JP2006117559A - トリメチルシランの精製方法 - Google Patents
トリメチルシランの精製方法 Download PDFInfo
- Publication number
- JP2006117559A JP2006117559A JP2004305306A JP2004305306A JP2006117559A JP 2006117559 A JP2006117559 A JP 2006117559A JP 2004305306 A JP2004305306 A JP 2004305306A JP 2004305306 A JP2004305306 A JP 2004305306A JP 2006117559 A JP2006117559 A JP 2006117559A
- Authority
- JP
- Japan
- Prior art keywords
- trimethylsilane
- oxide
- activated carbon
- zinc oxide
- copper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 title claims abstract description 26
- 238000000034 method Methods 0.000 title claims abstract description 21
- 238000007670 refining Methods 0.000 title abstract 2
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims abstract description 41
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 35
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims abstract description 33
- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical class C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000011787 zinc oxide Substances 0.000 claims abstract description 16
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical class [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 claims abstract description 15
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 8
- 229910000077 silane Inorganic materials 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 239000004065 semiconductor Substances 0.000 abstract description 6
- 239000005751 Copper oxide Substances 0.000 abstract description 5
- 229910000431 copper oxide Inorganic materials 0.000 abstract description 5
- 150000004756 silanes Chemical class 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 2
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 9
- 239000012535 impurity Substances 0.000 description 8
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 6
- 238000002156 mixing Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 238000009835 boiling Methods 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- 239000005051 trimethylchlorosilane Substances 0.000 description 3
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- 238000007323 disproportionation reaction Methods 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910000103 lithium hydride Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000005046 Chlorosilane Substances 0.000 description 1
- 229910010082 LiAlH Inorganic materials 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 239000003610 charcoal Substances 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- HJXBDPDUCXORKZ-UHFFFAOYSA-N diethylalumane Chemical compound CC[AlH]CC HJXBDPDUCXORKZ-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000012280 lithium aluminium hydride Substances 0.000 description 1
- -1 lithium aluminum hydride Chemical compound 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- ZFAYZXMSTVMBLX-UHFFFAOYSA-J silicon(4+);tetrachloride Chemical compound [Si+4].[Cl-].[Cl-].[Cl-].[Cl-] ZFAYZXMSTVMBLX-UHFFFAOYSA-J 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 238000009849 vacuum degassing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Abstract
【解決手段】 少なくとも酸化銅(II)および酸化亜鉛を混合固化させた活性炭を用いてトリメチルシラン中のシラン、メチルシラン、ジメチルシランを吸着除去する。
【選択図】 なし
Description
和光純薬製の酸化亜鉛 (〜5μm)5gと酸化銅(II)5gとを水200mlに分散懸濁させ、pH9に調整して和光純薬製の活性炭(顆粒状)を100g混入し、活性炭に酸化亜鉛、酸化銅を添着した。ろ過後の活性炭を400℃で熱処理し、酸化亜鉛と酸化銅を活性炭に固定化した。酸化亜鉛および酸化銅(II)の固形分割合は、ICP発光分光分析より求めたところ、それぞれ5wt%であった。
充填塔に流通させるガスとしてシラン10volppm、メチルシラン65volppm、ジメチルシラン320volppm含有するトリメチルシランを用いる以外は実施例1と同様の方法で流通させた。充填塔出口のガス中のシラン、メチルシラン、ジメチルシランの濃度は、いずれも1volppm以下であった。
実施例1で使用した充填塔を用いて、メチルシラン328volppm、ジメチルシラン1090volppmを含むトリメチルシランを大気圧下、100sccmで8時間流通させた。
酸化銅(II)、酸化亜鉛を含有しない活性炭を用いる以外は実施例1と同様の方法で充填塔を作製し、メチルシラン288volppm、ジメチルシラン860volppmを含むトリメチルシランを大気圧下、100sccmで流通させた。充填塔出口のガス中のメチルシラン濃度は、238volppm、ジメチルシラン濃度は81volppmであった。
Claims (1)
- 少なくとも酸化銅(II)および酸化亜鉛を混合固定化させた活性炭を用いてトリメチルシラン中のシラン、メチルシラン、ジメチルシランを吸着除去することを特徴とするトリメチルシランの精製方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004305306A JP4437733B2 (ja) | 2004-10-20 | 2004-10-20 | トリメチルシランの精製方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004305306A JP4437733B2 (ja) | 2004-10-20 | 2004-10-20 | トリメチルシランの精製方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006117559A true JP2006117559A (ja) | 2006-05-11 |
JP4437733B2 JP4437733B2 (ja) | 2010-03-24 |
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Application Number | Title | Priority Date | Filing Date |
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JP2004305306A Expired - Lifetime JP4437733B2 (ja) | 2004-10-20 | 2004-10-20 | トリメチルシランの精製方法 |
Country Status (1)
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JP (1) | JP4437733B2 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013125262A1 (ja) | 2012-02-21 | 2013-08-29 | セントラル硝子株式会社 | トリメチルシランの精製方法 |
CN109336919A (zh) * | 2018-11-02 | 2019-02-15 | 辽宁新邦新材料有限公司 | 有机硅材料的前体材料的纯化方法和装置 |
-
2004
- 2004-10-20 JP JP2004305306A patent/JP4437733B2/ja not_active Expired - Lifetime
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013125262A1 (ja) | 2012-02-21 | 2013-08-29 | セントラル硝子株式会社 | トリメチルシランの精製方法 |
JP2013170139A (ja) * | 2012-02-21 | 2013-09-02 | Central Glass Co Ltd | トリメチルシランの精製方法 |
CN104136447A (zh) * | 2012-02-21 | 2014-11-05 | 中央硝子株式会社 | 三甲基硅烷的纯化方法 |
TWI480284B (zh) * | 2012-02-21 | 2015-04-11 | Central Glass Co Ltd | Purification method of trimethylsilane |
US20150119596A1 (en) * | 2012-02-21 | 2015-04-30 | Central Glass Company, Limited | Method for refining trimethylsilane |
US9073953B2 (en) | 2012-02-21 | 2015-07-07 | Central Glass Company, Limted | Method for refining trimethylsilane |
CN104136447B (zh) * | 2012-02-21 | 2016-04-13 | 中央硝子株式会社 | 三甲基硅烷的纯化方法 |
CN109336919A (zh) * | 2018-11-02 | 2019-02-15 | 辽宁新邦新材料有限公司 | 有机硅材料的前体材料的纯化方法和装置 |
Also Published As
Publication number | Publication date |
---|---|
JP4437733B2 (ja) | 2010-03-24 |
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