JP4852023B2 - Retainer and substrate storage container - Google Patents

Retainer and substrate storage container Download PDF

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JP4852023B2
JP4852023B2 JP2007298979A JP2007298979A JP4852023B2 JP 4852023 B2 JP4852023 B2 JP 4852023B2 JP 2007298979 A JP2007298979 A JP 2007298979A JP 2007298979 A JP2007298979 A JP 2007298979A JP 4852023 B2 JP4852023 B2 JP 4852023B2
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JP2009124063A (en
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正人 細井
博 三村
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Shin Etsu Polymer Co Ltd
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Description

本発明は、半導体ウェーハやガラスウェーハ等からなる基板を保持するリテーナ及び基板収納容器に関するものである。   The present invention relates to a retainer and a substrate storage container for holding a substrate made of a semiconductor wafer, a glass wafer, or the like.

従来の基板収納容器は、図示しないが、丸い精密基板である半導体ウェーハを複数枚整列収納するフロントオープンボックスタイプの容器本体と、この容器本体の開口した正面部を手動操作あるいは自動操作により開閉する着脱自在の蓋体と、この蓋体の裏面に深く装着されて半導体ウェーハの端部周縁である前部周縁を保持部を介し保持するリテーナとを備えて構成されている(特許文献1、2参照)。   Although not shown, a conventional substrate storage container opens and closes a front open box type container main body for arranging and storing a plurality of semiconductor wafers, which are round precision substrates, and an open front portion of the container main body by manual operation or automatic operation. A detachable lid, and a retainer that is deeply attached to the back surface of the lid and holds the front edge, which is the edge of the semiconductor wafer, via a holding part (Patent Documents 1 and 2). reference).

蓋体とリテーナとは、一方に凹部が、他方には凸部がそれぞれ形成され、これら凹部と凸部との係合により蓋体にリテーナが面接触して装着固定される。また、リテーナは、枠体内の左右水平方向に伸びる弾性片を備え、この弾性片に、半導体ウェーハの前部周縁を保持する保持部が一体形成されている。
特開2002−353301号公報 特開2005−320028号公報
The lid body and the retainer each have a concave portion on one side and a convex portion on the other side, and the retainer is brought into surface contact with the lid body by the engagement between the concave portion and the convex portion, and is fixed. The retainer includes an elastic piece extending in the horizontal direction in the frame, and a holding portion for holding the front periphery of the semiconductor wafer is integrally formed on the elastic piece.
JP 2002-353301 A JP 2005-320028 A

従来における基板収納容器は、以上のように構成され、蓋体の裏面にリテーナが面接触するので、洗浄水を循環させる洗浄装置により蓋体を洗浄して乾燥させる場合に、リテーナに洗浄水が少なからず付着したり、溜まることとなり、この結果、乾燥作業の遅延を招いたり、残留した洗浄水により半導体ウェーハが汚染してしまうという問題がある。
本発明は上記に鑑みなされたもので、乾燥作業の迅速化や基板の汚染防止を図ることのできるリテーナ及び基板収納容器を提供することを目的としている。
The conventional substrate storage container is configured as described above, and the retainer comes into surface contact with the back surface of the lid, so that when the lid is washed and dried by a washing device that circulates the washing water, the retainer has washing water. As a result, there is a problem that the semiconductor wafer is deposited or accumulated, and as a result, the drying operation is delayed or the semiconductor wafer is contaminated by the remaining cleaning water.
The present invention has been made in view of the above, and an object thereof is to provide a retainer and a substrate storage container capable of speeding up a drying operation and preventing substrate contamination.

本発明においては上記課題を解決するため、蓋体に装着される枠体と、この枠体の一対の対向片からそれぞれ突出する一対の弾性片と、この一対の弾性片に形成されて基板の端部周縁を保持する保持部とを備え、洗浄水により洗浄されるものであって、
枠体を、間隔をおいて対向する一対の対向片と、この一対の対向片の両端部間にそれぞれ架設される一対の架設片とから形成し、これら対向片と架設片のうち、少なくとも対向片の蓋体に対向する裏面の長手方向に、洗浄水の水切り性を向上させる複数の凹凸部を間隔をおいて交互に形成し、対向片の裏面中央部には、蓋体の位置決め突起に嵌合して位置決め精度を向上させる位置決め部を凹み形成したことを特徴としている。
In the present invention, in order to solve the above problems, a frame body mounted on the lid body, a pair of elastic pieces projecting from a pair of opposed pieces of the frame body, and a pair of elastic pieces formed on the pair of elastic pieces A holding portion for holding the edge of the end, and is washed with washing water,
The frame body is formed of a pair of facing pieces facing each other at an interval, and a pair of erected pieces respectively installed between both ends of the pair of facing pieces , and at least the facing pieces of the facing pieces and the erected pieces are opposed to each other. In the longitudinal direction of the back surface facing the lid of the piece, a plurality of concave and convex portions that improve the drainability of the washing water are alternately formed at intervals, and in the center of the back surface of the facing piece, the positioning projection of the lid It is characterized in that a positioning portion that is fitted to improve positioning accuracy is formed as a recess .

なお、枠体の対向片と架設片の少なくともいずれか一方に、枠体を変形させるバネ性の屈曲部を形成するとともに、位置決め部を形成することができる。
また、一対の弾性片を、枠体の一対の対向片からそれぞれ突出して相互に接近する一対の第一弾性片と、この一対の第一弾性片の屈曲した自由端部に支持されて基板を保持する第二弾性片とから形成し、
第一弾性片の自由端部よりも枠体の対向片寄りの外側に第二弾性片の外側端部を位置させ、この外側端部と保持部とを一体化することができる。
Note that at least one of the opposing piece and the installation piece of the frame body can be formed with a spring-like bent portion that deforms the frame body and a positioning portion.
The pair of elastic pieces are supported by a pair of first elastic pieces that protrude from the pair of opposed pieces of the frame and approach each other, and a bent free end portion of the pair of first elastic pieces. Formed from the second elastic piece to hold,
The outer end portion of the second elastic piece can be positioned outside the free end portion of the first elastic piece closer to the opposing piece of the frame body, and the outer end portion and the holding portion can be integrated.

また、保持部は、一対の傾斜面により断面略V字形あるいは略Y字形の保持溝を形成する突起を備え、この突起の一対の傾斜面を上下左右非対称に形成することが可能である。
また、保持部を第一、第二の保持部に分割してこれらを第二弾性片に間隔をおいて形成し、第一の保持部よりも第二の保持部を第二弾性片の外側端部側に位置させることも可能である。
The holding portion includes a protrusion that forms a holding groove having a substantially V-shaped cross section or a substantially Y-shaped cross section by a pair of inclined surfaces, and the pair of inclined surfaces of the protrusions can be formed asymmetrically in the vertical and horizontal directions.
In addition, the holding portion is divided into first and second holding portions, and these are formed with a space between the second elastic pieces, and the second holding portion is arranged outside the second elastic piece with respect to the first holding portion. It is also possible to position it on the end side.

また、本発明においては上記課題を解決するため、基板を収納する容器本体の開口部を、洗浄水により洗浄される着脱自在の蓋体で開閉するものであって、
蓋体の基板に対向する対向面に、請求項1ないし5いずれかに記載のリテーナを取り付け、蓋体の対向面にリテーナの凹凸部を向けるようにしたことを特徴としている。
In the present invention, in order to solve the above problems, the opening of the container main body for storing the substrate is opened and closed with a detachable lid that is cleaned with cleaning water,
The retainer according to any one of claims 1 to 5 is attached to an opposing surface of the lid that faces the substrate, and the concave and convex portions of the retainer are directed to the opposing surface of the lid.

ここで、特許請求の範囲における枠体は、縦長でも良いし、横長でも良い。一対の弾性片や第一弾性片は、複数対でも良い。また、基板には、少なくとも各種サイズの半導体ウェーハ、ガラスウェーハ、液晶基板等が含まれる。弾性片を形成する第二弾性片は、単数複数を特に問うものではない。保持部を形成する第一の保持部も、それぞれ単数複数を特に問うものではない。   Here, the frame in the claims may be vertically long or horizontally long. A plurality of pairs of the pair of elastic pieces and the first elastic pieces may be used. Further, the substrate includes at least various sizes of semiconductor wafers, glass wafers, liquid crystal substrates, and the like. The second elastic piece forming the elastic piece is not particularly limited. Each of the first holding portions forming the holding portion is not particularly limited to a plurality.

さらに、基板収納容器は、フロントオープンボックスタイプ、基板をカセットを介して収納するトップオープンボックスタイプ、ボトムオープンボックスタイプ、透明、不透明、半透明等を問うものではない。この場合、リテーナは、基板収納容器のタイプに応じ、フロントリテーナやリヤリテーナ等として使用される。   Further, the substrate storage container is not limited to a front open box type, a top open box type for storing a substrate via a cassette, a bottom open box type, transparent, opaque, translucent or the like. In this case, the retainer is used as a front retainer, a rear retainer or the like according to the type of the substrate storage container.

本発明によれば、枠体に凹凸部を形成して洗浄水の水切り性を向上させるので、乾燥作業の迅速化や基板の汚染防止を図ることができるという効果がある。また、少なくとも対向片の蓋体に対向する裏面長手方向に複数の凹凸を形成するので、洗浄水により蓋体を洗浄して乾燥させる場合に、リテーナに洗浄水が付着して溜まるのを抑制することができる。この結果、乾燥作業の遅延を招いたり、残留した洗浄水により基板が汚染してしまうおそれが少ない。
また、リテーナが成形される場合、複数の凹凸により、リテーナの成形収縮を緩和して変形を抑制することが可能になる。したがって、基板と保持部との接触精度を向上させることができる。さらに、対向片の裏面中央部に、蓋体の位置決め突起に嵌合する位置決め部を形成するので、蓋体にリテーナを高い位置決め精度で取り付けることができる。
According to the present invention, the concave and convex portions are formed on the frame to improve the drainability of the washing water, so that the drying operation can be speeded up and the substrate can be prevented from being contaminated. In addition, since a plurality of projections and depressions are formed in the longitudinal direction of the back surface facing at least the lid of the opposing piece, the cleaning water is prevented from adhering and accumulating on the retainer when the lid is washed and dried with cleaning water. be able to. As a result, there is little risk of delaying the drying operation or contamination of the substrate by the remaining cleaning water.
Moreover, when a retainer is shape | molded, it becomes possible to relieve the shaping | molding shrinkage | contraction of a retainer and to suppress a deformation | transformation by several unevenness | corrugations. Therefore, the contact accuracy between the substrate and the holding part can be improved. Furthermore, since the positioning part which fits into the positioning protrusion of a cover body is formed in the center part of the back surface of an opposing piece, a retainer can be attached to a cover body with high positioning accuracy.

また、一対の弾性片を、枠体の一対の対向片からそれぞれ突出して相互に接近する一対の第一弾性片と、この一対の第一弾性片の屈曲した自由端部に支持されて基板を保持する第二弾性片とから形成し、第一弾性片の自由端部よりも枠体の対向片寄りの外側に第二弾性片の外側端部を位置させ、この外側端部と保持部とを一体化すれば、基板の保持領域を拡大して基板を安定して継続保持することができる。したがって、基板の回転を抑制することができ、基板の回転に伴い保持部が削られたり、基板の汚染や損傷を招くおそれが少ない。   The pair of elastic pieces are supported by a pair of first elastic pieces that protrude from the pair of opposed pieces of the frame and approach each other, and a bent free end portion of the pair of first elastic pieces. A second elastic piece to be held, and the outer end portion of the second elastic piece is positioned outside the free end portion of the first elastic piece and closer to the opposing piece of the frame body. If the substrate is integrated, the substrate holding region can be expanded to stably hold the substrate. Therefore, the rotation of the substrate can be suppressed, and there is little possibility that the holding portion is shaved or the substrate is contaminated or damaged as the substrate rotates.

さらに、保持部の突起の一対の傾斜面を上下左右対称に形成するのではなく、上下左右非対称に形成すれば、一つの保持溝を形成する傾斜面が、基板と接触することのできる領域が、上下左右対称に形成する場合よりも広くなるので、基板と保持溝との位置がずれている場合でも、確実に基板を保持溝に収納することができる。   Further, if the pair of inclined surfaces of the protrusions of the holding part are not formed vertically and horizontally symmetrical, but if they are formed vertically and horizontally asymmetric, there is an area where the inclined surface forming one holding groove can contact the substrate. Since it is wider than the case where it is formed symmetrically in the vertical and horizontal directions, the substrate can be reliably accommodated in the holding groove even when the positions of the substrate and the holding groove are shifted.

以下、図面を参照して本発明の好ましい実施の形態を説明すると、本実施形態における基板収納容器は、図1ないし図10に示すように、複数枚の丸い半導体ウェーハWを収納する容器本体1と、この容器本体1の開口した正面部を開閉する蓋体10と、収納された半導体ウェーハWに対向する蓋体10の対向面である裏面にフロントリテーナとして装着され、半導体ウェーハWを保持するリテーナ20とを備え、このリテーナ20の枠体21から突出する弾性片29を、複数の第一弾性片31と第二弾性片33とに分割し、各第一弾性片31にダンパー機能を付与するようにしている。   Hereinafter, a preferred embodiment of the present invention will be described with reference to the drawings. A substrate storage container in this embodiment is a container body 1 for storing a plurality of round semiconductor wafers W as shown in FIGS. And a lid 10 that opens and closes the opened front portion of the container body 1 and a back retainer that is a facing surface of the lid 10 facing the accommodated semiconductor wafer W as a front retainer and holds the semiconductor wafer W. A retainer 20 is provided, and an elastic piece 29 protruding from the frame body 21 of the retainer 20 is divided into a plurality of first elastic pieces 31 and second elastic pieces 33, and each first elastic piece 31 is provided with a damper function. Like to do.

複数枚の半導体ウェーハWは、例えば25枚あるいは26枚からなり、容器本体1に整列収納される。各半導体ウェーハWは、例えば直径300mmの薄い円板状の単結晶シリコンからなり、表裏面がそれぞれ鏡面に形成され、周縁部に、整列を容易にする平面略半楕円形のノッチnが切り欠かれており、このノッチnが容器本体1の開口した正面部側に通常位置する。このノッチnの近傍には、図示しない読取装置に読み取られるバーコードが周縁に沿って形成される。このような半導体ウェーハWは、その両側部周縁が図示しない専用のロボットによりハンドリングされた状態で容器本体1に出し入れされる。   The plurality of semiconductor wafers W are, for example, 25 or 26, and are aligned and stored in the container body 1. Each semiconductor wafer W is made of, for example, a thin disc-shaped single crystal silicon having a diameter of 300 mm, the front and back surfaces are respectively formed as mirror surfaces, and a notch n having a substantially semi-elliptical shape that facilitates alignment is cut out at the periphery. The notch n is normally located on the front side of the container body 1 which is open. In the vicinity of the notch n, a barcode that is read by a reading device (not shown) is formed along the periphery. Such a semiconductor wafer W is taken in and out of the container body 1 with the peripheral edges of the both sides being handled by a dedicated robot (not shown).

基板収納容器の容器本体1と蓋体10とは、例えばポリプロピレン、シクロオレフィンポリマー、ポリカーボネート、ポリエチレンテレフタレート、ポリブチレンテレフタレート、ポリエーテルエーテルケトン、ポリアセタール、ポリエーテルイミド等の成形材料を使用して成形される。これらの成形材料の中では、透明性や高剛性に優れるポリカーボネートの選択が最適である。これらの成形材料には、帯電防止剤、カーボンや金属繊維等の導電性付与剤、紫外線吸収剤、ガラス繊維や炭素繊維等の補強剤が選択的に適量添加される。   The container body 1 and the lid 10 of the substrate storage container are molded using a molding material such as polypropylene, cycloolefin polymer, polycarbonate, polyethylene terephthalate, polybutylene terephthalate, polyether ether ketone, polyacetal, polyether imide, or the like. The Among these molding materials, selection of polycarbonate having excellent transparency and high rigidity is optimal. An appropriate amount of an antistatic agent, a conductivity imparting agent such as carbon or metal fiber, an ultraviolet absorber, or a reinforcing agent such as glass fiber or carbon fiber is selectively added to these molding materials.

容器本体1は、図1に示すように、正面部の開口したフロントオープンボックスタイプに形成され、複数枚の半導体ウェーハWを所定の間隔で上下に整列させた状態で収納する。この容器本体1は、その内部両側に、相互に対向して半導体ウェーハWを水平に支持する左右一対のティースが上下方向に所定のピッチで配列される。   As shown in FIG. 1, the container body 1 is formed in a front open box type having an open front portion, and stores a plurality of semiconductor wafers W in a state of being vertically aligned at a predetermined interval. The container body 1 has a pair of left and right teeth that horizontally support the semiconductor wafer W facing each other on both sides of the container body 1 and arranged in a vertical direction at a predetermined pitch.

各ティースは、図示しないが、容器本体1の内側部に一体形成されて半導体ウェーハWの側部周縁に沿う平面略長方形、略く字形、略半円弧形の棚板と、この棚板上に一体形成される平坦な基板接触部とを備え、棚板の容器本体1正面部側には、容器本体1の内壁面と共に半導体ウェーハWの位置を規制する段差が形成される。このような複数対のティースは、半導体ウェーハWの両側部周縁を高精度に水平に支持し、半導体ウェーハWが上下方向に傾斜して専用のロボットによる出し入れが困難になるのを防止するよう機能する。   Although not shown, each tooth is formed integrally with the inner side of the container body 1 and has a substantially rectangular, substantially square, or substantially semicircular arc shaped shelf board along the side edge of the semiconductor wafer W, and the shelf board. And a flat substrate contact portion integrally formed on the front surface of the container main body 1 on the shelf, and a step for regulating the position of the semiconductor wafer W together with the inner wall surface of the container main body 1 is formed. Such multiple pairs of teeth function to support the periphery of both sides of the semiconductor wafer W with high precision and to prevent the semiconductor wafer W from tilting in the vertical direction and making it difficult for a dedicated robot to put in and out. To do.

容器本体1の底面の前部両側と後部中央とには、基板収納容器を搭載する加工装置(図示せず)上に位置決めされる位置決め具(図示せず)がそれぞれ一体形成され、各位置決め具が断面略M字形、略V字形、略Y字形等に形成される。また、容器本体1の天井中央部には、図示しない自動搬送機構(オーバーヘッドホイストトランスファー)に把持される平面略矩形のロボティックフランジ(図示せず)が着脱自在に装着される。また、容器本体1の両側壁の上下間には、上下方向に斜めに伸びる手動操作用のハンドル2がそれぞれ架設される。   Positioning tools (not shown) that are positioned on a processing device (not shown) on which the substrate storage container is mounted are integrally formed on both the front side and the rear center of the bottom surface of the container body 1. Are formed in a substantially M-shaped cross section, a substantially V-shaped cross-section, a substantially Y-shaped cross section, and the like. A flat rectangular robotic flange (not shown) that is gripped by an automatic transport mechanism (overhead hoist transfer) (not shown) is detachably attached to the center of the ceiling of the container body 1. Moreover, between the upper and lower sides of the both side walls of the container main body 1 are manually operated handles 2 that extend obliquely in the vertical direction.

蓋体10は、図1や図2に示すように、容器本体1の正面部に対応する正面略矩形の筐体11と、この筐体11の開口した表面左右両側部に装着されて露出する一対の表面プレートとを備え、これら筐体11と一対の表面プレートとの間に、外部からの操作により作動する施錠用の施錠機構が内蔵されており、容器本体1の正面部に蓋体開閉装置によりシールガスケット12を介し着脱自在に嵌合される。   As shown in FIG. 1 and FIG. 2, the lid 10 is mounted and exposed on a substantially rectangular front case 11 corresponding to the front part of the container body 1 and on the left and right sides of the open surface of the case 11. A pair of surface plates is provided, and a locking mechanism for locking that is operated by an external operation is built in between the housing 11 and the pair of surface plates, and the lid body is opened and closed on the front portion of the container body 1. The device is detachably fitted through the seal gasket 12.

蓋体10の筐体11は、基本的には外周面にエンドレスのシールガスケット12を備えた断面略皿形に形成され、表面の中央部が正面略矩形に膨出形成されており、この表面中央部の膨出に伴い、両側部が分離されて施錠機構内蔵用の空間を区画形成するとともに、裏面中央部13が略矩形に凹んでリテーナ20装着用の空間を形成する(図7ないし図10参照)。   The casing 11 of the lid 10 is basically formed in a substantially dish-shaped cross section having an endless seal gasket 12 on the outer peripheral surface, and the center of the surface is formed to bulge into a substantially rectangular front surface. As the central portion bulges, both side portions are separated to form a space for incorporating a locking mechanism, and the rear central portion 13 is recessed in a substantially rectangular shape to form a space for mounting the retainer 20 (FIGS. 7 to 7). 10).

シールガスケット12は、例えば弾性のポリエステル系熱可塑性エラストマー等を使用して枠形に成形され、蓋体10の嵌合時に圧縮変形されてシール機能を発揮する。また、施錠機構は、図示しないが、筐体11表面の左右両側部中央にそれぞれ軸支されて外部から回転操作される一対の回転プレートと、各回転プレートに連結されてその回転に伴い上下方向にスライドする一対の進退動作プレートと、各進退動作プレートの先端部に回転可能に連結軸支されて容器本体1の正面部内周縁に穿孔された係止穴に係止する係止爪とを備え、蓋体10の表面プレートに被覆される。   The seal gasket 12 is formed into a frame shape using, for example, an elastic polyester-based thermoplastic elastomer or the like, and is compressed and deformed when the lid body 10 is fitted to exhibit a sealing function. In addition, although not shown, the locking mechanism is a pair of rotating plates that are pivotally supported at the center of the left and right sides of the surface of the housing 11 and are operated to rotate from the outside. A pair of advancing and retreating plates that slide on each other, and a locking claw that is rotatably connected to the front end of each of the advancing and retreating operation plates and engages with a locking hole that is perforated on the inner peripheral edge of the front surface of the container body 1 The surface plate of the lid 10 is covered.

筐体11の凹んだ裏面中央部13には、リテーナ20の枠体21を位置決めする左右一対の位置決め突起14が配設されるとともに、リテーナ20の第一弾性片31に対向する複数のストッパ15が突設され、各ストッパ15が第一弾性片31の過度の変形や破損を規制するよう機能する(図7、図9、図10参照)。このストッパ15は、円柱形や台形等、任意の形に形成される。また、筐体11の裏面中央部13の左右両側には図2に示すように、枠体21の表面に着脱自在に係合する複数の係合爪16が上下方向に配列され、各係合爪16がJ字形やL字形等に屈曲形成される。   A pair of left and right positioning projections 14 for positioning the frame 21 of the retainer 20 are disposed on the recessed rear surface central portion 13 of the housing 11, and a plurality of stoppers 15 facing the first elastic piece 31 of the retainer 20. And the stoppers 15 function to restrict excessive deformation and breakage of the first elastic piece 31 (see FIGS. 7, 9, and 10). The stopper 15 is formed in an arbitrary shape such as a columnar shape or a trapezoidal shape. Further, as shown in FIG. 2, a plurality of engagement claws 16 that are detachably engaged with the surface of the frame body 21 are arranged in the vertical direction on both the left and right sides of the rear surface central portion 13 of the housing 11. The claw 16 is bent and formed into a J shape, an L shape, or the like.

リテーナ20は、図2ないし図5等に示すように、蓋体10に装着される縦長の枠体21と、この枠体21の一対の対向片22からそれぞれ突出して相互に接近する一対の弾性片29と、この一対の弾性片29に形成されて半導体ウェーハWの前部周縁を保持する保持部30とを備え、一対の弾性片29が、枠体21の一対の対向片22からそれぞれ突出する一対の第一弾性片31と、この一対の第一弾性片31の屈曲した自由端部32に支持されて半導体ウェーハWの周縁方向に伸びてこれを保持する第二弾性片33とから形成されるとともに、保持部30が第一、第二の保持部35・36に分割されており、蓋体10と共に、あるいは蓋体10とは別に単独で湿式洗浄されたり、乾燥作業に供される。   As shown in FIGS. 2 to 5, etc., the retainer 20 has a pair of elastic frames 21 that are attached to the lid body 10 and a pair of elastic members that protrude from the pair of opposed pieces 22 of the frame body 21 and approach each other. A piece 29 and a holding part 30 formed on the pair of elastic pieces 29 and holding the front peripheral edge of the semiconductor wafer W are provided, and the pair of elastic pieces 29 protrude from the pair of opposed pieces 22 of the frame body 21, respectively. A pair of first elastic pieces 31 and a second elastic piece 33 which is supported by the bent free end portions 32 of the pair of first elastic pieces 31 and extends in the peripheral direction of the semiconductor wafer W to hold it. At the same time, the holding unit 30 is divided into first and second holding units 35 and 36, and is wet-cleaned separately from the lid body 10 or separately from the lid body 10, or is subjected to a drying operation. .

リテーナ20は、例えばポリプロピレン、ポリカーボネート、ポリエチレンテレフタレート、ポリブチレンテレフタレート、ポリエーテルエーテルケトン、ポリアセタール、ポリエーテルイミド等の合成樹脂、ポリエステル系の熱可塑性能エラストマー、ポリウレタン系の熱可塑性能エラストマー等の成形材料を使用して成形される。これらの成形材料の中では、成形時のアウトガスや損傷の少ないポリブチレンテレフタレートの選択が最適である。これらの成形材料には、帯電防止剤、カーボンや金属繊維等の導電性付与剤、紫外線吸収剤、ガラス繊維や炭素繊維等の補強剤が選択的に適量添加される。   The retainer 20 is a molding material such as synthetic resin such as polypropylene, polycarbonate, polyethylene terephthalate, polybutylene terephthalate, polyether ether ketone, polyacetal, polyether imide, polyester-based thermoplastic performance elastomer, polyurethane-based thermoplastic performance elastomer, and the like. Is molded using. Among these molding materials, it is optimal to select polybutylene terephthalate, which has less outgassing and damage during molding. An appropriate amount of an antistatic agent, a conductivity imparting agent such as carbon or metal fiber, an ultraviolet absorber, or a reinforcing agent such as glass fiber or carbon fiber is selectively added to these molding materials.

リテーナ20の枠体21は、図2ないし図5、図8等に示すように、間隔をおき平行に対向して蓋体10の上下方向に伸びる一対の対向片22と、この一対の対向片22の上下両端部間にそれぞれ水平に架設される一対の架設片23とを備え、各対向片22の裏面中央部に、蓋体10の位置決め突起14に挟持嵌合して位置決め精度を向上させる位置決め部24が凹み形成され、各架設片23には、半導体ウェーハW方向に突出するバネ性の屈曲部25が形成されており、蓋体10の凹んだ裏面中央部13に複数の係合爪16を介し着脱自在に装着される。   As shown in FIGS. 2 to 5, 8, and the like, the frame body 21 of the retainer 20 includes a pair of facing pieces 22 that extend in the vertical direction of the lid body 10 in parallel and spaced apart from each other, and the pair of facing pieces. A pair of installation pieces 23 installed horizontally between the upper and lower end portions of each of the two pieces 22 are sandwiched and fitted to the positioning projections 14 of the lid 10 at the center of the rear surface of each facing piece 22 to improve the positioning accuracy. A positioning portion 24 is formed in a recessed manner, and each erected piece 23 is formed with a spring-like bent portion 25 protruding in the direction of the semiconductor wafer W, and a plurality of engaging claws are formed in the recessed rear surface central portion 13 of the lid 10. 16 is detachably mounted via 16.

枠体21の表面四隅部には、半導体ウェーハW方向に伸びる握持操作可能な正面略I字形のリブ26がそれぞれ突出形成され、この複数のリブ26が、取付性を向上させたり、リテーナ20のストック時に保持部30が荷重の作用で変形するのを有効に防止する。また、複数のリテーナ20の積層時には、スタッキング機能を発揮したり、第一弾性片31や第二弾性片33の接触に伴う変形を防止する。各リブ26の高さは、複数のリテーナ20の積層時にリテーナ20と隣接する他のリテーナ20における保持部30が非接触となる高さが好ましい。   At the four corners of the front surface of the frame body 21, front substantially I-shaped ribs 26 extending in the direction of the semiconductor wafer W and capable of being gripped are projected and formed, and the plurality of ribs 26 improve the mounting property or retainer 20. The holding part 30 is effectively prevented from being deformed by the action of the load during the stocking. Further, when the plurality of retainers 20 are stacked, a stacking function is exhibited, and deformation due to contact of the first elastic piece 31 and the second elastic piece 33 is prevented. The height of each rib 26 is preferably such that when the plurality of retainers 20 are stacked, the holding portions 30 of the other retainers 20 adjacent to the retainer 20 are not in contact with each other.

各対向片22の表面縁には図3に示すように、リテーナ20の着脱性を向上させる複数の逃がし溝27が間隔をおいて配列形成され、逃がし溝27の形成されていない領域に筐体11の係合爪16が外側から着脱自在に係合する。また、各対向片22の蓋体10に対向する裏面長手方向には図8に示すように、複数の凹凸28が間隔をおいて交互に形成され、この複数の凹凸28がリテーナ20の洗浄や乾燥時の水切り性を向上させる。   As shown in FIG. 3, a plurality of escape grooves 27 that improve the detachability of the retainer 20 are arranged at intervals on the surface edge of each facing piece 22, and the housing is formed in a region where the escape grooves 27 are not formed. 11 engaging claws 16 are detachably engaged from the outside. Further, as shown in FIG. 8, a plurality of irregularities 28 are alternately formed at intervals in the back surface longitudinal direction of each facing piece 22 facing the lid body 10, and the plurality of irregularities 28 are formed by cleaning the retainer 20. Improves drainability during drying.

各屈曲部25は、図5や図7に示すように、架設片23の中央部に略U字形に湾曲形成され、握持操作されることにより狭まるよう変形してリテーナ20を断面略へ字形に撓ませ、蓋体10の裏面中央部13にリテーナ20を係合爪16を介し装着する装着作業を円滑にする。   As shown in FIG. 5 and FIG. 7, each bent portion 25 is formed in a substantially U-shaped curve at the center of the installation piece 23, and is deformed so as to be narrowed by a gripping operation, so that the retainer 20 has a substantially rectangular shape in cross section. The mounting operation of mounting the retainer 20 on the back surface central portion 13 of the lid body 10 via the engaging claws 16 is made smooth.

一対の第一弾性片31は、図5ないし図7等に示すように、枠体21の一対の対向片22からそれぞれ内方向に突出し、間隔をおき相互に接近しており、枠体21の上下長手方向に所定のピッチで複数配列される。各第一弾性片31は、図5ないし図7等に示すように、半導体ウェーハWの動きに追従して変形可能な細長い略L字形に屈曲して枠体21の架設片23に平行に配置され、短い自由端部32が半導体ウェーハW方向に指向しており、屈曲部の裏面が蓋体10のストッパ15に間隔をおいて対向する。   As shown in FIGS. 5 to 7 and the like, the pair of first elastic pieces 31 protrude inward from the pair of opposed pieces 22 of the frame body 21 and approach each other at intervals. A plurality are arranged at a predetermined pitch in the vertical direction. Each of the first elastic pieces 31 is arranged in parallel with the erected piece 23 of the frame body 21 by bending into a substantially elongated L shape that can be deformed following the movement of the semiconductor wafer W, as shown in FIGS. The short free end portion 32 is directed in the direction of the semiconductor wafer W, and the back surface of the bent portion faces the stopper 15 of the lid body 10 with an interval.

第二弾性片33は、図5ないし図7等に示すように、半導体ウェーハWの前部周縁に沿うようやや屈曲した板片に形成され、中央部が第一弾性片31方向に略U字形に浅く凹み形成される。この第二弾性片33は、一対の第一弾性片31の屈曲した自由端部32間に架設され、枠体21の架設片23や第一弾性片31に平行に配置されるとともに、第一弾性片31の自由端部32よりも枠体21の対向片22寄りの外側に外側端部34が位置しており、半導体ウェーハWを第一、第二の保持部35・36を介して保持する。   As shown in FIGS. 5 to 7 and the like, the second elastic piece 33 is formed in a slightly bent plate piece along the front peripheral edge of the semiconductor wafer W, and the central portion is substantially U-shaped in the direction of the first elastic piece 31. A shallow dent is formed. The second elastic piece 33 is installed between the bent free ends 32 of the pair of first elastic pieces 31 and is disposed in parallel to the installation piece 23 of the frame body 21 and the first elastic piece 31. An outer end 34 is located outside the free end 32 of the elastic piece 31 and closer to the facing piece 22 of the frame body 21, and holds the semiconductor wafer W via the first and second holding portions 35 and 36. To do.

第一、第二の保持部35・36は、同図に示すように、第二弾性片33の中央部からやや左右外方向にずれた位置、換言すれば、第一の保持部形成領域37に左右一対の第一の保持部35がそれぞれ一体形成され、第二弾性片33の両外側端部34、換言すれば、第二の保持部形成領域38に第二の保持部36がそれぞれ一体形成されており、第一の保持部35よりも第二の保持部36が第二弾性片33の外側端部34に位置する。   As shown in the figure, the first and second holding portions 35 and 36 are displaced slightly from the central portion of the second elastic piece 33 in the left and right direction, in other words, the first holding portion forming region 37. A pair of left and right first holding portions 35 are formed integrally with each other, and both outer end portions 34 of the second elastic piece 33, in other words, a second holding portion 36 is integrally formed with the second holding portion forming region 38. The second holding part 36 is located at the outer end 34 of the second elastic piece 33 rather than the first holding part 35.

第一、第二の保持部35・36は、図2、図5ないし図7に示すように、相対向する一対の傾斜面39により断面略V字形あるいは略Y字形を呈する奥細りの保持溝40を形成する突起41をそれぞれ備え、この突起41の保持溝40に半導体ウェーハWの前部周縁が案内され、位置決め挟持される。   As shown in FIGS. 2 and 5 to 7, the first and second holding portions 35, 36 are narrow holding grooves each having a substantially V-shaped or Y-shaped cross section by a pair of opposed inclined surfaces 39. Each of the projections 41 forming the projection 40 is provided, and the front peripheral edge of the semiconductor wafer W is guided in the holding groove 40 of the projection 41 and is positioned and clamped.

一対の第一の保持部35は、図5ないし図7、図9等に示すように、第二の保持部36よりも先に半導体ウェーハWのノッチnを挟んだ状態で半導体ウェーハWの中心線近傍を保持するよう機能する。この第一の保持部35は、略ブロック形を呈する突起41の一対の傾斜面39が上下左右非対称に形成され、この一対の傾斜面39が第二の保持部36における一対の傾斜面39よりも高く形成される。すなわち、この突起41の一対の傾斜面39は、確実に半導体ウェーハWを保持溝40に導く観点から一方が高く、他方が低く形成され、しかも、半導体ウェーハWの平面の中心線を挟んで左右に非対称を呈する。   As shown in FIGS. 5 to 7, 9, and the like, the pair of first holding portions 35 are arranged at the center of the semiconductor wafer W with the notch n of the semiconductor wafer W sandwiched before the second holding portion 36. It works to keep the line neighborhood. In the first holding portion 35, a pair of inclined surfaces 39 of a substantially block-shaped protrusion 41 is formed asymmetrically in the vertical and horizontal directions, and the pair of inclined surfaces 39 is more than the pair of inclined surfaces 39 in the second holding portion 36. Is also formed high. That is, the pair of inclined surfaces 39 of the protrusion 41 is formed such that one is high and the other is low from the viewpoint of reliably guiding the semiconductor wafer W to the holding groove 40, and the left and right sides of the center line of the plane of the semiconductor wafer W are sandwiched. Exhibits asymmetry.

各第二の保持部36は、図5ないし図7、図9等に示すように、第一の保持部35により所定の位置に整列した半導体ウェーハWを安定して保持する観点から、突起41やその保持溝40が半導体ウェーハWの周縁方向に伸長して形成される。この第二の保持部36の高さは、蓋体10の裏面から突出しない高さに調整される。   As shown in FIGS. 5 to 7, 9, etc., each second holding part 36 has a protrusion 41 from the viewpoint of stably holding the semiconductor wafer W aligned at a predetermined position by the first holding part 35. In addition, the holding groove 40 is formed to extend in the peripheral direction of the semiconductor wafer W. The height of the second holding portion 36 is adjusted to a height that does not protrude from the back surface of the lid 10.

上記構成において、蓋体10にリテーナ20を装着する場合には、先ず、枠体21の一対の屈曲部25をそれぞれ握持操作して枠体21を断面略へ字形に変形させ、この変形した枠体21を蓋体10の裏面中央部13に係合爪16と干渉しないよう積層し、その後、各屈曲部25の握持操作を解除して枠体21を元の状態や幅に復帰させれば、蓋体10の係合爪16と逃がし溝27の形成されていない領域とが係合することにより、リテーナ20を適切、かつ強固に装着することができる。   In the above configuration, when the retainer 20 is attached to the lid body 10, first, the pair of bent portions 25 of the frame body 21 are each gripped to deform the frame body 21 into a substantially square shape in cross section. The frame body 21 is laminated on the back surface central portion 13 of the lid body 10 so as not to interfere with the engaging claw 16, and then the gripping operation of each bent portion 25 is released to return the frame body 21 to its original state and width. Then, the retainer 20 can be mounted appropriately and firmly by engaging the engaging claw 16 of the lid 10 with the region where the escape groove 27 is not formed.

上記構成によれば、リテーナ20に一対の屈曲部25をそれぞれ形成して弾性を予め付与しておくので、リテーナ20の枠体21を大きく強く無理に変形させる必要が全くない。したがって、リテーナ20の装着作業時に必要以上の力を誤って加えてしまうことにより、リテーナ20の変形を招くおそれがきわめて少ない。   According to the above configuration, the pair of bent portions 25 are formed on the retainer 20 to give elasticity in advance, so that there is no need to deform the frame body 21 of the retainer 20 to be large and strong. Therefore, there is very little possibility that the retainer 20 will be deformed by mistakenly applying an excessive force when the retainer 20 is mounted.

また、例えリテーナ20を大型に形成しても、係合爪16や逃がし溝27等を多数形成する必要がないので、装着作業の円滑化や容易化を図ることができ、作業効率を著しく向上させることができる。また、枠体21の外周縁に複数の逃がし溝27を配列形成するので、この逃がし溝27を活用して握持操作すれば、装着されたリテーナ20の取り外し作業の簡易化や容易化が大いに期待できる。   Further, even if the retainer 20 is formed in a large size, it is not necessary to form a large number of engaging claws 16 and escape grooves 27, etc., so that the mounting operation can be made smooth and easy, and the working efficiency is remarkably improved. Can be made. In addition, since a plurality of escape grooves 27 are arranged on the outer peripheral edge of the frame body 21, if the gripping operation is performed using the escape grooves 27, the removal work of the attached retainer 20 is greatly simplified and facilitated. I can expect.

次に、複数枚数の半導体ウェーハWを整列収納した容器本体1の開口した正面部に蓋体10をリテーナ20を介して嵌合する場合について説明する。この場合、半導体ウェーハWの前部周縁に第一の保持部35の傾斜面39が先ず接触し、この状態で半導体ウェーハWの位置を傾斜面39に沿わせて調整しながら、リテーナ20が半導体ウェーハWの中心線に沿って接近し、第二の保持部36の傾斜面39も半導体ウェーハWと接触する。この状態で第一、第二の保持部35・36の保持溝40内に半導体ウェーハWが収納される。   Next, a case where the lid 10 is fitted to the opened front portion of the container main body 1 in which a plurality of semiconductor wafers W are aligned and stored via the retainer 20 will be described. In this case, the inclined surface 39 of the first holding unit 35 first comes into contact with the front peripheral edge of the semiconductor wafer W, and the retainer 20 is adjusted to adjust the position of the semiconductor wafer W along the inclined surface 39 in this state. It approaches along the center line of the wafer W, and the inclined surface 39 of the second holding part 36 also contacts the semiconductor wafer W. In this state, the semiconductor wafer W is stored in the holding grooves 40 of the first and second holding portions 35 and 36.

容器本体1の開口した正面部に蓋体10が完全に嵌合した状態においては、第一、第二の保持部35・36を備えた第二弾性片33が、半導体ウェーハWの中心線上を半導体ウェーハWの形状に沿って平行に移動し、半導体ウェーハWが保持される状態となる。このとき、第二弾性片33を支持する第一弾性片31が蓋体10の厚さ方向に変形し、この変形に伴う反発力が第二弾性片33に伝達されることにより、半導体ウェーハWが強固に保持される。   In a state where the lid 10 is completely fitted to the opened front portion of the container body 1, the second elastic piece 33 including the first and second holding portions 35 and 36 is placed on the center line of the semiconductor wafer W. The semiconductor wafer W moves in parallel along the shape of the semiconductor wafer W, and the semiconductor wafer W is held. At this time, the first elastic piece 31 supporting the second elastic piece 33 is deformed in the thickness direction of the lid body 10, and the repulsive force accompanying this deformation is transmitted to the second elastic piece 33, whereby the semiconductor wafer W Is firmly held.

次に、基板収納容器の輸送時の振動や衝撃等が半導体ウェーハWに作用し、半導体ウェーハWにずれが生じる場合について説明すると、この場合、半導体ウェーハWの左右方向のいずれかに力(図10の矢印参照)が作用するが、このとき、第二弾性片33を支持する一対の第一弾性片31が左右非対称に個々に変形して応力を緩和するので、第一、第二の保持部35・36が半導体ウェーハWとの接触状態を維持することになる。   Next, a description will be given of a case where vibration or impact during transportation of the substrate storage container acts on the semiconductor wafer W to cause a shift in the semiconductor wafer W. In this case, a force is exerted on either side of the semiconductor wafer W (see FIG. 10) (see the arrow 10), but at this time, the pair of first elastic pieces 31 that support the second elastic piece 33 are individually deformed asymmetrically to relieve the stress. The portions 35 and 36 are kept in contact with the semiconductor wafer W.

この結果、半導体ウェーハWが第一、第二の保持部35・36の保持溝40から外れたり、回転するのを有効に抑制防止することができる。また、半導体ウェーハWとの接触状態を維持するので、半導体ウェーハWとの擦れに伴うパーティクルの発生を効果的に低減することができる。   As a result, it is possible to effectively suppress and prevent the semiconductor wafer W from coming off or rotating from the holding grooves 40 of the first and second holding portions 35 and 36. Further, since the contact state with the semiconductor wafer W is maintained, the generation of particles due to rubbing with the semiconductor wafer W can be effectively reduced.

上記構成によれば、対向片22の蓋体10に対向する裏面長手方向に複数の凹凸28を形成するので、循環する洗浄水により蓋体10を洗浄して乾燥させる場合に、リテーナ20に洗浄水が付着して溜まるのを抑制防止することができる。この結果、乾燥作業の遅延を招いたり、残留した洗浄水により半導体ウェーハWが汚染してしまうおそれがない。また、複数の凹凸28により、リテーナ20の成形時の成形収縮を緩和して変形を抑制することが可能になる。したがって、半導体ウェーハWと第一、第二の保持部35・36との接触精度を著しく向上させることが可能になる。   According to the above configuration, since the plurality of projections and depressions 28 are formed in the longitudinal direction of the back surface of the facing piece 22 facing the lid 10, the retainer 20 is washed when the lid 10 is washed and dried with circulating washing water. It is possible to suppress and prevent water from adhering and accumulating. As a result, there is no possibility that the drying operation is delayed or the semiconductor wafer W is contaminated by the remaining cleaning water. In addition, the plurality of projections and depressions 28 can relieve molding shrinkage during molding of the retainer 20 and suppress deformation. Therefore, the contact accuracy between the semiconductor wafer W and the first and second holding portions 35 and 36 can be remarkably improved.

また、リテーナ20の弾性片29を第一弾性片31と第二弾性片33とに分割し、第一弾性片31のみを変形させ、第二弾性片33における第一、第二の保持部35・36の半導体ウェーハWとの相対位置に変更を来たさないようにするので、半導体ウェーハWの保持領域を拡大し、半導体ウェーハWを安定して継続保持することができる。したがって、半導体ウェーハWの回転を規制することができ、半導体ウェーハWの回転に伴い第一、第二の保持部35・36が削られてパーティクルを発生させたり、半導体ウェーハWの汚染や表面の損傷を招くおそれがない。   In addition, the elastic piece 29 of the retainer 20 is divided into a first elastic piece 31 and a second elastic piece 33, and only the first elastic piece 31 is deformed, and the first and second holding portions 35 in the second elastic piece 33. Since the relative position with respect to the 36 semiconductor wafers W is not changed, the holding area of the semiconductor wafers W can be expanded and the semiconductor wafers W can be stably held continuously. Therefore, the rotation of the semiconductor wafer W can be restricted, and the first and second holding portions 35 and 36 are scraped along with the rotation of the semiconductor wafer W to generate particles. There is no risk of damage.

また、第一、第二の保持部35・36の保持力を大きくして半導体ウェーハWの回転を規制する必要もないので、容器本体1の正面部に蓋体10を嵌合する際に大きな抵抗が生じることがない。これにより、容器本体1に蓋体10を円滑に嵌合することができる。さらに、第一の保持部35を一対として第二の保持部36との間に間隔を形成するので、半導体ウェーハWのバーコードの目視確認や読み取り作業に何ら支障を来たすことがない。   Further, since it is not necessary to restrict the rotation of the semiconductor wafer W by increasing the holding force of the first and second holding portions 35 and 36, it is large when the lid 10 is fitted to the front portion of the container body 1. There is no resistance. Thereby, the lid body 10 can be smoothly fitted to the container body 1. Furthermore, since the first holding part 35 is paired with the second holding part 36, a gap is formed between the first holding part 35 and the second holding part 36, so that there is no hindrance to the visual confirmation and reading operation of the barcode of the semiconductor wafer W.

次に、図11、図12は本発明の第2の実施形態を示すもので、この場合には、リテーナ20の弾性片29を第一弾性片31と第二弾性片33とに分割せず、各弾性片29を略L字形に形成してその直線的な自由端部上に保持部30を一体形成するようにしている。
蓋体10の裏面中央部13の両側には、複数の凹部が配列して穿孔される。また、リテーナ20の枠体21には、蓋体10の凹部に干渉する複数の係合爪16が並べて突出形成される。また、各弾性片29の裏面には、各弾性片29の過剰な変形や破損を防止するストッパ15が選択的に形成される。
Next, FIGS. 11 and 12 show a second embodiment of the present invention. In this case, the elastic piece 29 of the retainer 20 is not divided into the first elastic piece 31 and the second elastic piece 33. Each elastic piece 29 is formed in a substantially L shape, and the holding portion 30 is integrally formed on the linear free end portion.
A plurality of concave portions are arranged and perforated on both sides of the back surface central portion 13 of the lid body 10. In addition, a plurality of engaging claws 16 that interfere with the concave portion of the lid body 10 are juxtaposed and formed on the frame body 21 of the retainer 20. Further, a stopper 15 that prevents excessive deformation and breakage of each elastic piece 29 is selectively formed on the back surface of each elastic piece 29.

保持部30は、相対向する一対の傾斜面39により断面略V字形あるいは略Y字形を呈する奥細りの保持溝40を形成する突起41を備え、この突起41の保持溝40に半導体ウェーハWの前部周縁が案内され、位置決め挟持される。この保持部30の一対の傾斜面39は、上下左右非対称に形成される。その他の部分については、上記実施形態と略同様であるので説明を省略する。
本実施形態においても上記実施形態と同様の作用効果が期待でき、しかも、リテーナ20の構成の多様化が期待できるのは明らかである。
The holding unit 30 includes a protrusion 41 that forms a narrow holding groove 40 having a substantially V-shaped or substantially Y-shaped cross section by a pair of opposed inclined surfaces 39, and the holding groove 40 of the protrusion 41 has a semiconductor groove W formed on the holding groove 40. The front periphery is guided and positioned. The pair of inclined surfaces 39 of the holding part 30 are formed asymmetrically in the vertical and horizontal directions. The other parts are substantially the same as those in the above embodiment, and thus description thereof is omitted.
In the present embodiment, it is obvious that the same operational effects as those of the above embodiment can be expected, and that the configuration of the retainer 20 can be expected to be diversified.

次に、図13ないし図15は本発明の第3の実施形態を示すもので、この場合には、基板収納容器を、上面の開口した容器本体1Aに複数枚の半導体ウェーハWを整列用のカセット3を介し整列収納するトップオープンボックスタイプとし、容器本体1Aとカセット3の開口上部を覆う蓋体10Aの天井内面に、水平方向に並んだ複数枚の半導体ウェーハWの端部周縁である上部周縁を保持するリテーナ20を着脱自在に装着するようにしている。   Next, FIGS. 13 to 15 show a third embodiment of the present invention. In this case, a substrate storage container is used for aligning a plurality of semiconductor wafers W in a container body 1A having an open top surface. A top open box type that is arranged and stored via the cassette 3 and is an upper edge that is a peripheral edge of a plurality of semiconductor wafers W arranged in the horizontal direction on the ceiling inner surface of the lid 10A that covers the container body 1A and the upper opening of the cassette 3 A retainer 20 that holds the periphery is detachably mounted.

リテーナ20の枠体21は、図14や図15に示すように、相対向する一対の架設片23の間に、対向片22に平行な一対の平行片45がそれぞれ間隔をおいて架設され、各対向片22と各平行片45との間には、これら22・45の長手方向に並ぶ複数の弾性片29が架設されており、各弾性片29には、半導体ウェーハWの上部周縁を保持する保持部30が一体形成される。   As shown in FIGS. 14 and 15, the frame body 21 of the retainer 20 has a pair of parallel pieces 45 that are parallel to the opposing piece 22 and are installed between a pair of opposing installation pieces 23 at intervals. Between each opposing piece 22 and each parallel piece 45, a plurality of elastic pieces 29 arranged in the longitudinal direction of these 22 and 45 are installed, and each elastic piece 29 holds the upper peripheral edge of the semiconductor wafer W. A holding portion 30 is integrally formed.

一対の平行片45の間には、枠体21の略中央部に位置する矩形の空間46が細長く区画形成される。また、各弾性片29は、半導体ウェーハWの上部周縁に接近するよう湾曲形成される。その他の部分については、上記実施形態と略同様であるので説明を省略する。
本実施形態においても上記実施形態と同様の作用効果が期待でき、しかも、リテーナ20の構成の多様化が期待できるのは明らかである。
Between the pair of parallel pieces 45, a rectangular space 46 positioned substantially at the center of the frame body 21 is formed in an elongated shape. Each elastic piece 29 is curved so as to approach the upper peripheral edge of the semiconductor wafer W. The other parts are substantially the same as those in the above embodiment, and thus description thereof is omitted.
In the present embodiment, it is obvious that the same operational effects as those of the above embodiment can be expected, and that the configuration of the retainer 20 can be expected to be diversified.

なお、上記実施形態では、直径300mmの半導体ウェーハWを示したが、何らこれに限定されるものではなく、例えば直径200mmや450mmの半導体ウェーハWでも良い。また、容器本体1の内部両側にティースをそれぞれ一体形成したが、容器本体1の内部両側に別体のティースを固定部品や摩擦係合等を利用して後から取り付けても良い。また、枠体21の表面に、正面略L字形等のリブ26を必要数突出形成しても良い。また、架設片23の蓋体10に対向する裏面に複数の凹凸28を形成しても良い。また、屈曲部25を略C字形や略V字形等に形成することもできる。   In the above embodiment, the semiconductor wafer W having a diameter of 300 mm is shown. However, the present invention is not limited to this. For example, the semiconductor wafer W having a diameter of 200 mm or 450 mm may be used. Further, although the teeth are integrally formed on both inner sides of the container body 1, separate teeth may be attached to both sides of the container body 1 later by using fixed parts, frictional engagement, or the like. Further, a required number of ribs 26 having a substantially L-shaped front surface may be formed on the surface of the frame body 21 so as to protrude. Moreover, you may form the some unevenness | corrugation 28 in the back surface facing the cover body 10 of the installation piece 23. FIG. Further, the bent portion 25 can be formed in a substantially C shape, a substantially V shape, or the like.

また、架設片23全体を弧形に湾曲させてバネ性の屈曲部25を形成しても良いし、架設片23ではなく、対向片22にバネ性の屈曲部25を形成することもできる。また、位置決め突起14や位置決め部24は、左右対称に配設したり、あるいは左右非対称に配設してリテーナ20装着の際の方向性を向上させることもできる。   Further, the entire bent piece 23 may be curved in an arc shape to form the spring-like bent portion 25, or the spring-like bent portion 25 may be formed not on the installed piece 23 but on the opposing piece 22. Further, the positioning protrusions 14 and the positioning portions 24 can be arranged symmetrically in the left-right direction or asymmetrically arranged in the left-right direction to improve the directionality when the retainer 20 is mounted.

また、位置決め突起14や位置決め部24を左右対称に配設し、枠体21に、上下方向の方向性を示す凹凸等を新たに形成することも可能である。また、蓋体10の裏面中央部13に位置決め部24を凹み形成し、枠体21の対向片22に位置決め突起14を形成することも可能である。さらに、第一弾性片31をJ字形、S字形、Z字形等に形成することも可能である。   It is also possible to arrange the positioning protrusions 14 and the positioning portions 24 symmetrically and to newly form irregularities or the like indicating the vertical directionality on the frame body 21. It is also possible to form the positioning portion 24 in the center of the back surface 13 of the lid body 10 and to form the positioning projection 14 on the opposing piece 22 of the frame body 21. Further, the first elastic piece 31 can be formed in a J shape, an S shape, a Z shape, or the like.

本発明に係る基板収納容器の実施形態を模式的に示す全体斜視説明図である。It is a whole perspective explanatory view showing typically an embodiment of a substrate storage container concerning the present invention. 本発明に係る基板収納容器の実施形態における蓋体の裏面を模式的に示す説明図である。It is explanatory drawing which shows typically the back surface of the cover body in embodiment of the substrate storage container which concerns on this invention. 本発明に係るリテーナの実施形態を模式的に示す正面説明図である。It is front explanatory drawing which shows typically embodiment of the retainer which concerns on this invention. 本発明に係るリテーナの実施形態を模式的に示す側面説明図である。It is side explanatory drawing which shows typically embodiment of the retainer which concerns on this invention. 本発明に係るリテーナの実施形態を模式的に示す端面説明図である。It is an end face explanatory view showing typically an embodiment of a retainer concerning the present invention. 本発明に係るリテーナの実施形態を模式的に示す要部斜視説明図である。It is principal part perspective explanatory drawing which shows typically embodiment of the retainer which concerns on this invention. 本発明に係るリテーナの実施形態における装着作業状態を模式的に示す説明図である。It is explanatory drawing which shows typically the mounting work state in embodiment of the retainer which concerns on this invention. 本発明に係る基板収納容器の実施形態における蓋体とリテーナとの位置決め状態を模式的に示す断面説明図である。It is a section explanatory view showing typically a positioning state of a lid and a retainer in an embodiment of a substrate storage container concerning the present invention. 本発明に係るリテーナ及び基板収納容器の実施形態における半導体ウェーハの保持状態を模式的に示す説明図である。It is explanatory drawing which shows typically the holding | maintenance state of the semiconductor wafer in embodiment of the retainer which concerns on this invention, and a substrate storage container. 本発明に係るリテーナ及び基板収納容器の実施形態を模式的に示す説明図である。It is explanatory drawing which shows typically embodiment of the retainer and board | substrate storage container which concern on this invention. 本発明に係るリテーナ及び基板収納容器の第2の実施形態における蓋体等を模式的に示す説明図である。It is explanatory drawing which shows typically the cover body etc. in 2nd Embodiment of the retainer and board | substrate storage container which concern on this invention. 本発明に係るリテーナ及び基板収納容器の第2の実施形態を模式的に示す説明図である。It is explanatory drawing which shows typically 2nd Embodiment of the retainer and board | substrate storage container which concern on this invention. 本発明に係るリテーナ及び基板収納容器の第3の実施形態を模式的に示す全体斜視説明図である。It is a whole perspective explanatory view showing a 3rd embodiment of a retainer and a substrate storage container concerning the present invention typically. 本発明に係るリテーナ及び基板収納容器の第3の実施形態におけるリテーナを模式的に示す正面説明図である。It is front explanatory drawing which shows typically the retainer in 3rd Embodiment of the retainer and board | substrate storage container which concern on this invention. 本発明に係るリテーナ及び基板収納容器の第3の実施形態を模式的に示す側面説明図である。It is side surface explanatory drawing which shows typically 3rd Embodiment of the retainer and board | substrate storage container which concern on this invention.

符号の説明Explanation of symbols

1 容器本体
1A 容器本体
10 蓋体
10A 蓋体
11 筐体
13 裏面中央部
14 位置決め突起
15 ストッパ
16 係合爪
17 固定突起
20 リテーナ
21 枠体
22 対向片
23 架設片
24 位置決め部
25 屈曲部
26 リブ
27 逃がし溝
28 凹凸
29 弾性片
30 保持部
31 第一弾性片
32 自由端部
33 第二弾性片
34 外側端部
35 第一の保持部
36 第二の保持部
39 傾斜面
40 保持溝
41 突起
45 平行片
W 半導体ウェーハ(基板)
DESCRIPTION OF SYMBOLS 1 Container main body 1A Container main body 10 Cover body 10A Cover body 11 Housing | casing 13 Back surface center part 14 Positioning protrusion 15 Stopper 16 Engagement claw 17 Fixing protrusion 20 Retainer 21 Frame body 22 Opposing piece 23 Positioning piece 24 Positioning part 25 Bending part 26 Rib 27 Escape groove 28 Concavity and convexity 29 Elastic piece 30 Holding portion 31 First elastic piece 32 Free end portion 33 Second elastic piece 34 Outer end portion 35 First holding portion 36 Second holding portion 39 Inclined surface 40 Holding groove 41 Projection 45 Parallel piece W Semiconductor wafer (substrate)

Claims (6)

蓋体に装着される枠体と、この枠体の一対の対向片からそれぞれ突出する一対の弾性片と、この一対の弾性片に形成されて基板の端部周縁を保持する保持部とを備え、洗浄水により洗浄されるリテーナであって、
枠体を、間隔をおいて対向する一対の対向片と、この一対の対向片の両端部間にそれぞれ架設される一対の架設片とから形成し、これら対向片と架設片のうち、少なくとも対向片の蓋体に対向する裏面の長手方向に、洗浄水の水切り性を向上させる複数の凹凸部を間隔をおいて交互に形成し、対向片の裏面中央部には、蓋体の位置決め突起に嵌合して位置決め精度を向上させる位置決め部を凹み形成したことを特徴とするリテーナ。
A frame body mounted on the lid body, a pair of elastic pieces projecting from the pair of opposing pieces of the frame body, and a holding part formed on the pair of elastic pieces to hold the peripheral edge of the substrate. A retainer which is washed with washing water,
The frame body is formed of a pair of facing pieces facing each other at an interval, and a pair of erected pieces respectively installed between both ends of the pair of facing pieces , and at least the facing pieces of the facing pieces and the erected pieces are opposed to each other. In the longitudinal direction of the back surface facing the lid of the piece, a plurality of concave and convex portions that improve the drainability of the washing water are alternately formed at intervals, and in the center of the back surface of the facing piece, the positioning projection of the lid A retainer characterized in that a positioning portion for fitting and improving positioning accuracy is formed in a recess .
枠体の対向片と架設片の少なくともいずれか一方に、枠体を変形させるバネ性の屈曲部を形成するとともに、位置決め部を形成した請求項1記載のリテーナ。   The retainer according to claim 1, wherein a spring-like bent portion that deforms the frame body is formed on at least one of the opposing piece and the installation piece of the frame body, and a positioning portion is formed. 一対の弾性片を、枠体の一対の対向片からそれぞれ突出して相互に接近する一対の第一弾性片と、この一対の第一弾性片の屈曲した自由端部に支持されて基板を保持する第二弾性片とから形成し、
第一弾性片の自由端部よりも枠体の対向片寄りの外側に第二弾性片の外側端部を位置させ、この外側端部と保持部とを一体化するようにした請求項1又は2記載のリテーナ。
The pair of elastic pieces are supported by the pair of first elastic pieces that protrude from the pair of opposing pieces of the frame and approach each other, and the bent free ends of the pair of first elastic pieces to hold the substrate. Formed from the second elastic piece,
The outer end portion of the second elastic piece is positioned outside the free end portion of the first elastic piece closer to the opposing piece of the frame body, and the outer end portion and the holding portion are integrated. The retainer according to 2.
保持部は、一対の傾斜面により断面略V字形あるいは略Y字形の保持溝を形成する突起を備え、この突起の一対の傾斜面を上下左右非対称に形成した請求項1、2、又は3記載のリテーナ。   The holding part includes a protrusion that forms a holding groove having a substantially V-shaped or substantially Y-shaped cross section by a pair of inclined surfaces, and the pair of inclined surfaces of the protrusions are formed asymmetrically in the vertical and horizontal directions. Retainer. 保持部を第一、第二の保持部に分割してこれらを第二弾性片に間隔をおいて形成し、第一の保持部よりも第二の保持部を第二弾性片の外側端部側に位置させるようにした請求項4記載のリテーナ。   The holding portion is divided into first and second holding portions, and these are formed with a space between the second elastic pieces, and the second holding portion is arranged outside the first elastic piece with respect to the outer end portion of the second elastic piece. The retainer according to claim 4, wherein the retainer is positioned on a side. 基板を収納する容器本体の開口部を、洗浄水により洗浄される着脱自在の蓋体で開閉する基板収納容器であって、
蓋体の基板に対向する対向面に、請求項1ないし5いずれかに記載のリテーナを取り付け、蓋体の対向面にリテーナの凹凸部を向けるようにしたことを特徴とする基板収納容器。
A substrate storage container that opens and closes an opening of a container body that stores a substrate with a removable lid that is cleaned with cleaning water,
6. A substrate storage container, wherein the retainer according to any one of claims 1 to 5 is attached to a facing surface of the lid facing the substrate, and the concave and convex portions of the retainer are directed to the facing surface of the lid.
JP2007298979A 2007-11-19 2007-11-19 Retainer and substrate storage container Active JP4852023B2 (en)

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