持溝片34や半導体ウェーハWを位置合わせしても良い。また、凹部32や凸部33の数は、必要に応じ、適宜増加させることができる。さらに、干渉回避面37は、傾斜面、C面、R面、湾曲面を特に問うものではない。さらにまた、蓋体20Aの裏面中央部に取付板40を一体化させることもできる。   Similarly, a concave portion 32 is formed on one opposing surface and a convex portion 33 is formed on the other opposing surface of both opposing surfaces of the holding groove pieces 34 facing the adjacent holding groove pieces 34. Even if the corner portions of the concave portion 32 and the convex portion 33 and the vicinity thereof are inclined to form the interference avoidance surface 37, the adjacent holding groove pieces 34 and the semiconductor wafer W can be aligned using the concave portion 32 and the convex portion 33. good. Moreover, the number of the recessed parts 32 and the convex parts 33 can be increased suitably as needed. Furthermore, the interference avoiding surface 37 does not particularly ask for an inclined surface, a C surface, an R surface, or a curved surface. Furthermore, the mounting plate 40 can be integrated with the center of the back surface of the lid 20A.

本発明に係る基板収納容器の実施形態を模式的に示す分解斜視説明図である。It is an exploded perspective explanatory view showing typically an embodiment of a substrate storage container concerning the present invention. 本発明に係る基板収納容器の実施形態を模式的に示す断面説明図である。It is a section explanatory view showing typically an embodiment of a substrate storage container concerning the present invention. 本発明に係る基板収納容器の実施形態における蓋体の内面とリテーナとを模式的に示す説明図である。It is explanatory drawing which shows typically the inner surface of a cover body and a retainer in embodiment of the substrate storage container which concerns on this invention. 本発明に係る基板収納容器の実施形態における複数の弾性片と保持溝片とを模式的に示す側面説明図である。It is side surface explanatory drawing which shows typically the some elastic piece and holding groove piece in embodiment of the substrate storage container which concerns on this invention. 本発明に係る基板収納容器の実施形態における複数の弾性片と保持溝片とを模式的に示す表面説明図である。It is surface explanatory drawing which shows typically the some elastic piece and holding groove piece in embodiment of the substrate storage container which concerns on this invention. 本発明に係る基板収納容器の実施形態における半導体ウェーハ、弾性片、及び保持溝片を模式的に示す要部拡大説明図である。It is a principal part expansion explanatory drawing which shows typically the semiconductor wafer, elastic piece, and holding groove piece in embodiment of the substrate storage container which concerns on this invention. 本発明に係る基板収納容器の第2の実施形態を模式的に示す説明図である。It is explanatory drawing which shows typically 2nd Embodiment of the substrate storage container which concerns on this invention. 本発明に係る基板収納容器の第3の実施形態を模式的に示す説明図である。It is explanatory drawing which shows typically 3rd Embodiment of the substrate storage container which concerns on this invention. 本発明に係る基板収納容器の第3の実施形態におけるリテーナを模式的に示す説明図である。It is explanatory drawing which shows typically the retainer in 3rd Embodiment of the substrate storage container which concerns on this invention. 本発明に係る基板収納容器の第4の実施形態を模式的に示す説明図である。It is explanatory drawing which shows typically 4th Embodiment of the substrate storage container which concerns on this invention. 本発明に係る基板収納容器の第5の実施形態を模式的に示す全体斜視説明図である。It is a whole perspective explanatory view showing typically a 5th embodiment of a substrate storage container concerning the present invention. 本発明に係る基板収納容器の第5の実施形態を模式的に示す断面説明図である。It is a section explanatory view showing typically a 5th embodiment of a substrate storage container concerning the present invention. 従来の基板収納容器の蓋体、半導体ウェーハ、及びリテーナの関係を示す要部拡大説明図である。It is principal part expansion explanatory drawing which shows the relationship between the cover body of a conventional board | substrate storage container, a semiconductor wafer, and a retainer.

符号の説明Explanation of symbols

1 カセット
2 側壁
6 ティース
7 整列支持溝
7A 整列支持溝
10 容器本体
10A 容器本体
20 蓋体
20A 蓋体
30 リテーナ
31 弾性片
32 凹部
33 凸部
34 保持溝片
35 ガイド溝部
36 最深溝部
37 干渉回避面
40 取付板
W 半導体ウェーハ(基板)
DESCRIPTION OF SYMBOLS 1 Cassette 2 Side wall 6 Teeth 7 Alignment support groove 7A Alignment support groove 10 Container main body 10A Container main body 20 Lid 20A Lid 30 Retainer 31 Elastic piece 32 Recess 33 Protrusion 34 Holding groove piece 35 Guide groove part 36 Deepest groove part 37 Interference avoiding surface 40 Mounting plate W Semiconductor wafer (substrate)

Claims (4)

複数枚の基板を整列収納可能な容器本体とその蓋体との間に、基板を保持するリテーナを介在した基板収納容器であって、
リテーナは、蓋体の内側から容器本体に収納される基板方向に伸び、複数枚の基板の整列方向に並ぶ可撓性の複数の弾性片と、弾性片に形成されて基板の周縁部を接触保持する保持溝片とを含み、これら弾性片と保持溝片とを蓋体の内側から基板方向に向かうに従い徐々に曲げて基板の幅方向外側に向け、基板の周縁部に対する保持溝片の接触保持領域を減少させるようにしたことを特徴とする基板収納容器。
A substrate storage container having a retainer for holding a substrate between a container body capable of aligning and storing a plurality of substrates and its lid,
The retainer extends from the inside of the lid toward the substrate housed in the container body, and is formed on the elastic piece and contacts the peripheral edge of the substrate. The elastic piece is arranged in the alignment direction of the plurality of substrates. Holding the holding groove pieces, and gradually bending the elastic pieces and the holding groove pieces toward the substrate direction from the inside of the lid body toward the outside in the width direction of the substrate, and the contact of the holding groove pieces with the peripheral portion of the substrate A substrate storage container characterized in that the holding area is reduced.
容器本体を上部の開口した略箱形に形成してその内部には少なくとも上部の開口したカセットを着脱自在に嵌め入れ、このカセットの両側壁内面には、基板用の整列支持溝をそれぞれ並べて形成した請求項1記載の基板収納容器。   The container body is formed in a substantially box shape with an upper opening, and at least the upper opening cassette is detachably fitted inside, and the alignment support grooves for the substrates are formed side by side on the inner surfaces of both sides of the cassette. The substrate storage container according to claim 1. 基板の周縁部に略対向する一対の弾性片を備え、この一対の弾性片を複数枚の基板の整列方向に配列し、各弾性片を蓋体の内面から突出させてその先端部には保持溝片を形成し、これら弾性片と保持溝片とを略半円弧形に湾曲させて基板の幅方向外側に向けた請求項1又は2記載の基板収納容器。   A pair of elastic pieces substantially opposite to the peripheral edge of the substrate is provided, the pair of elastic pieces are arranged in the alignment direction of the plurality of substrates, and each elastic piece protrudes from the inner surface of the lid and is held at the tip thereof 3. The substrate storage container according to claim 1, wherein a groove piece is formed, and the elastic piece and the holding groove piece are curved in a substantially semicircular arc shape and directed outward in the width direction of the substrate. 容器本体を正面の開口した略箱形に形成してその両側壁の内面には、基板用の整列支持溝をそれぞれ並べて形成し、
基板の周縁部に略対向する一対の弾性片を備え、この一対の弾性片を複数枚の基板の整列方向に配列して取付板に取り付けるとともに、この取付板を蓋体の内面に設け、各弾性片の先端部に保持溝片を形成した請求項1記載の基板収納容器。
The container body is formed in a substantially box shape with an opening on the front, and on the inner surfaces of both side walls, alignment support grooves for substrates are formed side by side,
A pair of elastic pieces that are substantially opposed to the peripheral edge of the substrate, and the pair of elastic pieces are arranged in the alignment direction of the plurality of substrates and attached to the attachment plate, and the attachment plate is provided on the inner surface of the lid, The substrate storage container according to claim 1, wherein a holding groove piece is formed at the tip of the elastic piece.
JP2006318318A 2006-11-07 2006-11-27 Substrate storage container Active JP5072067B2 (en)

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JP2006318318A JP5072067B2 (en) 2006-11-27 2006-11-27 Substrate storage container
CN2007800414081A CN101536174B (en) 2006-11-07 2007-10-26 Substrate container
US12/513,304 US7967147B2 (en) 2006-11-07 2007-10-26 Substrate storage container
EP07830663A EP2081223A4 (en) 2006-11-07 2007-10-26 Substrate container
PCT/JP2007/070929 WO2008056549A1 (en) 2006-11-07 2007-10-26 Substrate container
KR1020097008151A KR101472145B1 (en) 2006-11-07 2007-10-26 Substrate storage container
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022215310A1 (en) * 2021-04-06 2022-10-13 信越ポリマー株式会社 Substrate accommodating container

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005005525A (en) * 2003-06-12 2005-01-06 Shin Etsu Polymer Co Ltd Substrate container
JP2005005396A (en) * 2003-06-10 2005-01-06 Shin Etsu Polymer Co Ltd Substrate storing container

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005005396A (en) * 2003-06-10 2005-01-06 Shin Etsu Polymer Co Ltd Substrate storing container
JP2005005525A (en) * 2003-06-12 2005-01-06 Shin Etsu Polymer Co Ltd Substrate container

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022215310A1 (en) * 2021-04-06 2022-10-13 信越ポリマー株式会社 Substrate accommodating container

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