JP2006119601A5 - - Google Patents

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Publication number
JP2006119601A5
JP2006119601A5 JP2005232946A JP2005232946A JP2006119601A5 JP 2006119601 A5 JP2006119601 A5 JP 2006119601A5 JP 2005232946 A JP2005232946 A JP 2005232946A JP 2005232946 A JP2005232946 A JP 2005232946A JP 2006119601 A5 JP2006119601 A5 JP 2006119601A5
Authority
JP
Japan
Prior art keywords
modulation element
degrees
light modulation
light
reflection bands
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005232946A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006119601A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005232946A priority Critical patent/JP2006119601A/ja
Priority claimed from JP2005232946A external-priority patent/JP2006119601A/ja
Priority to US11/233,657 priority patent/US7317511B2/en
Publication of JP2006119601A publication Critical patent/JP2006119601A/ja
Publication of JP2006119601A5 publication Critical patent/JP2006119601A5/ja
Pending legal-status Critical Current

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JP2005232946A 2004-09-24 2005-08-11 光変調素子及びそれを利用した光学装置 Pending JP2006119601A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005232946A JP2006119601A (ja) 2004-09-24 2005-08-11 光変調素子及びそれを利用した光学装置
US11/233,657 US7317511B2 (en) 2004-09-24 2005-09-23 Light modulator, and optical apparatus using the same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004278224 2004-09-24
JP2005232946A JP2006119601A (ja) 2004-09-24 2005-08-11 光変調素子及びそれを利用した光学装置

Publications (2)

Publication Number Publication Date
JP2006119601A JP2006119601A (ja) 2006-05-11
JP2006119601A5 true JP2006119601A5 (https=) 2008-09-25

Family

ID=36098654

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005232946A Pending JP2006119601A (ja) 2004-09-24 2005-08-11 光変調素子及びそれを利用した光学装置

Country Status (2)

Country Link
US (1) US7317511B2 (https=)
JP (1) JP2006119601A (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5703069B2 (ja) * 2010-09-30 2015-04-15 株式会社Ｓｃｒｅｅｎホールディングス 描画装置および描画方法
NL2009850A (en) 2011-12-02 2013-06-05 Asml Netherlands Bv Lithographic method and apparatus.
JP2013205799A (ja) * 2012-03-29 2013-10-07 Furukawa Electric Co Ltd:The Ｍｅｍｓ素子、光スイッチ、波長選択光スイッチ、波長ブロッカー、およびビームステアリング方法
KR102065107B1 (ko) 2013-05-20 2020-02-12 삼성디스플레이 주식회사 무마스크 노광 장치
JP7821650B2 (ja) * 2022-03-24 2026-02-27 株式会社Ｓｃｒｅｅｎホールディングス 可変光減衰器

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5148157A (en) * 1990-09-28 1992-09-15 Texas Instruments Incorporated Spatial light modulator with full complex light modulation capability
US5312513A (en) * 1992-04-03 1994-05-17 Texas Instruments Incorporated Methods of forming multiple phase light modulators
JP3550861B2 (ja) * 1996-03-19 2004-08-04 松下電器産業株式会社 光偏向装置
JPH11237602A (ja) 1998-02-20 1999-08-31 Sony Corp 液晶プロジェクタ装置
US6335831B2 (en) * 1998-12-18 2002-01-01 Eastman Kodak Company Multilevel mechanical grating device
US6489984B1 (en) * 1998-12-29 2002-12-03 Kenneth C. Johnson Pixel cross talk suppression in digital microprinters
US6479811B1 (en) * 2000-03-06 2002-11-12 Eastman Kodak Company Method and system for calibrating a diffractive grating modulator
JP2001264626A (ja) * 2000-03-15 2001-09-26 Canon Inc 回折光学素子を有する光学系
JP2002162599A (ja) * 2000-11-24 2002-06-07 Sony Corp 立体画像表示装置
GB0107742D0 (en) * 2001-03-28 2001-05-16 Swan Thomas & Co Ltd Spatial light modulators
JP2003059804A (ja) 2001-08-15 2003-02-28 Sony Corp パターン形成装置及びパターン製造方法
US6829092B2 (en) * 2001-08-15 2004-12-07 Silicon Light Machines, Inc. Blazed grating light valve
US7106490B2 (en) * 2001-12-14 2006-09-12 Micronic Laser Systems Ab Methods and systems for improved boundary contrast
JP4337403B2 (ja) * 2002-05-28 2009-09-30 ソニー株式会社 光回折変調装置、光回折変調素子調整装置、光回折変調素子調整方法、及び画像表示装置
US7016014B2 (en) * 2004-02-27 2006-03-21 Asml Netherlands B.V Lithographic apparatus and device manufacturing method
US6967711B2 (en) * 2004-03-09 2005-11-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US6963434B1 (en) * 2004-04-30 2005-11-08 Asml Holding N.V. System and method for calculating aerial image of a spatial light modulator
US7116404B2 (en) * 2004-06-30 2006-10-03 Asml Netherlands B.V Lithographic apparatus and device manufacturing method

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