JP2006119490A5 - - Google Patents
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- JP2006119490A5 JP2006119490A5 JP2004309129A JP2004309129A JP2006119490A5 JP 2006119490 A5 JP2006119490 A5 JP 2006119490A5 JP 2004309129 A JP2004309129 A JP 2004309129A JP 2004309129 A JP2004309129 A JP 2004309129A JP 2006119490 A5 JP2006119490 A5 JP 2006119490A5
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- JP
- Japan
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Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004309129A JP2006119490A (ja) | 2004-10-25 | 2004-10-25 | 反射屈折型投影光学系及び当該反射屈折型投影光学系を有する露光装置、デバイス製造方法 |
| US11/257,785 US7283294B2 (en) | 2004-10-25 | 2005-10-24 | Catadioptric projection optical system, exposure apparatus having the same, device fabrication method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004309129A JP2006119490A (ja) | 2004-10-25 | 2004-10-25 | 反射屈折型投影光学系及び当該反射屈折型投影光学系を有する露光装置、デバイス製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006119490A JP2006119490A (ja) | 2006-05-11 |
| JP2006119490A5 true JP2006119490A5 (enExample) | 2006-08-10 |
Family
ID=36206296
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004309129A Pending JP2006119490A (ja) | 2004-10-25 | 2004-10-25 | 反射屈折型投影光学系及び当該反射屈折型投影光学系を有する露光装置、デバイス製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7283294B2 (enExample) |
| JP (1) | JP2006119490A (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| WO2005031397A2 (en) * | 2003-09-26 | 2005-04-07 | Zetetic Institute | Catoptric and catadioptric imaging systems with pellicle and aperture-array beam-splitters and non-adaptive and adaptive catoptric surfaces |
| US20080151365A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
| KR101213831B1 (ko) | 2004-05-17 | 2012-12-24 | 칼 짜이스 에스엠티 게엠베하 | 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
| WO2008003442A1 (en) | 2006-07-03 | 2008-01-10 | Carl Zeiss Smt Ag | Method for revising/repairing a lithographic projection objective |
| US10996448B2 (en) * | 2018-07-26 | 2021-05-04 | Fujifilm Corporation | Imaging optical system, projection display device, and imaging apparatus having a catoptric system and a dioptric system |
| CN113302536B (zh) * | 2019-01-23 | 2023-04-18 | 株式会社尼康 | 拍摄装置 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62210415A (ja) | 1986-03-12 | 1987-09-16 | Matsushita Electric Ind Co Ltd | 精密複写用投影光学系 |
| DE3787035T2 (de) * | 1986-03-12 | 1994-03-10 | Matsushita Electric Ind Co Ltd | Optisches Projektionssystem für Präzisionskopien. |
| US4757354A (en) * | 1986-05-02 | 1988-07-12 | Matsushita Electrical Industrial Co., Ltd. | Projection optical system |
| JPS62258414A (ja) | 1986-05-02 | 1987-11-10 | Matsushita Electric Ind Co Ltd | 精密複写用投影光学系 |
| US4953960A (en) | 1988-07-15 | 1990-09-04 | Williamson David M | Optical reduction system |
| JP2847883B2 (ja) | 1990-03-30 | 1999-01-20 | 株式会社ニコン | 反射屈折縮小投影光学系 |
| US5220454A (en) * | 1990-03-30 | 1993-06-15 | Nikon Corporation | Cata-dioptric reduction projection optical system |
| JPH05188298A (ja) | 1991-08-05 | 1993-07-30 | Nikon Corp | 反射屈折縮小投影光学系 |
| US5668673A (en) * | 1991-08-05 | 1997-09-16 | Nikon Corporation | Catadioptric reduction projection optical system |
| JP3690819B2 (ja) | 1993-02-03 | 2005-08-31 | 株式会社ニコン | 投影光学系、それを用いた露光装置及び露光方法 |
| US5592329A (en) * | 1993-02-03 | 1997-01-07 | Nikon Corporation | Catadioptric optical system |
| JP3747951B2 (ja) | 1994-11-07 | 2006-02-22 | 株式会社ニコン | 反射屈折光学系 |
| US5650877A (en) * | 1995-08-14 | 1997-07-22 | Tropel Corporation | Imaging system for deep ultraviolet lithography |
| DE69933973T2 (de) | 1998-07-29 | 2007-06-28 | Carl Zeiss Smt Ag | Katadioptrisches optisches system und damit ausgestattete belichtungsvorrichtung |
| DE10127227A1 (de) | 2001-05-22 | 2002-12-05 | Zeiss Carl | Katadioptrisches Reduktionsobjektiv |
| EP1480065A3 (en) * | 2003-05-23 | 2006-05-10 | Canon Kabushiki Kaisha | Projection optical system, exposure apparatus, and device manufacturing method |
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2004
- 2004-10-25 JP JP2004309129A patent/JP2006119490A/ja active Pending
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2005
- 2005-10-24 US US11/257,785 patent/US7283294B2/en not_active Expired - Fee Related