JP2006119490A - 反射屈折型投影光学系及び当該反射屈折型投影光学系を有する露光装置、デバイス製造方法 - Google Patents

反射屈折型投影光学系及び当該反射屈折型投影光学系を有する露光装置、デバイス製造方法 Download PDF

Info

Publication number
JP2006119490A
JP2006119490A JP2004309129A JP2004309129A JP2006119490A JP 2006119490 A JP2006119490 A JP 2006119490A JP 2004309129 A JP2004309129 A JP 2004309129A JP 2004309129 A JP2004309129 A JP 2004309129A JP 2006119490 A JP2006119490 A JP 2006119490A
Authority
JP
Japan
Prior art keywords
optical system
imaging
catadioptric projection
lens
intermediate image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004309129A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006119490A5 (enExample
Inventor
Yuji Katashiba
悠二 片芝
Chiaki Terasawa
千明 寺沢
Hideki Morishima
英樹 森島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004309129A priority Critical patent/JP2006119490A/ja
Priority to US11/257,785 priority patent/US7283294B2/en
Publication of JP2006119490A publication Critical patent/JP2006119490A/ja
Publication of JP2006119490A5 publication Critical patent/JP2006119490A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004309129A 2004-10-25 2004-10-25 反射屈折型投影光学系及び当該反射屈折型投影光学系を有する露光装置、デバイス製造方法 Pending JP2006119490A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004309129A JP2006119490A (ja) 2004-10-25 2004-10-25 反射屈折型投影光学系及び当該反射屈折型投影光学系を有する露光装置、デバイス製造方法
US11/257,785 US7283294B2 (en) 2004-10-25 2005-10-24 Catadioptric projection optical system, exposure apparatus having the same, device fabrication method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004309129A JP2006119490A (ja) 2004-10-25 2004-10-25 反射屈折型投影光学系及び当該反射屈折型投影光学系を有する露光装置、デバイス製造方法

Publications (2)

Publication Number Publication Date
JP2006119490A true JP2006119490A (ja) 2006-05-11
JP2006119490A5 JP2006119490A5 (enExample) 2006-08-10

Family

ID=36206296

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004309129A Pending JP2006119490A (ja) 2004-10-25 2004-10-25 反射屈折型投影光学系及び当該反射屈折型投影光学系を有する露光装置、デバイス製造方法

Country Status (2)

Country Link
US (1) US7283294B2 (enExample)
JP (1) JP2006119490A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016146000A (ja) * 2006-07-03 2016-08-12 カール・ツァイス・エスエムティー・ゲーエムベーハー リソグラフィ投影対物器械を修正／修理する方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
WO2005031397A2 (en) * 2003-09-26 2005-04-07 Zetetic Institute Catoptric and catadioptric imaging systems with pellicle and aperture-array beam-splitters and non-adaptive and adaptive catoptric surfaces
US20080151365A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR101213831B1 (ko) 2004-05-17 2012-12-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US10996448B2 (en) * 2018-07-26 2021-05-04 Fujifilm Corporation Imaging optical system, projection display device, and imaging apparatus having a catoptric system and a dioptric system
CN113302536B (zh) * 2019-01-23 2023-04-18 株式会社尼康 拍摄装置

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62210415A (ja) 1986-03-12 1987-09-16 Matsushita Electric Ind Co Ltd 精密複写用投影光学系
DE3787035T2 (de) * 1986-03-12 1994-03-10 Matsushita Electric Ind Co Ltd Optisches Projektionssystem für Präzisionskopien.
US4757354A (en) * 1986-05-02 1988-07-12 Matsushita Electrical Industrial Co., Ltd. Projection optical system
JPS62258414A (ja) 1986-05-02 1987-11-10 Matsushita Electric Ind Co Ltd 精密複写用投影光学系
US4953960A (en) 1988-07-15 1990-09-04 Williamson David M Optical reduction system
JP2847883B2 (ja) 1990-03-30 1999-01-20 株式会社ニコン 反射屈折縮小投影光学系
US5220454A (en) * 1990-03-30 1993-06-15 Nikon Corporation Cata-dioptric reduction projection optical system
JPH05188298A (ja) 1991-08-05 1993-07-30 Nikon Corp 反射屈折縮小投影光学系
US5668673A (en) * 1991-08-05 1997-09-16 Nikon Corporation Catadioptric reduction projection optical system
JP3690819B2 (ja) 1993-02-03 2005-08-31 株式会社ニコン 投影光学系、それを用いた露光装置及び露光方法
US5592329A (en) * 1993-02-03 1997-01-07 Nikon Corporation Catadioptric optical system
JP3747951B2 (ja) 1994-11-07 2006-02-22 株式会社ニコン 反射屈折光学系
US5650877A (en) * 1995-08-14 1997-07-22 Tropel Corporation Imaging system for deep ultraviolet lithography
DE69933973T2 (de) 1998-07-29 2007-06-28 Carl Zeiss Smt Ag Katadioptrisches optisches system und damit ausgestattete belichtungsvorrichtung
DE10127227A1 (de) 2001-05-22 2002-12-05 Zeiss Carl Katadioptrisches Reduktionsobjektiv
EP1480065A3 (en) * 2003-05-23 2006-05-10 Canon Kabushiki Kaisha Projection optical system, exposure apparatus, and device manufacturing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016146000A (ja) * 2006-07-03 2016-08-12 カール・ツァイス・エスエムティー・ゲーエムベーハー リソグラフィ投影対物器械を修正／修理する方法
US10042265B2 (en) 2006-07-03 2018-08-07 Carl Zeiss Smt Gmbh Lithographic projection objective

Also Published As

Publication number Publication date
US20060088320A1 (en) 2006-04-27
US7283294B2 (en) 2007-10-16

Similar Documents

Publication Publication Date Title
KR100678484B1 (ko) 투영광학계, 노광장치 및 디바이스의 제조방법
US9606443B2 (en) Reducing immersion projection optical system
US9500943B2 (en) Projection optical system, exposure apparatus, and exposure method
CN101216682B (zh) 投影光学系统、曝光装置及曝光方法
US7317571B2 (en) Catadioptric projection optical system, exposure apparatus having the same, device fabrication method
JP2005039211A (ja) 投影光学系、露光装置及びデバイスの製造方法
US7253971B2 (en) Catadioptric projection optical system and exposure apparatus having the same
US7268952B2 (en) Catadioptric projection system, and exposure apparatus having the same
US7283294B2 (en) Catadioptric projection optical system, exposure apparatus having the same, device fabrication method
JP2005107362A (ja) 投影光学系及び露光装置、デバイスの製造方法
JP2005037896A (ja) 投影光学系、露光装置及びデバイスの製造方法
JP2015132843A (ja) 投影光学系、露光装置、露光方法、およびデバイス製造方法
JP2016136273A (ja) 投影光学系、露光装置、露光方法、およびデバイス製造方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060623